578results about "Non-surface-active detergent solvents" patented technology

A method for efficiently and safely cleaning an apparatus for tin compound and a highly purified tin compound apparatus are provided. A cleaning method for an apparatus that has been in contact with a tin compound having formula (1) below includes at least steps (A) to (C), in which step (B) is performed after step (A), and step (C) is performed after step (B):(A) a step of cleaning the apparatus with a non-protic solvent,(B) a step of cleaning the apparatus with alcohol, and(C) a step of cleaning the apparatus with ultrapure water having a resistivity value of 17 MΩ·cm at 25° C.RpSnXm  (1)In formula (1), R is a hydrocarbon group, p is an integer from 1 to 3, X is a hydrolyzable substituent, and m=4−p.

A method for efficiently and safely cleaning an apparatus for a tin compound and a highly purified apparatus for a tin compound are provided. A method of cleaning an apparatus that has been in contact with a tin compound having formula (1) includes at least steps (A) to (C) in this order:(A) a step of cleaning the apparatus with a non-protonic solvent,(B) a step of cleaning the apparatus with an acidic aqueous solution and / or alkaline aqueous solution, and(C) a step of cleaning the apparatus with ultrapure water having a resistivity of 17 MΩ·cm at 25° C.RpSnXm  (1)R is a hydrocarbon group, p is an integer of 0 to 3, X is a hydrolyzable substituent, and m=4-p.

A treatment liquid for a semiconductor device contains water, a removing agent, and a copolymer. The copolymer has a first repeating unit having at least one group selected from a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit. A substrate treatment method using the treatment liquid is also provided.

The invention provides a film stripping liquid and a preparation method thereof. The film stripping liquid is composed of a solubilizer, a metal corrosion inhibitor, a surface leveling agent and an organic solvent. Wherein the solubilizer can be a combination containing benzene series, so that the solubility of the photoresist in an organic solvent can be improved, and the service life of the stripping liquid is prolonged. The surface leveling agent is one or more of 1, 3-propylene glycol, 2-phenyl-1, 3-propylene glycol and 2-amino-1, 3-propylene glycol, and is used for improving the uniformity of the film stripping liquid in the film stripping process and avoiding the uneven concave-convex phenomenon on the surface of the photoresist. The metal corrosion inhibitor can be selected from azole or polyphenol compounds and can inhibit corrosion of metals such as Cu and Ag in the film stripping process; and the organic solvent is a combination of xylene and dichloromethane and is mainly used for dissolving and removing the expanded and fallen photoresist. According to the film stripping liquid provided by the invention, the glue stripping speed can be increased, the glue stripping uniformity can be remarkably improved, in addition, metals can be effectively protected from being corroded, and the corrosion speed of the metals such as Cu and Ag is controlled to be limited below 1 A / min.

To provide: a cleaning fluid having improved removability of stains due to organic impurities: and a cleaning method using the cleaning fluid.SOLUTION: Provided is a cleaning fluid, comprising a solvent and a metal remover. The cleaning fluid includes two or more kinds of solvents, the distance (HSP distance) between the Hansen solubility parameter of the cleaning fluid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the total content of organic matter selected from the group consisting of organic acid polymers, organic acid esters, and ketone bodies is 0.1×10-9 pts.mass or more to 105×10-6 pts.mass or less relative to 100 pts.mass in total of the solvent and the metal remover.SELECTED DRAWING: None

To provide: a cleaning fluid having improved removability of stains due to impurities: and a cleaning method using the cleaning fluid.SOLUTION: Provided is a cleaning fluid, comprising a solvent and a metal remover. The cleaning fluid includes two or more kinds of solvents, the distance (HSP distance) between the Hansen solubility parameter of the cleaning fluid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the content of metal impurities is 0.1×10-9 pts.mass or more to 102×10-6 pts.mass or less relative to 100 pts.mass in total of the solvent and the metal remover.SELECTED DRAWING: None

The present invention addresses the problem of providing a processing liquid for a semiconductor device, said processing liquid having excellent corrosion resistance with respect to a metal-containing layer, excellent removability of an object to be removed, and excellent solubility in a post-processing liquid. The present invention also addresses the problem of providing a method for processing a substrate using the processing liquid. This processing liquid for a semiconductor device contains water, a remover, and a copolymer, the copolymer having a first repeating unit having at least one group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit.

The invention relates to the technical field of plastic surface treatment, in particular to an environment-friendly novel plastic brightening cleaning agent formula and a preparation method and application thereof. The formula consists of 25-35% of a high-polarity compound propylene carbonate, 5-15% of a moderate-polarity compound ethyl acetate and 55-65% of a low-polarity compound dimethyl carbonate according to a specific weight ratio, and during preparation, under the protection of nitrogen, the three components are stirred for 20-30 minutes at the temperature of 20-30 DEG C at the speed of 200-400 rpm, and are sealed in an HDPE (High-Density Polyethylene) barrel after being filtered by 0.5 mu m. The bright cleaning agent has low toxicity (VOCsilt; 50 g / L), rapid volatilization (the surface drying time is less than or equal to 3 minutes) and high biodegradability (gt; the sulfate crystals of the lead-acid storage battery shell can be efficiently removed (the wiping removal rate after spraying is gt; and moreover, the glossiness is obviously improved to be more than or equal to 85 GU (an incidence angle of 60 degrees). The method is simple in process, meets the international environmental protection standard (such as GB 38508-2020), is suitable for industrial production and multi-scene application, has efficient cleaning and environmental protection safety, and is suitable for industrial production and multi-scene application.

The present invention employs a cleaning liquid containing a solvent and a metal remover. In the cleaning liquid, two or more solvents are included, the distance (HSP distance) between the Hansen solubility parameter of the cleaning liquid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the total content of an organic substance selected from the group consisting of organic acid multimers, organic acid esters, and ketone bodies is 0.1 × 10-9 parts by mass or more and 105 × 10-6 parts by mass or less with respect to 100 parts by mass of the total of the solvent and the metal remover. This cleaning liquid improves removal of organic impurities.

The invention discloses a series of azeotropic or azeotrope-like compositions for solvent and single-phase or two-phase cleaning applications, and the formula of the azeotropic or azeotrope-like compositions mainly comprises trans-1, 2-dichloroethylene and hexafluoropropylene dimer; the composition may include at most one of 1, 1, 2, 2-tetrafluoroethyl-2, 2, 2-trifluoroethyl ether or 1, 1, 2, 3, 3, 3-hexafluoropropyl-2, 2, 2-trifluoroethyl ether, for example, 60 to 80% by mass of trans-1, 2-dichloroethylene, 20 to 40% by mass of hexafluoropropylene dimer or 60 to 65% by mass of trans-1, 2-dichloroethylene, or may also include any at most one of 1, 1, 2, 2-tetrafluoroethyl-2, 2, 2-trifluoroethyl ether or 1, 1, 2, 3, 3, 3-hexafluoropropyl-2, 2, 2-trifluoroethyl ether, for example, 60 to 80% by mass of trans-1, 2-dichloroethylene, 20 to 40% by mass of hexafluoropropylene dimer or 60 to 65% by mass of 1, 1, 2, 2- 25 to 30% by mass of a hexafluoropropylene dimer; and 10 to 15% by mass of any one of HFE347 or HFE449. According to the present invention, the component capable of generating the azeotrope-like composition with the trans-1, 2-dichloroethylene component can inhibit the flash point of the trans-1, 2-dichloroethylene component so as to improve the safety performance of transportation, storage and use. The multi-component composition described by the formula can be used for high-efficiency degreasing of metal parts or high-efficiency cleaning of precise devices in the metal processing process, can also be used as a solvent, a degreasing agent, a desoldering agent or a drying agent and the like, and can meet multiple application requirements.

The invention provides a method for delaminating a composite by immersing the composite into a delamination solution; wherein the composite comprises a metal substrate and a coating applied on one side or both sides of the metal substrate, wherein the coating comprises a polymeric binder; and wherein the polymeric binder comprises an aqueous copolymer. The use of delamination solution comprising an alkali metal silicate salt allows for complete delamination of the composite in a highly efficient and extremely fast manner. Furthermore, the delamination method disclosed herein circumvents complex separation processes, contamination and corrosion of the metal substrate and enables an excellent materials recovery. An application of the method for delaminating an electrode for a battery is disclosed herein.

The present application provides biodegradable microcapsules, based on specific poly ß-amino ester shells that can encapsulate and retain cargoes such as, lipophilic, or hydrophobic core materials comprising fragrances, butters, essential or other oils; or oil solubilized ingredients, process of making said biodegradable microcapsules and their applications in various industries. Present application further provides biodegradable shell materials that show evidence of biodegradation or non-persistence in aquatic based and / or soil or compost based environments, and which are stable on storage before use.

The invention provides a method for delaminating a composite by immersing the composite into a delamination solution; wherein the composite comprises a metal substrate and a coating applied on one side or both sides of the metal substrate, wherein the coating comprises a polymeric binder, and wherein the polymeric binder comprises an aqueous copolymer. The use of delamination solution comprising an alkali metal silicate salt allows for complete delamination of the composite in a highly efficient and extremely fast manner. Furthermore, the delamination method disclosed herein circumvents complex separation processes, contamination and corrosion of the metal substrate and enables an excellent materials recovery. An application of the method for delaminating an electrode for a battery is disclosed herein.

The invention discloses a steam generator chemical cleaning agent based on composite EDTA and a cleaning method, the steam generator chemical cleaning agent comprises a main cleaning agent, a corrosion inhibitor, a reducing agent, a dissolution promoter, a defoaming agent, a pH regulator and water, by means of the cleaning agent and the cleaning method, the cleaning time of a steam generator can be shortened, the dirt dissolution rate of a heat transfer pipe is high, and the corrosion amount is extremely low.

The invention provides a composition, application thereof and a preparation method of a semiconductor device. The composition comprises the following components in percentage by mass: 5-50% of a first aprotic organic solvent; 5%-30% of a second aprotic organic solvent; 0.01%-5% of an acid; 0.15%-5% of a corrosion inhibitor; 10%-85% of water; the corrosion inhibitor comprises amino acid with the molecular weight larger than or equal to 100. The composition provided by the invention can be mixed with an oxidizing agent for use, etching residues on the surface of a patterned substrate can be effectively cleaned after mixing, a part of a hard mask on the patterned substrate can be selectively removed while a metal material in the patterned substrate is effectively protected, and the etching selection ratio of the hard mask to the metal material is improved.

The invention discloses an efficient bio-based multifunctional cleaning agent for an agricultural-photovoltaic complementary photovoltaic panel and a preparation method of the efficient bio-based multifunctional cleaning agent, and belongs to the technical field of photovoltaic panel cleaning agents. The cleaning agent is prepared from the following raw materials in percentage by mass: 30 to 50 weight percent of a component A, 30 to 50 weight percent of a component B and 20 to 40 weight percent of a component C, on the basis of the total mass of the cleaning agent, the component A is prepared by mixing 15-30 wt% of a biological enzymolysis complexing agent, 10-20 wt% of nanocellulose gel and 5-10 wt% of a zwitterionic surfactant; the component B is prepared by mixing 10 to 20 weight percent of plant source synergist, 5 to 15 weight percent of nano titanium dioxide and 5 to 15 weight percent of environment-friendly solvent system; the component C is prepared by mixing 10 to 20 weight percent of intelligent response additive and 10 to 20 weight percent of biodegradable slow-release carrier. The intelligent cleaning agent has triple functions of self-cleaning, ecological restoration and intelligent response, and is used for solving the problems of poor environmental protection property, poor low-temperature effect and the like of the existing photovoltaic panel cleaning agent.

The perfume-containing particles are provided to delight consumers with an enhanced olfactory experience during and after the laundry process. Each such particle contains a perfume, polyethylene glycol, and water-soluble or water-dispersible filler particles, the water-soluble or water-dispersible filler particles being characterized by a particle size of 5 micrometers to 150 micrometers.

This invention relates to compositions and methods for cleaning and peeling. This disclosure provides a composition for cleaning or peeling materials from a substrate. The composition includes a primary solvent and a co-solvent. The co-solvent includes one or more caprolactam-derived solvents.

The invention discloses multifunctional windshield washer fluid as well as a preparation method and application thereof. The windshield washer fluid contains siloxane with terminal reactive groups. The windshield washer fluid provided by the invention has good anti-icing performance, the adhesion strength of ice on the glass surface after the windshield washer fluid is applied is reduced by more than 10 times, and the windshield washer fluid has obvious anti-icing effect. The glass water disclosed by the invention can be sprayed at the temperature of-20 DEG C, so that an anti-fouling and anti-icing coating can be quickly formed on the surface of glass to meet the requirement of keeping the surface of the glass clean at low temperature in winter, and the low-adhesion effect of a solid pollution agent on the surface of the glass can be realized under extreme conditions; the deicing device is suitable for simple and rapid deicing of the glass surface in a glass icing environment in winter in northern China. A coating formed by the windshield washer fluid is small in surface tension and excellent in lubricating property, the friction force between glass and a wiper blade can be reduced, and then the service life of a windscreen wiper is effectively prolonged.

This disclosure relates to a method that includes applying a polishing composition to a surface of a substrate; bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate to create a polished substrate; treating the polished substrate with a rinse solvent; flowing a vapor over a meniscus formed at an interface between air and the rinse solvent on the polished substrate. The vapor includes a first component containing a water miscible organic solvent, a second component containing a cleaning agent, and a third component containing an inert gas.

Proposed is a lacquer for treating a 3D printing-created printed matter that is configured to contain a perfluorinated acrylic resin having a relatively high surface hardness and excellent water resistance and contamination resistance, as well as an excellent force of adhesion to a printing resin making up a 3D printed matter. While the 3D printed matter that is printed through a photocuring-type 3D printer is cleaned and rinsed, an uncured resin remaining on the 3D printed matter is removed, and at the same time, a protective film layer is formed on a surface of the 3D printed matter by being coated thereon. As a result, the surface of the 3D printed matter is protected from damage during a post curing process. Furthermore, the 3D printed matter, which is to be manufactured, is also effectively safeguarded against quality degradation that is caused by contamination through the surface thereof and subsequent discoloration.

To provide a composition for removing edge beads of a metal-containing resist, in detail, a composition for removing edge beads of a metal-containing resist that minimizes a resist residue.SOLUTION: A composition for removing edge beads of a metal-containing resist includes: an additive including at least one selected from a group consisting of phosphoric acid, a phosphorous acid-based compound, and a hypophosphorous acid-based compound and a carboxylic acid-based compound; and an organic solvent. A mixing mass ratio of the at least one selected from the group consisting of the phosphoric acid, the phosphorous acid-based compound, and the hypophosphorous acid-based compound to the carboxylic acid-based compound is 9:1 to 1.2:1.SELECTED DRAWING: Figure 1

The invention provides a semiconductor cleaning solution, a preparation method and a cleaning method of a semiconductor structure, and belongs to the technical field of semiconductor manufacturing. The cleaning liquid at least comprises a solvent; an active component; the general formula of the additive is # imgabs0 #; wherein R1, R2 and R3 are respectively one of methyl, ethyl or propyl; and the low temperature resistance of the cleaning solution is-10 DEG C to-22 DEG C. According to the semiconductor cleaning solution, the preparation method and the cleaning method of the semiconductor structure provided by the invention, the cleaning effect can be enhanced, cleaning can be carried out under a low-temperature condition, the material loss of a substrate or a film layer is reduced, the influence of the material loss on a semiconductor manufacturing process is avoided, and the yield of the semiconductor manufacturing process is improved.

SOLVENT COMPOSITIONS The present invention relates to a solvent composition for solvent-based paints or other coatings characterized in that it comprises a combination of dimethyl glutarate and at least one other compound selected from isobutyl acetate, ethyl lactate, dimethyl 2-methylglutarate, 2-methyltetrahydrofuran, ethyl acetate, cyclopentyl methyl ether, dithoxymethane, dimethyl carbonate, dimethyl succinate, benzyl alcohol, dimethyl adipate, and glyceryl triacetate. Fig. 1

To provide a manufacturing method for a semiconductor substrate using a cleaning agent composition with excellent adhesive removal properties.SOLUTION: The manufacturing method for a semiconductor substrate includes the steps of (1) bonding a wafer to a fixed member with an adhesive, (2) polishing the back surface of a bonded surface of the wafer to the fixed member, (3) processing the polished surface of the wafer, (4) separating the processed wafer from the fixed member, and (5) removing residual adhesive on the separated wafer with a cleaning agent. The step (3) includes a heat treatment of the wafer fixed to the fixed member with adhesive at a temperature of 230°C or higher. The cleaning agent composition used in step (5) is a cleaning agent which contains an alkanolamine (component A) and a glycol ether (component B) represented by the following formula (I) and has a content of component A of not less than 35 mass% and not more than 85 mass%. R-O-(EO)n-H (I)SELECTED DRAWING: None

Cleaning compositions and the method of using the same are disclosed, where the compositions include one or more alkanolamines, one or more ether alcohol solvents or aromatic containing alcohol, one or more corrosion inhibitors, and optionally one or more secondary solvents.

Provided is a maintenance fluid excellent in terms of humectant property and cleaning property. The maintenance fluid is for use in ink-jet recording devices, and comprises organic solvents that comprise a lactone-based solvent and an organic solvent A, wherein the organic solvent A has a boiling point of 240-310°C. The maintenance fluid has a volatile content X, as determined by the following test, of 900 g / L or less. Testing method: In accordance with the provisions of GB / T13173-2008, Chapter 15, the volatile content X is determined using equation (A) . VolatilecontentX=Wv×p×0.01 (In equation (A), Wv is the mass fraction (unit, mass%) of the organic solvents contained in the maintenance fluid and p indicates the specific gravity (unit, g / L) of the maintenance fluid. A two-gram portion of the maintenance fluid is precisely weighed out and put on a dish having a diameter of 5 cm and a height of 1 cm. This dish is put in an oven heated to 105°C to dry the maintenance fluid for four hours. Thereafter, the dish is allowed to cool for 30 minutes in a desiccator and then precisely weighted, and the amount Wv (mass%) of volatilized components of the organic solvents is calculated.)

The present invention addresses the problem of providing a semiconductor processing liquid in which dissolution of cobalt is suppressed, and occurrence of defects after processing a silicon substrate and then further performing water rinse processing is suppressed. A semiconductor processing liquid according to the present invention comprises water, an organic solvent, an anticorrosive, a chelating agent, and a basic compound, and does not comprise either hydroxylamine or a salt thereof, wherein the basic compound is a basic inorganic compound or a basic organic compound having a molecular weight of 150 or less and having at least one group selected from the group consisting of -NH2, -NHRN, -NRN 2, and -N+RN 3 X-, and the content of the organic solvent is 0.1-9.5 mass% with respect to the total mass of the semiconductor processing liquid.

The present invention relates to: [1] a cleaning composition for an inkjet head, the cleaning composition containing a solvent (A) and water, the dipole moment of the solvent (A) at 25 DEG C as determined by a density pan-function method being 5.0 D or more, and the water content in the cleaning composition being 30 mass% or more; [2] The use of a composition as an inkjet head cleaning agent, said composition containing: a solvent (A) having a dipole moment of 5.0 D or more at 25 DEG C as determined by a density pan-function method, and a water content of 30 mass% or more; [3] A method for cleaning an inkjet head using a composition containing a solvent (A) and water, the dipole moment of the solvent (A) at 25 DEG C as determined by a density pan-function method being 5.0 D or more, and the content of the water being 30 mass% or more.

The application discloses a cleaning method for PFA bottles, which comprises the following steps: multiple static washing of the PFA bottles with clean water; first dynamic washing of the PFA bottles with a first cleaning solution, wherein the first cleaning solution comprises propylene glycol methyl ether acetate and cyclopentanone; second dynamic washing of the PFA bottles with a second cleaning solution, wherein the second cleaning solution comprises propylene glycol methyl ether acetate and N-methyl pyrrolidone; third dynamic washing of the PFA bottles with a third cleaning solution, wherein the third cleaning solution comprises nitric acid and hydrogen peroxide; and fourth dynamic washing of the PFA bottles with a fourth cleaning solution, wherein the fourth cleaning solution comprises nitric acid and hydrochloric acid. The application has the beneficial effect of providing a cleaning method for PFA bottles, which effectively removes residues in the bottles by using multiple composite cleaning solutions.