266 results about "Azole" patented technology

The invention provides a pharmaceutical composition containing a pyrazole ether compound and application of the pharmaceutical composition, the pharmaceutical composition comprises an effective component A and an effective component B. The effective component A is a pyrazole ether compound with a structure shown in a formula I; and the effective component B is selected from any one or a combination of at least two of azole bactericides, mitochondrial electron transport chain compound III inhibitor bactericides, SDHI bactericides, multi-site contact type bactericides or other bactericides. In the invention, the effective component A and the effective component B have a synergistic effect, so that the pharmaceutical composition has higher biological activity and favorable or wider active spectrum, can reduce the application amount of compounds and compositions required for effectively controlling phytopathogens, and has longer lasting activity.

The invention provides a film stripping liquid and a preparation method thereof. The film stripping liquid is composed of a solubilizer, a metal corrosion inhibitor, a surface leveling agent and an organic solvent. Wherein the solubilizer can be a combination containing benzene series, so that the solubility of the photoresist in an organic solvent can be improved, and the service life of the stripping liquid is prolonged. The surface leveling agent is one or more of 1, 3-propylene glycol, 2-phenyl-1, 3-propylene glycol and 2-amino-1, 3-propylene glycol, and is used for improving the uniformity of the film stripping liquid in the film stripping process and avoiding the uneven concave-convex phenomenon on the surface of the photoresist. The metal corrosion inhibitor can be selected from azole or polyphenol compounds and can inhibit corrosion of metals such as Cu and Ag in the film stripping process; and the organic solvent is a combination of xylene and dichloromethane and is mainly used for dissolving and removing the expanded and fallen photoresist. According to the film stripping liquid provided by the invention, the glue stripping speed can be increased, the glue stripping uniformity can be remarkably improved, in addition, metals can be effectively protected from being corroded, and the corrosion speed of the metals such as Cu and Ag is controlled to be limited below 1 A / min.

The invention discloses a method for enhancing Candida albicans biofilm resistance of azole drugs by using a zinc ion chelating agent, through the combined action of the zinc ion chelating agent N, N, N ', N'-tetra (2-picolyl) ethylenediamine (TPEN) and fluconazole, the activity of the Candida albicans biofilm can be reduced, and the Candida albicans biofilm can be enhanced. The early-stage adhesion process, the medium-stage yeast-to-hypha conversion process and the late-stage maturation process formed by the candida albicans biological membrane are inhibited, the structure of the candida albicans biological membrane is destroyed, then the high drug resistance of the candida albicans biological membrane to fluconazole is reversed, and the pathogenicity of the fluconazole is reduced; the problems of high drug resistance and sustained infection caused by the formation of a candida albicans biofilm are hopefully solved, and a direction is provided for the treatment of clinical fungal infection and the research and development of drugs.

Disclosed in the present application are an anti-corrosion coating, a preparation method therefor, and a use thereof, and a coated product. The raw material components of the anti-corrosion coating in parts by weight include 30-44 parts of an epoxy resin and 1-10 parts of an organic azole-modified metal-organic framework material.

The invention relates to the technical field of photoresists, in particular to a positive chemical amplification type photoresist as well as a preparation method, a use method and application thereof, and aims to solve the problems that the photoresist is easily subjected to bottom residue on a metal substrate after development, and the etching yield is poor after metal electroplating in a subsequent process. The key points of the technical scheme are as follows: the mixed resin comprises first resin and second resin; an initiator, wherein the initiator comprises a photoacid production compound; the quenching agent is an alkaline agent or an acid-induced alkali production agent; the auxiliary agent comprises a protective agent, and the protective agent is a group modified azole compound; the solvent is used for dissolving the substances to prepare the positive chemical amplification type photoresist, and by optimizing the composition and the process of the positive chemical amplification type photoresist, on the premise of ensuring the adaptability and the stability of the process, the problems of the side wall angle of a product after exposure and development and the residual of the photoresist on the bottom of a metal substrate after development are effectively improved.

The invention relates to the technical field of biological medicine, in particular to application of a combination of a Cd1 and Mdr1 double-target inhibitor and an azole drug in preparation of an antifungal drug. Based on the fact that the compound as shown in the formula (I) can be used as a CCd1 and Mdr1 double-target inhibitor, the inhibition effect of the compound on candida albicans, candida auricula, candida glabrata, candida tropicalis, trichophyton rubrum and trichophyton indicus when the compound is combined with azole drugs is further evaluated, and the result shows that the compound as shown in the formula (I) has no obvious antibacterial activity on various fungi, and can be used for preparing a medicine for treating various fungi. The drug resistance of CCd1 and Mdr1 overexpression drug-resistant fungi can be reversed, the activity of Candida albicans, Candida auricula, Candida glabrata, Candida tropicalis, Trichophyton rubrum and Trichophyton indicus can be synergistically inhibited when the drug is combined with azole drugs, the treatment dosage of the azole drugs is effectively reduced, and the drug toxicity is small. Therefore, the compound shown in the formula (I) can improve the antifungal effect of azole drugs and reduce the drug resistance of the azole drugs.

The invention discloses a preparation method of a low-chlorine composite environment-friendly coal transportation anti-freezing agent, and belongs to the technical field of anti-freezing solutions. The anti-freezing solution is used for solving the technical problems of complex components and poor anti-freezing and metal corrosion resistance of the anti-freezing solution for coal transportation in the prior art. The preparation method of the low-chlorine composite environment-friendly coal transportation anti-freezing agent comprises the following step: uniformly mixing the compound pour point depressant, the modified corrosion inhibitor, the thickening stabilizer and the industrial water to prepare the low-chlorine composite environment-friendly coal transportation anti-freezing agent. The compound pour point depressant comprises an organic pour point depressant and an inorganic pour point depressant; the organic pour point depressant is obtained by reacting unsaturated azole, sodium methallyl sulfonate and fumaric acid; the unsaturated nitrogen is obtained by reaction of an intermediate B and benzaldehyde, and the intermediate B is obtained by reaction of triazole and ethyl chloroacetate; the modified corrosion inhibitor is obtained by carrying out a reaction on potassium thiocyanate, benzoyl chloride and chitosan vanillin Schiff base. The anti-freezing solution prepared by the invention has the advantages of moderate fluidity, good metal corrosion resistance and good anti-freezing performance.

The invention provides a copper etching solution and application thereof. The copper etching liquid comprises an inorganic acid, hydrogen peroxide, an azole compound, a halogen ion source and an amine compound, wherein the amine compound is selected from a compound shown in a formula 1 or an ammonium salt with a structural fragment shown in a formula 2. When the copper etching solution is applied to etching treatment on a chemical copper plating seed layer by a semi-additive method, the copper etching solution shows excellent differential etching capability, and has no obvious etching on the side wall of electroplating copper and the seed layer at the bottom of a copper circuit on the basis of effectively removing the seed layer between the copper circuits, so that the etching quality of the copper plating seed layer is improved. The undercut phenomenon can be prevented, the line width reduction amount is small, and the reliability degree of micronized line wiring can be obviously improved.

The present application relates to a kind of composite phosphorus-free scale inhibitor and its preparation method, including 800-1200 parts by weight of desalted water, 1-3 parts by weight of modified lignin sulfonate, 2-4 parts by weight of calcium magnesium acetate, 0.5-1.5 parts by weight of azole, 400-600 parts by weight of soluble inorganic zinc salt and 50-150 parts by weight of copolymer A.The composite phosphorus-free scale inhibitor provided by the present application is clear and transparent concentrate, after the above concentrate is added to circulating water, the effective ingredient in it can form soluble chelate with Ca 2+ , Mg 2+ Forming, increase the saturation solubility of ion, hinder micro-fouling lattice formation, distort crystal growth, so that microcrystalline will not accumulate into scale, and can make old scale loose, gradually shed old scale;At the same time, the special corrosion inhibitor and other corrosion inhibitor produce synergistic effect, which can effectively control the pitting of stainless steel, achieve the purpose of preventing scale, and fundamentally reduce the efficiency of corrosion and scale inhibition.

The invention relates to the field of industrial water treatment agents, and discloses a high-hardness water corrosion and scale inhibitor and a preparation method thereof. The scale inhibitor comprises the following components in parts by weight: 15-25 parts of an organic phosphonic acid compound; 10 to 20 parts of a polycarboxylic acid polymer; 3-8 parts of zinc salt; 2-5 parts of an azole compound; 5-12 parts of a cosolvent; the total parts by weight are 100; the preparation method comprises the steps of raw material preparation, mixing and dissolving, sequential addition and reaction control, system optimization and finished product preparation. In the scale inhibitor, the organic phosphonic acid and the polycarboxylic acid polymer synergistically inhibit scale, and the zinc salt and the azole compound synergistically inhibit corrosion, so that the scale inhibitor can stably play a role in high-hardness and high-alkalinity water, effectively inhibit corrosion and scaling of equipment, prolong the service life of the equipment and reduce the operation cost; the preparation process is simple, all the components are easy to obtain, the cost is controllable, and industrial production, popularization and application are facilitated.

The circularly polarized phosphorescent Pt (II) complex based on pinene modification is characterized in that a pinene group and an azole group are connected to form the Pt (II) complex with a symmetric and asymmetric structure, and the chemical general formula of the Pt (II) complex is shown as follows: # imgabs0 # provides a chiral center due to the pinene group, and utilizes the characteristics of large steric hindrance and chirality of pinene micromolecules to induce spiral accumulation of the Pt (II) complex, so that the pinene micromolecules can be converted into pinene micromolecules, and the pinene micromolecules can be converted into pinene micromolecules, so that the pinene micromolecules can be converted into pinene micromolecules, and the pinene micromolecules can be converted into pinene micromolecules. Therefore, plane rigidity and circular polarization characteristics are considered, chiral signals and quantum yield of a system are enhanced, and the compound shows excellent luminescence performance in dark red light and has great development prospects in the field of photoelectric materials.

A polishing composition, includes an abrasive; a pH adjuster; a barrier film removal rate enhancer; a low-k removal rate inhibitor; an azole-containing corrosion inhibitor; and a ruthenium removal rate enhancer. A method of polishing a substrate includes the steps of: applying the polishing composition described herein to a surface of a substrate, wherein the surface comprises ruthenium or a hard mask material; and bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate.

Compositions and methods for inhibiting corrosion of metals in contact with aqueous systems are provided. For example, a corrosion inhibitor composition of the present disclosure may include an imidazoline, a polycarboxylic acid compound, a polymeric dispersant, an inorganic salt, and / or an azole. The various compounds of the composition may be added, alone or in any combination, to an aqueous medium and / or to a metal surface in contact with the aqueous medium. The aqueous medium may include, for example, a sulfide, a sulfide derivative, or any combination thereof.

The invention relates to the field of hydraulic oil complexing agents, in particular to an anti-wear hydraulic oil complexing agent with high water diversion performance and a preparation method thereof.The anti-wear hydraulic oil complexing agent is prepared from, by weight, 30-80 parts of zinc dialkyl dithiophosphate, 1-20 parts of phenolic ester type antioxidant, 1-10 parts of alkyl diphenylamine antioxidant and 1-10 parts of sulfurized calcium alkyl phenolate detergent. 5 to 50 parts of dinonyl naphthalene sulfonate antirust agent, 1 to 5 parts of azole metal deactivator and 0 to 20 parts of base oil. A hydraulic oil product prepared by the hydraulic oil complexing agent provided by the invention has excellent water diversion performance, and simultaneously meets the performance requirements of wear resistance, oxidation resistance, rust prevention and the like.

To provide a stable water treatment composition containing an inorganic sterilizing agent having high sterilization power and an azole compound, and a water treatment method using the water treatment composition.SOLUTION: The present invention provides a water treatment composition containing hypobromous acid, a bromine stabilizer, and an azole compound, and having a pH of 13 or more. The bromine stabilizer comprises (A) a sulfonamide compound and (B) a sulfobenzimide compound.SELECTED DRAWING: None

The application discloses an organic electroluminescent material, an organic electroluminescent device and a display device, and the organic electroluminescent material comprises an organic compound shown in formula 1, the organic compound comprises an azole derivative structural unit and a phenanthro (hetero) aryl structural unit, the organic compound can be used as a host material of the organic electroluminescent device, can effectively reduce a driving voltage of the organic electroluminescent device, and can improve the efficiency and the service life of the light-emitting device and the comprehensive performance of the light-emitting device.

A family of sulfonyl-azole compounds are described which include small molecule activators of phosphofructokinase-1, liver isoform (PFKL). The small molecule activators selectively form covalent adducts with PFKL, including particularly lysine 677 of the human PFKL. Also provided are methods for using the small molecule activators to activate PFKL, e.g., to provide increased glycolysis and / or T cell activation, to treat cancers and / or tumors, and / or to enhance fructose-1,6-bisphosphate (FBP) content in cells.

To achieve an efficacy equivalent to or superior to that of traditional organic biocides through the combination of low-cost components.SOLUTION: A composition for slime prevention according to the present invention comprises a chlorine-based oxidizing agent, a sulfamic acid compound, an anionic polymer, an alkali metal salt, and an azole compound.SELECTED DRAWING: None

The present invention addresses the problem of providing a novel compound having an effect to more effectively enhance the antifungal activity of an antifungal drug compared with known pharmaceutical compounds. One aspect of the present invention relates to a compound represented by formula (I) [wherein R1, R2, R3, R4, R5, and R6 have meanings as set forth in the description and the claims], a salt of the compound, or a solvate of the compound or the salt. Another aspect of the present invention relates to: a method for producing a compound represented by formula (I), a salt of the compound, or a solvate of the compound or the salt; and an activity enhancer for at least one antifungal drug selected from the group consisting of a polyene macrolide-based drug, an azole-based drug, a candin-based drug, and a fluoropyrimidine-based drug, the activity enhancer containing, as an active ingredient, the compound, a pharmaceutically acceptable salt of the compound, or a pharmaceutically acceptable solvate of the compound or the pharmaceutically acceptable salt.

This invention provides an oligonucleotide synthesis catalyst and its preparation method, as well as a method for synthesizing oligonucleotides. The oligonucleotide synthesis catalyst comprises at least one of a tetrazolium, azole salt, pyridine salt, and imidazole salt compound as the main component, and a polar additive. The oligonucleotide synthesis catalyst of this invention solves the problems of current oligonucleotide synthesis processes, such as the difficulty in synthesizing complex oligonucleotide sequences (e.g., oligonucleotide chains that are too long, have high GC content, or have repetitive or continuous sequences that easily generate secondary structures), the difficulty in obtaining the target oligonucleotide fragment, or the high impurity content and poor quality of the target oligonucleotide fragment. When the oligonucleotide synthesis catalyst of this invention is applied to oligonucleotide synthesis, the success rate of synthesizing high-GC-content oligonucleotides can be increased, and the quality of oligonucleotides can be improved.

This acidic electrolytic copper plating solution is characterized by comprising a soluble copper salt, an azole compound, a carboxylic acid, water, and an acid, the azole compound content being 5-100 mmol / L, and the carboxylic acid content being 5-500 mg / L.

The invention discloses a chemical mechanical polishing solution for flattening a barrier layer. The polishing solution comprises silicon dioxide grinding particles, azole compounds, organic carboxylic acid, alkyl betaine and hydrogen peroxide. The chemical mechanical polishing solution can meet the requirements on the polishing rate and the selection ratio of various materials in the barrier layer polishing process, and can effectively reduce the number of defects on the surface of a polished wafer.

The present invention relates to methods and means for inhibiting or preventing the growth of fungal cells with at least one flavone selected from the group consisting of 5-methoxyflavone, 2′-methoxyflavone, 7-methoxyflavone, 3′,4′,5,7-tetrametoxyflavone, 3′,4′,5′,5,6,7-hexymethoxyflavone, 7,8-benzoflavone and 5,6-benzoflavone for inhibiting or preventing the growth of a fungal cell, wherein said flavone is used in combination with at least one further antimycotic compound selected from the group of azoles, both in an amount to exhibit a synergistic effect compared to the separate use of said flavone and said antimycotic compound.

A composition for semiconductor processing includes abrasive particles, and a dishing control additive, comprising a first dishing control additive and a second dishing control additive. The first dishing control additive includes a compound having a betaine group and a salicylic group or a derivative thereof, and the second dishing control additive includes an azole-based compound. The first dishing control additive includes 0.07 parts by weight or more based on 100 parts by weight of the abrasive particles, and the second dishing control additive includes 0.13 parts by weight or less based on 100 parts by weight of the abrasive particles.

The present invention belongs to the technical field of drug synthesis. Specifically, disclosed are an azole derivative as shown in general formula I, or a stereoisomer thereof, or a pharmaceutically acceptable salt, a hydrate, a solvate or a prodrug thereof, a preparation method therefor, and the use thereof in the preparation of a drug for preventing or treating various diseases caused by fungal infections.

The invention relates to application of azole drugs in preparation of antifungal drugs, and belongs to the technical field of research and development of antifungal drugs. According to the application of the glycyrrhetinic acid combined with the azoles in preparation of the antifungal drugs, the glycyrrhetinic acid combined with the itraconazole, the voriconazole and the posaconazole shows a good synergistic effect or antagonistic effect on aspergillus, ectobottle dermatitis, candida and cryptococcus neoformans, and the application of the glycyrrhetinic acid combined with the itraconazole, the voriconazole and the posaconazole in preparation of the antifungal drugs is disclosed. And a research and development direction is provided for preparing medicines for resisting aspergillus, ectobottle dermatitis, candida and cryptococcus neoformans.

The invention provides an application of a fusarium verticillium transcription factor FVEG06682 in regulating the sensitivity of fusarium to azole drugs, and belongs to the technical field of drug resistance. The invention provides an application of a fusarium verticillium transcription factor FVEG06682 in regulating the sensitivity of fusarium to azole drugs or regulating the toxicity of fusarium to plants, and the FVEG06682 improves the sensitivity of fusarium to azole drugs and reduces the toxicity of fusarium to plants through negative regulation. Therefore, the transcription factor is identified and proved to be a key molecule for regulating and controlling the intrinsic resistance of the azole drugs in the fusarium verticillium for the first time, and the sensitivity of pathogenic bacteria to various clinical and agricultural azole drugs (such as ketoconazole, voriconazole, triazolone and tebuconazole) can be remarkably improved by knocking out the FVEG06682 gene; a brand-new and efficient molecular target is provided for overcoming the inherent drug resistance problem of fusarium.

The present application relates to the field of fine chemical industry, in particular to a fuel cell coolant, a preparation method and application thereof.The fuel cell coolant comprises N,N,N-trimethylglycine and water, and the conductivity is 0 muS / cm-5 muS / cm; the fuel cell coolant comprises N,N,N-trimethylglycine, water and non-ionic corrosion inhibitor, and the conductivity is 0 muS / cm-5 muS / cm.The non-ionic corrosion inhibitor is selected from one or more of lipid compounds, azole compounds and amide compounds, and the total mass of the above non-ionic corrosion inhibitor in the fuel cell coolant is ≯2%.The hydrogen fuel cell coolant has excellent antifreezing performance, low conductivity and metal ion inhibition, and is compatible with proton membranes, and is applied to hydrogen fuel cell engines.

The application discloses a kind of azole-based metal organic framework and its preparation method and application, preparation method includes: sodium azide, hydrazine hydrate, 4-imidazole formaldehyde, ferrous trifluoromethyl sulfonate are dissolved in methanol solution and are reacted;The reaction product is filtered, washed, dried, and azole-based organic ligand is obtained;Azole-based organic ligand and transition metal salt are reacted in the mixed solution of N, N-dimethylformamide and methanol or ethanol, and the reaction product is centrifuged, filtered, washed, and azole-based metal organic framework is obtained.In the application, azole-based metal organic framework has the characteristics of spontaneous generation of singlet oxygen, without active oxygen under light conditions, and the needle shape of azole-based metal organic framework material can produce physical puncture effect on bacteria, which can effectively cooperate with the singlet oxygen spontaneously generated to resist bacteria.

The present invention provides a polishing composition that effectively polishes dielectric or barrier components on Co-containing surfaces without causing metal corrosion. [Solution] The polishing composition comprises at least one abrasive, at least one organic acid, at least one anionic surfactant containing at least a phosphate, at least one phosphonic acid compound with a molecular weight of less than 500 g / mol, at least one azole-containing compound, at least one alkylamine compound having an alkyl chain of 6 to 24 carbon atoms, an aqueous solvent, and optionally a pH adjuster.