20165results about "Cleaning using gases" patented technology

A method for cleaning a reaction chamber is conducted after depositing an oxide, nitride, or oxynitride film on a substrate in a reaction chamber having interior surfaces on which oxide, nitride, or oxynitride is accumulated as a result of the deposition, said oxide, nitride, or oxynitride being selected from the group consisting of silicon oxide, silicon nitride, silicon oxynitride, metal oxide, metal nitride, and metal oxynitride. The method includes: oxidizing or nitriding the oxide, nitride, or oxynitride is accumulated on the interior surfaces of the reaction chamber, by RF-excited plasma of an oxygen- or nitrogen-containing gas in the absence of halide gas as a pre-cleaning step; and cleaning the interior surfaces of the reaction chamber, by RF-excited plasma of a halide cleaning gas.

A remote plasma process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber after processing a substrate disposed in the substrate processing chamber. In one embodiment, the substrate is transferred out of the substrate processing chamber and a flow of a fluorine-containing etchant gas is introduced into a remote plasma source where reactive species are formed. A continuous flow of the reactive species from the remote plasmas source to the substrate processing chamber is generated while a cycle of high and low pressure clean steps is repeated. During the high pressure clean step, reactive species are flown into the substrate processing chamber while pressure within the substrate processing chamber is maintained between 4-15 Torr. During the low pressure clean step, reactive species are flown into the substrate processing chamber while reducing the pressure of the substrate processing chamber by at least 50 percent of a high pressure reached in the high pressure clean step.

Methods and apparatuses for making three-dimensional objects from multiple solidifiable materials is shown and described. Multiple solidifiable material container assemblies are provided for holding different solidifiable materials. Relative movement between the solidifiable material container assemblies and a build platform allows the solidifiable materials to be switched as an object is built. Several exemplary cleaning stations are provided for removing residual solidifiable materials from the surface of the three-dimensional object as it is built to better ensure smooth transitions between materials on the finished object.

Methods of preparing a clean surface of germanium tin or silicon germanium tin layers for subsequent deposition are provided. An overlayer of Ge, doped Ge, another GeSn or SiGeSn layer, a doped GeSn or SiGeSn layer, an insulator, or a metal can be deposited on a prepared GeSn or SiGeSn layer by positioning a substrate with an exposed germanium tin or silicon germanium tin layer in a processing chamber, heating the processing chamber and flowing a halide gas into the processing chamber to etch the surface of the substrate using either thermal or plasma assisted etching followed by depositing an overlayer on the substantially oxide free and contaminant free surface. Methods can also include the placement and etching of a sacrificial layer, a thermal clean using rapid thermal annealing, or a process in a plasma of nitrogen trifluoride and ammonia gas.

To automatically purge a transfer chamber by means of inert gas. There is provided a substrate processing apparatus including a controller that performs control so that a transfer chamber 102 connected to a processing chamber 202 for processing a substrate is purged by gas, the controller having a switching unit that switches a function of exhausting the gas in the transfer chamber 102 in a set direction, and a function of circulating the gas through the transfer chamber 102 in an inert gas atmosphere.

A self-propelled cleaning device having a cylindrical side cover has a suction body capable of moving transversely to the forward direction. The side cover is held by a base via a suspension. When cleaning corners of a room, the suction body moves by a wall and as the suction body moves to a corner, the movement amount of the suction body is changed. When an obstacle touches the cleaning device, the side cover moves, and the article touches a side cover switch, and the direction of the article is detected.

In cleaning using a self-propelled cleaning device, firstly the cleaning device moves alongside a wall surface and then a reference direction is set. Next, the cleaning device advances alongside the wall surface at a prescribed distance, makes a right-angle turn, and travels in the reference direction. When the cleaning device reaches the surface of an opposing wall, it moves in a spiraling manner. At that time, the orientation angle of the cleaning device, which is estimated using a gyro sensor, is checked and corrected. If an obstacle is encountered while traveling, the cleaning device travels on a path that avoids the obstacle or travels in a spiral manner in a region in front of the obstacle.

A system and method of moving a meniscus from a first surface to a second surface includes forming a meniscus between a head and a first surface. The meniscus can be moved from the first surface to an adjacent second surface, the adjacent second surface being parallel to the first surface. The system and method of moving the meniscus can also be used to move the meniscus along an edge of a substrate.

A method for assaying fibrous material, such as carpet (or other fabric) condition, and treating the fibrous material such as carpet by physically separating contaminating particulate matter therefrom, thereafter releasing entrained matter, and absorbing the released formerly entrained matter.

Tread structures, wave motion navigational controls, and ramp up recovery controls are provided to an autonomous floor cleaner to reduce wheel slippage. The floor cleaner delivers liquid to the floor as part of the cleaning process. Wheels on the device are provided with relatively deep peripheral grooves to minimize the contact surfaces of a sprocket wheel and to accommodate the layer of liquid on the floor. In the event of wheel slippage, or to prevent wheel slippage, the device is designed to move forward with a slight side-to-side wave action caused by periodically altering the relative speeds of two drive wheels. There is also provided a slippage recovery mode where the drive wheels shut down or greatly slow when severe slippage is sensed, followed by a slow ramp up of speed.