5results about How to "Improve pumping capacity" patented technology

The invention discloses a TC cavity automatic cleaning system, and relates to the technical field of semiconductor manufacturing, the TC cavity automatic cleaning system comprises a cavity, a vacuum hand disc is installed in the cavity, the automatic cleaning system further comprises a second air inlet branch pipe, the two ends of the bottom of the second air inlet branch pipe penetrate through the top of the cavity and extend into the cavity, and the second air inlet branch pipe is arranged in the cavity. The two ends of the bottom of the second air inlet branch pipe fixedly communicate with the same annular air inlet pipe, and the bottom of the annular air inlet pipe fixedly communicates with a plurality of first air spraying heads. According to the invention, through a simple structure, automatic cleaning in the cavity is realized, manual cavity opening is not needed, the downtime is obviously reduced, contamination particles of a vacuum hand disc are prevented from being adhered to a wafer to cause chip scrapping, the production continuity and efficiency are improved, the production cost is reduced, the production efficiency is improved, the production cost is reduced, and the production cost is reduced. The manual intervention requirement is reduced, precise cleaning is ensured through the adjusting assembly, pollutants are rapidly removed through the exhaust assembly, and cleaning parameters can be optimized through the valve.

A kind of vacuum powder sintering furnace special evacuation unit, including diffusion pump, the diffusion pump is connected with front valve and main valve, and the connecting pipeline between diffusion pump and front valve is also provided with maintenance pump with maintenance valve;The end of the front valve away from diffusion pump is provided with three-way pipe, and the opening of three-way pipe away from diffusion pump is connected with pre-evacuation valve and front stage pump respectively;The end of the pre-evacuation valve away from three-way pipe is connected to main valve, and micro-evacuation valve is also provided between three-way pipe and main valve, the pre-evacuation valve and micro-evacuation valve cannot be opened simultaneously;Roots pump is arranged between three-way pipe and front stage pump, and rough evacuation valve is arranged between roots pump and front stage pump.Different from conventional equipment, the device is through multiple pipelines and is respectively provided with micro-evacuation valve, pre-evacuation valve and main valve, then control above-mentioned valve is opened in different time period, to be able to carry out vacuumizing operation in different stages for different purposes respectively.

The utility model discloses a distillation system, including controller and the distillation reation kettle, first condenser, vacuum buffer tank, air pump, second condenser and gas collection tank that are connected in proper order in series, be equipped with first pressure sensor on the distillation reation kettle, and the connecting pipeline between distillation reation kettle and first condenser is equipped with first electric control valve, and the connecting pipeline between vacuum buffer tank and air pump is equipped with second electric control valve, and air pump includes first vacuum pump and second vacuum pump, and first vacuum pump is roots vacuum pump, and second vacuum pump is reciprocating vacuum pump, first pressure sensor, first electric control valve, second electric control valve, first vacuum pump and second vacuum pump all are electric connection with controller. The utility model embodiment can realize automation and optimize distillation condition.

The invention provides a particle discharging device and method for a Tokamak divertor area. The device comprises an adsorbent pump unit arranged in a divertor area and a gas channel structure communicated with the divertor area, and is used for capturing and discharging neutral particles generated by interaction of plasma and divertor components. The adsorbent pump unit is made of a non-evaporation type adsorbent material, has high adsorption capacity on hydrogen and isotopes thereof, can keep stable structure and working performance under the condition of high temperature, and is suitable for a high-heat-load and high-particle-flux operating environment in a divertor area. The in-situ air exhaust of the neutral particles is realized in the divertor area, so that the transport path of the particles is shortened, and the response speed and efficiency of particle discharge are improved. Meanwhile, the particle discharging device has large air extraction capacity and effective extraction speed, is suitable for tritium-related application scenes and operating environments with neutron irradiation, and has good engineering application prospects.

The utility model provides a double-runner impeller which comprises an upper cover (1) and a lower cover (2), a first shaft (4) is arranged at the top of the upper cover (1) in an extending mode, a second shaft (5) is arranged at the bottom of the lower cover (2) in an extending mode, the double-runner impeller is characterized in that the upper cover (1) and the lower cover (2) are fixedly connected through a shell (3), and double runners (S) are formed in an inner cavity defined by the upper cover (1), the shell (3) and the lower cover (2). A flow inlet (41) communicated with the double flow channels is formed in the first shaft (4), and flow outlets (31) communicated with the double flow channels are formed in the two sides of the shell respectively. An impeller structure is omitted, the precise actuarial and analogue simulation process is omitted, the possibility of abrasion or breakage of blades after long-time use is reduced, pumping of internal fluid media is achieved only through an inner cavity double-flow-channel structure, the pumping effect is guaranteed, and the service life is prolonged.