4results about How to "Pollution control" patented technology

The application discloses an automatic conveying device, relates to the material conveying technical field, and improves a series of requirements and problems such as long distance, large conveying capacity and high efficiency, maximally reduces labor and material waste, and improves production efficiency, and comprises a hopper, a plurality of standard spiral conveying pipes, a plurality of series joints and a discharge port. The conveying device is assembled by a plurality of standard units, so that the conveying equipment is more miniaturized and simplified, equipment installation, dismounting and transportation are facilitated, different working environments and conditions can be adapted, power output of the conveying device is more stable and efficient by adopting a decentralized arrangement form, the conveying device can realize longer distance transportation, meanwhile, the conveyed materials are transported through a closed pipeline, so that the materials can be prevented from being accidentally spilled, personnel casualty and property loss are avoided, and the conveying device has higher safety. In addition, sealed transportation can effectively control dust pollution, irritating smell and the like, and has higher environmental protection.

This utility model relates to a point source pollution purification device for river and lake management, comprising a base plate, a packing box, floats, and a housing. The housing is located on top of the base plate, and multiple floats are located at the bottom of the base plate. A main sewage pipe running left-right is located at the top of the housing. A pumping assembly connected to the right end of the main sewage pipe is located on the right side of the housing. Several branch sewage pipes running front-back are evenly arranged along the length of the main sewage pipe at its bottom, and outlets are evenly arranged along the length of the branch sewage pipes at their bottom. Several packing boxes are evenly arranged along the left-right direction below the branch sewage pipes within the housing. The side walls of adjacent packing boxes are tightly fitted together, and the inner wall of the housing is tightly fitted to the side walls of the packing boxes. Water passage holes are evenly arranged at the top and bottom of each packing box. A drain outlet aligned with the bottom of the packing box is located at the bottom of the housing, passing through the base plate. This utility model has the advantages of convenient installation and labor-saving cleaning.

The present application relates to the field of medicinal plant tissue culture, and particularly relates to a Nitraria sibirica culture medium and a culture method and application thereof. The method comprises the following steps: S1. Sterile seedlings are obtained by sequentially treating Nitraria sibirica seeds with concentrated sulfuric acid and chlorine fumigation; S2. Hypocotyls of the sterile seedlings obtained in S1 are cut and inoculated on a callus induction culture medium; the callus induction culture medium mainly comprises: MS culture medium + 17-23 g / L sucrose + 1.5-2.5 mg / L 6-BA + 0.1-0.4 mg / L NAA; S3. The callus obtained in S2 is inoculated on a callus proliferation culture medium; the callus proliferation culture medium mainly comprises: MS culture medium + 17-23 g / L sucrose + 0.3-3.5 mg / L 6-BA + 0.5-3.5 mg / L NAA. The quality and survival rate of the tissue culture seedlings can be improved, and the production cost and environmental risk can be significantly reduced.

This invention discloses a polishing slurry, its preparation method, and its application, relating to the field of polishing slurry technology. The polishing slurry of this invention comprises silica abrasive, citric acid, and sodium citrate, with a pH < 7. It effectively controls metal ion contamination during the polishing process of synthetic quartz, improves the removal rate during the polishing of quartz glass substrates, and reduces the surface roughness of the quartz. It synergistically optimizes chemical corrosion and mechanical removal, achieving an atomically smooth, scratch-free, and subsurface-damage-free quartz glass substrate surface while maintaining a high material removal rate. Furthermore, it possesses characteristics such as low contamination, easy cleaning, and environmental friendliness.