Helicon wave plasma enhanced chemical vapor deposition unit

Abstract

The invention provides a helicon wave plasma enhanced chemical vapor deposition unit, belonging to the technical field of plasma processing units, in order to achieve the stability and effective feed-in of radio-frequency power and effectively prevent the mode of the helicon wave plasma from hopping. The technical scheme of the invention is as follows that: the helicon wave plasma enhanced chemical vapor deposition unit comprises an external high-voltage power supply, an antenna for exciting the helicon wave plasma, an insulating dielectric tube, a high-vacuum cavity, a coil and an auxiliary coil, wherein the insulating dielectric tube is provided with an air inlet and an inlet air controlling device, and the high-vacuum cavity is provided with a ring-shaped nozzle and a heater; a self-excited radio-frequency oscillating circuit is connected between the external high-voltage power supply and the antenna for exciting the helicon wave plasma. By coupling the radio-frequency electromagnetic field with the helicon wave plasma in a self-excited oscillation manner, the invention can effectively prevent the mode of the helicon wave plasma from hopping, make the generated helicon wave plasma more stable and exploit new development potential for the application of the helicon wave plasma; and the invention further has the advantages of simple circuits, convenient adjustment and low construction cost.

Description

technical field [0001] The invention relates to a helicon wave plasma-enhanced chemical vapor deposition device for preparing films with special performance requirements such as light, electricity and magnetism, and belongs to the technical field of plasma processing equipment. Background technique [0002] The generation of low-pressure plasma is generally realized by gas discharge forms such as DC, AC, radio frequency, and microwave. Radio frequency plasma gas discharge can adopt capacitive coupling and inductive coupling, and has a lower discharge voltage and lower working pressure, which is easy to realize Plasma density, temperature control and other characteristics have been widely used in the fields of semiconductor material synthesis, etching and processing. Low-voltage radio frequency plasma chemical vapor deposition technology uses plasma to realize ionization, decomposition and excitation of chemical reaction gases. The activation of chemical reactions enables the...

AI Technical Summary

Problems solved by technology

At present, the helicon wave plasma generators in the prior art are all connected to an external RF power supply and antenna to realize the coupling of the radio frequency electromagnetic field and the excited helicon wave plasma through other exciting methods. This method requires a matching box or a matching network In order to realize the effective feeding of radio frequency power, and there is a mode hopping phenomenon of helicon wave plasma

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