6 results about "Inorganic acids" patented technology

The application provides an Ag etching solution, a preparation method and application thereof. The Ag etching solution comprises the following components in a weight ratio: 40-80 parts of inorganic acid; 10-50 parts of organic acid; 0.05-1.5 parts of corrosion inhibitor; 0.1-2 parts of chelating agent; 1-7.5 parts of buffer; and 30-50 parts of ultrapure water. The application further discloses a preparation method of the Ag etching solution and application thereof in the field of etching ITO-Ag-ITO composite layers. The inorganic acid is selected from one or more of phosphoric acid, sulfuric acid, carbonic acid, boric acid, hydrobromic acid, iodic acid, hypoiodous acid, hydrofluoric acid and nitric acid. The inorganic acid is preferably phosphoric acid and nitric acid. The Ag etching solution has a stable etching rate for ITO-Ag-ITO, and is not damaged to the insulating layer and photoresist, and can be used in the OLED pixel electrode manufacturing process, and the Ag layer is not provided with burrs and is not shrunk after etching.

The invention relates to the technical field of frosting powder preparation, and discloses frosting powder for soft light display screen glass and a preparation method thereof, and the frosting powder comprises 1-3 parts of ferric trichloride, 5-7 parts of solid citric acid, 10-14 parts of solid ammonium bifluoride, 2-4 parts of barium sulfate and 2-4 parts of solid acetylated dihydrogen phosphate. According to the frosting powder for the soft light display screen glass, a reaction system taking water and specific solid acid / salt as cores is innovatively constructed, and the use of liquid strong inorganic acid such as hydrochloric acid and hydrofluoric acid is completely abandoned, so that the serious corrosion of strong acid to production equipment is thoroughly eliminated, and the service life of the equipment is prolonged; the problems of safety risk and environmental pollution caused by acid mist volatilization and strong acid storage and transportation are completely eradicated from the source, so that the production process is safer and more environment-friendly, and ferric trichloride, solid citric acid, ammonium bifluoride, barium sulfate and acetylated dihydrogen phosphate are combined according to a specific ratio and synergistically act on the surface of the glass, so that the glass surface is more stable. According to the formula, a uniform and fine microcrystalline structure can be formed in the etching process.

The invention belongs to the technical field of resource recovery and material application, and provides a preparation method of regenerated glass fibers suitable for a denitration catalyst and the denitration catalyst, the obtained glass fibers are particularly suitable for being applied to the denitration catalyst with titanium dioxide as a carrier material, and the obtained denitration catalyst has better denitration activity and wear resistance and can be used for preparing denitration catalysts. And excellent compressive strength can be considered, and the service life can be prolonged. The preparation method comprises the following steps: S1, selecting recycled glass fibers, wherein the recycled glass fibers are selected from one or more of glass fibers recycled by an acid method and glass fibers recycled by an organic method; s2, placing the glass fiber in a mixed aqueous solution of hydrofluoric acid and nitric acid, and reacting at 40-60 DEG C; after the reaction is finished, washing the glass fibers with organic acid to remove residual inorganic acid liquid, and then drying the glass fibers; and S3, putting the glass fiber obtained in the step S2 into a titanate coupling agent solution, and reacting at the temperature of 100 DEG C or above.

The invention discloses a cleaning agent for silicon substrate residues after dry etching. The cleaning agent comprises 0.01%-11% of fluoride, 50%-85% of a polar organic solvent, 0.01%-10% of a pH value regulator, 0.01%-3% of a corrosion inhibitor and 2%-30% of water. The pH value of the silicon-based residual cleaning agent is 4-6; the fluoride comprises fluorine-containing inorganic acid, the fluorine-containing inorganic acid is hydrofluoric acid and / or fluoboric acid, and the mass percent of the fluorine-containing inorganic acid in the cleaning agent is 0.01%-1.7%. The cleaning agent for silicon substrate residues after dry etching can effectively remove SIO / SINx residues in micropores after a dry etching process, has no obvious corrosion on copper, MTD, ITO and the like, has small side etching amount on the side walls of the micropores, and is beneficial to maintaining the sizes and structures of the micropores after dry etching and before cleaning. The invention further discloses a method for cleaning silicon substrate residues after dry etching.

The invention relates to the technical field of quality detection, and discloses a machine vision-based inorganic acid finished product quality detection method, which comprises the following steps of: acquiring a bubble image sequence under a specific stirring entrainment working condition, and extracting a center coordinate set and an average radius of bubbles through image processing; determining the wave number of a structural ring in the frequency domain according to the average radius, wherein the wave number corresponds to the spatial feature scale of the bubble near-contact pairing; based on the center coordinate set, calculating a second-order angle harmonic normalization amplitude of the structure factor at the wave number of the structure ring to obtain a second-order anisotropy coefficient of the structure ring for representing the orientation order degree of the bubble group in the stirring flow field; and finally, comparing the coefficient with a preset quality threshold value to judge whether a finished product is qualified or not. By capturing frequency domain fingerprints generated by strong electrolyte inhibition and combination effect and flow field shearing, the defect that traditional vision is insensitive to microcosmic physicochemical properties is effectively overcome, and non-contact and high-precision online monitoring of inorganic acid finished product quality is realized.

The invention relates to a composition (C) comprising 10 to 99 wt.% secondary or tertiary alkanolamine (A) in the form of a salt , preferably an inorganic acid salt, and 1 to 90 wt.% of non-salified alkanolamine (A).