205 results about "Dielectric tube" patented technology

A microwave resonance plasma generating apparatus, a plasma processing system having the same and a method of generating a microwave resonance plasma are provided. The apparatus includes a microwave generating unit which generates a microwave, and a plasma producing unit which produces electrons and photons of high energy using the microwave generated from the microwave generating unit. The plasma producing unit includes a coaxial waveguide having an inner electrode disposed adjacent to the microwave generating unit, an outer electrode connected to the microwave generating unit and disposed to coaxially surround a portion of the inner electrode, the outer electrode being shorter than the inner electrode, and a dielectric tube disposed between the inner electrode and the outer electrode to insulate between the inner electrode and the outer electrode. The coaxial waveguide utilizes a principle of “cut or truncated electrode of coaxial waveguide” and a resonance phenomenon of Langmiur.

Described and shown is a dielectric antenna (1) having a dielectric feeding section (2), a first transition section (3) comprising a dielectric rod, a dielectric emitting section (5) and, a further, second transition section (4) forming a dielectric horn, wherein the feeding section (2) can be struck with electromagnetic radiation (6), electromagnetic radiation (6) can be guided with the first transition section (3) and the second transition section (4) and the electromagnetic radiation can be emitted from the emitting section (5) as airborne waves.The object of the present invention is to provide a dielectric antenna, which is adaptable as low-loss as possible to different mounting situations, which additionally is as low-reflection as possible and, at the same time is highly bundling.The object of the above-mentioned dielectric antenna is met in that the emitting section (5) is designed as dielectric tube connecting to the second transition section (4).

An antenna adapted to apply a uniform electromagnetic field with high energy density to a volume of gas. The antenna includes an input node for receiving electrical energy and a first coil for radiating electromagnetic energy into the gas. The first coil is connected to the input node on one end thereof and is grounded on the opposite side to cause flux to flow in a first direction. A second coil is included for radiating electromagnetic energy into the gas. The second coil is also connected to the input node on one end thereof and grounded on the opposite side to flow in the first direction. Multiple number of coils can be added to form an antenna. In an illustrative application, the antenna is used in a plasma processing system comprising a vacuum chamber, a gas disposed within the vacuum chamber, and a dielectric disposed around the vacuum chamber. The inventive antenna is mounted around the dielectric tube and radiates electromagnetic energy into the gas. In a specific embodiment, the invention further includes a magnet disposed about the chamber in proximity to the antenna. When RF power is supplied to the antenna via an impedance matching network, the antenna radiates a uniform, dense electromagnetic wave into the gas creating plasma. The invention includes an electrically isolated electrode located on top of the source. When (RF) power is supplied to the electrode via on impedance matching network, the electrode creates an electrostatic force that pushes electrons back into plasma there by resulting in high plasma density.

The present invention provides an inexpensive security sensor cable, a method for manufacturing of same and an overall security system for using that sensor cable. The sensor cable consists of a central conductor, an air separator, a polyethylene dielectric tube, an outer conductor and an outer protective jacket. The central conductor is loosely centered in the coaxial cable and thus freely movable relative to the dielectric tube. The sensor cable has application either in a passive sensing system or in an active ranging sensing system to determine the location of an intrusion along the cable. For the passive sensing function, when the center conductor moves, it contacts a suitable dielectric material from the triboelectric series, such as polyethylene, which can be processed to produce a charge transfer by triboelectric effect that is measurable as a terminal voltage. In an active system, the central conductor moves within the dielectric in response to a vibration to provide an impedance change that can be sensed. Conventional radio grade cable may be modified in its construction by removing its dielectric thread to manufacture the sensor cable, thus enabling the center conductor to move freely in the air gap within the dielectric tube. An inexpensive method of manufacturing sensor cable is provided as the cable parts are readily available. Such a sensor cable is advantageous in that the passive triboelectric properties of the cable, in response to a disturbance, can provide a larger voltage response over prior art cables.

Provided is helical resonator plasma processing apparatus. The plasma processing apparatus comprises a process chamber having a substrate holder for supporting a substrate, a dielectric tube disposed on the process chamber to communicate with the process chamber, a helix coil wounded around the dielectric tube, and an RF power source to supply RF power to the helix coil. The dielectric tube has a double tube shape and comprises an inner tube and an outer tube, and a plasma source gas inlet port to supply plasma source gas into a space between the inner tube and the outer tube is disposed in the outer tube. A control electrode to control plasma potential is disposed in the dielectric tube. This plasma processing apparatus provides a uniform plasma density distribution along a radial direction of a wafer, and easy control of the plasma potential in the process chamber.

A system and method are described for providing simultaneously conformal coating of a plurality of three dimensional objects using atomic layer deposition. The system comprises a dielectric tube adapted for maintaining the plurality of objects under vacuum and at least one inlet for providing a gaseous material in the dielectric tube. The dielectric tube used for comprising the objects is mounted rotatable so as to be able to rotate the plurality of objects under vacuum during atomic layer deposition of a coating on the plurality of objects.

The invention discloses a method for directly ionizing samples by low-temperature plasma, and an ion source thereof. The ion source comprises an insulated dielectric tube (1), an inner electrode (2), an outer electrode (3), a working gas inlet (5) and a plasma torch outlet (4). The insulated dielectric tube is a hollow tube with both ends provided with openings contracting inward, and the inner electrode is a bar-shaped electrode or an electrode taking the shape of an hollow tube, and the outer electrode is a bar-shaped electrode; one of the openings contracting inward at both ends of the insulated dielectric tube is a plasma torch outlet; the inner electrode is sheathed on the insulated dielectric tube through the other opening of the insulated dielectric tube, and one end of the inner electrode runs out of the insulated dielectric tube while the other end is positioned in the insulated dielectric tube; the outer electrode covers the insulated dielectric tube. The ion source can determine various organic substances under the atmospheric pressure, with high ionization efficiency and no limitation to the size, the shape and the thickness of samples to be tested. Furthermore, the iron source is applicable to carriers of various materials.

The present invention provides an inexpensive security sensor cable, a method for manufacturing of same and an overall security system for using that sensor cable. The sensor cable consists of a central conductor, an air separator, a polyethylene dielectric tube, an outer conductor and an outer protective jacket. The central conductor is loosely centered in the coaxial cable and thus freely movable relative to the dielectric tube. The sensor cable has application either in a passive sensing system or in an active ranging sensing system to determine the location of an intrusion along the cable. For the passive sensing function, when the center conductor moves, it contacts a suitable dielectric material from the triboelectric series, such as polyethylene, which can be processed to produce a charge transfer by triboelectric effect that is measurable as a terminal voltage. In an active system, the central conductor moves within the dielectric in response to a vibration to provide an impedance change that can be sensed. Conventional radio grade cable may be modified in its construction by removing its dielectric thread to manufacture the sensor cable, thus enabling the center conductor to move freely in the air gap within the dielectric tube. An inexpensive method of manufacturing sensor cable is provided as the cable parts are readily available. Such a sensor cable is advantageous in that the passive triboelectric properties of the cable, in response to a disturbance, can provide a larger voltage response over prior art cables.

A reflectron lens and method are provided. The reflectron lens comprises a tube having a continuous conductive surface along the length of the tube for providing an electric field interior to the tube that varies in strength along the length of the tube. The tube may comprise glass, and in particular, a glass comprising metal ions, such as lead, which may be reduced to form the conductive surface. The method includes a step of introducing a beam of ions into a first end of a dielectric tube having a continuous conductive surface along the length of the tube. The method further includes a step of applying an electric potential across the tube to create an electric field gradient that varies in strength along the length of the tube so the electric field deflects the ions to cause the ions to exit the tube through the first end of the tube.

A plasma body jet flow device belongs to a plasma body generating device and aims at producing plasma body jet flows with long distance, low temperature and rich active compositions, the electrode position is safe, the device is applied in a plurality of discharge. The high voltage electrode of the invention is arranged in an inner dielectric tube and commonly located in an outer dielectric container, power supply is connected with the high voltage electrode, the outer dielectric container is communicated with a working gas source, the inner dielectric tube takes a hollow tubular shape with a sealed single end, the sealed end of the inner dielectric tube is provided with conducting materials which are communicated with one end of the high voltage electrode, the other end of the high voltage electrode in the inner dielectric tube is provided with an insulating plug, and the high voltage electrode is fixed by the insulating block head and the conducting materials. The invention has easy manufacture, good maintenance, safe and convenient use, wide working gas range and changeable temperature, length and thickness of the plasma body jet flows, further develops the range of application of a plasma body technique, and increases the application effects of the plasma body.

The invention relates to a plasma generating device, which aims at carrying out different combinations according to different requirements to generate plasmas with different areas and different shapes, and generating plasmas on one plane or multiple planes, such as cylindrical or conical plasmas. The plasma generating device comprises a power supply, high-voltage electrodes, ground electrodes and dielectric tubes; the high-voltage electrodes and the ground electrodes which are arranged in the dielectric tubes are respectively adjacent, that is to say, the high-voltage electrodes and the ground electrodes are bound to be respectively placed in two adjacent dielectric tubes; and the plasmas can be generated in clearances between the outer walls of the dielectric tubes and the dielectric tubes. The plasmas of which the temperature approaches to room temperature can be generated by using different power supply parameters, thus the application at normal temperature and normal pressure is realized. According to the device, the plasmas of which the temperature approaches to room temperature can be generated according to different shapes in a large area and the dielectric tubes generating the plasmas in the device can be made of bendable material, thus the available range of the device is greatly widened.

A device for producing high power microwave plasmas. The device comprises at least one microwave feed that is surrounded by at least one dielectric tube. A dielectric fluid flows through the space between the microwave feed and the outer dielectric tube. The dielectric fluid has a small dielectric loss factor tan δ in the region of between 10−2 to 10−7. A fluid cools at least the outer dielectric tube.

A gas detector especially adapted for use with gas chromatographs contains two capillary tubing electrodes through which a gas flows. The inner ends of the electrodes are coaxial and are separated by a gap. The outer end of one of the electrodes forms a gas inlet. The gas detector also contains a coaxial dielectric tube spaced apart from and surrounding the electrodes axially, a means for applying a sufficient voltage across the gap between the electrodes to create a discharge within the gas, and a means for measuring a change in properties of the gas as it passes through the gap between the electrodes.

An ozone generating apparatus according to one embodiment includes a hollow cylindrical sealed container provided with an inlet for a feed gas containing oxygen gas and an outlet for an ozonized gas. A discharge tube including a dielectric tube arranged within the container and a first electrode arranged within the dielectric tube is provided in the container. A second electrode is arranged within the container and surrounds the first electrode, spaced apart from the dielectric tube to form a discharge gap between the second electrode and the dielectric tube. The apparatus further includes a discharge voltage source configured to apply a discharging voltage across the first and second electrodes, and a cooling water jacket surrounding the second electrode. The dielectric tube has an outer diameter of 12 mm or more, but 19 mm or less.

A device for locally producing microwave plasma. The device comprises at least one microwave feed that is surrounded by at least one dielectric tube. At least one of the dielectric tubes, such as an outer dielectric tube, is partially surrounded by a metal jacket. A locally delimited plasma is produced by the device by shielding microwaves.

A gas detector designed for use with a gas chromatography system, or alone, comprising a tubular inner electrode, a tubular outer electrode coaxial with the inner electrode, and a dielectric tube axially between the inner electrode and the outer electrode. The dielectric tube serves as a dielectric barrier between the inner electrode and the outer electrode. There is a longitudinal gap between the left end of the outer electrode and the right end of the inner electrode, and a sufficient voltage is applied across the gap between the electrodes to create an electrical discharge which emits light from a gas passing through the gap. The light is then detected and analyzed to determine the chemical constituents of the gas passing through the gap.

The invention discloses a spiral resonator plasma processing equipment. The plasma processing apparatus includes: a processing chamber having a substrate holder supporting a substrate to be processed; a dielectric tube disposed on the processing chamber so as to communicate with an interior space of the processing chamber; a helical coil wound around the outer tube of the dielectric tube; and an RF power supply that supplies RF power to the helical coil. The dielectric tube is in the form of a double tube, including an inner tube and an outer tube. A plasma source gas inlet is arranged in the outer tube to supply the plasma source gas into the space between the inner tube and the outer tube. A control electrode is arranged in the dielectric tube to control the plasma potential. This plasma processing apparatus provides a uniform plasma density distribution along the radial direction of the wafer and facilitates control of the plasma potential within the processing chamber.

An RF antenna assembly is to be positioned within a wellbore in a subterranean formation for hydrocarbon resource recovery. The RF antenna assembly includes a series of tubular dipole antennas to be positioned within the wellbore, each tubular dipole antenna having a pair of dipole elements, and an RF transmission line extending within the series of tubular dipole antennas. The RF antenna assembly includes a respective coupling structure between each pair of dipole elements and between the series of tubular dipole antennas, each coupling structure including a dielectric tube mechanically coupling adjacent dipole elements, and a tap connector carried by the dielectric tube and electrically coupling the RF transmission line to a corresponding dipole element.

The invention discloses a tubular dielectric barrier corona discharge reaction device for a coaxial line, comprising a reactor and a power supply, wherein the reactor comprises a closed shell; the closed shell is provided with a liquid inlet and a liquid outlet and comprises a barrier dielectric tube, a base and a top cover, wherein the base is arranged on one end of the barrier dielectric tube; the top cover is arranged on the other end of the barrier dielectric tube; the barrier dielectric tube is internally provided with a fine line electrode and externally provided with an external electrode; the fine line electrode and the external electrode are electrically connected with the power supply; and the external electrode is connected to the ground. The tubular dielectric barrier corona discharge reaction device for the coaxial line has the advantages of simple structure, small size, uniform and stable discharge, low cost and good biological preprocessing effect on pharmaceutical wastewater.

Model human hands (902) for use in electromagnetic (e.g., microwave and RF) testing comprise a skeleton (1200, 104) of dielectric tubes (142, 148, 166, 170, 174, 178, 206, 208, 210, 1202, 1212, 1214, 1216, 1228, 1230, 1236, 1240, 1242, 194, 195, 196) inside a glove (908) that is filled with a fluid that has electrical properties that match that of a typical human hand at a particular frequency. According to certain embodiments the model hands comprise thumbs (193, 1236) that are located out of a plane of palms of the model hands. According to one embodiment the dielectric tubes are pivotally coupled to each other and biasing means (181,702) are provided to bias the hand into a gripping position so that the model human hand is able to grip different types of wireless communication devices (802) in different ways.

A high voltage bushing includes an electrically conductive coupling having an aperture; first and second dielectric tubes mounted to the coupling so that they are coaxially aligned and have first and second ends, respectively, first and second end plates mounted in a fluid tight manner to the first and second ends of the first and second tubes, respectively; an electrically conductive ground shield mounted in the aperture, and having an inwardly profiled end for moderating an electric field along the bushing, and having second and third apertures; and a center conductor that extends through the second and third apertures of the ground shield, and is mounted to the first and second end plates.

Described and shown is a dielectric antenna (1) having a dielectric feeding section (2), a first transition section (3) comprising a dielectric rod, a dielectric emitting section (5) and, a further, second transition section (4) forming a dielectric horn, wherein the feeding section (2) can be struck with electromagnetic radiation (6), electromagnetic radiation (6) can be guided with the first transition section (3) and the second transition section (4) and the electromagnetic radiation can be emitted from the emitting section (5) as airborne waves.The object of the present invention is to provide a dielectric antenna, which is adaptable as low-loss as possible to different mounting situations, which additionally is as low-reflection as possible and, at the same time is highly bundling.The object of the above-mentioned dielectric antenna is met in that the emitting section (5) is designed as dielectric tube connecting to the second transition section (4).

A plasma generating apparatus includes a chamber, a slow wave antenna and an electromagnetic wave generator. The chamber has an accommodating space. The slow wave antenna has a central conductive tube passing through the accommodating space, and a dielectric tube arranged around the central tube. The electromagnetic wave generator is used for coupling electromagnetic wave into the slow wave antenna. An electromagnetic wave transmitted by the electromagnetic wave generator can pass through the slow wave antenna and radiate into the accommodating space.

A reactor and method for production of nanostructures, including metal oxide nanowires or nanoparticles, are provided. The reactor includes a regulated metal powder delivery system in communication with a dielectric tube; a plasma-forming gas inlet, whereby a plasma-forming gas is delivered substantially longitudinally into the dielectric tube; a sheath gas inlet, whereby a sheath gas is delivered into the dielectric tube; and a microwave energy generator coupled to the dielectric tube, whereby microwave energy is delivered into a plasma-forming gas. The method for producing nanostructures includes providing a reactor to form nanostructures and collecting the formed nanostructures, optionally from a filter located downstream of the dielectric tube.

The invention provides a helicon wave plasma enhanced chemical vapor deposition unit, belonging to the technical field of plasma processing units, in order to achieve the stability and effective feed-in of radio-frequency power and effectively prevent the mode of the helicon wave plasma from hopping. The technical scheme of the invention is as follows that: the helicon wave plasma enhanced chemical vapor deposition unit comprises an external high-voltage power supply, an antenna for exciting the helicon wave plasma, an insulating dielectric tube, a high-vacuum cavity, a coil and an auxiliary coil, wherein the insulating dielectric tube is provided with an air inlet and an inlet air controlling device, and the high-vacuum cavity is provided with a ring-shaped nozzle and a heater; a self-excited radio-frequency oscillating circuit is connected between the external high-voltage power supply and the antenna for exciting the helicon wave plasma. By coupling the radio-frequency electromagnetic field with the helicon wave plasma in a self-excited oscillation manner, the invention can effectively prevent the mode of the helicon wave plasma from hopping, make the generated helicon wave plasma more stable and exploit new development potential for the application of the helicon wave plasma; and the invention further has the advantages of simple circuits, convenient adjustment and low construction cost.

A microstrip antenna suitable for omnidirectional S-band operation is formed by the application of a plurality of microstrip radiating elements to the exterior surface of a dielectric tube. The microstrip radiating elements are fed by a branched microstrip input feed line connected to the elements. In the illustrated embodiment, the microstrip radiating elements are fed in-phase by feed line. A substantially cylindrical reflector tube is disposed within the dielectric tube.

In a continuous flow microwave heater for heating a fluid including a microwave source connected to an applicator so as to supply microwave energy to the applicator, the applicator is a rectangular block-like resonator space with opposite front walls and side walls with a microwave in-coupling opening in one of the side walls through which the microwave energy is supplied to the resonator space in which a linearly polarized base mode TE10 is excited. A dielectric tube extends through the resonator space to conduct the fluid to be heated through the applicator, the dielectric tube being so arranged that the microwave energy supplied to the applicator is completely dis-sipated into the fluid flowing through the dielectric tube.

An RF antenna assembly is positioned within a wellbore in a subterranean formation for hydrocarbon resource recovery. The RF antenna assembly includes first and second tubular conductors and a dielectric isolator therebetween. The dielectric isolator includes a dielectric tube having opposing first and second open ends, a first tubular connector having a first slotted recess receiving therein the first open end of the dielectric tube, and a second tubular connector having a second slotted recess receiving therein the second open end of the dielectric tube.

The invention provides a device and a method for generating uniform and continuous discharge or plasma photonic crystals. The device comprises a discharge mechanism, a gas supply mechanism and a power supply mechanism. The discharge mechanism includes a hollow needle electrode, a dielectric block, and a liquid electrode. The hollow needle electrode is vertically inserted into the dielectric block and is connected with a gas cylinder in the gas supply mechanism through a dielectric tube. The liquid electrode is located below the hollow needle electrode. The hollow needle electrode is electrically connected with the high-voltage output end of a high-voltage DC power supply in the power supply mechanism. The liquid electrode is connected with a ground wire. According to the technical scheme of the invention, only the air in the atmospheric environment is used as a working gas, and the uniform and continuous discharge can be generated between the two electrodes. When an inert gas is introduced into the hollow needle electrode through the dielectric tube, periodically arranged plasma photonic crystals can be generated between the two electrodes. The device utilizes different working gases to generate uniform and continuous discharge or plasma photonic crystals at the atmospheric pressure. Therefore, the diversification of functions is realized.