49 results about "Acid dissociation constant" patented technology

Provided is a composition that contains bismuth, a first bismuth compound having at least one of an acryloyl group and a methacryloyl group, and a coordinating organic compound having an acid dissociation constant pKa of 1.5 or more. Also provided are a curable composition containing said composition; a cured body of said curable composition; an optical product, a lens, eyeglasses, and an antimicrobial / antiviral agent containing said cured body; and a resin composition.

A 1,1-dicyanoethylene-containing composition comprising 1,1-dicyanoethylene, water, and an acidic compound (A), wherein the content of the acidic compound (A) and the content of the water in the composition satisfy a specific relationship represented by formula (Ia): -4.00≦α≦0 (α is pKa+Log(C H2O / C a ), where pKa is the logarithmic acid dissociation constant of the acidic compound (A), and C H2O is the molar concentration of water in the composition, and C a is the molar concentration of the acidic compound (A) in the composition.

The present invention relates to an etching solution capable of forming a good etching surface on the surface of a copper-containing metal layer while controlling the etching amount, and a method for manufacturing a semiconductor device using the same. This etching solution is used to etch the surface of a copper-containing metal layer, and is characterized by containing, based on the total amount of the etching solution, (A) more than 0.1% by mass but not more than 0.5% by mass of hydrogen peroxide, (B) 0.01-20% by mass of an organic acid having a minimum acid dissociation constant pKa of 2.0 or more, (C) 0.010-0.3% by mass of a nitrogen-containing heterocyclic monocyclic compound, and (D) water, in the etching solution, the content of inorganic acid is less than 0.1% by mass.

The present invention relates to a trivalent chromium surface treatment agent for aluminum or aluminum alloy, and the preparation and use thereof. The present invention provides a trivalent chromium surface treatment agent for aluminum or aluminum alloy, starting materials thereof comprising: a) a hexavalent chromium compound; b) an organic reducing agent, containing a primary hydroxyl group, a secondary hydroxyl group and / or a phenolic hydroxyl group; c) hydrofluoric acid; d) an inorganic acid, having an acid dissociation constant pKa that is less than the pKa of hydrofluoric acid; wherein the ratio of Cr in the hexavalent chromium compound to the maximum number of moles of electrons theoretically provided by the organic reducing agent is 1.0: 3.0 -5.0; the trivalent chromium being obtained by in-situ reduction of the hexavalent chromium compound.

A photoresist developer includes a solvent having Hansen solubility parameters of 15<δd<25, 10<δp<25, and 6<δp<30; an acid having an acid dissociation constant, pKa, of −15<pKa<4, or a base having a pKa of 40>pKa>9.5; and a chelate.

The application provides a patterning material and substrate interlayer composition, application and device thereof, and the composition comprises a main resin A, a main resin B, a thermal acid generator and a solvent; the acid dissociation constant pKa of the conjugated acid corresponding to the anion in the thermal acid generator is lower than -3; the main resin A and the main resin B both contain crosslinkable groups and are crosslinked at 150-300 DEG C; and the molar ratio of the crosslinkable groups in the main resin A to the crosslinkable groups in the main resin B is 1:0.6-1.3. In the application, the main resin A and the main resin B control the molar ratio of the crosslinkable groups in the two resins under the thermal acid generator and at 150-300 DEG C, realize a high crosslinking state, avoid the falling phenomenon of the upper patterning material, and can form a strong crosslinking structure on various substrates and are suitable for use.

To provide a manufacturing method that enables the precise and rapid production of a component having a recessed structure that closely resembles a vertical structure. [Solution] A manufacturing method according to one embodiment of the present invention is a method for manufacturing a member having a recessed structure, comprising: a first step of preparing a workpiece containing an element whose fluoride boiling point is 550°C or lower; a second step of forming a catalyst material on a part of the surface of the workpiece; and a third step of exposing the workpiece to an etching gas in an environment of 80°C or higher to form a recessed structure on the portion of the workpiece where the catalyst material has been formed, wherein the etching gas includes a fluorine-containing gas and an acidic gas, and the acidic gas has a lower acid dissociation constant than hydrogen fluoride.

The present invention relates to lipid nanoparticles capable of delivering a target substance to hepatic stellate cells. The lipid nanoparticles are for delivering a target substance to hepatic stellate cells and comprise a pH-sensitive cationic lipid including a hydrophilic portion and two hydrophobic portions, wherein an acid dissociation constant pKa of a lipid membrane constituting the lipid nanoparticles is greater than or equal to 6.7 and less than 8.2.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can form a resist pattern with a low LWR. An actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes a resin whose polarity is increased by the action of an acid, one or more photoacid generators composed of a cation and an anion and generating an acid upon irradiation with an actinic ray or radiation, a first acid diffusion control agent composed of a first cation and a first anion, and a second acid diffusion control agent composed of a second cation and a second anion, wherein an acidic compound produced by replacing the cation in the photoacid generator with a proton has an acid dissociation constant A of −1.50 or less, an acidic compound produced by replacing the first cation of the first acid diffusion control agent with a proton has an acid dissociation constant B of more than −1.50, and an acidic compound produced by replacing the second cation of the second acid diffusion control agent with a proton has an acid dissociation constant C of more than −1.50, the first cation has a C log P value in the range of 5.400 to 6.000, and the second cation has a C log P value of 8.000 or more.

Provided is a reagent system for acridinium ester chemiluminescence, and a method of detecting a target antigen using the same. The reagent system for eliciting an acridinium ester chemiluminescence includes: a wash buffer including a first surfactant in one or more of a phosphate-buffered saline (PBS) and a tris-buffered saline (TBS); a first reagent including hydrogen peroxide and an acid, and optionally a first alkali metal salt; and a second reagent including a base and a second surfactant, and optionally a second alkali metal salt, where the first surfactant and the second surfactant are independently one or more of a cationic surfactant, a neutral surfactant and an anionic surfactant, where the acid having an acid dissociation constant (pKa) of −1.0 to 5.0, and where the base comprises one or more of sodium hydroxide (NaOH), potassium hydroxide (KOH), ammonium hydroxide, tetra-n-ethylammonium hydroxide (TEA), tetra-n-propylammonium hydroxide (TPA), and tetra-n-butylammonium hydroxide (TBA).

A method of producing acrolein from glycerol comprising introducing in a reactor a heteropoly acid catalyst comprising amorphous silica having heteropoly acid groups; preheating the catalyst in the re

The invention provides a patterned material and substrate intermediate coating composition as well as application and a device thereof. The composition comprises matrix resin A, matrix resin B, a thermally induced acid generator and a solvent, the acid dissociation constant pKa of conjugated acid corresponding to anions in the thermally induced acid generator is lower than-3; the matrix resin A and the matrix resin B both contain cross-linkable groups and are cross-linked at 150-300 DEG C; the molar ratio of the cross-linking groups in the matrix resin A to the cross-linking groups in the matrix resin B is 1: (0.6-1.3). The molar ratio of cross-linking groups in the matrix resin A and the matrix resin B is controlled at 150-300 DEG C in the presence of the thermally induced acid generator, so that a high cross-linking state is realized, and the phenomenon that an upper-layer patterned material falls off is avoided; strong cross-linked structures can be formed on various substrates, and the applicability is high.

The present invention provides a composition for treating a semiconductor device, a compound, a method for producing a modified substrate, and a method for producing a semiconductor device, each of which can form a coating film having a high coat-forming property for inhibiting the formation of an ALD coating film. The composition for treating a semiconductor device of an embodiment of the present invention includes a compound having a specific functional group bonded to or adsorbed on a substrate and a polymerizable group, and a solvent, in which the specific functional group is a basic functional group or an acidic functional group, in a case where the specific functional group is the basic functional group, an acid dissociation constant of a conjugate acid of a compound obtained by adding a proton to the basic functional group is 7.0 or more, and in a case where the specific functional group is the acidic functional group, an acid dissociation constant of the compound upon dissociation of a proton from the acidic functional group is 5.0 or less.

The present invention relates to an electrolyte solution for a hybrid electrolytic capacitor, which contains an aromatic carboxylic acid (A) having a substituent having 2 or more carbon atoms, and which is characterized in that the acid dissociation constant (pKa) of the carboxylic acid (A) as determined by the following measurement method is 1.0-4.5. The measurement method comprises the following steps: dropwise adding 0.1 mol / L methanol potassium hydroxide solution into a solution consisting of 1 part by weight of carboxylic acid (A) and 99 parts by weight of methanol at 25 DEG C, and taking the point with the minimum dropwise adding amount among inflection points of an obtained titration curve as a neutralization point. And the pH at half of the dropping amount of the neutralization point is used as the acid dissociation constant (pKa) of the carboxylic acid (A).

The present invention provides a composition for semiconductor device processing, which is capable of forming a film that has excellent ALD inhibition properties and is easily removed by removal processing after ALD processing. The present invention also provides: a method for manufacturing a modified substrate; a method for manufacturing a laminate; and a method for manufacturing an electronic device. A composition for semiconductor device processing according to the present invention contains a compound which has at least one specific functional group that interacts with a substrate. The molecular weight of the compound is 2,000 or less. ClogP of the molecular structure of the compound excluding the specific functional group is 10.3 or more. The specific functional group is a basic functional group or an acidic functional group. In cases where the specific functional group is the basic functional group, the acid dissociation constant of a conjugate acid of the compound, which is obtained by adding protons to the basic functional group, is 7.0 or more. In cases where the specific functional group is the acidic functional group, the acid dissociation constant of the compound is 5.0 or less when protons are dissociated from the acidic functional group.

The purpose of the present invention is to provide a method for efficiently producing an oligonucleotide by a solid-phase synthesis approach. The present invention provides a method for producing an oligonucleotide by a solid phase synthesis approach, the method comprising a step for reacting an oligonucleotide in which a hydroxyl group at a chain extendable end is protected with a protective group that can be removed under acidic conditions and a deblocking solution to remove a protective group for a hydroxyl group at the chain extendable end, wherein the deblocking solution is a deblocking solution containing a base, an acid, and an aprotic solvent, and the base is a base having an acid dissociation constant (pKa) of a conjugate acid of 5-12, and an oligonucleotide in which the content ratio of the 2', 3'transfer body is a certain amount or less.

The present invention addresses the problem of providing a photosensitive composition with which it is possible to form a pattern having a small LCDU. A photosensitive composition according to the present invention contains a resin that has a repeating unit which is derived from a monomer containing an onium base that is composed of an anionic group and a cation. The resin has an organometallic structure, or the photosensitive composition comprises an organometallic compound that is different from the resin. The acid dissociation constant of a compound that is obtained by replacing the cation with a proton in the monomer is -1.0 or less. The cation has a structure that is changeable by the action of an acid. When the cation before the structure is changed by the action of an acid is defined as a cation X, and the cation after the structure is changed by the action of the acid is defined as a cation Y, the integrated value of the molar absorption coefficients of the cation Y at wavelengths of 200-450 nm is larger than the integrated value of the molar absorption coefficients of the cation X at wavelengths of 200-450 nm, and the onium base that is composed of the anionic group and the cation Y generates an acid when irradiated with light having a wavelength of 200-450 nm.

An object of the present invention is to provide an aqueous coating material composition that has excellent storage stability and that demonstrates high coating film performance and strong glass adhesiveness even when cured at a relatively low temperature. The present invention discloses an aqueous coating material composition including (A) a hydroxyl group- and carboxyl group-containing resin, (B) a blocked polyisocyanate compound, (C) a polycarbodiimide compound, and (D) a basic compound. The basic compound (D) includes (D1) a basic compound having an acid dissociation constant (PKa) in a range from 7.0 to 8.5 and a boiling point in a range from 100 to 200° C. A content ratio of the basic compound (D1) is in a range from 30 to 100 mass % based on the mass of the basic compound (D). The aqueous coating material composition has a pH in a range from 8.0 to 11.5.

The present invention provides a composition comprising: a first bismuth compound having bismuth and having at least one of an acryloyl group and a methacryloyl group; and a coordinating organic compound having an acid dissociation constant (pKa) of 1.5 or more. Further, the present invention provides: a curable composition containing the composition; a cured product of the curable composition; an optical article, a lens, a pair of glasses, and an antibacterial / antiviral agent, each of which contains the cured product; and a resin composition.

The present invention provides a negative photosensitive resin composition which is high in sensitivity, excellent in half-tone characteristics, capable of obtaining a pattern shape with low taper, and alkali developable. A negative photosensitive resin composition comprising at least (A1) a resin containing a weak acid group and (A2) a resin containing an unsaturated group as (A) an alkali-soluble resin, the (A1) resin containing a weak acid group having an acid dissociation constant in dimethyl sulfoxide in the range of 13.0 to 23.0, and the (A2) resin containing an unsaturated group having an ethylenic unsaturated double bond group.

Process for preparing the compound of Formula (I) in the form of a base or a salt thereof, said process comprising: a) reacting the compound of Formula (II) with 4-toluenesulfonyl chloride in the presence of a base in an organic solvent, water or a combination thereof, to obtain a compound of Formula (III), b) reacting the compound of Formula (IV) with zinc and iodine in an aprotic polar solvent to obtain a complex between zinc and the compound of Formula (IV); c) reacting the compound of Formula (III) obtained in step a) with the complex zinc-compound of Formula (IV) obtained in step b) in the presence of a catalyst comprising palladium and a phosphine ligand in an aprotic polar solvent to obtain a suspension comprising the compound of Formula (V) d) reacting the compound of Formula (V) in suspension obtained in step c) with a carboxylic acid to obtain a solution of the compound of Formula (VI) e) reacting the compound of Formula (VI) in solution obtained in step d) with an acid having an acid dissociation constant Ka≥1 (also referred to in this text as "strong acid") to obtain the compound of Formula (I).

Provided is an optical film that can be molded with low stretching stress, that has appropriate retardation development, and that also has excellent durability under severe environmental conditions.　This optical film contains diacetyl cellulose and is characterized by: containing a nitrogen-containing heterocyclic compound; the nitrogen-containing heterocyclic compound having an aromatic ring containing 1-3 nitrogen atoms; a hydrogen atom being bonded to at least one of the nitrogen atoms contained in the aromatic ring; the acid dissociation constant when the hydrogen atom bonded to the nitrogen atom dissociates as a hydrogen ion being 14 or greater; and the nitrogen-containing heterocyclic compound being represented by general formula 1.

An electrolytic capacitor includes a capacitor element, and a liquid component. The capacitor element includes an anode body having a dielectric layer at a surface of the anode body, and a conductive polymer component covering part of the dielectric layer. The liquid component contains a first solvent, a base component, and an acid component. The first solvent is at least one selected from the group consisting of a polyol and a derivative thereof. The base component contains a first base which has no boiling point or a boiling point of 100° C. or higher. A conjugate acid of the first base has an acid dissociation constant of 5 or more and 10 or less.

A composition for absorbing carbon dioxide including an ionic liquid (A) containing a cation and an anion, and a protic compound (B) having a relative permittivity at 25° C. of 20 or more, wherein the cation at least includes a cation represented by the formula (1), the anion includes an anion where an acid dissociation constant (pKa) at 25° C. of its conjugate acid in water is 4.5 or more, and the ratio of a value obtained by multiplying the number of hydroxyl groups of the protic compound (B) by the number of moles of the protic compound (B) to the number of moles of the ionic liquid (A) [number of moles of protic compound (B) / number of moles of ionic liquid (A)] is 0.2 to 1.0:wherein R1 and R2 each independently represent a hydrogen or a C1-C6 linear alkyl group.

A cleaning solution includes a solvent having Hansen solubility parameters: 25>δd>13, 25>δp>3, 30>δh>4; an acid having an acid dissociation constant pKa: −11<pKa<4, or a base having pKa of 40>pKa>9.5; and a surfactant. The surfactant is an ionic or non-ionic surfactant, selected fromR is substituted or unsubstituted aliphatic, alicyclic, or aromatic group, and non-ionic surfactant has A-X or A-X-A-X structure, where A is unsubstituted or substituted with oxygen or halogen, branched or unbranched, cyclic or non-cyclic, saturated C2-C100 aliphatic or aromatic group, X includes polar functional groups selected from —OH, ═O, —S—, —P—, —P(O2), —C(═O)SH, —C(═O)OH, —C(═O)OR—, —O—, —N—, —C(═O) NH, —SO2OH, —SO2SH, —SOH, —SO2—, —CO—, —CN—, —SO—, —CON—, —NH—, —SO3NH—, and SO2NH.

To provide a method for producing high-purity N-substituted aspartic acid from which impurities such as long-chain aliphatic amines have been sufficiently removed. [Solution] A method for producing N-substituted aspartic acid (1), comprising: (A) an acid decomposition step in which crude N-substituted aspartate obtained by an addition reaction of maleate and / or fumarate with a long-chain aliphatic amine is acid-decomposed in an aqueous solution with an inorganic acid having an acid dissociation constant smaller than that of N-substituted aspartic acid at a temperature range of 40 to 100°C to precipitate N-substituted aspartic acid; (B) a separation step to separate the precipitated N-substituted aspartic acid; and (C) a washing step to wash the N-substituted aspartic acid after the separation step with water and a lower alcohol. JPEG2026115080000014.jpg42159

A method for reducing resist consumption (RRC) is provided. The method includes treating a surface of a substrate using a RRC composition and forming a photoresist layer comprising a metal-containing material on the RRC composition treated surface. The RRC composition includes a solvent and an acid or a base. The solvent has a dispersion parameter between 10 and 25. The acid has an acid dissociation constant between −20 and 6.8. The base having an acid dissociation constant between 7.2 and 45.

The invention relates to the technical field of component design, in particular to a benzene ring acid group substitution type screening method based on isoamyl cinnamate and application of the benzene ring acid group substitution type screening method based on isoamyl cinnamate. The screening method comprises the steps that a virtual substituent library is established, acid group substituents are introduced to an isoamyl cinnamate benzene ring, and a plurality of substitution combinations are generated; predicting a minimum value pKai of an acid dissociation constant and a polar atom ratio PAR for each structure, and screening less than or equal to 50 candidate structures according to the minimum value pKai and the polar atom ratio PAR; measuring the fluorescence polarization anisotropy r of each candidate structure, and screening the first 50% of samples according to the sequence of r values from small to large; sequentially measuring the quantum dot fluorescence intensity retention rate Fret and the coating UVB retention rate RAUVB of the screened samples; and outputting the acid group substitution type corresponding to the maximum value according to the product sequence of the two. The self anti-ultraviolet attenuation capability and the photosensitive component protection effect are reflected, and the optimal structure is ensured to have self stability and synergistic protection performance in a real compound system.

A photoresist developer includes a solvent having Hansen solubility parameters of 15<δd<25, 10<δp<25, and 6<δp<30; an acid having an acid dissociation constant, pKa, of −15<pKa<4, or a base having a pKa of 40>pKa>9.5; and a chelate.

A composition containing 1,1-dicyanethylene, containing 1,1-dicyanethylene, water, and an acidic compound (A), wherein the content of the above-mentioned acidic compound (A) and the content of the above-mentioned water in the composition satisfy a specific relationship formula (Ia): -4.00 ≤ α ≤ 0 (α is represented by pKa + Log(C H2O / C a ), pKa is the logarithmic acid dissociation constant of the above-mentioned acidic compound (A), C H2O is the molar concentration of the above-mentioned water in the above-mentioned composition, and C a is the molar concentration of the above-mentioned acidic compound (A) in the above-mentioned composition).