709 results about "Azole" patented technology

Disclosed are: an etching solution for a multilayer thin film having a copper layer and a molybdenum layer contained therein; and a method for etching a multilayer thin film having a copper layer and a molybdenum layer contained therein using the etching solution. Specifically disclosed are: an etching solution for a multilayer thin film having a copper layer and a molybdenum layer contained therein, which comprises (A) hydrogen peroxide, (B) an inorganic acid having no fluorine atom, (C) an organic acid, (D) an amine compound having 2 to 10 carbon atoms and also having an amino group and a hydroxy group in the total number of two or more, (E) an azole, and (F) a hydrogen peroxide stabilizer, and which has a pH value of 2.5 to 5; and an etching method using the etching solution.

Disclosed herein are novel platinum-based analogs with a single substituted azole ligand: RN═NR7, wherein the RN═NR7 functional group is covalently bonded to the platinum through nitrogen of NR7. The analogs also have nitrogen donor ligands capable of forming hydrogen bonds with the bases in DNA or RNA, and one or more leaving groups which can be displaced by water, hydroxide ions or other nucleophiles, which is thought to form active species in vivo, and then, form cross-linked complexes between nucleic acid strands, principally between purines in DNA (or RNA), i.e., at the Guanine or Adenine bases, thereof. These platinum analogs may also be more easily transported into tumor cells, due to their increased lipophilicity and are likely to be useful as anti-neoplastic agents, and in modulating or interfering with the synthesis or replication or transcription of DNA or translation or function of RNA in vitro or in vivo, as they are potentially capable of forming a platinum coordinate complex with an intact or nascent DNA or RNA and thereby interfering with cellular synthesis, transcription or replication of nucleic acid polynucleotides.

The invention discloses phosphorescent luminescent materials and a preparation method and application thereof. The invention is characterized in that the phosphorescent luminescent materials are red light materials containing a metal iridium complex; a structural general formula of the phosphorescent luminescent materials is shown in the specification; and in the structural general formula, R1 and R2 are independently one of alkyl, phenyl, halogen-substituted phenyl, alkyl-substituted phenyl, naphthyl, anthryl, a halogen substituent, methoxy, phenoxy, cyano-substituted carbazolyl, substituted N-phenylcarbazolyl, quinolyl, thiazolyl, thienyl, an aromatic amino group, a group with an azole structure, an aromatic heterocyclic radical, a substituted aromatic heterocyclic radical and a silicon alkyl substituent respectively. The phosphorescent materials have high luminous efficiency; and the high luminous efficiency shows that the compounds can be taken as luminescent materials or main luminescent materials and applied to electroluminescent devices. Through data test and comparison, the materials are organic electroluminescent materials which have excellent performance and a good prospect, and particularly are phosphorescent red light materials which have good performance; and moreover, a method for synthesizing the luminescent materials is simple and low in cost.

An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and / or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

Water-soluble prodrugs of triazole antifungal compounds having a secondary or tertiary hydroxy group are provided. More particularly, new water-soluble triazole antifungal compounds are provided having the general formula ##STR1## wherein A is the non-hydroxy portion of a triazole antifungal compound of the type containing a secondary or tertiary hydroxyl group and R and R.sup.1 are as defined in the specification.

A polishing liquid is provided which is used for polishing a barrier layer of a semiconductor integrated circuit, the polishing liquid including surface modified particles that include organic polymer particles having at least one inorganic atom selected from the group consisting of Ti, Al, Zr and Si bonded to the organic polymer particles via an oxygen atom present on a surface of the organic polymer particles, an organic acid, an azole compound having at least two carboxyl groups, and an oxidizing agent, the polishing liquid having a pH of from 1 to 7; and a polishing method for polishing a barrier layer of a semiconductor integrated circuit is also provided.