72 results about "Particle control" patented technology

The invention discloses a preparation method of a high-purity ultra-clean hydroxylamine aqueous solution. A four-stage purification process comprises the following steps: 1) low-temperature chelation-ceramic membrane metal removal; 2) molecular sieve membrane rectification decomposition prevention; 3) pulse electrodialysis reversal deep desalination; and 4) gradient filtration terminal refining. According to the preparation method of the high-purity ultra-clean hydroxylamine aqueous solution, a low-temperature molecular sieve membrane rectification technology is adopted, hydroxylamine liquid-phase thermal decomposition is avoided through a vapor phase separation mechanism, and the decomposition rate is reduced to 1t from 15% of a traditional process; the method comprises the following steps of: removing metal through chelation-electrodialysis synergistically, ensuring that Fe and Cu ion residues are less than or equal to 0.05 ppb through a thiosemicarbazide-bipolar membrane system, ensuring the nitrogen environment in the whole process, ensuring that the dissolved oxygen is less than or equal to 5ppb, replacing liquid phase distillation with molecular sieve membrane vapor phase separation, solving hydroxylamine liquid phase thermal decomposition, and breaking through the trace metal removal limit by combining thiosemicarbazide-bipolar membrane synergistically removing impurities. And then through nanoscale terminal filtration, the metal / particle control reaches ppb-level limit which is superior to the SEMI standard, and double spanning of quality and cost is realized.

All magnetic nuclear fusion devices face common technical challenges related to power and particle control arising from the close proximity of a thermonuclear plasma to the plasma-facing component. The plasma-facing component is subjected to high incident power density and erosion processes, and must facilitate the efficient remove of the fusion-ash. In the past, limiters and divertors have been used in magnetic fusion devices for this purpose. These are discussed and extended to a new concept, the “stochastic mantle”, which utilizes a stochastic magnetic field layer to disperse power on the plasma-facing component to the maximum extent possible. Further, if operated at sufficient plasma collisionality, it reduces the energy of particles incident on the plasma-facing component, globally reducing erosion by physical sputtering, while producing high gas pressures for fusion-ash removal through pumping ducts. The approach is particular suited for stellarators, but others devices may be considered.

The invention relates to the technical field of nano control, in particular to a nano particle control method and device based on an acoustic streaming suppression principle, and the method comprises the following steps: S1, arranging a micro-fluidic chip with a cavity; s2, a target standing wave sound field is established on the cross section of the cavity, and the sound pressure node plane of the target standing wave sound field is parallel to the adjacent side wall of the cavity; s3, fluid containing nano particles is introduced into the cavity channel, the nano particles can be migrated and driven to a sound pressure node area under the action of sound radiation force, and stable aggregation clusters are formed; the device comprises a micro-fluidic chip, the micro-fluidic chip is provided with a cavity channel, the surface of the micro-fluidic chip is provided with a sound wave driving structure, and a sound pressure node plane of a standing wave sound field generated by the sound wave driving structure is parallel to an adjacent side wall of the cavity channel. According to the method, the directional or fixed-point control of the nano particles can be realized under the action of actively inhibiting the sound stream interference.

The invention relates to a particle control, sorting and detection device and method, and the device comprises a special ultrasonic device which comprises two side edges extending from a first end to a second end, and the two side edges are gradually shrunk along the extending direction and form an angle, so that the dragging force of acoustic fluid formed by the side edges is gradually reduced along the extending direction; a second side edge, close to the downstream side of the first flow channel, of the two side edges is inclined to the extending direction of the first flow channel; when the special ultrasonic device is in a working state, particles in the first flow channel are captured, the particles are made to move towards the second end along the acoustic fluid tunnel of the second side edge, and the particles are made to break away from the acoustic fluid tunnel of the second side edge at the position where the dragging force of the acoustic fluid is matched with the dragging force of the fluid in the first flow channel. The invention further provides a corresponding method. Multi-channel particle sorting can be achieved through one special ultrasonic device, the number of the special ultrasonic devices is reduced, and the micro-fluidic device is suitable for miniaturization of a micro-fluidic system.

The invention belongs to the technical field of open surface control, and particularly relates to a multiphase particle control method for regulating and controlling a meniscus through a magnetic field response microneedle. According to the invention, the pose of the magnetic control microneedle is changed by utilizing the change of a magnetic field, and the deformation of an asymmetric meniscus is generated on a fluid interface; the deformation of the asymmetric meniscus provides an interfacial tension horizontal component difference for a control object, and the control object comprises solid-phase particles, liquid-phase particles or gas-phase particles; the interface tension horizontal component difference is used for driving the control object to conduct multifunctional movement, and the multifunctional movement comprises one or more of capturing, rotating, transmitting and in-situ releasing of the control object. The asymmetric meniscus is generated by using the inclined microneedle, multiphase and multifunctional control is realized by adjusting the form of the meniscus, flexible, lossless, multi-material and multifunctional operation can be realized on an open surface, the range of controllable materials and the control environment are widened, the motion control mode is enriched, and the application and development prospects are wider.

The invention provides an annular air supply chamber for particle control in the wafer conveying process, and the chamber comprises an annular air supply cavity, and the inner ring region of the annular air supply cavity is used for placing a wafer; an air inlet; the fan is arranged on the surface of the annular air supply cavity; the first-stage pressure stabilizing cavity is formed in the annular air supply cavity and communicates with the air inlet hole; the second-stage pressure stabilizing cavity is formed in the annular air supply cavity, and interstage gas transmission of the first-stage pressure stabilizing cavity and interstage gas transmission of the second-stage pressure stabilizing cavity are communicated through a micro gap; the air outlet hole is formed in the annular air supply cavity, located on the outer side of the wafer and communicated with the second-stage pressure stabilizing cavity; wherein the first-stage pressure stabilizing cavity is used for carrying out primary speed reduction and primary pressure homogenization on clean gas introduced from the gas inlet hole under the action of high flow resistance of the micro gap, the second-stage pressure stabilizing cavity is used for carrying out secondary speed reduction and secondary pressure homogenization on the clean gas subjected to primary pressure homogenization, and the gas outlet hole is used for spraying out the clean gas subjected to secondary pressure homogenization; and a uniform and stable closed annular air curtain is formed around the wafer.

A vacuum sweeper self-adaptive dust collection control system and the use, the system comprising: a, an environment mapping module which comprises a multi-dimensional sensing technology and a real-time modeling algorithm, and is configured to analyze the dust concentration and the particle size, and construct a three-dimensional model of a working environment; b, a dynamic programming module which is connected to the environment mapping module, and is configured to calculate a dust collection path and suction parameters, and generate a dust collection strategy; and c, a particle control module which is connected to the dynamic programming module and is configured to perform localized attraction or repulsion of dust particles in a specific area.

The application discloses a clean workshop independent decoupling clean air conditioning system and a control method thereof, and belongs to the field of clean air conditioning system. The clean workshop independent decoupling clean air conditioning system comprises a cleanliness control module, a temperature control module and a humidity and positive pressure control module. The cleanliness control module is used for bearing clean air supply and particle control in a clean room. The temperature control module comprises a coil pipe and is used for bearing sensible heat load processing in the clean room. The temperature control module runs in a dry working condition by taking medium-temperature water as refrigerant and inputting the refrigerant into the coil pipe. The surface temperature of the coil pipe is always higher than the dew point temperature of indoor air. The humidity and positive pressure control module is used for bearing fresh air load, latent heat load and positive pressure maintenance in the clean room. The cleanliness control module, the temperature control module and the humidity and positive pressure control module are independently realized by air volume decoupling, load decoupling and control decoupling modes, and cooperatively maintain the cleanliness, temperature, humidity and positive pressure of the clean room environment in a steady state. The application adopts the independent decoupling design, controls the cleanliness and temperature and humidity, has no condensation risk in the dry working condition, is energy-saving and convenient to operate and maintain.

The invention provides a particle control device and method based on a special sound wave sound beam, and the device comprises a micro-channel which comprises a first channel; the particle focusing unit is used for arranging particles in the fluid in the first flow channel in a queue and enabling the particles to pass through the following detection units one by one; the detection unit is used for detecting the particles in the queue so as to identify the first particles included in the queue; and the first special ultrasonic device is tightly attached to the micro-channel and is used for generating a special sound wave beam current with expected intensity when the first special ultrasonic device is started, and the first particles flowing through the first special ultrasonic device are driven to flow to other laminar flow in the first channel or flow to a target channel through the special sound wave beam current. According to the invention, deviation of the moving direction of the target particles can be accurately controlled.

The invention discloses a particle directional and fixed-point transport system and method based on asymmetric astigmatism light field regulation and control, and belongs to the technical field of optical micro-control. The system comprises a laser, a cylindrical lens, a first plano-convex lens, a second plano-convex lens, a first reflector, a second reflector and a microscope objective. The cylindrical lens is controlled in an off-axis mode to enable a light beam to be incident vertically in an off-axis mode, and light intensity deviation perpendicular to the optical tweezer line direction is formed on the focal plane of the cylindrical lens. And converting the offset into light intensity gradient distribution along the optical tweezers line direction by using a reflector group, and generating the asymmetric linear optical tweezers after focusing by a microscope objective. The light field generates a directional net scattering force to drive the particles to move unidirectionally along the optical tweezers line direction while maintaining stable capture of the particles. Active modulation devices such as an acousto-optic deflector and a spatial light modulator are not needed, particle directional transportation can be achieved only through cooperative regulation and control of optical elements, and the device has the advantages of being simple in structure, low in cost and high in light field stability and is suitable for biomedical microoperation and particle control in a micro-fluidic chip.

The application discloses a photoelectric tweezers device capable of patterning and controlling micro particles, relates to the technical field of micro particle control, and comprises a patterned light beam generating light path, an ultraviolet sheet-shaped illumination module and a photovoltaic wafer control platform. The patterned light beam generating light path generates a preset pattern light beam, and the preset pattern light beam generates a first electric field on the photovoltaic wafer control platform. The ultraviolet sheet-shaped illumination module generates a second laser, and the second laser is expanded, and the intensity and diameter of the expanded second laser are controlled, so that a second electric field is generated on the photovoltaic wafer control platform. Micro particles in the photovoltaic wafer control platform move to a preset pattern area under the influence of the first electric field and the second electric field. The application captures micro particles by using patterned laser, so that the number of controlled particles is increased and the capturing efficiency is improved.

The invention discloses a polishing pad particle control device and method for polishing a high-precision mask substrate, and belongs to the technical field of semiconductor manufacturing and optical element precision machining. The device comprises a mounting bracket, a flexible ramming head assembly, a multi-degree-of-freedom driving mechanism, a detection module and a gas path system, the flexible ramming head assembly is combined with a replaceable functional head through an air bag type flexible ramming head mounting seat and is matched with an air path system to realize self-adaptive pressure fitting and flexible contact; the multi-degree-of-freedom driving mechanism drives the ramming head to rotate and swing in a combined mode, and the detection module monitors the distance in real time. According to the invention, the functions of cleaning, shaping and particle control are integrated, so that efficient cleaning, precise shaping and thorough particle removal of the polishing pad are realized, rigid contact damage and secondary pollution are effectively avoided, and the polishing processing quality and process stability of the high-precision mask substrate are improved.

The application relates to an acceleration measuring device based on a particle image velocimetry, which comprises at least two CCD cameras, the center points of the mirrors of the two CCD cameras are located on a straight line through a limiting device; a tracer particle generator is used for emitting tracer particles along the direction vertical to the normal of the mirror of the CCD camera; a four-pulse laser is used for sequentially emitting four pulse laser beams along the direction vertical to the direction of the particle flow to illuminate the tracer particles; a control device is connected with the CCD camera and the four-pulse laser respectively, and is used for synchronously controlling the CCD camera and the four-pulse laser, so that the CCD camera acquires the tracer particle images under the irradiation of different pulse lasers in a double-exposure mode, and the speed and acceleration of the particles are acquired based on the tracer particle images. Since the four-pulse laser capable of sending four high-energy pulse lasers at a time is adopted, at least four particle images with a very short time interval are acquired by using two CCD cameras, and then the particle acceleration can be acquired.

The present application relates to air pollution particle control technical field, especially to a kind of dehumidification dust removal device and dehumidification dust removal method.The device includes filter cartridge and louvre flow guide device arranged annularly around the filter cartridge by inside and outside sequentially, the top of the filter cartridge is provided with clean gas outlet, the components of the louvre flow guide device include hoop beam and flow guide vane, wherein the flow guide vane is arranged around the filter cartridge, and the upper and lower ends of the flow guide vane are limited as cylindrical by the hoop beam, and there is gap between adjacent two flow guide vanes;Hook-shaped water collecting tank is located between the filter cartridge and the louvre flow guide device, and the inner wall of the hook-shaped water collecting tank is hydrophilic coating, for trapping moisture in the moisture and dust-containing gas.The dehumidification dust removal device of the present application can effectively dehumidify and remove dust, and the dehumidification rate reaches more than 50%, and the dust removal rate reaches more than 99%.

The invention provides a particle program optimization method based on a Shenwei architecture. The method comprises the following steps: analyzing program hotspots, finding and calculating a hotspot function, and optimizing the function by using five means of particle control, step number parameter control, data classification transmission, function expansion and function inline by utilizing the advantages of an SW26010pro architecture; the execution efficiency of the particle program is improved, the computing performance of the Shenwei architecture is fully played, and rapid and effective operation of the large-scale particle computing program is achieved.

An embodiment of the present application provides a method and related device for controlling particles in vehicle exhaust. The method includes: obtaining current operating condition data of a target vehicle; determining a corresponding particle control strategy according to the current operating condition data; controlling the opening and closing degrees of a first control valve and a second control valve according to the particle control strategy. The first control valve is used to control the opening and closing of a first exhaust pipe after the TWC of the target vehicle, and the second control valve is used to control the opening and closing of a second exhaust pipe after the TWC. A GPF is installed in the second exhaust pipe, and the GPF is used for particle trapping. Through the above solution, it is possible to effectively control the particle number of vehicle exhaust under various operating conditions.

The invention relates to the technical field of rare earth nano material preparation, in particular to a system for preparing nano yttrium oxide by a spray pyrolysis method based on double closed-loop fluid control, which comprises a yttrium salt solution storage tank and a cooling water tank. The atomizing nozzle adopts a self-cleaning design, high-pressure N2 is sprayed for 0.2 s every 30 s, impurity blockage can be effectively prevented, it is ensured that the atomizing process is stable and efficient, frequent manual maintenance is not needed, the production cost and equipment loss are reduced, nano yttrium oxide particles prepared through double-closed-loop fluid control and an accurate pyrolysis process are uniform in particle control, and the particle size of the nano yttrium oxide particles is reduced. The specific surface area reaches 120 + / -5m < 2 > / g, and the sphericity is And in addition, when the temperature of the reaction furnace exceeds the standard, the emergency cooling system is rapidly started, rapidly cooled and stabilized in a safe range, reaction out-of-control and equipment damage are avoided, the safety and reliability of the production process are greatly improved, and the product quality is guaranteed.

This invention discloses a hydraulically driven chiseling alloy array cutter head and a coke oven slag cleaning robot, belonging to the field of coke oven slag cleaning technology. It solves the problems of existing rotary cutter heads being unable to adjust their extension length in real time, which easily leads to cutter head jamming / chipping, excessive instantaneous back pressure in the hydraulic system, or incomplete cleaning when cleaning coke slag with sudden changes in thickness. The invention includes a chiseling cutter head mounting base, a hydraulic drive motor, a motor reduction mechanism, a chiseling linkage component, and a chiseling alloy array cutter head. In this invention, the chiseling alloy array cutter head, combined with the cutter head pitch adjustment unit, obtains feedback parameters from the pressure sensor on the hydraulic drive motor side in real time. It can automatically adjust the working depth and extension position of the chiseling alloy array cutter head based on dynamic load changes. This not only improves the uniformity of coal slag crushing and the fine particle control accuracy, but also fundamentally solves the problems of jamming, chipping, system impact, and cleaning blind spots caused by the inability of traditional fixed cutter heads to self-adjust.

The invention relates to the technical field of particle control equipment, and discloses a uniform mixing and uniform distribution control device for coiled material particle spreading, which comprises a material box for feeding particle materials; a base; the regulation and control mechanism is used for regulating and controlling the particle materials in the material box; and the regulation and control mechanism comprises a uniform control device, a width control device and a material control device. According to the uniform mixing and uniform distribution control device for spreading the coiled material particles, the uniform distribution roller composed of the two half rollers (the first half roller and the second half roller) rotating oppositely is arranged, particle materials are automatically distributed in the left direction and the right direction to be thrown in the falling process, the distribution uniformity of the particle materials on the surface of a coiled material is effectively improved, and the uniformity of the particle materials is improved. And threaded sleeves in the width control device are matched with opening limiting frames, and the two threaded sleeves adopt opposite thread screwing directions, so that the two opening limiting frames can move relatively, the width of the discharging opening is adjusted, and the requirements of coiled materials with different widths or different sowing densities are met.

The invention relates to dynamic adjustable optical tweezers based on a polarization-sensitive transverse bifocal superlens, and belongs to the field of optical tweezers technology and micro-nano optics. According to the super-lens, dynamic regulation and control of a focus are realized by using sensitive response of the silicon nano-column array to polarization through a composite propagation phase and a geometric phase. Under linear polarization or elliptically polarized light, the system can generate transversely symmetrical double focuses; under the circularly polarized light, a single-side focus is formed. By adjusting the polarization state of incident light, a double-particle capture mode, a single-particle capture mode and a particle transverse transport mode can be flexibly switched. According to the invention, the physical structure does not need to be changed, the dynamic control can be realized only by external optical regulation and control, the structure is compact, the integration degree is high, the control is flexible and the like, and a new technical approach is provided for an on-chip particle control system.

The present application provides a health care product high-speed particle counting intelligent control method based on DSP and linear array CCD, comprising the following steps: S1: health care product particle multi-dimensional feature self-adaptive calibration and reference feature library construction; S2: linear array CCD multi-channel synchronous acquisition and DSP pre-filtering processing; S3: frame-by-frame point feature matching based on sparse representation classification algorithm and dynamic counting initial value generation; S4: device parameter-motion feature adaptability analysis and deviation quantification based on cloud model correlation analysis algorithm; S5: double deviation fusion based on variable weight combination weighting-evidence theory fusion algorithm and adaptive particle control adjustment parameter calculation; S6: particle counting machine actuator closed-loop regulation and linear array CCD real-time verification; S7: DSP counting result calibration and adjustment parameter self-learning update. The present application realizes the collaborative optimization of particle recognition counting and device parameter adjustment, and improves the adaptive adjustment capability and intelligent control precision of the particle counting device.

The invention provides a particle control method of PVD (Physical Vapor Deposition) carbon film equipment. The particle control method comprises the following steps: S1, sputtering a carbon film on a substrate; s2, forming a silicon carbide passivation layer on the surface of the target material; s3, the carbon film particles react with oxygen and are removed; s4, the surface state of the target material is recovered to the initial state; and S5, repeating the steps S1 to S4. According to the method, after the carbon film is formed on the substrate through sputtering, the silicon carbide passivation layer is formed on the surface of the target material, so that when oxygen reacts with carbon particles in plasma, the carbon target cannot react and is consumed, the consumption of the target surface can be effectively reduced, and if the passivation layer does not exist, the surface of the target is not damaged. And the target surface is consumed when oxygen is subsequently introduced to react with the carbon particles. According to the particle control method, the carbon particles gradually accumulated in the vacuum cavity in the carbon film sputtering process in the cavity can be remarkably reduced.

The application discloses a kind of waste mine water geothermal extraction multiphase flow optimization device, it is related to geothermal resource processing technical field, including separation cavity subassembly and respectively being arranged in the first rotary joint and the second rotary joint of separation cavity subassembly left and right ends, first rotary joint and second rotary joint are used to realize the rotatable connection of separation cavity subassembly and fluid seal transmission, by in the cooperation of separation cavity subassembly, utilize main separation cavity broken cluster and vice separation cavity four-stage fractals guide combination, realize gas-liquid-solid " preliminary separation, fine separation, accurate separation, fine particle control " whole-process processing, so that separation efficiency is improved compared with traditional cyclone, and improve solid particle retention rate, and utilize main separation cavity rotation and wing type convex rib array cooperation, so that gas-liquid separation efficiency is greatly improved, so that overall heat exchanger fouling rate and gas blockage are greatly reduced, and heat transfer coefficient is improved, so that the service life of overall equipment is long.

Controlling robots for manufacturing objects using magnetic particles includes obtaining of a first set of object parameters associated with at least a first shape of a first physical object. Based on the first set of object parameters, first control data is generated for each robot of a first set of robots. Based on the first control data, the first set of robots is controlled to generate a first physical arrangement of the first set of robots in a second shape similar to the first shape. A magnetic field of each robot of the first set of robots is adjusted to generate a first layer of magnetic particles on the first physical arrangement. A supply of a first amount of heat around at least one portion of the first layer of magnetic particles is controlled to generate a second physical object similar to the first physical object.

The present application discloses a storage master control architecture and a flash memory particle control method, and relates to the field of storage technology. The storage master control architecture is used to adapt to flash memory particles of different types and page capacities, including a high-speed storage master control interface module, an adjustable cache and control module, a write data channel processing module, a read data channel processing module, a flash memory interface module, and a firmware control module. The present application introduces a plurality of different types of adjustable cache interval designs, and can adaptively configure the page capacity (Page size) required for data processing from 1K, 2K to 4K, 8K through the firmware program (Firmware), as well as a multi-channel processing architecture design. On the one hand, the present storage master control design can be widely used by multiple different types of flash memory particle products. On the other hand, the present application can greatly improve the read and write performance of the storage master control architecture through a parallel processing mechanism of multiple data channels for write operations (WP) and read operations (RP).

The invention relates to the technical field of particle control, and particularly discloses a particle control anti-interference method and device based on a perfect vortex beam, and the method comprises the following steps: vertically irradiating micro-nano particles suspended in a sample cell by using a modulated and shaped Gaussian beam, so as to form a dot matrix light field in the sample cell, part of micro-nano particles are stably captured at each bright spot of the dot matrix light field; an internal capture light field and an external anti-interference light field are formed in the sample cell; when the micro-nano particles which are not captured in the sample pool move to the vicinity of an external anti-interference light field, the micro-nano particles are driven by outward light force; according to the particle control anti-interference method based on the perfect vortex light beam, an anti-interference light field based on the perfect vortex light beam is directly added outside an experiment area for capturing the light field, particles which are not captured are driven out of the experiment area through outward light force of the light field, operation is easy, and the effect is obvious.

The invention discloses a water turbine anti-wear design method and system for controlling sand flow separation through multiphase flow simulation, and belongs to the field of hydraulic machinery design and anti-wear. The method comprises the steps that a parameterized geometric model and a water-sand physical property parameter library are established, computational domain grids are divided, boundary conditions are set, a water-sand multiphase flow control equation is established and solved, and the water-sand multiphase flow control equation is obtained. A wear model is implanted to calculate wall surface wear distribution, a sand grain track and a flow field structure are analyzed to identify a wear mechanism, wear-resistant optimization design is carried out based on a sand grain control concept, and design iteration and effect evaluation are carried out. The method can accurately predict the wear distribution of the flow passage component of the water turbine, reduces the wear of a key area by actively guiding a sand flow path, improves the wear resistance and service life of the water turbine, reduces the sand wear from the source, remarkably prolongs the operation cycle of the water turbine while guaranteeing the hydraulic efficiency of the water turbine, and improves the working efficiency of the water turbine. And the method has important engineering practical value and popularization prospect.

The present invention provides a particle control method for a PVD carbon film device, comprising the following steps: step S1, sputtering a carbon film on a substrate; step S2, forming a silicon carbide passivation layer on the surface of a target material; step S3, reacting carbon film particles with oxygen and being removed; step S4, restoring the surface state of the target material to an initial state; step S5, repeating steps S1-S4. After the present invention forms a carbon film on a substrate by sputtering, a silicon carbide passivation layer is formed on the surface of the target material, so that when oxygen reacts with carbon particles in a plasma, the carbon target itself will not react and be consumed, which can effectively reduce the consumption of the target surface. If there is no passivation layer, the subsequent introduction of oxygen to react with carbon particles will also cause the target surface to be consumed. The particle control method of the present invention can significantly reduce the carbon particles gradually accumulated in the vacuum chamber during the sputtering of the carbon film.

A high-performance valve with a composite throttling structure includes a valve body, a valve seat, and a valve core. The valve core has a flow channel in its center and a groove on its surface. The key feature is that both the outer and inner surfaces of the valve core are provided with throttling units. This invention enables a unique valve structure that achieves extremely low flow resistance at large openings and extremely high flow resistance at small openings. It achieves excellent flow control characteristics and resistance to erosion and cavitation across the entire opening range. This high-performance multi-stage throttling valve with strong particle control extends the valve's controllable range and performance to a wider extent.

The aggregate granularity control device for concrete processing comprises a screening table, an aggregate throwing device, a grading type screening barrel, an outer guide assembly and a rotary type storage mechanism, and a mounting opening is machined and formed in the lower left corner of the screening table; the aggregate throwing device is installed at the right end of the screening table and comprises a machine body shell, a material guiding-in pipe, a discharging pipe, a flow dividing column, a driving motor and throwing blades, the machine body shell is fixed to the screening table, a screening inner cavity is formed in the machine body shell, and the material guiding-in pipe is perpendicularly installed at the top of the machine body shell; the discharging pipe is installed on one side of the machine body shell and right faces the grading type screening barrel, the flow dividing column is located under the material guiding-in pipe, and the bottom of the flow dividing column is fixed to the center of the machine body shell. According to the throwing type concrete aggregate particle screening control device, an inertia throwing type screening mode is adopted for particle control, and compared with a screening mode of a traditional vibrating screen, the situation that aggregate particles block screen holes can be avoided, and therefore the screening control accuracy and effect are improved.