124results about How to "Arcing suppression" patented technology

A method and apparatus using deep pleated filters to provide efficient and safe electrically enhanced filtering (EEF), with ultra low pressure drop, higher efficiency of particulate removal and higher dirt holding capacity over the life of the filter. An EEF may be constructed with a housing, with or without an internal air moving device such as a fan, a deeply pleated filter, preferably a V-pack filter with sets of downstream ground electrodes and charge transfer electrodes borne by the exterior surface of the filter packs that form the filtering element. An ionizer assembly that ionizes the gas and charges particles entering the deeply pleated filter and also transfers a charge to the charge transfer electrodes on the filter pack. A plate seals the gasket on the filtering element against the ionizing assembly. A high electrical potential is applied to charging elements in the ionizer and, in some embodiments, a fan or motor assembly. The charge transfer electrodes enable the device to function with a high particle collection field between the charge transfer electrodes and the downstream grounded electrodes to safely and efficiently attain higher entrapment of the particles on the filter medium.

An electrical connector is provided that includes a dielectric housing having a plurality of slots therein, and a plurality of electrical contacts disposed within at least one of the slots. A plurality of electrical wafers, are each received in one of the plurality of slots. Each wafer has a first edge and a second edge. Some of the plurality of electrical wafers are signal wafers and some of the plurality of wafers are power wafers. Each of the power wafers includes at least one trace and at least one contact pad. The contact pad is sized to mate with a predetermined number of the plurality of contacts to transfer a predetermined amount of current through the trace.

The present invention discloses an electrical connection device (100) and method for minimizing arcing when the connection device is connected or disconnected under load. The present invention provides an arc suppression circuit in which one or more regulators (114, 116), such as transistors, are integrated into the connection device housing, the arc suppression circuit senses movement of the connection device, and when sensed Shunts current into impedance circuits when a possible arc condition is detected.

A vacuum circuit-breaker wherein one contact body is made with two windings implanted concentric with one another and connected electrically in parallel. The second winding is in the form of an solid part with an annular ring. The circuit-breaker increases the axial magnetic field (AMF) and distributes it uniformly over the contact surface so that arc extinction is improved for high short-circuit currents, typically greater than 63 kA.

A novel connector pair suppresses arcing during connection and disconnection. In one general aspect of the invention, first and second insulating barriers are configured to extend beyond corresponding first and second contacts, the barriers being arranged to cover a leading end of at least one of the contacts, and to engage with each other when the contacts are separated by a small gap, thereby closing off substantially all through-air arcing paths between them. In another general aspect of the invention, at least one electrical contact in a connector pair is a bimetal contact having a transitional segment made from high resistivity metal. The transitional segment is configured to make first and last contact during the initial phases of mating and un-mating, thereby increasing electrical resistance and significantly lowering the electrical current and the energy available for electrical arcing.

Disclosed is a CoCrPt-based sputtering target which is reduced in the size and the quantity of a high-chromium particle having a high chromium atom content unevenly distributed in the sputtering target and therefore has increased target homogeneity, which is reduced in the formation of nodule or arcing, and which has a desired chemical composition. The CoCrPt-based sputtering target comprises cobalt, chromium, a ceramic material and platinum, wherein a high-chromium particle which has a high chromium atom content and is unevenly distributed in the sputtering target has a longest diameter of 40 [mu]m or less.