440results about "Non-surface-active detergent solvents" patented technology

The invention relates to the technical field of plastic surface treatment, in particular to an environment-friendly novel plastic brightening cleaning agent formula and a preparation method and application thereof. The formula consists of 25-35% of a high-polarity compound propylene carbonate, 5-15% of a moderate-polarity compound ethyl acetate and 55-65% of a low-polarity compound dimethyl carbonate according to a specific weight ratio, and during preparation, under the protection of nitrogen, the three components are stirred for 20-30 minutes at the temperature of 20-30 DEG C at the speed of 200-400 rpm, and are sealed in an HDPE (High-Density Polyethylene) barrel after being filtered by 0.5 mu m. The bright cleaning agent has low toxicity (VOCsilt; 50 g / L), rapid volatilization (the surface drying time is less than or equal to 3 minutes) and high biodegradability (gt; the sulfate crystals of the lead-acid storage battery shell can be efficiently removed (the wiping removal rate after spraying is gt; and moreover, the glossiness is obviously improved to be more than or equal to 85 GU (an incidence angle of 60 degrees). The method is simple in process, meets the international environmental protection standard (such as GB 38508-2020), is suitable for industrial production and multi-scene application, has efficient cleaning and environmental protection safety, and is suitable for industrial production and multi-scene application.

The present application provides biodegradable microcapsules, based on specific poly ß-amino ester shells that can encapsulate and retain cargoes such as, lipophilic, or hydrophobic core materials comprising fragrances, butters, essential or other oils; or oil solubilized ingredients, process of making said biodegradable microcapsules and their applications in various industries. Present application further provides biodegradable shell materials that show evidence of biodegradation or non-persistence in aquatic based and / or soil or compost based environments, and which are stable on storage before use.

The invention provides a composition, application thereof and a preparation method of a semiconductor device. The composition comprises the following components in percentage by mass: 5-50% of a first aprotic organic solvent; 5%-30% of a second aprotic organic solvent; 0.01%-5% of an acid; 0.15%-5% of a corrosion inhibitor; 10%-85% of water; the corrosion inhibitor comprises amino acid with the molecular weight larger than or equal to 100. The composition provided by the invention can be mixed with an oxidizing agent for use, etching residues on the surface of a patterned substrate can be effectively cleaned after mixing, a part of a hard mask on the patterned substrate can be selectively removed while a metal material in the patterned substrate is effectively protected, and the etching selection ratio of the hard mask to the metal material is improved.

The invention discloses an efficient bio-based multifunctional cleaning agent for an agricultural-photovoltaic complementary photovoltaic panel and a preparation method of the efficient bio-based multifunctional cleaning agent, and belongs to the technical field of photovoltaic panel cleaning agents. The cleaning agent is prepared from the following raw materials in percentage by mass: 30 to 50 weight percent of a component A, 30 to 50 weight percent of a component B and 20 to 40 weight percent of a component C, on the basis of the total mass of the cleaning agent, the component A is prepared by mixing 15-30 wt% of a biological enzymolysis complexing agent, 10-20 wt% of nanocellulose gel and 5-10 wt% of a zwitterionic surfactant; the component B is prepared by mixing 10 to 20 weight percent of plant source synergist, 5 to 15 weight percent of nano titanium dioxide and 5 to 15 weight percent of environment-friendly solvent system; the component C is prepared by mixing 10 to 20 weight percent of intelligent response additive and 10 to 20 weight percent of biodegradable slow-release carrier. The intelligent cleaning agent has triple functions of self-cleaning, ecological restoration and intelligent response, and is used for solving the problems of poor environmental protection property, poor low-temperature effect and the like of the existing photovoltaic panel cleaning agent.

The perfume-containing particles are provided to delight consumers with an enhanced olfactory experience during and after the laundry process. Each such particle contains a perfume, polyethylene glycol, and water-soluble or water-dispersible filler particles, the water-soluble or water-dispersible filler particles being characterized by a particle size of 5 micrometers to 150 micrometers.

This invention relates to compositions and methods for cleaning and peeling. This disclosure provides a composition for cleaning or peeling materials from a substrate. The composition includes a primary solvent and a co-solvent. The co-solvent includes one or more caprolactam-derived solvents.

The invention discloses multifunctional windshield washer fluid as well as a preparation method and application thereof. The windshield washer fluid contains siloxane with terminal reactive groups. The windshield washer fluid provided by the invention has good anti-icing performance, the adhesion strength of ice on the glass surface after the windshield washer fluid is applied is reduced by more than 10 times, and the windshield washer fluid has obvious anti-icing effect. The glass water disclosed by the invention can be sprayed at the temperature of-20 DEG C, so that an anti-fouling and anti-icing coating can be quickly formed on the surface of glass to meet the requirement of keeping the surface of the glass clean at low temperature in winter, and the low-adhesion effect of a solid pollution agent on the surface of the glass can be realized under extreme conditions; the deicing device is suitable for simple and rapid deicing of the glass surface in a glass icing environment in winter in northern China. A coating formed by the windshield washer fluid is small in surface tension and excellent in lubricating property, the friction force between glass and a wiper blade can be reduced, and then the service life of a windscreen wiper is effectively prolonged.

This disclosure relates to a method that includes applying a polishing composition to a surface of a substrate; bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate to create a polished substrate; treating the polished substrate with a rinse solvent; flowing a vapor over a meniscus formed at an interface between air and the rinse solvent on the polished substrate. The vapor includes a first component containing a water miscible organic solvent, a second component containing a cleaning agent, and a third component containing an inert gas.

Proposed is a lacquer for treating a 3D printing-created printed matter that is configured to contain a perfluorinated acrylic resin having a relatively high surface hardness and excellent water resistance and contamination resistance, as well as an excellent force of adhesion to a printing resin making up a 3D printed matter. While the 3D printed matter that is printed through a photocuring-type 3D printer is cleaned and rinsed, an uncured resin remaining on the 3D printed matter is removed, and at the same time, a protective film layer is formed on a surface of the 3D printed matter by being coated thereon. As a result, the surface of the 3D printed matter is protected from damage during a post curing process. Furthermore, the 3D printed matter, which is to be manufactured, is also effectively safeguarded against quality degradation that is caused by contamination through the surface thereof and subsequent discoloration.

To provide a composition for removing edge beads of a metal-containing resist, in detail, a composition for removing edge beads of a metal-containing resist that minimizes a resist residue.SOLUTION: A composition for removing edge beads of a metal-containing resist includes: an additive including at least one selected from a group consisting of phosphoric acid, a phosphorous acid-based compound, and a hypophosphorous acid-based compound and a carboxylic acid-based compound; and an organic solvent. A mixing mass ratio of the at least one selected from the group consisting of the phosphoric acid, the phosphorous acid-based compound, and the hypophosphorous acid-based compound to the carboxylic acid-based compound is 9:1 to 1.2:1.SELECTED DRAWING: Figure 1

SOLVENT COMPOSITIONS The present invention relates to a solvent composition for solvent-based paints or other coatings characterized in that it comprises a combination of dimethyl glutarate and at least one other compound selected from isobutyl acetate, ethyl lactate, dimethyl 2-methylglutarate, 2-methyltetrahydrofuran, ethyl acetate, cyclopentyl methyl ether, dithoxymethane, dimethyl carbonate, dimethyl succinate, benzyl alcohol, dimethyl adipate, and glyceryl triacetate. Fig. 1

To provide a manufacturing method for a semiconductor substrate using a cleaning agent composition with excellent adhesive removal properties.SOLUTION: The manufacturing method for a semiconductor substrate includes the steps of (1) bonding a wafer to a fixed member with an adhesive, (2) polishing the back surface of a bonded surface of the wafer to the fixed member, (3) processing the polished surface of the wafer, (4) separating the processed wafer from the fixed member, and (5) removing residual adhesive on the separated wafer with a cleaning agent. The step (3) includes a heat treatment of the wafer fixed to the fixed member with adhesive at a temperature of 230°C or higher. The cleaning agent composition used in step (5) is a cleaning agent which contains an alkanolamine (component A) and a glycol ether (component B) represented by the following formula (I) and has a content of component A of not less than 35 mass% and not more than 85 mass%. R-O-(EO)n-H (I)SELECTED DRAWING: None

Provided is a maintenance fluid excellent in terms of humectant property and cleaning property. The maintenance fluid is for use in ink-jet recording devices, and comprises organic solvents that comprise a lactone-based solvent and an organic solvent A, wherein the organic solvent A has a boiling point of 240-310°C. The maintenance fluid has a volatile content X, as determined by the following test, of 900 g / L or less. Testing method: In accordance with the provisions of GB / T13173-2008, Chapter 15, the volatile content X is determined using equation (A) . VolatilecontentX=Wv×p×0.01 (In equation (A), Wv is the mass fraction (unit, mass%) of the organic solvents contained in the maintenance fluid and p indicates the specific gravity (unit, g / L) of the maintenance fluid. A two-gram portion of the maintenance fluid is precisely weighed out and put on a dish having a diameter of 5 cm and a height of 1 cm. This dish is put in an oven heated to 105°C to dry the maintenance fluid for four hours. Thereafter, the dish is allowed to cool for 30 minutes in a desiccator and then precisely weighted, and the amount Wv (mass%) of volatilized components of the organic solvents is calculated.)

The present invention addresses the problem of providing a semiconductor processing liquid in which dissolution of cobalt is suppressed, and occurrence of defects after processing a silicon substrate and then further performing water rinse processing is suppressed. A semiconductor processing liquid according to the present invention comprises water, an organic solvent, an anticorrosive, a chelating agent, and a basic compound, and does not comprise either hydroxylamine or a salt thereof, wherein the basic compound is a basic inorganic compound or a basic organic compound having a molecular weight of 150 or less and having at least one group selected from the group consisting of -NH2, -NHRN, -NRN 2, and -N+RN 3 X-, and the content of the organic solvent is 0.1-9.5 mass% with respect to the total mass of the semiconductor processing liquid.

The present invention relates to: [1] a cleaning composition for an inkjet head, the cleaning composition containing a solvent (A) and water, the dipole moment of the solvent (A) at 25 DEG C as determined by a density pan-function method being 5.0 D or more, and the water content in the cleaning composition being 30 mass% or more; [2] The use of a composition as an inkjet head cleaning agent, said composition containing: a solvent (A) having a dipole moment of 5.0 D or more at 25 DEG C as determined by a density pan-function method, and a water content of 30 mass% or more; [3] A method for cleaning an inkjet head using a composition containing a solvent (A) and water, the dipole moment of the solvent (A) at 25 DEG C as determined by a density pan-function method being 5.0 D or more, and the content of the water being 30 mass% or more.

The application discloses a cleaning method for PFA bottles, which comprises the following steps: multiple static washing of the PFA bottles with clean water; first dynamic washing of the PFA bottles with a first cleaning solution, wherein the first cleaning solution comprises propylene glycol methyl ether acetate and cyclopentanone; second dynamic washing of the PFA bottles with a second cleaning solution, wherein the second cleaning solution comprises propylene glycol methyl ether acetate and N-methyl pyrrolidone; third dynamic washing of the PFA bottles with a third cleaning solution, wherein the third cleaning solution comprises nitric acid and hydrogen peroxide; and fourth dynamic washing of the PFA bottles with a fourth cleaning solution, wherein the fourth cleaning solution comprises nitric acid and hydrochloric acid. The application has the beneficial effect of providing a cleaning method for PFA bottles, which effectively removes residues in the bottles by using multiple composite cleaning solutions.

To provide a peeling solution that can effectively remove resin. [Solution] This stripping solution contains water, an organic solvent having a δP value of 5.0 to 11.9, a δH value of 4.3 to 15.8, and a δD value of 15.9 to 18.6, and an alkaline compound having a pH of 12 or higher in the aqueous phase.

Azeotropic or azeotrope-like compositions, particularly azeotropic or azeotrope-like compositions consisting essentially of or consisting of (Z)-1-chloro-2,3,3-trifluoroprop-1-ene (HCFO-1233yd(Z)), ethanol, and each of methanol, as well as azeotropic or azeotrope-like compositions consisting essentially of or consisting of (Z)-1-chloro-2,3,3-trifluoroprop-1-ene (HCFO-1233yd(Z)), ethanol, and 1,2-trans-dichloroethylene (trans-DCE), and azeotropic or azeotrope-like compositions consisting essentially of or consisting of (Z)-1-chloro-2,3,3-trifluoroprop-1-ene (HCFO-1233yd(Z)), methanol, and 1,2-trans-dichloroethylene (trans-DCE), and solvent uses of the aforementioned compositions.

The invention provides a low-VOC (volatile organic compound) precise instrument cleaning agent. The low-VOC precise instrument cleaning agent is prepared from trans-dichloroethylene, isopropanol, a fluorocarbon solvent, a dicarbonyl compound and organic amine, the content of the trans-dichloroethylene is not less than 50% by mass, the content of the isopropanol is not less than 1% by mass, the content of the fluorocarbon solvent is not less than 30% by mass, the content of the dicarbonyl compound is not less than 2% by mass, and the content of the organic amine is not less than 1% by mass; wherein the fluorocarbon solvent is one or more of methyl (ethyl) nonafluorobutyl ether, methyl (ethyl) nonafluoroisobutyl ether, 3-methoxy-2-trifluoromethyl octafluorobutane, perfluorotriethylamine, perfluorotripropylamine, perfluorotributylamine, a perfluoropropylene oligomer (dimer or trimer) and perfluorohexanone. The precise cleaning agent prepared through the scheme has good cleaning capacity for scaling powder and metal salt, scaling powder residues on the inner surface and the outer surface of a complex circuit are effectively removed, and an important guarantee is provided for stable production of electronic products.

This invention employs a washing solution containing solvents and metal removal agents. The washing solution contains two or more solvents, the distance between the Hansen solubility parameter of the washing solution and the Hansen solubility parameter of dimethylacetamide (HSP distance) is less than 1.0, and the content of metal impurities is 0.1 × 10⁻¹¹ parts by mass relative to the total of 100 parts by mass of the aforementioned solvents and metal removal agents. ‑9 10 or more by weight 2 ×10 ‑6 The amount is less than a certain percentage by weight. The washing solution described herein can improve the removal of impurities and dirt.

In one aspect, a method for manufacturing a semiconductor substrate is provided that can suppress the generation of shredded temporary fixing agent residue. In one aspect, the present disclosure relates to a method for manufacturing a semiconductor substrate, including the following steps 1 and 2: Step 1: Preparing a semiconductor substrate with a film-like temporary fixing agent adhered to it Step 2: A step of peeling off the film-like temporary fixing agent from the semiconductor substrate obtained in Step 1 using a cleaning agent containing glycol ether, hydrocarbon, and amine.

The present invention relates to (i) an azeotropic or azeotrope-like composition comprising (a) cis-1,2-dichloroethylene and cis-1H,2H-octafluorocyclopentane or comprising (b) trans-1,2-dichloroethylene and trans-1H,2H-octafluorocyclopentane, (ii) a spin fluid for flash spinning comprising these azeotropic or azeotrope-like compositions and a polyolefin, and (iii) a process for the preparation of plexifilamentary fibrils of polyolefin using the spin fluid.

The present application provides a treatment liquid which is excellent in removal of organic residues and excellent in stability. A treatment method of a treated object related to the above treatment liquid is also provided. The treatment liquid contains water, hydroxylamine, and hydrazine species selected from one or more of hydrazine, hydrazine salts, and hydrazine derivatives, and the total content of the hydrazine species is 1 parts by mass or less relative to 100 parts by mass of the hydroxylamine.

The present application provides biodegradable microcapsules, based on specific poly ß-amino ester shells that can encapsulate and retain cargoes such as, lipophilic, or hydrophobic core materials comprising fragrances, butters, essential or other oils; or oil solubilized ingredients, process of making said biodegradable microcapsules and their applications in various industries. Present application further provides biodegradable shell materials that show evidence of biodegradation or non-persistence in aquatic based and / or soil or compost based environments, and which are stable on storage before use.

In one aspect, provided are a flux cleaning agent and a cleaning method, wherein when cleaning electronic components mounted using high-melting-point solder containing lead, it is possible to prevent lead from leaching into the cleaning agent.　In one aspect, disclosed is a flux cleaning agent composition containing component A, component B, and component C. Component A: organic solvent; Component B: aliphatic tertiary amine represented by formula (III); and Component C: phosphoric acid ester.

The present invention is a cleaning solution for a composition for forming a metal-containing film, the cleaning solution containing: (A) a solvent; and (B) an organic acid, where the solvent (A) contains at least one kind of a first solvent (A-1) having a normal boiling point of lower than 160°C and at least one kind of a second solvent (A-2) having a normal boiling point of 160°C or higher and lower than 500°C. This can provide: a cleaning solution excellent in cleaning property, such as the removal of the metal-containing film on the periphery of a substrate, hump suppression property, and waste liquid stability when a composition for forming a metal-containing film is applied to the substrate; a method for cleaning a semiconductor substrate, using the cleaning solution; and a method for forming a metal-containing film, using the cleaning method.

A composition comprising: (i) 1,1-difluoroethene (vinylidene fluoride, R-1132a); (ii) carbon dioxide (CO2, R-744); (iii) pentafluoroethane (R-125); and (iv) one or more of trifluoromethane (R-23) and hexafluoroethane (R-116).

The invention relates to a metal anti-corrosion cleaning agent, a preparation method and application, and the metal anti-corrosion cleaning agent comprises the following components in parts by weight: 0.001-0.06 part of a composite functional agent; 0.1 to 3 parts of a pH regulator; 0.01 to 1 part of inorganic acid; 50-80 parts of an organic solvent; and 20-50 parts of ultrapure water. The thienyl carboxylic ester derivative and the alkanol derivative are combined, the thienyl carboxylic ester derivative removes metal ions (such as Cu < + > and Fe < + >) in a targeted mode by means of the strong chelating capacity of ester groups, and organic pollutants are stripped through the pi-pi effect; the alkanol derivative wraps non-polar residual gum by using a long-chain hydrophobic end, and a hydrophilic end enhances the wettability of a solution, so that full-coverage cleaning of a nano-scale structure is realized.