3073 results about "Dielectric plate" patented technology

Substrates are contained in substrate containing holes which penetrate a tray in the thickness direction. A dielectric plate in a chamber is provided with a tray supporting surface which supports the lower surface of the tray and substrate placing sections which protrude upward, and has an electrostatic chuck electrode therein. The substrate supporting section which supports the substrate contained in the substrate containing holes is provided with a plurality of protruding sections formed at intervals in the circumferential direction of the substrate containing holes. The substrates are supported in point-contact mode by means of the protruding sections.

A tray 15 for a dry etching apparatus 1 has substrate accommodation holes 19A to 19D penetrating thickness direction and a substrate support portion 21 supporting an outer peripheral edge portion of a lower surface 2a of a substrate 2. A dielectric plate 23 has a tray support surface 28 supporting a lower surface of the tray 15, substrate placement portions 29A through 29D inserted from a lower surface side of the tray 15 into the substrate accommodation holes 19A through 19D and having a substrate placement surface 31 at its upper end surface for placing the substrate 2. A dc voltage applying mechanism 43 applies a dc voltage to an electrostatic attraction electrode 40. A heat conduction gas supply mechanism 45 supplies a heat conduction gas between the substrate 2 and substrate placement surface 31. The substrate 2 can be retained on the substrate placement surface 31 with high degree of adhesion. This results in that the cooling efficiency of the substrate 2 is improved and processing is uniformed at the entire region of the substrate surface including the vicinity of the outer peripheral edge.

A plasma processing apparatus includes a beam-shaped spacer 7 which is placed at an upper opening of a chamber 3 opposed to a substrate 2 to support a dielectric plate 8. The dielectric plate 8 is supported by the beam-shaped spacer 7. In the beam-shaped spacer 7 are provided a plurality of process gas introducing ports 31, 36 which have a depression angle θd and which are provided downward and directed toward the substrate 2, as well as a plurality of rare gas introducing ports 41 having a elevation angle θe directed toward the dielectric plate 8. Improvement of processing rates such as etching rate as well as effective suppression of wear of the dielectric plate 8 can be achieved.

A tray 15 for a dry etching apparatus 1 has substrate accommodation holes 19A to 19D penetrating thickness direction and a substrate support portion 21 supporting an outer peripheral edge portion of a lower surface 2a of a substrate 2. A dielectric plate 23 has a tray support surface 28 supporting a lower surface of the tray 15, substrate placement portions 29A through 29D inserted from a lower surface side of the tray 15 into the substrate accommodation holes 19A through 19D and having a substrate placement surface 31 at its upper end surface for placing the substrate 2. A dc voltage applying mechanism 43 applies a dc voltage to an electrostatic attraction electrode 40. A heat conduction gas supply mechanism 45 supplies a heat conduction gas between the substrate 2 and substrate placement surface 31. The substrate 2 can be retained on the substrate placement surface 31 with high degree of adhesion. This results in that the cooling efficiency of the substrate 2 is improved and processing is uniformed at the entire region of the substrate surface including the vicinity of the outer peripheral edge.

A plasma processing system 10 includes a processing chamber 100, a microwave source 900 that outputs a microwave, an inner conductor of a coaxial waveguide 315a that transfers the microwave, a through-hole 305a, a dielectric plate 305 that transmits the microwave transferred through the inner conductor 315a and discharges it into a processing chamber 100, and a metal electrode 310 that is coupled to the inner conductor 315a via the through-hole 305a, the metal electrode 310 being exposed on the surface of the dielectric plate 305 that faces the substrate with at least a portion of the metal electrode 310 being adjacent to the surface of the dielectric plate 305 that faces the substrate. A surface of the exposed surface of the metal electrode 310 is covered by the dielectric cover 320.

Provided is a plasma processing apparatus having a coaxial waveguide structure in which characteristic impedance of an input side and characteristic impedance of an output side are different. A microwave plasma processing apparatus, which plasma-processes a substrate by exciting a gas by using a microwave, includes: a processing container; a microwave source, which outputs a microwave, a first coaxial waveguide, which transmits the microwave output from the microwave source; and a dielectric plate, which is adjacent to the first coaxial waveguide while facing an inner side of the processing container, and emits the microwave transmitted from the first coaxial waveguide into the processing container. A thickness ratio between an inner conductor and an outer conductor of the first coaxial waveguide is not uniform along a longitudinal direction.

An object of the invention is to provide a fan-beam antenna which comprises a flare which is long in a horizontal direction thereof and whose cross section is horn-shaped, and a water-proof box housing components of said antenna, in which a vertical beam width is made narrow without spreading a vertical size to increase gain. Accordingly, this invention is characterized in that a radome radiation surface is constituted of a plurality of dielectric plates equivalently, and at least one of the dielectric plates is made a dielectric lens having a characteristic similar to a convex lens.

A microwave is radiated into a processing chamber (1) from a planar antenna member of an antenna (7) through a dielectric plate (6). With this, a C5F8 gas supplied into the processing chamber (1) from a gas supply member (3) is changed (activated) into a plasma so as to form a fluorine-containing carbon film of a certain thickness on a semiconductor wafer (W). Each time a film forming process of forming a film on one wafer is carried out, a cleaning process and a pre-coating process are carried out. In the cleaning process, the inside of the processing chamber is cleaned with a plasma of an oxygen gas and a hydrogen gas. In the pre-coating process, the C5F8 gas is changed into a plasma, and a pre-coat film of fluorine-containing carbon thinner than the fluorine-containing carbon film formed in the film forming process is formed.

A high-frequency micro-strip line for transmitting a high-frequency wave for a wireless LAN system has a layered structure where, on a ground layer made of a conductive material, a dielectric layer made of a dielectric material and a signal line made of a conductive material are successively laid. The high-frequency micro-strip line further includes a patch antenna comprising a dielectric plate made of a dielectric material and a patch made of a conductive material, which are successively laid into a layered structure, the patch antenna being electrically connected to the signal line. A wireless-communication RF signal transmission device capable of being applied to such a line is also provided.

A tunable filter having a resonator with a resonant frequency dependent upon a variable gap is provided. The variable gap may be controllably altered by use of an actuator. The resonator is a high Q resonator that may be formed by a ring resonator, microsphere, microdisc, or other high Q optical structures. Actuation is preferably achieved through an electrostatic actuator that moves a dielectric plate relative to the resonator in response to measured values of gap and temperature.

An atmospheric pressure plasma assembly (1) comprising a first and second pair of vertically arrayed, parallel spaced-apart planar electrodes (36) with at least one dielectric plate (31) between said first pair, adjacent one electrode and at least one dielectric plate (31) between said second pair adjacent one electrode, the spacing between the dielectric plate and the other dielectric plate or electrode of each of the first and second pairs of electrodes forming a first and second plasma regions (25,60) characterised in that the assembly further comprises a means of transporting a substrate (70,71,72) successively through said first and second plasma regions (25,60) and an atomiser (74) adapted to introduce an atomised liquid or solid coating making material into one of said first or second plasma regions.

A ceramic multilayer capacitor array having a plurality of capacitors in a surface mount compatible package. The array is constructed from a plurality of first dielectric plates, each of which has a first pattern of electrodes, and a plurality of second dielectric plates, each of which has a second pattern of electrodes. The second pattern of electrodes is substantially identical to the first pattern of electrodes, and is shifted with respect to the first pattern of electrodes. Each of the electrodes has at least one tab portion, which extends to at least one of the side faces of the package. Perpendicularly projecting first and second plates, the tab portions of the electrodes in the first plates are free from the tab portions of the electrodes in the second plates.

A meander line phased array antenna element is disclosed. The phased array antenna element has a dielectric plate, a transceiver medium component formed on the dielectric plate by a printed-circuit method and a microstrip line having a strip line for electrical connection with the transceiver medium component and a ground formed on the back of the dielectric plate. Since the phased array antenna element is planar, it can be mounted on any surface, such that the quality of the transmitted and / or received signal is able to be enhanced without any influence on the size of the product using this technique.

The invention discloses a broadband wide beam dual-polarization dipole antenna, belonging to a dipole antenna. The broadband wide beam dual-polarization dipole antenna comprises an antenna cover plate, a reflection plate and a first antenna dielectric slab and a second antenna dielectric slab in cross fixing, wherein the first antenna dielectric slab and the second antenna dielectric slab are mounted on the reflection plate; the antenna cover plate is supported by at least three support columns and placed above the reflection plate, the first antenna dielectric slab and the second antenna dielectric slab; and toothed rails are arranged at the outer parts of the first antenna dielectric plate and the second antenna dielectric plate and also mounted on the reflection plate. By adding the toothed rails around the dipole antenna dielectric slabs, the antenna operation is effectively expanded, and the width of the wide beam is increased; the antenna unit covers the frequency range of 1,710-2,690MHz when the standing wave is less than 1.4, and is directly fed through a microstrip feeder and a through hole with a metalized edge in the reflection plate; and moreover, the processing is easy, the integration of an antenna and a feed network after array formation is facilitated, and the application range is broad.

In a plasma processing apparatus, electromagnetic waves are radiated from slots of waveguides into a processing chamber via dielectric windows that are supported on beams, thereby generating a plasma. A substrate, which is an object of processing, is processed by the generated plasma. Dielectric plates are attached to those surfaces of the beams, which are opposed to the processing chamber. The thickness of each dielectric plate is set at ½ or more of the intra-dielectric wavelength of the electromagnetic waves. Using the plasma processing apparatus, a large-area processing can uniformly be performed.

An exemplary LED package includes a dielectric plate, a heat conductor, a first planar electrode and a second planar electrode, a LED chip, and metal wires. The dielectric plate comprises a receiving groove defined therein. The heat conductor is positioned in the dielectric plate opposite to the receiving groove, and the heat conductor comprises a holding portion exposed on bottom of the receiving groove. The first and second planar electrodes are respectively received in the dielectric plate extending to the receiving groove and are spaced from the heat conductor. The first and second electrodes are respectively electrically connected to the LED chip by the metal wires. The LED chip is mounted on the holding portion of the heat conductor.

The invention belongs to the technical field of reflection systems, and specifically relates to a circularly-polarized tuning modulator based on a tunable metasurface and a design method thereof. The circularly-polarized tuning modulator is mainly composed of an upper microstrip conduction band layer, a middle dielectric plate and a lower metal grounding plate. The upper microstrip conduction band layer is an electric brush structure and is mainly composed of a circular electric resonance (ELC) structure, a bias circuit and a PIN diode. The circular electric resonance (ELC) structure is composed of an upper semicircular arm, a lower semicircular arm, an arc intermediate opening, central vertical arms and intervals. By controlling the on-off state of the PIN diode, the switching from a turning transition function to a turning maintenance function and the switching from a turning hybridization function to the turning maintenance function are realized for the circularly-polarized tuning modulator. According to the invention, two or more function devices are integrated on one plate, the manufacturing cost is lowered, the efficiency and the reusability are improved, the circularly-polarized tuning modulator is realized without a multi-layer torsion chiral structure, and the circularly-polarized tuning modulator is simple in structure, small in size, low in loss, wide in frequency band and light in weight.

The invention discloses a low-profile dual-polarization dipole base station antenna loaded with an AMC reflecting plate. The antenna comprises a dual-polarization planar dipole antenna, four plastic support columns and the AMC reflecting plate. The dual-polarization planar dipole antenna comprises coupling microstrip lines, an upper dielectric plate, a radiating structure and coaxial lines from top to bottom in sequence; the AMC reflecting plate comprises a rectangular patch, a lower dielectric plate, an air dielectric, metal support columns and a metal plate which are periodically arranged from top to bottom in sequence, the coupling microstrip lines and the radiating structure are located on the upper side and the lower side of the upper dielectric plate in the same placing direction, and + / -45-degree dual-polarization is achieved in a coaxial line feeding mode. The dual-polarization planar dipole antenna is fixed to the AMC reflecting plate through the plastic support columns. Accordingly, the AMC reflecting plate is adopted for replacing an original metal reflecting plate, the antenna profile height is lowered to 0.132 lambda 2.2 GHz from 0.264 lambda 2.2 GHz, and meanwhile the advantages of being wide in frequency band, high in isolation, low in cross polarization, low in cost and the like are reserved. The application requirement of the current communication industry is met, and the low-profile dual-polarization dipole base station antenna conforms to the development trend of miniaturization of current base station antennae and has practical reference value.

A Ku-band low-profile dual-frequency dual-polarization array antenna in the field of satellite communication technology, a multi-layer sandwich structure composed of eight layers, followed by a parasitic unit layer, a first dielectric plate layer, an air layer, an excitation unit and a first The polarized feeding matching network layer, the second dielectric board layer, the grounding board layer, the third dielectric board layer and the second polarized feeding matching network layer. The invention can meet the impedance broadband requirement of the receiving and receiving frequency band of the current Ku-band satellite communication, and the isolation degree of the horizontal polarization and the vertical polarization port is better than 30dB.

Provided is a plasma processing apparatus which can perform uniform processing even when a substrate to be processed has a large area. The plasma processing apparatus propagates microwaves introduced into wave guide tubes to dielectric plates through slots, and performs plasma processing to the surface of the substrate by converting a gas supplied into a vacuum container into the plasma state. In the plasma processing apparatus, a plurality of waveguide tubes are arranged in parallel, a plurality of dielectric plates are arranged for each waveguide tube, and partitioning members formed of a conductor and grounded are arranged between the adjacent dielectric plates. The in-tube wavelength of the waveguide tube is adjusted to be an optimum value by vertically moving a plunger. Furthermore, unintended plasma generation is eliminated in a space between the dielectric plate and the adjacent member, and stable plasma can be efficiently generated. As a result, high-speed and uniform processings, such as etching, film-forming, cleaning, ashing, can be performed.

The invention belongs to the technical field of control of microwave band electromagnetic wave, and in particular relates to an ultra-wideband microwave vortex super surface and a wideband design method thereof. The wideband design method comprises the steps of firstly, obtaining a condition of a super surface unit conforming to a PB (Pancharatnam-Berry) geometrical phase under a reflection system by a cascaded matrix method; further obtaining a condition conforming to a wideband PB phase by a dispersion engineering method; secondly, designing two unit structures and parameters which are under orthogonal polarization and conform to multi-mode resonance; and finally, calculating to obtain vortex phase distribution of the vortex super surface under different topological chargers according to a theoretical calculation formula, and applying VBA macro-modeling in CST to achieve a super surface topological structure according to a root seeking algorithm and by rotating the super surface. Therefore, the super surface unit composed of a three-layer metal structure and a two-layer dielectric plate is designed by the invention, and the ultra-wideband microwave vortex super surface is obtained by performing two-dimensional limited periodic extension on a series of super surface units according to certain phase distribution; and the ultra-wideband microwave vortex super surface can generate high-efficiency vortex wave beam between 6-18GHz and has the advantages of ultra wide working bandwidth, high efficiency, simple design, low cost and the like.

An antenna unit includes a substrate (120), an antenna (110) located on one major surface of the substrate (120), a dielectric plate (130) opposed to the major surface of the substrate (120), and a dielectric layer (190) interposed between the substrate (120) and the dielectric plate (130). The dielectric plate (130) has a dielectric constant of not more than the dielectric constant of the substrate (120). The dielectric layer (190) has a dielectric constant smaller than the dielectric constant of the dielectric plate (130).

The invention discloses an array antenna for generating microwave orbital angular momentum based on a phase gradient super-surface. The array antenna is formed by the arrangement of phase shift units (1), each phase shift unit (1) comprises a dielectric plate (3), a metal patch (4) is arranged on the surface of the dielectric plate (3), an upper hole (5) is formed in the middle of the metal patch (4), a metal ground plate (6) is arranged at the bottom of the dielectric plate (3), a lower hole (7) is formed in the middle of the metal ground plate (6), and a metal pipe (8) is arranged at the middle of the dielectric plate (3) and communicates with the upper hole (5) and the lower hole (7). The array antenna has the characteristics of small size, light weight and low cost; meanwhile, the continuous control of the orbital angular momentum in phases of 0 to 2Pi is further achieved, and obvious vortex orbital angular momentum is generated; and moreover, the array antenna has an excellent reflection effect.

The invention discloses a broadband dual-polarized omnidirectional ceiling antenna, which comprises a round bottom plate, an antenna cover, a vertically-polarized antenna and a horizontally-polarized antenna, wherein the bottom plate and the antenna cover are assembled to cover the vertically-polarized antenna and the horizontally-polarized antenna; the vertically-polarized antenna comprises a round vertically-polarized metal plate provided with a through hole at the middle part, a metal support seat fixed in the through hole and having a lead hole, and a radiation oscillator vertically arranged on the metal support seat; the horizontally-polarized antenna is arranged on a round horizontally-polarized dielectric plate; the horizontally-polarized dielectric plate is above the bottom plate; and the vertically-polarized metal plate is above the horizontally-polarized dielectric plate, and a plurality of supporting columns pass through the horizontal dielectric plate and respectively fix and support the vertically-polarized metal plate and the bottom plate. The antenna manufactured according to the invention has strong environment applicability, low standing-wave ratio, high isolation degree, excellent antenna performance and a simple and compact structure.

A radio-frequency radiation source comprises electrodes containing opposing electrodeless parts formed on both sides of a dielectric plate in which the electrodeless parts are made to function as a dielectric resonator, a slit formed in the electrodeless part, and a switching element mounted over the slit. Further, a transmission line coupled to the dielectric resonator is provided. As constructed this way, the resonance frequency of the resonator is switched by turn-on and turn-off of the switching element. When the resonator resonates with the frequency of a signal propagated through the transmission line, the energy of the electromagnetic field is radiated to the outside through a slot.

The invention relates to a microstrip patch antenna with a reconfigurable directional diagram, which belongs to the technical field of antennae. The microstrip patch antenna comprises a metal ground plate on the lower surface of a dielectric plate and a radiation patch on the upper surface of the dielectric plate, wherein the radiation patch consists of a square main radiation patch unit and four appended patch units with same distances from four directions of the square main radiation patch unit; each appended patch unit consists of two rectangular patches connected by an electronic switch; and each electronic switch is respectively controlled by a switch controller. Different switch combinations control different appended patches to perform energy radiation so that a plurality of directional diagrams with multiple working modes can be realized. Meanwhile, the invention has the characteristics of little cross polarization, small size and high gain. The microstrip patch antenna is applicable to different antenna arrays to realize beam forming and scanning.

The invention discloses an artificial magnetic conductor structure-based broadband low-profile dual-polarized omnidirectional antenna, which structurally comprises a horizontally polarized loop antenna, an artificial magnetic conductor reflection plate structure and a vertically polarized antenna, wherein the horizontally polarized loop antenna and the vertically polarized antenna are vertically placed; the loop antenna comprises four pairs of rotationally symmetrical printed dipoles printed on two sides of a first dielectric plate (1); an artificial magnetic conductor comprises periodic patch elements (22) which are printed on the upper surface of the first dielectric plate (1), an air layer between a second dielectric plate (2) and the upper surface of a metal floor (3) and the metal floor (3); and the vertically polarized antenna comprises a metal cone (8), a patch (25) printed on the upper surface of a third dielectric plate (11) and a short-circuit pole (6). The artificial magnetic conductor structure-based broadband low-profile dual-polarized omnidirectional antenna is applied to indoor communication of a miniature mobile communication system and effectively reduces the profile height of the dual-polarized omnidirectional antenna under the premise of ensuring the antenna bandwidth and the non-circularity.

The invention provides a double-layer conductive thin film-based transparent broadband electromagnetic wave absorber and aims at solving the technical problem of a narrow application range of an existing wave absorber. The double-layer conductive thin film-based transparent broadband electromagnetic wave absorber comprises a conductive thin film, a first dielectric layer, a second dielectric layer, a third dielectric layer and a bottom plate, wherein transparent dielectric plates are adopted as the first dielectric layer and the third dielectric layer; the transparent dielectric plate or an air dielectric is adopted as the second dielectric layer; the three dielectric layers are arranged from top to bottom to form the dielectric layers with a stacked structure; a transparent conductive thin film is adopted as the bottom plate and is printed on the lower surface of the third dielectric layer; and the conductive film is formed by compounding m*n arrays formed by square transparent conductive thin films and (m+1)*(n+1) arrays formed by cross-shaped transparent conductive thin films and is printed on the upper surface of the first dielectric layer. High light transmission is achieved while the wave absorption bandwidth and the wave absorption rate are ensured; and the double-layer conductive thin film-based transparent broadband electromagnetic wave absorber can be applied to electromagnetic anti-interference of microwave systems, of aircraft cabin glass, a PCB-based novel inter-chip wireless interconnection system and the like, requiring the high light transmission.