26 results about "Azole" patented technology

The application discloses an organic electroluminescent material, an organic electroluminescent device and a display device, and the organic electroluminescent material comprises an organic compound shown in formula 1, the organic compound comprises an azole derivative structural unit and a phenanthro (hetero) aryl structural unit, the organic compound can be used as a host material of the organic electroluminescent device, can effectively reduce a driving voltage of the organic electroluminescent device, and can improve the efficiency and the service life of the light-emitting device and the comprehensive performance of the light-emitting device.

The present invention relates to methods and means for inhibiting or preventing the growth of fungal cells with at least one flavone selected from the group consisting of 5-methoxyflavone, 2′-methoxyflavone, 7-methoxyflavone, 3′,4′,5,7-tetrametoxyflavone, 3′,4′,5′,5,6,7-hexymethoxyflavone, 7,8-benzoflavone and 5,6-benzoflavone for inhibiting or preventing the growth of a fungal cell, wherein said flavone is used in combination with at least one further antimycotic compound selected from the group of azoles, both in an amount to exhibit a synergistic effect compared to the separate use of said flavone and said antimycotic compound.

The present invention provides a polishing composition that effectively polishes dielectric or barrier components on Co-containing surfaces without causing metal corrosion. [Solution] The polishing composition comprises at least one abrasive, at least one organic acid, at least one anionic surfactant containing at least a phosphate, at least one phosphonic acid compound with a molecular weight of less than 500 g / mol, at least one azole-containing compound, at least one alkylamine compound having an alkyl chain of 6 to 24 carbon atoms, an aqueous solvent, and optionally a pH adjuster.

This invention relates to a method for highly selective adsorption of low partial pressure CO2 using an ultraporous azole ionic liquid material, belonging to the field of gas separation and purification technology. The ultraporous ionic liquid material is an ionic adsorbent with selective CO2 adsorption sites and an ultraporous pore distribution, formed by modifying the surface and pore structure of a porous support with multi-site azole ionic liquids. This method is simple to synthesize and easy to scale up. Furthermore, due to the strong chemical interaction between the electronegative sites on the ionic liquid anions and CO2, as well as the ultraporous effect, it synergistically enhances the efficient capture and separation of low partial pressure CO2. Simultaneously, CO2 can be completely desorbed by heating or depressurization. The regenerated ultraporous ionic liquid material is recyclable and exhibits stable performance. This method has advantages such as high capacity and selectivity for low partial pressure CO2, good stability, and recyclability, and has great potential for application in CO2 capture and purification separation.

To improve electrochromic materials so that they can be used as a transparent medium for forming high-quality articles, especially high-quality eyeglass lenses, while maintaining electrochromic properties and having a wide range of colors. [Solution] The present invention relates to a novel group of electrochromic compounds. More specifically, the present invention relates to benzazole and condensed azole compounds substituted with one or more pyridinium rings, and the use of these compounds as variable transmittance media for the manufacture of optical articles such as spectacle lenses.

The application discloses an electrochemical synthesis N α A method for synthesizing azole compounds under mild electrochemical conditions through a three-component reaction of azole, aldehyde and alcohol N α In the electrolysis process, azole is oxidized into a nitrogen free radical at the anode, and aldehyde is reduced into a hydroxyalkyl free radical at the cathode, then the free radical coupling is carried out, and finally, intermolecular dehydration of alcohol is carried out to synthesize a series of azole compounds with an alkoxyalkyl group N α The reaction avoids the use of an acid catalyst, an additional oxidant and a reducing agent through a free radical active intermediate route, is low in production cost, is friendly to the environment, and is suitable for industrial large-scale production as shown by the feasibility of a kilogram-scale amplification experiment.​​​

The present invention relates to a cleaning composition and a cleaning method for a CMP process performed during the manufacturing process of a glass substrate-based Through Glass Via (TGV) structure. The cleaning composition comprises a quaternary ammonium salt, an alkanolamine, a glycol ether, an azole compound, a surfactant, and water. By including tetramethylammonium hydroxide and choline hydroxide as the quaternary ammonium salt in a specific ratio, the cleaning composition effectively removes polishing particles and organic residues remaining after the CMP process even under high alkaline conditions of pH 12 or higher, while suppressing excessive corrosion of the glass substrate and metal wiring, allowing the cleaning solution to penetrate uniformly into the high aspect ratio via, and simultaneously removing residual contaminants and preventing re-adsorption.

A method to reduce or eliminate N-heterocycles, the method providing one or more environmentally benign chelators (EBCs) to an aqueous cooling system, the aqueous cooling system having at least one N-heterocycle in the presence of a halogenating or non-halogenating oxidizer. A method to reduce or eliminate AOX, the method providing one or more environmentally benign chelators (EBCs) to an aqueous cooling system, the aqueous cooling system having at least one AOX-containing species in the presence of a halogenating biocide.

This invention relates to the field of resource recycling technology, specifically disclosing a system and method for extracting and recovering metals from etching waste liquid. The extractant combination of this invention can minimize the loss of etching aids, preserve the original composition of the etching liquid, and allow the etching liquid to be completely reused after reducing copper, molybdenum, and other metal ions. The extractant of this invention has a long effective life cycle of extraction-back-extraction, minimal loss of extractant aids in the extraction-back-extraction cycle, and no emulsification / flocculation of the extract phase during the extraction process. The extraction rate of copper and molybdenum in the etching liquid is high. By using a specific three-phase extractant combination, more than 98% of copper and molybdenum in the waste liquid can be recovered. The copper extraction process has a good retention effect on nitrogen azole etching aids, such as 5-aminotetrazole, thereby forming a closed loop in the extraction-back-extraction cycle of the etching liquid, reducing material input and pollution.

A method and cleaning composition for microelectronic devices or semiconductor substrates comprising (i) at least one organic solvent; (ii) at least one amine free of carboxylic acid moieties; (iii) water; and (iv) a corrosion inhibitor comprising one or more of (a) an amino acid, (b) an azole, and (c) a phenolic acid, wherein the remover solution is free of dimethyl sulfoxide, N-methyl pyrrolidone, and dimethylacetamide.

The present invention can provide a composition for removing a photoresist, which is for forming a copper-containing pattern, after the pattern has been formed, including:an alkaline agent containing at least one selected from the group consisting of an alkanolamine, a quaternary ammonium hydroxide, and an inorganic alkali;an organic solvent having Hansen solubility parameter coordinates that are within an area of a sphere centered on δd=16.0, δp=8.7, δh=15.5 within a radius of 3.60 MPa0.5 or less, andan azole compound.

The present invention provides a passivation composition for depositing a chromium-containing passivation layer on a substrate coated with zinc or zinc-nickel. [Solution] A passivation composition comprising: (i) trivalent chromium ions; (ii) at least one complexing agent for trivalent chromium ions, which is different from at least one corrosion inhibitor; and (iii) at least one corrosion inhibitor, which comprises (A) one or more substituted azole compounds and / or salts thereof in a total concentration of less than 10 mg / L based on the total volume of the passivation composition, and / or (B) one or more unsubstituted or substituted aliphatic organic acids and / or salts thereof having at least one mercapto group in a total concentration in the range of 0.001 mg / L to 100 mg / L based on the total volume of the passivation composition.

The present application relates to the technical field of scale inhibition, and proposes a gasifier ash water scale inhibitor and a preparation method thereof.The gasifier ash water scale inhibitor comprises the following components in parts by weight: polycarboxylic acid 22-35 parts, polysulfonate 21-28 parts, phosphate 5-12 parts, phosphonic acid 8-12 parts, azole 3-9 parts, auxiliary agent 22-30 parts, alcohol 15-25 parts, suspending agent 25-30 parts, and water 200-220 parts; the auxiliary agent comprises 2-pyridine carboxylic acid and 6-aminonicotinic acid.Through the above technical solution, the problem of poor scale inhibition performance of the scale inhibitor in the related art is solved.

This application discloses a spirofluorene compound, an electron transport material, and its applications, belonging to the field of organic electroluminescence technology. The compound's structure is shown in general formula I. The compound incorporates a pentacyclic structure into the spirofluorene ring, which not only modulates the HOMO energy level of the molecule but also further increases the degree of molecular twist, thereby effectively reducing intermolecular interactions, lowering the evaporation temperature of the compound, and improving its heat resistance. Simultaneously, substituting triazine groups and azole substituents at different positions of the spirofluorene ring not only modulates the LUMO energy level of the molecule but also improves the compound's electron mobility, enhances carrier transport balance, improves device efficiency, and extends its lifespan.

The present invention provides a chemical-mechanical polishing solution for backside copper reveal process of through silicon vias. The polishing solution comprises abrasive particles, an organic acid, an organic amine, an azole compound, a non-ionic surfactant, and an oxidizing agent. The chemical-mechanical polishing solution of the present invention can maintain a relatively high monocrystalline silicon removal rate and an adjustable copper removal rate, and can also effectively reduce copper contamination on a polished silicon surface.

The application discloses a water-based protective agent for improving the processing stability of iron-chromium-aluminum, a preparation method and application thereof. The water-based protective agent comprises the following components in parts by weight: 3-5 parts of an azole compound, 2-4 parts of phosphomolybdotungstic acid, 10-15 parts of an organic phosphonic acid compound, and 70-85 parts of water; the azole component is selected from one or more of a benzimidazole compound, a benzyl imidazole compound and a benzotriazole compound. The water-based protective agent can improve the processing stability of welding, bonding and assembly, and improve the salt mist resistance and alkali corrosion resistance of the iron-chromium-aluminum alloy.

This invention provides an adsorbent for treating azole-containing organic wastewater, its preparation method, and its application. The adsorbent comprises a zeolite molecular sieve and metal components I and II supported on the zeolite molecular sieve, wherein metal component I is selected from at least one of Cu, Fe, and Zn, and metal component II is selected from at least one of Ca, Ce, and La. This adsorbent, used in the adsorption treatment of azole-containing organic wastewater, has the advantages of being inexpensive, recyclable, and having low biotoxicity in the effluent. Furthermore, this invention also provides a method for treating azole-containing organic wastewater.

A polishing composition includes at least one abrasive, at least one organic acid, at least one anionic surfactant comprising at least a phosphate, at least one phosphonic acid compound having a molecular weight below 500 g / mol, at least one azole containing compound, at least one alkylamine compound having a 6-24 carbon alkyl chain, and an aqueous solvent, and optionally, a pH adjuster.

A method for removing organic compounds from a copper-containing solution includes producing the copper-containing solution from a mixture of wastewater from a copper chemical mechanical polishing (CMP) operation of a semiconductor manufacturing facility and a concentrated copper waste stream (CCW) from the semiconductor manufacturing facility, and introducing an oxidizer into the copper-containing solution, the copper catalyzing production of hydroxyl radicals from the oxidizer that react with the organic compounds.

This invention discloses a chemical mechanical polishing slurry for barrier layer planarization. The slurry comprises abrasive particles, an azole compound, an organic carboxylic acid, hydrogen peroxide, and water, and further includes a benzenesulfonic acid and / or benzenesulfonate surfactant. This slurry solves the problem of difficulty in controlling the removal rate of low dielectric constant (BD) and ultra-low dielectric constant (ULK) materials during polishing, meeting the requirements for the removal rate and selection ratio of various materials in barrier layer polishing processes, thus fulfilling the process requirements.