The invention discloses a preparation method of 
zinc nitride thin film. The preparation method comprises following steps: (1) a substrate is placed in a 
reaction chamber of an 
atomic layer deposition apparatus; (2) a 
zinc-containing precursor source is delivered into the 
reaction chamber of the 
atomic layer deposition apparatus so that the 
zinc atoms in the zinc-containing precursor source are absorbed by the surface of the substrate; (3) a 
nitrogen-containing precursor source is delivered into the 
reaction chamber of the 
atomic layer deposition apparatus, and then is ionized using 
plasma, or a 
nitrogen-containing precursor source which is ionized using 
plasma is delivered into the reaction chamber of the atomic layer deposition apparatus, so that a part of the 
nitrogen atoms in the ionized nitrogen-containing precursor source are precipitated, and nitrogen-zinc covalent bonds are formed by the precipitated nitrogen atoms with the zinc atoms on the surface of the substrate; and (4) the step (2) and the step (3) are repeated, so that layer by layer growth of the 
zinc nitride thin film is realized. According to the preparation method, the 
nitrogen source is delivered into an atomic layer deposition 
system using the 
plasma; and various high-quality 
zinc nitride thin films with adjustable 
band gap are obtained by adjusting chamber temperature, vacuum degree, circulating period, conditions of the plasma, and the like.