The invention provides a
semiconductor structure which comprises a substrate and a multi-channel
heterojunction layer which are arranged in a stacked mode, the multi-channel
heterojunction layer comprises a plurality of
heterojunction layers, each heterojunction layer comprises a channel layer and a
barrier layer, and the multi-channel heterojunction layer is provided with a plurality of grooves; and the P-type epitaxial layer comprises a plurality of first P-type regions for filling the grooves. The transverse PN junction is formed through the first P-type region and the two-dimensional
electron gas in the heterojunction, the
depletion region of the PN junction is broadened during reverse biasing so as to pinch off a
current channel, the Schottky junction with low barrier height is effectively shielded, the
Schottky barrier lowering effect can be inhibited,
reverse leakage current can be controlled, and therefore the
breakdown voltage is improved, and the low turn-on
voltage is kept. And meanwhile, a plurality of parallel two-dimensional
electron gas passages are formed between the
cathode and the
anode by utilizing stacking of a plurality of heterojunctions, so that depletion of two-dimensional
electron gas by the first P-type region is compensated, and the
forward current of the
diode is ensured.