The invention relates to a low-impedance high-current
coaxial line (1) for a
plasma process
system (10), comprising: a) a tubular heat-conducting electrical insulator (2), for example made of
ceramic, b) an electrical outer conductor (3), which is arranged on the insulator in the form of an outer layer, and c) an electrical inner conductor (4), which is arranged in the insulator in the form of an inner layer, the inner
diameter and the outer
diameter of the insulator (2) are dimensioned in such a way that a line impedance of < = 20
Omega can be achieved, e) wherein the low-impedance high-current
coaxial line (1) is designed to be connected to the impedance
adaptation circuit (6) and the
plasma process component (7), and f) wherein the low-impedance high-current
coaxial line (1) is designed to supply HF power to the
plasma process component (7) by means of an HF power source (9).