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1573results about "Non-surface-active detergent solvents" patented technology

Method for removing surface deposits and passivating interior surfaces of the interior of a chemical vapor deposition reactor

The present invention relates to plasma cleaning methods for removing surface deposits from a surface, such as the interior of a depositions chamber that is used in fabricating electronic devices. The present invention also provides gas mixtures and activated gas mixtures which provide superior performance in removing deposits from a surface. The methods involve activating a gas mixture comprising a carbon or sulfur source, NF3, and optionally, an oxygen source to form an activated gas, and contacting the activated gas mixture with surface deposits to remove the surface deposits wherein the activated gas mixture acts to passivate the interior surfaces of the apparatus to reduce the rate of surface recombination of gas phase species.
Owner:MASSACHUSETTS INST OF TECH

Solvent compositions for removing petroleum residue from a substrate and methods of use thereof

Water-soluble solvent compositions, including from about 10% to about 60% by weight of an aromatic ester; from about 30% to about 60% by weight of an aliphatic ester; from 0% to about 15% by weight of a co-solvent; from 0% to about 20% of one of a cyclic terpene and a terpenoid; from 0% to about 1% by weight of an odor-masking agent; and from 0% to about 20% by weight of a nonionic surfactant, for removing petroleum residue from a substrate, and methods of use thereof. The composition can further comprise water. The composition also can comprise an aqueous solution. The method for removing petroleum residue from a substrate can further comprise recycling the solvent composition by using a countercurrent separation column charged with compressed ammonia and / or carbon dioxide and a spinning band distillation column to separate the solvent composition from the petroleum residue.
Owner:CRUDE SPILL CLEANING CO INC

Pentafluoropropene-based compositions

Provided are azeotrope-like compositions comprising pentafluoropropene (HFO-1225) and a fluid selected from the group consisting of 3,3,3-trifluoropropene (“HFO-1243zf”), 1,1-difluoroethane (“HFC-152a”), trans-1,3,3,3-tetrafluoropropene (“HFO-1234ze”), and combinations of two or more thereof. Also provided are uses thereof including as refrigerants, blowing agents, sprayable compositions, flame suppressant, and the like.
Owner:HONEYWELL INT INC

Aqueous fluoride compositions for cleaning semiconductor devices

The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageously provide both cleaning efficiency and material compatibility.
Owner:EKC TECH

Stabilized alkaline compositions for cleaning microelectronic substrates

The invention provides aqueous alkaline compositions useful in the microelectronics industry for stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants. The compositions typically contain (a) one or more metal ion-free bases at sufficient amounts to produce a pH of about 10-13 and one or more bath stabilizing agents having at least one pKa in the range of 10-13 to maintain this pH during use; (b) optionally, about 0.01% to about 5% by weight (expressed as % SiO2) of a water-soluble metal ion-free silicate; (c) optionally, about 0.01% to about 10% by weight of one or more chelating agents; (d) optionally, about 0.01% to about 80% by weight of one or more water-soluble organic co-solvents; and (e) optionally, about 0.01% to about 1% by weight of a water-soluble surfactant.
Owner:AVANTOR PERFORMANCE MATERIALS LLC

Post clean treatment

A composition for removal of chemical residues from metal or dielectric surfaces or for chemical mechanical polishing of a copper or aluminum surface is an aqueous solution with a pH between about 3.5 and about 7. The composition contains a monofunctional, difunctional or trifunctional organic acid and a buffering amount of a quaternary amine, ammonium hydroxide, hydroxylamine, hydroxylamine salt, hydrazine or hydrazine salt base. A method in accordance with the invention for removal of chemical residues from a metal or dielectric surface comprises contacting the metal or dielectric surface with the above composition for a time sufficient to remove the chemical residues. A method in accordance with the invention for chemical mechanical polishing of a copper or aluminum surface comprises applying the above composition to the copper or aluminum surface, and polishing the surface in the presence of the composition.
Owner:DUPONT AIR PRODS NANOMATERIALS

Use of absorbent materials to separate water from lipophilic fluid

The present invention relates to the use of absorbent materials for separating water from an emulsion comprising water and lipophilic fluid. The methods, systems, and compositions of the present invention expose the emulsion to absorbent materials such that water is absorbed out of the emulsion in order to facilitate the recovery of the lipophilic fluid.
Owner:THE PROCTER & GAMBLE COMPANY

Cleaning composition for removing resists and method of manufacturing semiconductor device

The cleaning composition for removing resists includes a salt of hydrofluoric acid and a base not containing a metal (A component), a water-soluble organic solvent (B1 component), at least one organic acid or inorganic acid (C component), water (D component), and, optionally, an ammonium salt (E1 component), and having a pH 4-8. Thus, in manufacturing a semiconductor device, such as a copper interconnecting process, efficiency of removing resist residue and other etching residue after etching or ashing is improved, and corrosion resistance of a copper and an insulating film is also improved.
Owner:PANASONIC CORP +2

Compositions containing fluorine substituted olefins

The use of pentafluoropropene (HFO-1225) and tetrafluoropropene (HFO-1234) in refrigeration equipment is disclosed. These materials are generally useful as refrigerants for heating and cooling, as blowing agents, as aerosol propellants, as solvent composition, and as fire extinguishing and suppressing agents.
Owner:HONEYWELL INT INC

Azeotropic compositions comprising fluorinated compounds for cleaning applications

The present invention relates to compositions comprising fluorinated olefins or fluorinated ketones, and at least one alcohol, halocarbon, hydrofluorocarbon, or fluoroether and combinations thereof. In one embodiment, these compositions are azeotropic or azeotrope-like. In another emebodiment, these compositions are useful in cleaning applications as a degreasing agent or defluxing agent for removing oils and / or other residues from a surface.
Owner:EI DU PONT DE NEMOURS & CO

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.
Owner:EKC TECH

Care polymers

The present application relates to care agents, for example care polymers, and compositions such as consumer products comprising such care agents, as well as processes for making and using such care agents and such compositions. The performance of the care polymers that Applicants teach, can be further increased by following the emulsification teaching of the present specification and / or combining such care polymers with silicone materials.
Owner:THE PROCTER & GAMBLE COMPANY

Skin cleansing composition for removing ink

A skin cleansing composition suitable for removing ink and other stains from the hands and arms of a user includes an effective amount of a low molecular weight alcohol having from one to twelve carbon atoms and an effective amount of a peroxide releasing agent, e.g., a percarbonate salt, preferably sodium percarbonate, such that together, the alcohol and percarbonate salt provide a synergistic reaction that effectively removes ink from the skin of the user. Other additives such as fillers, abrasives, and detergents may be employed to provide further cleansing action.
Owner:GOJO IND INC

Solvent compositions comprising unsaturated fluorinated hydrocarbons

Disclosed is a method for removing residue from a surface comprising: contacting the surface with a composition comprising at least one unsaturated fluorinated hydrocarbon selected from the group consisting of compounds having the formula E- or Z-R1CH═CHR2, wherein R1 and R2 are, independently, C1 to C6 perfluoroalkyl groups, or C1 to C6 hydrofluoroalkyl groups, and recovering the surface from the composition.
Owner:THE CHEMOURS CO FC LLC

Environmentally friendly ink cleaning preparation

A solvent that is biodegradable, provides effective solvency for a broad range of tasks and is generally benign to human health is disclosed. This solvent is a mixture of a lactate ester and an edible oil ester that has a closed cup flash point at or above 59° C., and can include other non-halogenated solvents and surfactants.
Owner:VERTEC BIOSOLVENTS

Stabilized trifluoroiodomethane compositions

Provided are novel compositions comprising trifluoroiodomethane and an effective amount of a stabilizer preferably comprising at least one phenol compound and optionally at least one epoxide selected from the group consisting of aromatic epoxides, alkyl epoxides, alkenyl epoxides, multisubstituted epoxides, and combinations of two or more thereof. Also provided are methods of stabilizing a composition comprising trifluoroiodomethane by providing a composition comprising trifluoroiodomethane and introducing to the provided composition an effective amount of a stabilizer comprising at least one phenol compound and optionally at least one epoxide selected from the group consisting of aromatic epoxides, alkyl epoxides, alkenyl epoxides, and combinations of two or more thereof.
Owner:HONEYWELL INT INC

Composition for removal of residue comprising cationic salts and methods using same

The present invention relates to an aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from a substrate such as, for example, a semiconductor substrate. The cleaning composition comprises from about 0.01% to about 40% by weight of a salt selected from a guanidinium salt, an acetamidinium salt, a formamidinium salt, and mixtures thereof; water; and optionally a water soluble organic solvent. Compositions according to the present invention are free of an oxidizer and abrasive particles and are capable of removing residues from a substrate and, particularly, a substrate having silicon-containing BARC and / or photoresist residue.
Owner:VERSUM MATERIALS US LLC

Compositions for the removal of organic and inorganic residues

A composition and method using same for removing photoresist and / or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid selected from a carboxylic acid or a polybasic acid and an ammonium salt of the acid in a molar ratio of acid to ammonium salt ranging from 10:1 to 1:10; an organic polar solvent that is miscible in all proportions in water; a fluoride, and water wherein the composition has a pH ranging from about 3 to about 7.
Owner:VERSUM MATERIALS US LLC
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