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4results about How to "Reduce recombination rate" patented technology

Solar cell, stacked cell, and photovoltaic module

This application relates to the field of solar cell technology, and more particularly to a solar cell, a tandem cell, and a photovoltaic module. The first textured structure of the metallized region includes a raised structure, which includes at least a platform structure. The platform structure includes a side surface and a top platform with micro-pyramids. Both the side surface and the micro-pyramids reflect incident light, which is beneficial to improving the absorption capacity of long-wavelength light. Furthermore, the combination of the side surface and the micro-pyramids helps to reduce the number of relatively large sharp peaks, reduces surface defects, and facilitates the deposition of a passivation layer, thereby reducing the recombination probability of charge carriers and improving the photoelectric conversion efficiency of the solar cell. At the same time, the top platform with micro-pyramids can also allow the electrode paste to fully fill the gaps, increasing the contact area between the electrode and the substrate, which helps to reduce the contact resistance and improve the charge carrier collection efficiency, thereby improving the photoelectric conversion efficiency.
Owner:HUAIAN JIETAI NEW ENERGY TECHNOLOGY CO LTD

Preparation method of double perovskite La2CoFeO6 and its application in degrading odor pollutants

PendingCN122298437AImprove photocatalytic degradation performanceTake advantage ofOxygen vacancyGlycol synthesis
This invention relates to a method for preparing double perovskite La2CoFeO6 and its application in degrading odorous pollutants, comprising the following steps: dissolving La(NO3)3·6H2O, Co(NO3)2·6H2O, and Fe(NO3)3·9H2O in a mixed solution of deionized water and ethylene glycol or deionized water and citric acid, adjusting the pH, and then mixing thoroughly; placing them separately in a high-pressure reactor and heating or evaporating the moisture and drying in an oven to obtain precursor powder or dry gel; then calcining at high temperature and cooling to obtain double perovskite La2CoFeO6 powder. The R3c phase La2CoFeO6 material provided in this application, by combining crystal structure regulation with oxygen vacancy defect engineering, establishes a synergistic enhancement mechanism of "structure optimization + defect regulation" for double perovskite materials, significantly improving the photoresponse capability and catalytic performance of the material, providing a new technical path and material design idea for the design of subsequent high-performance photocatalysts for odor pollution control.
Owner:TIANJIN ORIENTAL GREEN TECH DEV CO LTD +1

A photoanode for preparing a photocatalytic fuel cell and application thereof

PendingCN122455793Alower bandgapEnhanced light absorptionFuel cellsPhoto catalysis
The application relates to a kind of photoanode for preparing photocatalytic fuel cell, and the photoelectrode is MgAl2O4 / WO3 photoanode or CODs / MgAl2O4 / WO3 photoanode.The application also discloses the application of the photoelectrode.The MgAl2O4 / WO3 photoanode and CODs / MgAl2O4 / WO3 photoanode of the application both have better light absorption capacity, and the preparation method is simple.The MgAl2O4 / WO3 photoanode or CODs / MgAl2O4 / WO3 photoanode is assembled into photocatalytic fuel cell with platinum electrode respectively, and the photocatalytic fuel cell can realize the degradation of rhodamine B under simulated sunlight.
Owner:NORTHWEST NORMAL UNIVERSITY

Graphene short channel preparation method based on lateral etching and high-speed photoelectric detector

The application discloses a graphene short channel preparation method based on lateral etching, which comprises the following steps: firstly, forming a graphene layer and a metal layer on a substrate, and then forming a hard sacrificial mask on the metal layer; then, removing the metal layer outside the hard mask area by a chemical etching method, and etching the metal layer laterally at the edge of the mask area to form a graphene short channel; and finally, depositing metal based on the hard sacrificial mask to form a metal electrode on the other side. The preparation method of the application can obtain a graphene channel length which is not limited by the minimum line width of a patterning process equipment, and the graphene is not in contact with organic contaminants such as photoresist throughout the whole process, so that a higher channel carrier speed and a lower ohmic contact resistance are realized, the types of electrodes on both sides can be independently changed to construct an internal potential field, a high-speed and low-recombination-rate graphene channel is obtained, and then a high-speed photoelectric detector is realized, and the process is easy to control and has an array potential.
Owner:NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD