The invention discloses a
corrosion method for simultaneously corroding zns and
tellurium-
cadmium-mercury, and relates to the technical field of
chip manufacturing, and the method comprises the following steps: providing a
chip with a
zinc sulfide layer and a
tellurium-
cadmium-mercury layer on the surface, forming a graphical
photoresist mask, and exposing an area to be corroded; mixing
hydrobromic acid with
bromine, fully stirring, and standing for 10-20 minutes to obtain a corrosive liquid; immersing the processed
chip into a corrosive liquid, and standing and corroding for 30-60 seconds; taking out the corroded chip, and immediately placing the corroded chip in flowing pure water for standing so as to terminate the
corrosion reaction; the
photoresist mask is removed, and graphical
corrosion of the chip is completed; according to the method, high-quality one-step synchronous corrosion of the ZnS / HgCdTe double-layer structure is realized, inherent defects of a step-by-step process are fundamentally avoided, the
corrosion morphology is uniform and consistent, lateral undercutting is effectively inhibited, the quality is greatly improved, a complex multi-step process is simplified into one step, the dependence on high-skill operators is reduced, the production period is shortened, and the production cost is reduced. The method is more suitable for large-scale automatic production.