Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

758results about "Non-surface-active detergent solvents" patented technology

Method for cleaning an apparatus for a tin compound and the cleaned apparatus obtained thereby

A method for efficiently and safely cleaning an apparatus for tin compound and a highly purified tin compound apparatus are provided. A cleaning method for an apparatus that has been in contact with a tin compound having formula (1) below includes at least steps (A) to (C), in which step (B) is performed after step (A), and step (C) is performed after step (B):(A) a step of cleaning the apparatus with a non-protic solvent,(B) a step of cleaning the apparatus with alcohol, and(C) a step of cleaning the apparatus with ultrapure water having a resistivity value of 17 MΩ·cm at 25° C.RpSnXm  (1)In formula (1), R is a hydrocarbon group, p is an integer from 1 to 3, X is a hydrolyzable substituent, and m=4−p.
Owner:MITSUBISHI CHEM CORP +2

Method for cleaning an apparatus for a tin compound and the cleaned apparatus obtained thereby

A method for efficiently and safely cleaning an apparatus for a tin compound and a highly purified apparatus for a tin compound are provided. A method of cleaning an apparatus that has been in contact with a tin compound having formula (1) includes at least steps (A) to (C) in this order:(A) a step of cleaning the apparatus with a non-protonic solvent,(B) a step of cleaning the apparatus with an acidic aqueous solution and / or alkaline aqueous solution, and(C) a step of cleaning the apparatus with ultrapure water having a resistivity of 17 MΩ·cm at 25° C.RpSnXm  (1)R is a hydrocarbon group, p is an integer of 0 to 3, X is a hydrolyzable substituent, and m=4-p.
Owner:MITSUBISHI CHEM CORP +1

Application of poly-2-acrylamide-2-methylpropanesulfonic acid in removal of residual lithium on surface of high-nickel NCM ternary material

The invention provides application of poly-2-acrylamide-2-methylpropanesulfonic acid in removal of residual lithium on the surface of a high-nickel NCM ternary material, and relates to the technical field of surface treatment of the high-nickel NCM ternary material. The method aims at solving the problem that an existing method for removing lithium carbonate on the surface of an NCM material through high-temperature calcination or high-concentration ethyl alcohol soaking and cleaning has adverse effects on the structure and performance of the high-nickel NCM ternary material. According to the invention, the cleaning agent using poly-2-acrylamide-2-methylpropanesulfonic acid as a main component is provided for cleaning the residual lithium of the high-nickel NCM ternary material, and verification proves that the high-nickel NCM ternary material can be effectively prevented from being damaged by existing high-temperature calcination and high-concentration ethanol soaking and cleaning treatment, and meanwhile, the electrochemical performance of the high-nickel NCM ternary material is remarkably improved.
Owner:TAN KAH KEE INNOVATION LAB

Treatment liquid and substrate treatment method

A treatment liquid for a semiconductor device contains water, a removing agent, and a copolymer. The copolymer has a first repeating unit having at least one group selected from a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit. A substrate treatment method using the treatment liquid is also provided.
Owner:FUJIFILM CORP

Film stripping liquid and preparation method thereof

The invention provides a film stripping liquid and a preparation method thereof. The film stripping liquid is composed of a solubilizer, a metal corrosion inhibitor, a surface leveling agent and an organic solvent. Wherein the solubilizer can be a combination containing benzene series, so that the solubility of the photoresist in an organic solvent can be improved, and the service life of the stripping liquid is prolonged. The surface leveling agent is one or more of 1, 3-propylene glycol, 2-phenyl-1, 3-propylene glycol and 2-amino-1, 3-propylene glycol, and is used for improving the uniformity of the film stripping liquid in the film stripping process and avoiding the uneven concave-convex phenomenon on the surface of the photoresist. The metal corrosion inhibitor can be selected from azole or polyphenol compounds and can inhibit corrosion of metals such as Cu and Ag in the film stripping process; and the organic solvent is a combination of xylene and dichloromethane and is mainly used for dissolving and removing the expanded and fallen photoresist. According to the film stripping liquid provided by the invention, the glue stripping speed can be increased, the glue stripping uniformity can be remarkably improved, in addition, metals can be effectively protected from being corroded, and the corrosion speed of the metals such as Cu and Ag is controlled to be limited below 1 A / min.
Owner:HUBEI SINOPHORUS ELECTRONIC MATERIALS CO LTD

Cleaning fluid and cleaning method

To provide: a cleaning fluid having improved removability of stains due to organic impurities: and a cleaning method using the cleaning fluid.SOLUTION: Provided is a cleaning fluid, comprising a solvent and a metal remover. The cleaning fluid includes two or more kinds of solvents, the distance (HSP distance) between the Hansen solubility parameter of the cleaning fluid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the total content of organic matter selected from the group consisting of organic acid polymers, organic acid esters, and ketone bodies is 0.1×10-9 pts.mass or more to 105×10-6 pts.mass or less relative to 100 pts.mass in total of the solvent and the metal remover.SELECTED DRAWING: None
Owner:TOKYO OHKA KOGYO CO LTD

Cleaning fluid and cleaning method

To provide: a cleaning fluid having improved removability of stains due to impurities: and a cleaning method using the cleaning fluid.SOLUTION: Provided is a cleaning fluid, comprising a solvent and a metal remover. The cleaning fluid includes two or more kinds of solvents, the distance (HSP distance) between the Hansen solubility parameter of the cleaning fluid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the content of metal impurities is 0.1×10-9 pts.mass or more to 102×10-6 pts.mass or less relative to 100 pts.mass in total of the solvent and the metal remover.SELECTED DRAWING: None
Owner:TOKYO OHKA KOGYO CO LTD

Processing liquid and substrate processing method

The present invention addresses the problem of providing a processing liquid for a semiconductor device, said processing liquid having excellent corrosion resistance with respect to a metal-containing layer, excellent removability of an object to be removed, and excellent solubility in a post-processing liquid. The present invention also addresses the problem of providing a method for processing a substrate using the processing liquid. This processing liquid for a semiconductor device contains water, a remover, and a copolymer, the copolymer having a first repeating unit having at least one group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit.
Owner:FUJIFILM CORP

Water-based flux cleaning agent for integration

The invention discloses a water-based flux cleaning agent for integration, and belongs to the field of semiconductor cleaning agents. The water-based flux cleaning agent is prepared from the following raw materials in percentage by weight: 30-50% of alcohol ether solvent, 1-5% of organic amine, 3-5% of gemini imidazoline corrosion inhibitor and 40-70% of deionized water, wherein the sum of the weight percentages of the raw materials is 100%. According to the water-based flux cleaning agent, the imidazoline corrosion inhibitor is adopted, so that a remarkable cleaning effect on flux residues, soldering paste and fine particles on a semiconductor electronic device is achieved, meanwhile, the brightness of welding spots can be maintained, the surface insulation performance is good, the metal surface of an IPM module can be effectively prevented from being oxidized, and the service life of the IPM module is prolonged. The cleaning agent is especially suitable for cleaning pollutants in the welding process of semiconductor chips, chip type capacitors and circuit substrates.
Owner:FUJIAN YOUDA ENVIRONMENTAL PROTECTION MATERIAL CO LTD

Stripper composition and method for stripping photoresist

The invention provides a stripping agent composition and a method for stripping a photoresist, wherein the stripping agent composition has good stripping performance and can inhibit corrosion of a lower contact surface during stripping of the photoresist. The stripping agent composition comprises an ether alcohol organic solvent (A), another organic solvent (B), an alkaline substance (C), a substrate corrosion inhibitor (D) and water (E). The other organic solvent (B) does not include an ether alcohol organic solvent. The alkaline substance (C) includes an organic base (C1), an inorganic base (C2), or a combination thereof. Based on 100 parts by weight of the total usage amount of the stripping agent composition, the usage amount of the ether alcohol organic solvent (A) is 7-70 parts by weight, and the usage amount of the base material corrosion inhibitor (D) is more than 0 part by weight and less than 18 parts by weight.
Owner:ECHEM SOLUTIONS CORP

Formula, preparation method and application of novel environment-friendly plastic brightening cleaning agent

The invention relates to the technical field of plastic surface treatment, in particular to an environment-friendly novel plastic brightening cleaning agent formula and a preparation method and application thereof. The formula consists of 25-35% of a high-polarity compound propylene carbonate, 5-15% of a moderate-polarity compound ethyl acetate and 55-65% of a low-polarity compound dimethyl carbonate according to a specific weight ratio, and during preparation, under the protection of nitrogen, the three components are stirred for 20-30 minutes at the temperature of 20-30 DEG C at the speed of 200-400 rpm, and are sealed in an HDPE (High-Density Polyethylene) barrel after being filtered by 0.5 mu m. The bright cleaning agent has low toxicity (VOCsilt; 50 g / L), rapid volatilization (the surface drying time is less than or equal to 3 minutes) and high biodegradability (gt; the sulfate crystals of the lead-acid storage battery shell can be efficiently removed (the wiping removal rate after spraying is gt; and moreover, the glossiness is obviously improved to be more than or equal to 85 GU (an incidence angle of 60 degrees). The method is simple in process, meets the international environmental protection standard (such as GB 38508-2020), is suitable for industrial production and multi-scene application, has efficient cleaning and environmental protection safety, and is suitable for industrial production and multi-scene application.
Owner:CHANGXING XINGYING GLASS FIBER TECH CO LTD

Cleaning liquid and cleaning method

The present invention employs a cleaning liquid containing a solvent and a metal remover. In the cleaning liquid, two or more solvents are included, the distance (HSP distance) between the Hansen solubility parameter of the cleaning liquid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the total content of an organic substance selected from the group consisting of organic acid multimers, organic acid esters, and ketone bodies is 0.1 × 10-9 parts by mass or more and 105 × 10-6 parts by mass or less with respect to 100 parts by mass of the total of the solvent and the metal remover. This cleaning liquid improves removal of organic impurities.
Owner:TOKYO OHKA KOGYO CO LTD

Cleaning agent composition and water dilution type cleaning agent

To provide a novel cleaning agent composition that exhibits excellent cleanability, is less corroded by articles containing metals such as aluminum, and is capable of removing a copper oxide film.SOLUTION: There is provided a cleaning agent composition including: 3-amino-4-octanol (A); at least one type of organic phosphorus compound (B) selected from the group consisting of acidic phosphate esters (B1), organic phosphonic acids (B2), and salts thereof; and optionally, water (C).SELECTED DRAWING: None
Owner:ARAKAWA CHEM IND LTD

Azeotropic or azeotrope-like compositions for solvent and single-phase or two-phase cleaning applications

The invention discloses a series of azeotropic or azeotrope-like compositions for solvent and single-phase or two-phase cleaning applications, and the formula of the azeotropic or azeotrope-like compositions mainly comprises trans-1, 2-dichloroethylene and hexafluoropropylene dimer; the composition may include at most one of 1, 1, 2, 2-tetrafluoroethyl-2, 2, 2-trifluoroethyl ether or 1, 1, 2, 3, 3, 3-hexafluoropropyl-2, 2, 2-trifluoroethyl ether, for example, 60 to 80% by mass of trans-1, 2-dichloroethylene, 20 to 40% by mass of hexafluoropropylene dimer or 60 to 65% by mass of trans-1, 2-dichloroethylene, or may also include any at most one of 1, 1, 2, 2-tetrafluoroethyl-2, 2, 2-trifluoroethyl ether or 1, 1, 2, 3, 3, 3-hexafluoropropyl-2, 2, 2-trifluoroethyl ether, for example, 60 to 80% by mass of trans-1, 2-dichloroethylene, 20 to 40% by mass of hexafluoropropylene dimer or 60 to 65% by mass of 1, 1, 2, 2- 25 to 30% by mass of a hexafluoropropylene dimer; and 10 to 15% by mass of any one of HFE347 or HFE449. According to the present invention, the component capable of generating the azeotrope-like composition with the trans-1, 2-dichloroethylene component can inhibit the flash point of the trans-1, 2-dichloroethylene component so as to improve the safety performance of transportation, storage and use. The multi-component composition described by the formula can be used for high-efficiency degreasing of metal parts or high-efficiency cleaning of precise devices in the metal processing process, can also be used as a solvent, a degreasing agent, a desoldering agent or a drying agent and the like, and can meet multiple application requirements.
Owner:SHANGHAI FLUORO IND CO LTD

Method for cleaning blockage material of polycarbonate production device

The invention belongs to the technical field of chemical engineering, and particularly relates to a cleaning method for a blocked material of a polycarbonate production device. According to the invention, a detergent is adopted to clean the blocking material in the polycarbonate production device, the detergent comprises 66-90 parts of phenol, 9.5-30 parts of diphenyl carbonate and 0.5-4 parts of a volatile basic catalyst, and the boiling point of the volatile basic catalyst is less than 130 DEG C. The detergent provided by the invention is used for cleaning blockage materials in the polycarbonate production device, does not introduce any impurities, meets the pressure-bearing requirement of the polycarbonate production device, and is good in actual cleaning effect, simple to operate and energy-saving.
Owner:ZHEJIANG PETROLEUM&CHEM CO LTD

Method for composite delamination

The invention provides a method for delaminating a composite by immersing the composite into a delamination solution; wherein the composite comprises a metal substrate and a coating applied on one side or both sides of the metal substrate, wherein the coating comprises a polymeric binder; and wherein the polymeric binder comprises an aqueous copolymer. The use of delamination solution comprising an alkali metal silicate salt allows for complete delamination of the composite in a highly efficient and extremely fast manner. Furthermore, the delamination method disclosed herein circumvents complex separation processes, contamination and corrosion of the metal substrate and enables an excellent materials recovery. An application of the method for delaminating an electrode for a battery is disclosed herein.
Owner:GRST SINGAPORE PTE LTD

Solvent-based cleaning agent for replacing dichloromethane as well as preparation method and application of solvent-based cleaning agent

The invention discloses a solvent type cleaning agent for replacing dichloromethane, which is characterized by comprising the following components in parts by weight: 70-90 parts of hydrocarbon solvent D40; 0 to 15 parts of chlorinated methoxy fatty acid methyl ester; and 0-15 parts of butanediol diacetate, wherein the number of parts of the chloro-methoxy fatty acid methyl ester or butanediol diacetate is not 0 at the same time. Compared with the existing dichloromethane cleaning agent, the cleaning agent disclosed by the invention has the advantages of low toxicity, low volatilization amount, no corrosivity, low VOC (Volatile Organic Compounds), certain anti-rust capability and no key control pollutant CFC113, carbon tetrachloride and trichloroethylene.
Owner:SHANGHAI JIUSHENG IND

Method for composite delamination

The invention provides a method for delaminating a composite by immersing the composite into a delamination solution; wherein the composite comprises a metal substrate and a coating applied on one side or both sides of the metal substrate, wherein the coating comprises a polymeric binder, and wherein the polymeric binder comprises an aqueous copolymer. The use of delamination solution comprising an alkali metal silicate salt allows for complete delamination of the composite in a highly efficient and extremely fast manner. Furthermore, the delamination method disclosed herein circumvents complex separation processes, contamination and corrosion of the metal substrate and enables an excellent materials recovery. An application of the method for delaminating an electrode for a battery is disclosed herein.
Owner:GRST SINGAPORE PTE LTD

Polymer removal composition and removal method

To provide a removal composition which is capable of satisfactorily removing a strong resist, and a polymer residue and a resist residue on a substrate for semiconductor device production, while reducing the toxicity to humans, and which is also capable of suppressing damage to a wiring metal.SOLUTION: The present invention relates to a nonaqueous composition which is used for removing a polymer residue, a resist, and / or a resist residue on a substrate for semiconductor device production by applying ultrasonic waves thereto, and which contains 80-100 mass% of diethylene glycol monoethyl ether or triethylene glycol monomethyl ether.SELECTED DRAWING: Figure 1
Owner:KANTO CHEM CO INC

Method for composite delamination

The invention provides a method for delaminating a composite by immersing the composite into a delamination solution; wherein the composite comprises a metal substrate and a coating applied on one side or both sides of the metal substrate, wherein the coating comprises a polymeric binder; and wherein the polymeric binder comprises an aqueous copolymer. The use of delamination solution comprising a weak base allows for complete delamination of the composite in a highly efficient and extremely fast manner. Furthermore, the delamination method disclosed herein circumvents complex separation processes, contamination and corrosion of the metal substrate and enables an excellent materials recovery. An application of the method for delaminating an electrode for a battery is disclosed herein.
Owner:GRST SINGAPORE PTE LTD

Vapor generator chemical cleaning agent and cleaning method based on compound EDTA (Ethylene Diamine Tetraacetic Acid)

The invention discloses a steam generator chemical cleaning agent based on composite EDTA and a cleaning method, the steam generator chemical cleaning agent comprises a main cleaning agent, a corrosion inhibitor, a reducing agent, a dissolution promoter, a defoaming agent, a pH regulator and water, by means of the cleaning agent and the cleaning method, the cleaning time of a steam generator can be shortened, the dirt dissolution rate of a heat transfer pipe is high, and the corrosion amount is extremely low.
Owner:XIAN THERMAL POWER RES INST CO LTD

Composition and application thereof, and preparation method of semiconductor device

The invention provides a composition, application thereof and a preparation method of a semiconductor device. The composition comprises the following components in percentage by mass: 5-50% of a first aprotic organic solvent; 5%-30% of a second aprotic organic solvent; 0.01%-5% of an acid; 0.15%-5% of a corrosion inhibitor; 10%-85% of water; the corrosion inhibitor comprises amino acid with the molecular weight larger than or equal to 100. The composition provided by the invention can be mixed with an oxidizing agent for use, etching residues on the surface of a patterned substrate can be effectively cleaned after mixing, a part of a hard mask on the patterned substrate can be selectively removed while a metal material in the patterned substrate is effectively protected, and the etching selection ratio of the hard mask to the metal material is improved.
Owner:ZHUHAI CORNERSTONE TECH CO LTD

Cleaning agent for car exterior

To provide a cleaning agent for a car exterior.SOLUTION: A cleaning agent contains a high-boiling point water-soluble solvent and / or a high-boiling point oil-soluble solvent, which further improves a prevention of unevenness and stains even if a surface to be cleaned becomes hot when cleaning the car parked outdoor.SELECTED DRAWING: None
Owner:PROSTAFF KK

Efficient bio-based multifunctional cleaning agent for agriculture-light complementary photovoltaic panel and preparation method of efficient bio-based multifunctional cleaning agent

The invention discloses an efficient bio-based multifunctional cleaning agent for an agricultural-photovoltaic complementary photovoltaic panel and a preparation method of the efficient bio-based multifunctional cleaning agent, and belongs to the technical field of photovoltaic panel cleaning agents. The cleaning agent is prepared from the following raw materials in percentage by mass: 30 to 50 weight percent of a component A, 30 to 50 weight percent of a component B and 20 to 40 weight percent of a component C, on the basis of the total mass of the cleaning agent, the component A is prepared by mixing 15-30 wt% of a biological enzymolysis complexing agent, 10-20 wt% of nanocellulose gel and 5-10 wt% of a zwitterionic surfactant; the component B is prepared by mixing 10 to 20 weight percent of plant source synergist, 5 to 15 weight percent of nano titanium dioxide and 5 to 15 weight percent of environment-friendly solvent system; the component C is prepared by mixing 10 to 20 weight percent of intelligent response additive and 10 to 20 weight percent of biodegradable slow-release carrier. The intelligent cleaning agent has triple functions of self-cleaning, ecological restoration and intelligent response, and is used for solving the problems of poor environmental protection property, poor low-temperature effect and the like of the existing photovoltaic panel cleaning agent.
Owner:XIAN THERMAL POWER RES INST CO LTD +1

Method for washing vehicles with aerosol detergent composition

To provide a novel aerosol composition for washing automobiles, two-wheeled vehicles, bicycles, construction equipment, farm equipment, aircraft, railroad cars, ships, and / or various other types of car / vehicle / transportation means which is nonflammable, which presents little hazard of ignition or risk during fire, which is a nonhazardous material under the Fire Prevention Law, which does not require a hazardous material storage warehouse and is not subject to legal restrictions with respect to amounts that may be stored, which is of low toxicity, which has little environmental impact in terms of depletion of the ozone layer and so forth, which has a washability as good as or better than conventional products such as has been unattained by aqueous products or high-flash-point products, which permits achievement of appropriate drying characteristics, and which, while preventing erosion of rubbers and resins, causes dirt components to be moistened and washed off and away therefrom by the detergent composition, and which permits accommodation of mechanization by virtue of its being capable of being sprayed thereonto from a roughly constant distance therefrom, said aerosol composition for washing is made to contain (Z)-1-chloro-3,3,3-trifluoropropene and gas propellant which is N2, compressed air, CO2, argon, or a mixture of two or more thereof.
Owner:KOBEGOSEI CO LTD

Packaged Composition

The perfume-containing particles are provided to delight consumers with an enhanced olfactory experience during and after the laundry process. Each such particle contains a perfume, polyethylene glycol, and water-soluble or water-dispersible filler particles, the water-soluble or water-dispersible filler particles being characterized by a particle size of 5 micrometers to 150 micrometers.
Owner:PROCTER & GAMBLE CO

Multifunctional windshield washer fluid as well as preparation method and application thereof

The invention discloses multifunctional windshield washer fluid as well as a preparation method and application thereof. The windshield washer fluid contains siloxane with terminal reactive groups. The windshield washer fluid provided by the invention has good anti-icing performance, the adhesion strength of ice on the glass surface after the windshield washer fluid is applied is reduced by more than 10 times, and the windshield washer fluid has obvious anti-icing effect. The glass water disclosed by the invention can be sprayed at the temperature of-20 DEG C, so that an anti-fouling and anti-icing coating can be quickly formed on the surface of glass to meet the requirement of keeping the surface of the glass clean at low temperature in winter, and the low-adhesion effect of a solid pollution agent on the surface of the glass can be realized under extreme conditions; the deicing device is suitable for simple and rapid deicing of the glass surface in a glass icing environment in winter in northern China. A coating formed by the windshield washer fluid is small in surface tension and excellent in lubricating property, the friction force between glass and a wiper blade can be reduced, and then the service life of a windscreen wiper is effectively prolonged.
Owner:INST OF CHEM CHINESE ACAD OF SCI

Method of reducing defects on polished wafers

This disclosure relates to a method that includes applying a polishing composition to a surface of a substrate; bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate to create a polished substrate; treating the polished substrate with a rinse solvent; flowing a vapor over a meniscus formed at an interface between air and the rinse solvent on the polished substrate. The vapor includes a first component containing a water miscible organic solvent, a second component containing a cleaning agent, and a third component containing an inert gas.
Owner:FUJIFILM ELECTRONIC MATERIALS U S A INC