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218 results about "Azole" patented technology

Azoles are a class of five-membered heterocyclic compounds containing a nitrogen atom and at least one other non-carbon atom (i.e. nitrogen, sulfur, or oxygen) as part of the ring. Their names originate from the Hantzsch–Widman nomenclature. The parent compounds are aromatic and have two double bonds; there are successively reduced analogs (azolines and azolidines) with fewer. One, and only one, lone pair of electrons from each heteroatom in the ring is part of the aromatic bonding in an azole. Names of azoles maintain the prefix upon reduction (e.g., pyrazoline, pyrazolidine). The numbering of ring atoms in azoles starts with the heteroatom that is not part of a double bond, and then proceeds towards the other heteroatom.

Anti-corrosion coating, preparation method therefor, and use thereof, and coated product

Disclosed in the present application are an anti-corrosion coating, a preparation method therefor, and a use thereof, and a coated product. The raw material components of the anti-corrosion coating in parts by weight include 30-44 parts of an epoxy resin and 1-10 parts of an organic azole-modified metal-organic framework material.
Owner:WUHU MIDEA KITCHEN & BATH APPLIANCES MFG CO LTD

Positive chemically amplified photoresist as well as preparation method, use method and application thereof

The invention relates to the technical field of photoresists, in particular to a positive chemical amplification type photoresist as well as a preparation method, a use method and application thereof, and aims to solve the problems that the photoresist is easily subjected to bottom residue on a metal substrate after development, and the etching yield is poor after metal electroplating in a subsequent process. The key points of the technical scheme are as follows: the mixed resin comprises first resin and second resin; an initiator, wherein the initiator comprises a photoacid production compound; the quenching agent is an alkaline agent or an acid-induced alkali production agent; the auxiliary agent comprises a protective agent, and the protective agent is a group modified azole compound; the solvent is used for dissolving the substances to prepare the positive chemical amplification type photoresist, and by optimizing the composition and the process of the positive chemical amplification type photoresist, on the premise of ensuring the adaptability and the stability of the process, the problems of the side wall angle of a product after exposure and development and the residual of the photoresist on the bottom of a metal substrate after development are effectively improved.
Owner:JIANGSU AISEN SEMICON MATERIAL CO LTD +1

Application of combination of Cd1 and Mdr1 double-target inhibitor and azole drugs in preparation of antifungal drugs

The invention relates to the technical field of biological medicine, in particular to application of a combination of a Cd1 and Mdr1 double-target inhibitor and an azole drug in preparation of an antifungal drug. Based on the fact that the compound as shown in the formula (I) can be used as a CCd1 and Mdr1 double-target inhibitor, the inhibition effect of the compound on candida albicans, candida auricula, candida glabrata, candida tropicalis, trichophyton rubrum and trichophyton indicus when the compound is combined with azole drugs is further evaluated, and the result shows that the compound as shown in the formula (I) has no obvious antibacterial activity on various fungi, and can be used for preparing a medicine for treating various fungi. The drug resistance of CCd1 and Mdr1 overexpression drug-resistant fungi can be reversed, the activity of Candida albicans, Candida auricula, Candida glabrata, Candida tropicalis, Trichophyton rubrum and Trichophyton indicus can be synergistically inhibited when the drug is combined with azole drugs, the treatment dosage of the azole drugs is effectively reduced, and the drug toxicity is small. Therefore, the compound shown in the formula (I) can improve the antifungal effect of azole drugs and reduce the drug resistance of the azole drugs.
Owner:SHANDONG UNIV

Preparation method of low-chlorine composite environment-friendly coal transportation anti-freezing agent

The invention discloses a preparation method of a low-chlorine composite environment-friendly coal transportation anti-freezing agent, and belongs to the technical field of anti-freezing solutions. The anti-freezing solution is used for solving the technical problems of complex components and poor anti-freezing and metal corrosion resistance of the anti-freezing solution for coal transportation in the prior art. The preparation method of the low-chlorine composite environment-friendly coal transportation anti-freezing agent comprises the following step: uniformly mixing the compound pour point depressant, the modified corrosion inhibitor, the thickening stabilizer and the industrial water to prepare the low-chlorine composite environment-friendly coal transportation anti-freezing agent. The compound pour point depressant comprises an organic pour point depressant and an inorganic pour point depressant; the organic pour point depressant is obtained by reacting unsaturated azole, sodium methallyl sulfonate and fumaric acid; the unsaturated nitrogen is obtained by reaction of an intermediate B and benzaldehyde, and the intermediate B is obtained by reaction of triazole and ethyl chloroacetate; the modified corrosion inhibitor is obtained by carrying out a reaction on potassium thiocyanate, benzoyl chloride and chitosan vanillin Schiff base. The anti-freezing solution prepared by the invention has the advantages of moderate fluidity, good metal corrosion resistance and good anti-freezing performance.
Owner:ORDOS SHENDONG TIANLONG CHEM

Copper etching solution and application thereof

The invention provides a copper etching solution and application thereof. The copper etching liquid comprises an inorganic acid, hydrogen peroxide, an azole compound, a halogen ion source and an amine compound, wherein the amine compound is selected from a compound shown in a formula 1 or an ammonium salt with a structural fragment shown in a formula 2. When the copper etching solution is applied to etching treatment on a chemical copper plating seed layer by a semi-additive method, the copper etching solution shows excellent differential etching capability, and has no obvious etching on the side wall of electroplating copper and the seed layer at the bottom of a copper circuit on the basis of effectively removing the seed layer between the copper circuits, so that the etching quality of the copper plating seed layer is improved. The undercut phenomenon can be prevented, the line width reduction amount is small, and the reliability degree of micronized line wiring can be obviously improved.
Owner:HUAWEI TECH CO LTD

Composite non-phosphorus scale inhibitor and preparation method thereof

The present application relates to a kind of composite phosphorus-free scale inhibitor and its preparation method, including 800-1200 parts by weight of desalted water, 1-3 parts by weight of modified lignin sulfonate, 2-4 parts by weight of calcium magnesium acetate, 0.5-1.5 parts by weight of azole, 400-600 parts by weight of soluble inorganic zinc salt and 50-150 parts by weight of copolymer A.The composite phosphorus-free scale inhibitor provided by the present application is clear and transparent concentrate, after the above concentrate is added to circulating water, the effective ingredient in it can form soluble chelate with Ca 2+ , Mg 2+ Forming, increase the saturation solubility of ion, hinder micro-fouling lattice formation, distort crystal growth, so that microcrystalline will not accumulate into scale, and can make old scale loose, gradually shed old scale;At the same time, the special corrosion inhibitor and other corrosion inhibitor produce synergistic effect, which can effectively control the pitting of stainless steel, achieve the purpose of preventing scale, and fundamentally reduce the efficiency of corrosion and scale inhibition.
Owner:北京首创大气环境科技股份有限公司

High-hardness water corrosion and scale inhibitor and preparation method thereof

The invention relates to the field of industrial water treatment agents, and discloses a high-hardness water corrosion and scale inhibitor and a preparation method thereof. The scale inhibitor comprises the following components in parts by weight: 15-25 parts of an organic phosphonic acid compound; 10 to 20 parts of a polycarboxylic acid polymer; 3-8 parts of zinc salt; 2-5 parts of an azole compound; 5-12 parts of a cosolvent; the total parts by weight are 100; the preparation method comprises the steps of raw material preparation, mixing and dissolving, sequential addition and reaction control, system optimization and finished product preparation. In the scale inhibitor, the organic phosphonic acid and the polycarboxylic acid polymer synergistically inhibit scale, and the zinc salt and the azole compound synergistically inhibit corrosion, so that the scale inhibitor can stably play a role in high-hardness and high-alkalinity water, effectively inhibit corrosion and scaling of equipment, prolong the service life of the equipment and reduce the operation cost; the preparation process is simple, all the components are easy to obtain, the cost is controllable, and industrial production, popularization and application are facilitated.
Owner:CHANGSHA YAXIN ELECTRICAL TECH SERVICE CO LTD

Polishing compositions and methods of use thereof

A polishing composition, includes an abrasive; a pH adjuster; a barrier film removal rate enhancer; a low-k removal rate inhibitor; an azole-containing corrosion inhibitor; and a ruthenium removal rate enhancer. A method of polishing a substrate includes the steps of: applying the polishing composition described herein to a surface of a substrate, wherein the surface comprises ruthenium or a hard mask material; and bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate.
Owner:FUJIFILM ELECTRONIC MATERIALS U S A INC

Phosphorus-free compositions and methods for inhibiting corrosion in cooling water systems

Compositions and methods for inhibiting corrosion of metals in contact with aqueous systems are provided. For example, a corrosion inhibitor composition of the present disclosure may include an imidazoline, a polycarboxylic acid compound, a polymeric dispersant, an inorganic salt, and / or an azole. The various compounds of the composition may be added, alone or in any combination, to an aqueous medium and / or to a metal surface in contact with the aqueous medium. The aqueous medium may include, for example, a sulfide, a sulfide derivative, or any combination thereof.
Owner:ECOLAB USA INC

Organic electroluminescent material, organic electroluminescent device, and display device

PendingCN122444669AArylSimple Organic Compounds
The application discloses an organic electroluminescent material, an organic electroluminescent device and a display device, and the organic electroluminescent material comprises an organic compound shown in formula 1, the organic compound comprises an azole derivative structural unit and a phenanthro (hetero) aryl structural unit, the organic compound can be used as a host material of the organic electroluminescent device, can effectively reduce a driving voltage of the organic electroluminescent device, and can improve the efficiency and the service life of the light-emitting device and the comprehensive performance of the light-emitting device.
Owner:BOE TECHNOLOGY GROUP CO LTD +1

Sulfonyl-triazoles useful as covalent activators of the glycolytic enzyme PFKL for t cell activation

PCT designated stageWO2026006838A1Organic chemistrySulfur/selenium/tellurium active ingredientsAcyl groupGlycolytic enzymes
A family of sulfonyl-azole compounds are described which include small molecule activators of phosphofructokinase-1, liver isoform (PFKL). The small molecule activators selectively form covalent adducts with PFKL, including particularly lysine 677 of the human PFKL. Also provided are methods for using the small molecule activators to activate PFKL, e.g., to provide increased glycolysis and / or T cell activation, to treat cancers and / or tumors, and / or to enhance fructose-1,6-bisphosphate (FBP) content in cells.
Owner:BOARD OF RGT THE UNIV OF TEXAS SYST

An oligonucleotide synthesis catalyst

This invention provides an oligonucleotide synthesis catalyst and its preparation method, as well as a method for synthesizing oligonucleotides. The oligonucleotide synthesis catalyst comprises at least one of a tetrazolium, azole salt, pyridine salt, and imidazole salt compound as the main component, and a polar additive. The oligonucleotide synthesis catalyst of this invention solves the problems of current oligonucleotide synthesis processes, such as the difficulty in synthesizing complex oligonucleotide sequences (e.g., oligonucleotide chains that are too long, have high GC content, or have repetitive or continuous sequences that easily generate secondary structures), the difficulty in obtaining the target oligonucleotide fragment, or the high impurity content and poor quality of the target oligonucleotide fragment. When the oligonucleotide synthesis catalyst of this invention is applied to oligonucleotide synthesis, the success rate of synthesizing high-GC-content oligonucleotides can be increased, and the quality of oligonucleotides can be improved.
Owner:JIANGSU GENSCRIPT BIOTECH CO LTD

Acidic electrolytic copper plating solution

PCT designated stageWO2025187815A1Copper platingCarboxylic acid
This acidic electrolytic copper plating solution is characterized by comprising a soluble copper salt, an azole compound, a carboxylic acid, water, and an acid, the azole compound content being 5-100 mmol / L, and the carboxylic acid content being 5-500 mg / L.
Owner:MITSUBISHI MATERIALS CORP

Chemical mechanical polishing solution

The invention discloses a chemical mechanical polishing solution for flattening a barrier layer. The polishing solution comprises silicon dioxide grinding particles, azole compounds, organic carboxylic acid, alkyl betaine and hydrogen peroxide. The chemical mechanical polishing solution can meet the requirements on the polishing rate and the selection ratio of various materials in the barrier layer polishing process, and can effectively reduce the number of defects on the surface of a polished wafer.
Owner:ANJI MICROELECTRONICS TECH (SHANGHAI) CO LTD

Composition for semiconductor processing and manufacturing method of semiconductor device using the same

A composition for semiconductor processing includes abrasive particles, and a dishing control additive, comprising a first dishing control additive and a second dishing control additive. The first dishing control additive includes a compound having a betaine group and a salicylic group or a derivative thereof, and the second dishing control additive includes an azole-based compound. The first dishing control additive includes 0.07 parts by weight or more based on 100 parts by weight of the abrasive particles, and the second dishing control additive includes 0.13 parts by weight or less based on 100 parts by weight of the abrasive particles.
Owner:YOUNG CHANG CHEMICAL CO LTD

Cyp51-targeted azole compound and use thereof

The present invention belongs to the technical field of drug synthesis. Specifically, disclosed are an azole derivative as shown in general formula I, or a stereoisomer thereof, or a pharmaceutically acceptable salt, a hydrate, a solvate or a prodrug thereof, a preparation method therefor, and the use thereof in the preparation of a drug for preventing or treating various diseases caused by fungal infections.
Owner:SHENYANG PHARMA UNIV

Application of azole medicine in preparation of antifungal medicine

The invention relates to application of azole drugs in preparation of antifungal drugs, and belongs to the technical field of research and development of antifungal drugs. According to the application of the glycyrrhetinic acid combined with the azoles in preparation of the antifungal drugs, the glycyrrhetinic acid combined with the itraconazole, the voriconazole and the posaconazole shows a good synergistic effect or antagonistic effect on aspergillus, ectobottle dermatitis, candida and cryptococcus neoformans, and the application of the glycyrrhetinic acid combined with the itraconazole, the voriconazole and the posaconazole in preparation of the antifungal drugs is disclosed. And a research and development direction is provided for preparing medicines for resisting aspergillus, ectobottle dermatitis, candida and cryptococcus neoformans.
Owner:JINGZHOU CENT HOSPITAL (JINGZHOU HOSPITAL AFFILIATED TO YANGTZE UNIV)

Application of fusarium verticillium transcription factor FVEG06682 in regulating sensitivity of fusarium to azole drugs

The invention provides an application of a fusarium verticillium transcription factor FVEG06682 in regulating the sensitivity of fusarium to azole drugs, and belongs to the technical field of drug resistance. The invention provides an application of a fusarium verticillium transcription factor FVEG06682 in regulating the sensitivity of fusarium to azole drugs or regulating the toxicity of fusarium to plants, and the FVEG06682 improves the sensitivity of fusarium to azole drugs and reduces the toxicity of fusarium to plants through negative regulation. Therefore, the transcription factor is identified and proved to be a key molecule for regulating and controlling the intrinsic resistance of the azole drugs in the fusarium verticillium for the first time, and the sensitivity of pathogenic bacteria to various clinical and agricultural azole drugs (such as ketoconazole, voriconazole, triazolone and tebuconazole) can be remarkably improved by knocking out the FVEG06682 gene; a brand-new and efficient molecular target is provided for overcoming the inherent drug resistance problem of fusarium.
Owner:TIANJIN UNIV OF COMMERCE

Fuel cell coolant, method for producing the same, and use thereof

The present application relates to the field of fine chemical industry, in particular to a fuel cell coolant, a preparation method and application thereof.The fuel cell coolant comprises N,N,N-trimethylglycine and water, and the conductivity is 0 muS / cm-5 muS / cm; the fuel cell coolant comprises N,N,N-trimethylglycine, water and non-ionic corrosion inhibitor, and the conductivity is 0 muS / cm-5 muS / cm.The non-ionic corrosion inhibitor is selected from one or more of lipid compounds, azole compounds and amide compounds, and the total mass of the above non-ionic corrosion inhibitor in the fuel cell coolant is ≯2%.The hydrogen fuel cell coolant has excellent antifreezing performance, low conductivity and metal ion inhibition, and is compatible with proton membranes, and is applied to hydrogen fuel cell engines.
Owner:HEFEI HUAQING FANGXING SURFACING TECH CO LTD

A nitrogen azole-based metal organic framework and a preparation method and application thereof

The application discloses a kind of azole-based metal organic framework and its preparation method and application, preparation method includes: sodium azide, hydrazine hydrate, 4-imidazole formaldehyde, ferrous trifluoromethyl sulfonate are dissolved in methanol solution and are reacted;The reaction product is filtered, washed, dried, and azole-based organic ligand is obtained;Azole-based organic ligand and transition metal salt are reacted in the mixed solution of N, N-dimethylformamide and methanol or ethanol, and the reaction product is centrifuged, filtered, washed, and azole-based metal organic framework is obtained.In the application, azole-based metal organic framework has the characteristics of spontaneous generation of singlet oxygen, without active oxygen under light conditions, and the needle shape of azole-based metal organic framework material can produce physical puncture effect on bacteria, which can effectively cooperate with the singlet oxygen spontaneously generated to resist bacteria.
Owner:JINAN UNIVERSITY

Method for polishing a substrate containing cobalt

The present invention provides a polishing composition that effectively polishes dielectric or barrier components on Co-containing surfaces without causing metal corrosion. [Solution] The polishing composition comprises at least one abrasive, at least one organic acid, at least one anionic surfactant containing at least a phosphate, at least one phosphonic acid compound with a molecular weight of less than 500 g / mol, at least one azole-containing compound, at least one alkylamine compound having an alkyl chain of 6 to 24 carbon atoms, an aqueous solvent, and optionally a pH adjuster.
Owner:FUJIFILM ELECTRONIC MATERIALS U S A INC

Fifth-generation gasoline detergent as well as preparation method and application thereof

The invention discloses a fifth-generation gasoline detergent and a preparation method and application thereof.The detergent is prepared from, by mass, 5.1%-16% of azole polynitrogen compounds with the carbon atom number being 6-12 and the nitrogen atom number being 3-6, 40.1%-48% of Mannich base detergent dispersants with the number containing C8-14, 5.1%-12% of organic acid R6-12 hydrazine catalytic auxiliaries, 1.4%-3% of antioxidants and 30%-49.5% of C8-12 straight-chain alkane. The preparation method comprises the following steps: mixing the components according to the proportion, and filtering through a 1-1.5 mu m filter screen. The additive amount of the cleaning agent is 200-220 mL / m < 3 >, sufficient combustion of gasoline can be promoted, the emission amounts of CO, HC and NOx in tail gas are reduced by 30%, 33% and 19% respectively, the fuel saving rate reaches 10.24-14.01%, the power of an engine can be improved, and an automobile is assisted to meet the strict emission standard.
Owner:葛康玲

2-substituted azole cell necrosis pathway inhibitor, preparation method therefor and use thereof

PCT designated stageWO2026032293A1Senses disorderNervous disorderDiseaseBiochemistry
The present invention provides a 2-substituted azole cell necrosis pathway inhibitor, a preparation method therefor and a use thereof. Specifically, the present invention provides a compound having a structure represented by formula I, each group being as defined in the description. The compound of the present invention has strong inhibitory activity against RIPK3 and a RIPK3-mediated cell necrosis pathway at both enzyme level and cell level. Therefore, the compound provided by the present invention has broad application prospects in the field of treatment or prevention of programmed cell necrosis and inflammation-related diseases.
Owner:SHANGHAI INSTITUTE OF MATERIA MEDICA CHINESE ACADEMY OF SCIENCES

Chromium-free passivator for copper bar for new energy automobile battery and preparation method of chromium-free passivator

The invention relates to a chromate-free passivator for a copper bar for a new energy automobile battery and a preparation method of the chromate-free passivator, and belongs to the technical field of metal surface treatment.The chromate-free passivator comprises, by weight, 6-16 parts of organic azole compounds; 10 to 30 parts by weight of molybdate; 2-10 parts by weight of a silane coupling agent; 4 to 12 parts by weight of a water-soluble polymer; 1-6 parts by weight of an accelerant; 0.2 to 2 parts by weight of a surfactant; and the balance of deionized water. According to the chromium-free passivating agent for the copper bar for the new energy automobile battery and the preparation method of the chromium-free passivating agent, the prepared chromium-free passivating agent for the copper bar for the new energy automobile battery eliminates the harm of hexavalent chromium to the environment and operators from the source, completely meets the strict requirements of global green manufacturing and environmental protection laws and regulations, and has a wide application prospect. And support is provided for the concept of full-life-cycle environmental protection of new energy automobiles, the copper bar surface treatment industry is promoted to develop towards the environment-friendly and sustainable direction, and the advantage of remarkable environmental protection performance is achieved.
Owner:WUHU TRUCHUM ALLOY COPPER CO LTD

Method for producing compound

ActiveUS12428387B2Organic compound preparationPreparation from ortho-estersArylCompound a
A method by which an intermediate product of an azole derivative can be produced at a lower cost than known production methods is provided. A method for producing a compound represented by General Formula (IV) includes converting a compound represented by General Formula (II) into the compound represented by General Formula (IV) using (a) dimethyl sulfide and / or dimethyl sulfoxide, and (b) a methyl-LG (an LG is a nucleophilically substitutable leaving group and is selected from the group consisting of a halogen group, an alkoxysulfonyloxy group, an aryloxysulfonyloxy group, an alkylsulfonyloxy group, a haloalkylsulfonyloxy group, and an arylsulfonyloxy group) in the presence of an inorganic base.
Owner:KUREHA CORPORATION

Composition for removing photoresist and method for removing photoresist

According to the present invention, it is possible to provide a composition for removing a photoresist for forming a copper-containing pattern after the formation of the pattern, the composition comprising: an alkaline agent comprising at least one selected from the group consisting of an alkanolamine, a quaternary ammonium hydroxide, and an inorganic base; an organic solvent in which the Hansen solubility parameter coordinates fall within the range of a sphere having a radius of 3.60 MPa 0.5 or less centered on [Delta] d = 16.0, [Delta] p = 8.7, and [Delta] h = 15.5; and an azole compound.
Owner:MITSUBISHI GAS CHEM CO INC

Organic-inorganic hybrid perovskite compounds

Photoactive materials comprising organic-inorganic hybrid halide perovskite compounds are provided. Photovoltaic cells and light-emitting devices incorporating the photoactive materials into their light-absorbing and light-emitting layers, respectively, are also provided. The halide perovskites have an amAMX3 perovskite crystal structure, wherein am is an alkyl diamine cation, an aromatic diamine cation, an aromatic azole cation, a cyclic alkyl diamine cation or a hydrazinediium cation; A is a monovalent alkylammonium cation or an alkali metal cation; X is a halide ion or a combination of halide ions; and M is an octahedrally coordinated bivalent metal atom.
Owner:NORTHWESTERN UNIV

Azole compound as well as preparation method and application thereof

The invention belongs to the technical field of medicines, and relates to an azole compound as well as a preparation method and application thereof. The azole compound or the pharmaceutically acceptable salt thereof has a structure as shown in general formulas I and II: # imgabs0. The azole compound provided by the invention has an excellent bactericidal effect on various cryptococcus and filamentous fungi.
Owner:SOUTHWEST UNIV

An indole-azole derivative WM-20, its preparation method and use

The application discloses an indole-azole derivative WM-20, a structural formula of which is as shown in the following formula, and a molecular formula of which is C 32 H 32 ClF5N6O2. The application further discloses a preparation method of the indole-azole derivative WM-20 and application of the indole-azole derivative WM-20 to preparation of an anti-inflammatory drug in vitro and in vivo.
Owner:YUNNAN PROVINCIAL HOSPITAL OF TRADITIONAL CHINESE MEDICINE +1