241 results about "Hansen solubility parameter" patented technology

To provide an electrophotographic member with improved filming, and a development roller.SOLUTION: The present invention is an electrophotographic member having a Hansen solubility parameter dispersion term δD of 17.0 MPa0.5 or less, a polar term δP of 8.0 MPa0.5 or less, and a hydrogen bond term δH of 7.0 MPa0.5 or less. A development roller of the present invention uses the electrophotographic member of the present invention in a coating layer.SELECTED DRAWING: Figure 1

To provide: a cleaning fluid having improved removability of stains due to impurities: and a cleaning method using the cleaning fluid.SOLUTION: Provided is a cleaning fluid, comprising a solvent and a metal remover. The cleaning fluid includes two or more kinds of solvents, the distance (HSP distance) between the Hansen solubility parameter of the cleaning fluid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the content of metal impurities is 0.1×10-9 pts.mass or more to 102×10-6 pts.mass or less relative to 100 pts.mass in total of the solvent and the metal remover.SELECTED DRAWING: None

A process for purifying a recycled polyethylene is disclosed. The process includes dissolving recycled polyethylene in a solvent with a boiling point higher than 70°C and a relative energy difference between the solvent and the polyethylene in the recycled polyethylene, as calculated using Hansen Solubility Parameters, less than or equal to 0.8 to provide a first polyethylene-containing solution, and contacting the first polyethylene-containing solution with an adsorption media to obtain a second polyethylene-containing solution. The second polyethylene-containing solution is separated to provide a purified recycled polyethylene.

Provided is an electrolytic capacitor including a capacitor element and a liquid component. The capacitor element includes an anode foil having a dielectric layer on a surface of the anode foil, and a conductive polymer component in contact with at least a portion of the dielectric layer. The conductive polymer component contains a self-doped conductive polymer. A difference ΔHSP1 between a Hansen solubility parameter HSPp of the self-doped conductive polymer and a Hansen solubility parameter HSPe of the liquid component is 9.0 MPa0.5 or more and 11.4 MPa0.5 or less.

An object of the present invention is to provide an aqueous dispersion composition containing polyester resin having high storage stability, film-forming properties, tackiness, adhesiveness, and water resistance. An aqueous dispersion composition containing polyester resin, comprises, a polyester resin (A), a coalescing aid (B), and an aqueous medium (C), wherein the coalescing aid (B) has a Hansen solubility parameter with a dispersion term (δd) of 15.4 MPa0.5 or more and less than 18.0 MPa0.5, a polarization term (δp) of 4.1 MPa0.5 or more and less than 9.1 MPa0.5, and a hydrogen bond term (δh) of 7.0 MPa0.5 or more and less than 12.3 MPa0.5.

The invention discloses a photoresist stripping liquid composition as well as a preparation method and application thereof, and relates to the technical field of photoresist stripping materials. The amide solvent is added, and the Hansen solubility parameter delta of the amide solvent is controlled to be close to the range of the solubility parameter of the photoresist, so that the capacity of the photoresist stripping liquid composition for dissolving the photoresist is maximized. Meanwhile, due to the existence of the amide solvent, the alcohol ether solvent can be selected from a monohydroxy alcohol ether solvent and a dihydroxy alcohol ether solvent which are mixed for use, so that the washing effect of the photoresist stripping liquid composition is improved. By controlling the octanol / water partition coefficient of the mixed solvent formed by the monohydroxy alcohol ether solvent, the dihydroxy alcohol ether solvent and the amide solvent, the photoresist stripping liquid composition has good photoresist dissolving capacity and washing performance, the service life of the photoresist stripping liquid is prolonged, meanwhile, the photoresist after-tack phenomenon is avoided, and the photoresist stripping liquid composition is suitable for being used in the field of photoresist stripping. And the yield of the material manufacturing process is improved.

To provide a water-in-oil emulsion cosmetic that excels in ease of reapplication, covering power, three-dimensional gloss, pigment dispersibility, and smooth spreadability.SOLUTION: A water-in-oil emulsion cosmetic comprises following components (A)-(D): (A) pigmentary titanium dioxide, (B) a powder dispersant that is liquid at 25°C, and contains three or more ester bonds, (C) a nonionic surfactant that is solid at 25°C, and (D) an aqueous component with √{(δp)2+(δh)2} under 20 in the Hansen solubility parameter.

To provide an aqueous ink composition capable of achieving both excellent discharge stability and storage stability over a long period of time even in an inkjet printhead having a nozzle having a stepped part having a smaller diameter toward the ink discharge direction.SOLUTION: There is provided an aqueous ink composition discharged from a nozzle having a stepped part having a smaller diameter toward the ink discharge direction, which comprises a pigment, a colloidal silica, more than 0.5 mass% of 1,2-hexanediol based on the total amount of the aqueous ink composition as a first solvent and 0.1 mass% or more and less than 4.0 mass% of an alcohol having a Hansen solubility parameter polarity term of 9 or less and a hydrogen bonding term of 17 or less based on the total amount of the aqueous ink composition as a second solvent.SELECTED DRAWING: Figure 1

The present invention employs a cleaning liquid containing a solvent and a metal remover. In the cleaning liquid, two or more solvents are included, the distance (HSP distance) between the Hansen solubility parameter of the cleaning liquid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the total content of an organic substance selected from the group consisting of organic acid multimers, organic acid esters, and ketone bodies is 0.1 × 10-9 parts by mass or more and 105 × 10-6 parts by mass or less with respect to 100 parts by mass of the total of the solvent and the metal remover. This cleaning liquid improves removal of organic impurities.

One embodiment of the present invention provides a cleaning agent composition which has excellent resin mask removability.　One embodiment of the present disclosure relates to a cleaning agent composition for removing a resin mask, the cleaning agent composition containing a polyhydric alcohol (component A), an amine (component B), and an organic solvent (excluding the component A and the component B) which has a Hansen solubility parameter SP value of 18-33 MPa1 / 2 (component C), wherein: the mass ratio A / B of the component A to the component B is 2 to 8 inclusive; and the component C is composed of at least one compound that is selected from among a sulfur-containing compound and a nitrogen-containing compound.

To provide a keratotic plug removal composition that exhibits high performance in removing keratotic plugs and makeup, while ensuring non-irritation.SOLUTION: A keratotic plug removal composition contains following components (a) and (b): (a) an oil solution with an HSP distance Ra of 5.0 or less relative to δd=14.0, δp=1.0, and δh=1.0 and (b) an oil solution with an HSP distance Ra of 5.0 or less relative to δd=18.5, δp=4.0, and δh=4.0. At 25°C, the HSP distance Ra between the composition's Hansen solubility parameters and δd=15.6, δp=4.7, and δh=5.1 satisfies 4.0 or less. The composition is substantially free of organic acids and organic bases.SELECTED DRAWING: None

Developer compositions are described based on blends of solvents, in which the developers are particularly effective for EUV patterning using organometallic based patterning compositions. Methods for use of these developing compositions are described. The blends of solvents can be selected based on Hansen solubility parameters. Generally, one solvent has low polarity as express by the sum of δP+δH, and a second solvent component of the developer has a higher value of δP+δH. Corresponding solvent compositions are described.

The present invention relates to new salt forms of sabcomeline. The new salt forms are lipophilic acid salts of sabcomeline wherein the lipophilic acids used to prepare the new salts may have a Hansen solubility parameter distance from water of at least 20.7. The present invention also relates to new crystalline forms of sabocomeline salts.

To provide a photosensitive composition capable of forming a film that offers superior storage stability and exhibits superior resistance after low-temperature heating.SOLUTION: A photosensitive composition contains a pigment (A), an alkali-soluble resin (B), a polymerizable compound (C), a polymerization initiator (D), and an organic solvent (E). The alkali-soluble resin (B) contains an alkali-soluble resin (B1) with a thermally crosslinkable group-containing monomer unit (b1). The polymerization initiator (D) contains a bisoxime ester polymerization initiator (D1). Of the organic solvent (E) 100 mass%, 0.1-20 mass% is an organic solvent (E1) with a hydrogen bonding component of a Hansen solubility parameter of 10 MPa1 / 2 or more.SELECTED DRAWING: Figure 1

The present invention provides an ACQ fluorescent probe composition, which is characterized in that the ACQ fluorescent probe composition is a probe solution for directly determining the cmc concentration of a surfactant, the ACQ fluorescent probe composition comprises a probe molecule and an auxiliary agent, the probe molecule is a fluorescent molecule having the property of aggregation-caused luminescence quenching (ACQ), the auxiliary agent comprises more than one non-volatile organic solvent, and the auxiliary agent is a non-volatile organic solvent. The boiling point of the organic solvent is 100 DEG C or more, and the HSP distance Ra, which is the distance between the Hansen solubility parameters of the probe molecule and the organic solvent, is 17 (MPa) 1 / 2 or less. Also provided are a cmc measurement method, a stain cleaning concentration determination method, a detergent delivery control method, and a detergent delivery control system using the ACQ fluorescent probe composition.

(Meth)acrylate-functionalized oligomers having a) an oligomeric backbone comprised of first segments and second segments and b) (meth)acrylate-functionalized end groups are provided. Such oligomers are useful as components of curable compositions. The first segments, second segments and (meth)acrylate-functionalized end groups are linked together by linking moieties derived from a polyisocyanate. The first segments are residues of a first segment precursor containing a plurality of repeating units and a plurality of isocyanate-reactive functional groups and having a number average molecular weight of at least 250 daltons. The second segments are residues of a second segment precursor, different from the first segment precursor, containing a plurality of repeating units and a plurality of isocyanate-reactive functional groups and having a number average molecular weight of at least 250 daltons. The first segment and the second segment exhibit a Hansen Solubility Parameter Distance Relative Energy Difference of at least about 4 and not more than about 9.

The invention belongs to the field of nano materials, and particularly relates to an indium selenide nanosheet compound as well as a preparation method and application thereof. The preparation method provided by the invention comprises the following steps: mixing indium selenide nanosheets and silver ions in a second solvent, so that silver nanoparticles grow on the surfaces of the indium selenide nanosheets; the second solvent is a polar solvent, the Hansen solubility parameter delta of the third solvent is greater than or equal to 18MPa < 1 / 2 >, and the mass ratio of the indium selenide nanosheets to the silver ions is (5-50): 1. And growing silver nano-silver particles on the surface of indium selenide by utilizing a spontaneous oxidation-reduction reaction of indium selenide and silver nitrate, so as to prepare the indium selenide nanosheet compound with the surface modified by the silver nano-silver particles. The silver nanoparticles have strong absorption, and the photoelectric response effect of the indium selenide nanosheet is remarkably improved by compounding the silver nanoparticles and the indium selenide nanosheet.

The present invention provides a curable composition which provides a coating film having excellent hot water-resistant adhesiveness, a cured product of the curable composition, a laminate using the curable composition, and production methods thereof. The curable composition of the present invention comprises the following compound A and the following compound B. Compound A: a compound in which an effect δd due to a van der Waals dispersion force in a Hansen solubility parameter as a single substance is 16.00 to 16.72 MPa0.5 (excluding the compound B), Compound B: a polyfunctional (meth)acrylate monomer having three or more (meth)acryloyl groups

This invention employs a washing solution containing solvents and metal removal agents. The washing solution contains two or more solvents, the distance between the Hansen solubility parameter of the washing solution and the Hansen solubility parameter of dimethylacetamide (HSP distance) is less than 1.0, and the content of metal impurities is 0.1 × 10⁻¹¹ parts by mass relative to the total of 100 parts by mass of the aforementioned solvents and metal removal agents. ‑9 10 or more by weight 2 ×10 ‑6 The amount is less than a certain percentage by weight. The washing solution described herein can improve the removal of impurities and dirt.

Provided is a means that, in temporary fixing applications in a process for manufacturing an electronic device, enables a sufficient amount of a UV absorber to be blended on the basis of long-term usability, and enables the suppression of heat generation associated with light irradiation. The present invention relates to a photocurable composition comprising (A) a first (meth) acrylate monomer comprising at least a monofunctional (meth) acrylate monomer, (B) a photoradical polymerization initiator, and (C) a UV absorber, the composition being characterized in that component (A) comprises (A-1) a monofunctional (meth) acrylate monomer and (A-2) a polyfunctional (meth) acrylate monomer; the absolute value of the difference between the delta P of the component (A) and the delta P of the component (C) is 5 or less with respect to a polarity term delta P at 25 DEG C in Hansen solubility parameters calculated by converting and introducing a molecular structural formula by an SMILES labeling method in HSPiP (Hansen Solubility Parameters in Practice) software, and the delta D of the component (A) is 16-20 with respect to a dispersion term delta D at 25 DEG C in Hansen solubility parameters.

Layered polymer materials include a first layer including a first cyclic olefin polymer or a first cyclic olefin copolymer, a third layer including a second cyclic olefin polymer or a second cyclic olefin copolymer, and a second layer including an amphiphilic polymer having a hydrophilic component with a Hansen Solubility Parameter distance of 8 MPa1 / 2 or greater from oxygen gas, while at the same time having a hydrophobic component with a Hansen Solubility Parameter distance of 8 MPa1 / 2 or less from COC or COP. The second layer can be in contact with and be between the first layer and the third layer. The layered polymer material can be used to construct the body of a vial or a syringe. Methods of making the layered polymer material and kits containing the layered polymer material or containers having a body constructed from the layered polymer material are also described.

An emulsion polymer comprising: (a) structural units of a specific polymerizable surfactant, (b) structural units of an ethylenically unsaturated anionic monomer, and (c) structural units of an ethylenically unsaturated nonionic monomer; wherein polymer segments of the emulsion polymer that comprise structural units of the ethylenically unsaturated anionic monomer and structural units of the ethylenically unsaturated nonionic monomer together have specific Hansen solubility parameters. An aqueous coating composition comprising such emulsion polymer provides good early water blister resistance.

The present invention provides a laminate capable of sufficiently suppressing foreign matter when a substrate is peeled off. This laminate includes a substrate and a resin composition layer formed on the substrate. The resin composition layer contains inorganic particles, an epoxy resin, and a silane coupling agent, and has a thickness of 0.10 mm to 1.00 mm. The percentage of the inorganic particles with respect to the solid content of the resin composition layer is 50 mass% to 99 mass%. The cumulative 50% particle diameter D50 of the inorganic particles is 10 μm or less from the fine grain side of a cumulative particle size distribution based on volume. The silane couple agent is such that the polarity term of the Hansen solubility parameter is 2 to 10.

According to the present invention, it is possible to provide a composition for removing a photoresist for forming a copper-containing pattern after the formation of the pattern, the composition comprising: an alkaline agent comprising at least one selected from the group consisting of an alkanolamine, a quaternary ammonium hydroxide, and an inorganic base; an organic solvent in which the Hansen solubility parameter coordinates fall within the range of a sphere having a radius of 3.60 MPa 0.5 or less centered on [Delta] d = 16.0, [Delta] p = 8.7, and [Delta] h = 15.5; and an azole compound.

The invention relates to a sheet for sintering and bonding, a composition, a varnish, and a dicing tape with the sheet for sintering and bonding. Provided is a sheet for sintering bonding, which is not susceptible to the occurrence of particle unevenness in the sheet, cracks during processing, and defects. A sheet for sintering bonding, which contains a binder and sinterable particles containing a conductive metal, and which is characterized in that the distance (Db) between the Hansen solubility parameter of the sinterable particles and the Hansen solubility parameter of the binder is less than 15.0.

A method for forming a semiconductor device can include coating a reversible overcoat layer over first mandrels on a substrate, inducing a crosslinking reaction within the reversible overcoat layer that renders the reversible overcoat layer insoluble to a developer and forms a crosslinked overcoat layer, diffusing acid particles from the first mandrels into first portions of the crosslinked overcoat layer, inducing a de-crosslinking reaction within the first portions of the crosslinked overcoat layer to form de-crosslinked regions, where unmodified regions of the crosslinked overcoat layer form second mandrels, and selectively removing the de-crosslinked regions with the developer such that the first mandrels and the second mandrels form a mandrel pattern over the substrate, where the developer has a solubility distance in a range of zero to seven in a Hansen Solubility Parameter space relative to methyl isobutyl carbinol.

To provide a photoresist stripping solution having excellent storage stability while maintaining sufficient resist detachability.SOLUTION: The photoresist stripping solution contains a quaternary ammonium hydroxide (A), water (B), and an organic solvent (C). The organic solvent (C) is a mixture of the following organic solvents (C1), (C2) and (C3): an organic solvent (C1) having a polarity term (dP) of Hansen solubility parameters of 15.0 or more and less than 21.0 and a hydrogen bond term (dH) thereof of 6.0 or more and less than 14.0; an organic solvent (C2) having a polarity term (dP) of Hansen solubility parameters of 3.0 or more and less than 14.0 and a hydrogen bond term (dH) thereof of 8.0 or more and less than 31.0; and an organic solvent (C3) having a polarity term (dP) of Hansen solubility parameters of 3.0 or more and less than 8.0 and a hydrogen bond term (dH) thereof of 2.5 or more and less than 8.0.SELECTED DRAWING: None

An ultrasound phantom comprising: water; agar; a thickening polysaccharide; and a water-retention auxiliary agent, wherein when a first phase transition point is defined as a temperature at which an aqueous dispersion liquid of the agar is solated by temperature raising and becomes a solated aqueous solution of the agar, and a second phase transition point is defined as a temperature at which the solated aqueous solution of the agar is gelated by temperature lowering, the thickening polysaccharide does not have a phase transition point at which an aqueous solution of the thickening polysaccharide is gelated by temperature lowering in a temperature range from the second phase transition point to the first phase transition point, and a polar term δP of Hansen solubility parameters of the water-retention auxiliary agent is 13.0 MPa0.5 or more.

A process for removing 1, 2-pentanediol from a mixture rich in ethylene glycol, said process comprising an extractive distillation in which an entrainer having a Hansen solubility parameter [delta] H of between 5 and 15 is used, and said entrainer has a boiling point at atmospheric pressure of at least 200 DEG C.

The present disclosure provides: a multilayer composite for airbags having excellent durability by controlling the softness and the adhesion between the adhesive layer and the base fabric within a specific range; and an airbag using the multilayer composite for airbags. The multilayer composite for airbags of the present invention comprises: a base fabric; and a multilayer film, which includes an outer layer and an adhesive layer bonded to one surface of the base fabric, characterized in that the bonding strength at the interface between the multilayer film and the base fabric is 5 N / cm or more, and the difference in ring stiffness between the multilayer composite for airbags and the base fabric is 130 mN / cm or less, the adhesive layer comprises a first resin having hydrogen bonding ability, and the difference in Hansen solubility parameter (△HSP) between the base fabric and the first resin is 5 MPa 0 . 5 the following.