1794results about "Chemical paints/ink removers" patented technology

A composition for removal of chemical residues from metal or dielectric surfaces or for chemical mechanical polishing of a copper or aluminum surface is an aqueous solution with a pH between about 3.5 and about 7. The composition contains a monofunctional, difunctional or trifunctional organic acid and a buffering amount of a quaternary amine, ammonium hydroxide, hydroxylamine, hydroxylamine salt, hydrazine or hydrazine salt base. A method in accordance with the invention for removal of chemical residues from a metal or dielectric surface comprises contacting the metal or dielectric surface with the above composition for a time sufficient to remove the chemical residues. A method in accordance with the invention for chemical mechanical polishing of a copper or aluminum surface comprises applying the above composition to the copper or aluminum surface, and polishing the surface in the presence of the composition.

An environmentally-friendly cleaning composition for industrial and consumer applications comprising (a) a blend of dibasic esters, (b) one or more surfactants (c) and, optionally, (d) water or a solvent. The dibasic esters are be derived from a blend of adipic, glutaric, and succinic diacids, and, in one particular embodiment, the blend comprises dialkyl adipate, dialkyl methylglutarate and dialkyl ethylsuccinate, wherein the alkyl groups individually comprise a C1-C12 hydrocarbon group. The one or more surfactants are typically chosen from alcohol alkoxylate, an alkyl phenol ethoxylate, a terpene, a terpene alkoxylate or any derivates thereof. Optionally, additional components or additives including delaminates such as pinene and d-limonene, fragrances, whiteners, stabilizers, thickeners and the like can be added to the composition. The industrial or consumer application selected from the group consisting of a graffiti cleaner, a painted-substrate cleaner, an ink cleaner, a metal substrate cleaner, a plastic substrate cleaner, an environmentally friendly cleaner, a stain-spot cleaner, an industrial hand cleaner, a resin cleaner, a tar resin cleaner, a textile cleaner, a paint stripper and any combination thereof.

A method of enhancing removal of photoresist and / or resist residue from a substrate includes exposing the substrate to an environmentally friendly, non-hazardous co-solvent mixture comprising a carbonate, an oxidizer and an accelerator. The stripping process may be performed under ambient conditions, or in the presence of a supercritical fluid such as supercritical carbon dioxide with the supercritical cleaning step itself being a desirable "green" process. In one embodiment, the co-solvent mixture includes propylene carbonate, benzyl alcohol, hydrogen peroxide and an accelerator such as formic acid. If desired, supercritical carbon dioxide in combination with a second co-solvent mixture may be subsequently applied to the substrate to rinse and dry the substrate. In one embodiment, the second co-solvent mixture includes a lower alkyl alcohol such as isopropyl alcohol.

The present invention relates to compositions and their use for removing coatings from a substrate. The present invention is directed to a composition comprising (a) surfactants, (b) a sequestrant, and (c) a plasticizer / solvent. The composition may also contain (d) a hydrolyzing agent, e.g., a strong base compound and other additives. The composition of the present invention is free of chlorinated solvents, environmentally safe and user-friendly. In one embodiment, the composition further comprises a hydrolyzing agent present in an amount sufficient to reduce at least one of mechanical strength and adhesion between the coating and the substrate. Another embodiment of the invention is a method for removing paint or a coating from a substrate comprising applying a paint or coating removing effective amount of a composition comprising the compositions described herein to the substrate. Yet another embodiment of the invention is a method for cleaning a substrate comprising applying a cleaning effective amount of the composition of the present invention to the substrate. In one particular embodiment of the present invention, an immersion method for the removal of cured and uncured paint and coatings from ferrous metals is provided.

An ink cleaner consists of fatty acid monoalkyl ester, water, a water soluble nonionic surfactant, an anion active agent and a cosurfactant. The ink cleaner provided by the invention has the advantages of simple preparation, stable latex, strong cleansing power and the like and is especially applicable to cleaning printing ink.

A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

A solvent that is biodegradable, provides effective solvency for a broad range of tasks and is generally benign to human health is disclosed. This solvent is a mixture of a lactate ester and an edible oil ester that has a closed cup flash point at or above 59° C., and can include other non-halogenated solvents and surfactants.

The present invention relates to, inter alia, a composition for stripping photoresist from substrates comprising: about 5% to about 50% by weight of an alkyl substituted pyrrolidone, an alkyl substituted piperidone, or a mixture thereof, about 0.2% to about 20% of one or more alkanolamines, and about 50% to about 94% of a sulfoxide, sulfoxone, or mixture thereof. Advantageously, the composition can remove copper from a copper substrate at a rate of less than about 10 Å per minute when the substrate is immersed in the composition which is held at 70° C. for 30 minutes and rotated relative to the composition at about 200 revolutions per minute.

An oil-in-water emulsion composition remover is disclosed. The compositions comprise a solvent, water and a surfactant. The removers are useful in removing non-aqueous and aqueous coatings, waxes, greases, and the like, from substrates to which the coatings, waxes, greases, and the like, have been applied.

A reworkable conductive adhesive composition, and method of making such, comprising an epoxy based conductive adhesive containing conductive metal filler particles dispersed in a solvent-free hybrid epoxy polymer matrix. In an additional embodiment an improved method of removing cured conductive polymer adhesives, disclosed here as thermal interface materials, from electronic components for reclamation or recovery of usable parts of module assemblies, particularly high cost semiconductor devices, heat sinks and other module components.

The invention is directed to compositions and methods for forming conductive patterned coatings of carbon nanotubes. Patterns are electrically conductive coatings / films made by exploiting self patterning nanostructures composed of electrically conductive materials. The resulting layer is suitable for conducting electricity in applications where a transparent electrode is required. Typical applications include, but are not limited to; LC displays, touch screens, EMI shielding windows, and architectural windows. Films may be highly transparent. In one embodiment, carbon nanotubes are applied to an insulating substrate to form an electrically conductive network of nanotubes with controlled porosity in the network. The open area between the networks of nanotubes, increases the optical transparency in the visible spectrum while the continuous nanotube phase provides electrical conductivity across the entire surface or patterned area. Through the controlled application of this self assembled network of nanotubes by means of printing or spraying, patterned areas can be formed to function as electrodes in devices. The use of printing technology to form these electrodes obviates the need for more expensive process such as vacuum deposition and photolithography typically employed today during the formation of ITO coatings.

A method of making a printing plate in which the uncoated surface of a substrate is treated with a pre-treatment solution prior to the deposition of ink on the surface. The pre-treatment liquid comprises a polyvalent metal salt, and at least one of an organic swelling reagent and / or a coalescence reagent. The pre-treatment liquid is applied to form a thin, homogenous layer of approximately 4 μm to the entire upper surface of the recording plate. The swelling reagent and / or the coalescence reagent and the polyvalent metal cations are physically well localized in the porous structure of the plate's surface. After partial drying of the pretreated anodized aluminum plate, CTP liquid is deposited onto the surface to form an image. The CTP liquid solids react with the pre-treatment liquid and are, therefore, chemically bound to the surface. This allows all data to be deposited in a single pass of the inkjet head without the problem of clustering.

Compositions of the invention include: a surfactant having an HLB value from 1 to 10; and a compound of formula (I): where; x is an integer from 2 to 6, y is an integer from 0 to 5, R is a bond or (C1-C4)alkylene, R1 is a hydrogen, halo, aryl, (C1-C4)alkyl, heteroaryl, cycloalkyl, or heterocycyl, R2 is independently selected from hydrogen, halo, (C1-C4)alkyl, (C1-C4)alkoxy, (C2-C4) alkenylene. Methods forming stable aqueous and non-aqueous solutions of the same are also provided.

A stripping composition comprising at least one of alcohols having an ether-bond in the molecule thereof as component (a), and an anticorrosive as component (b). Furfuryl alcohol or tetrahydrofurfuryl alcohol is preferable as component (a).

This invention concerns a composition useful as a paint remover, comprising: an organic carbonate, an alcohol, an activator, hydrogen peroxide, and water. The alcohol may be benzyl alcohol. The organic carbonate may be propylene carbonate, ethylene carbonate, or combination thereof. The activator may be an alkyl-substituted cycloalkane (naphthene), a soy oil, an alkyl soyate, or combination thereof.

A method for removing a resist from a substrate comprising contacting a substrate having a resist coating present thereon with a composition comprising hydroxylamine and at least one alkanolamine which is miscible with hydroxylamine is described. Optionally, the composition may comprise one or more polar solvents. The method is especially suitable for removing a photoresist from a substrate during the manufacture of semiconductor integrated circuits and for removing cured polymer coatings, such as polyimide coatings.

An etching residue remover for cleaning etching residue from a substrate, derived from a mixture of at least hydroxylamine, an alkanolamine which is miscible with said hydroxylamine, water, and, optionally, a chelating agent, wherein the hydroxylamine and the alkanolamine are present in amounts sufficient to clean etching residue from the substrate.

The present invention relates to corrosion inhibitor systems, in particular to cleaning and corrosion inhibiting compositions for surfaces of aluminum or colored metals and alloys thereof under alkaline conditions, especially in the food and pharmaceutical industries. The cleaning and corrosion inhibiting compositions comprise as a corrosion inhibitor at least one alkyleneoxy alkylphosphate di- or triester having the general formula (I) where Z is either —O—M or —O—(AO)n2— Alkyl wherein M is an ammonium, alkali metal or alkaline earth metal cation, Alkyl is a C5-C22 alkyl or alkylaryl group, AO is a C2-4-alkylene oxide unit and n1, n2 and n3 each are integers from 2 to 10.

A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable for removing a variety of resists from substrates at different stages in the process of manufacturing integrated circuits.

This invention concerns a composition useful as a paint remover, comprising: alkylene carbonate such as propylene carbonate or ethylene carbonate, hydrogen peroxide, and water, and optionally an alcohol such as benzyl alcohol. In another broad respect, this invention concerns a process for removing paint, comprising: applying a composition containing alkylene carbonate, hydrogen peroxide, and water to a painted surface for a time and under conditions effective to cause blistering or bubbling of the paint. In another broad respect, this invention is a composition useful as a paint remover, comprising: dialkyl carbonate, hydrogen peroxide, and water, optionally containing an alcohol, optionally containing a glycol ether. In another broad respect, this invention is a process for removing paint, comprising: applying a composition containing dialkyl carbonate, hydrogen peroxide, and water to a painted surface for a time and under conditions effective to cause blistering or bubbling of the paint.

The invention is a combination of at least one dense phase fluid and at least one dense phase fluid modifier which can be used to contact substrates for electronic parts such as semiconductor wafers or chips to remove photoresist materials which are applied to the substrates during manufacture of the electronic parts. The dense phase fluid modifier is one selected from the group of cyclic, aliphatic or alicyclic compounds having the functional group:wherein Y is a carbon, oxygen, nitrogen, phosphorus or sulfur atom or a hydrocarbon group having from 1 to 10 carbon atoms, a halogen or halogenated hydrocarbon group having from 1 to 10 carbon atoms, silicon or a fluorinated silicon group; and wherein R1 and R2 can be the same or different substituents; and wherein, as in the case where X is nitrogen, R1 or R2 may not be present. The invention compositions generally are applied to the substrates in a pulsed fashion in order to remove the hard baked photoresist material remaining on the surface of the substrate after removal of soft baked photoresist material and etching of the barrier layer.

A reworkable conductive adhesive composition, comprising an epoxy based conductive adhesive containing conductive metal filler particles dispersed in a solvent-free hybrid epoxy polymer matrix.

Paint detackifiers and / or sedimentation agents are provided which contain amorphous alumina and / or alumina in pseudoboehmite or boehmite form having an average crystallite size of from 0.1 to 15 nm and / or the hydrates and hydroxyalkylpolysaccharides thereof.

A composition useful as a paint remover which may include a carbonate, a dibasic ester and a mono-ester. The paint stripping composition may also contain an organic sulfur-containing compound such as dimethyl sulfoxide (DMSO), a glycol ether, a ketone, or combination thereof. The composition may be used in a process for removing paint by applying it to a painted surface. A degreasing composition is also disclosed which may comprise a carbonate and a alkyl-substituted cyclo-alkane such as naphthene. The compositions have several important attributes, including low toxicity and high efficacy in removing paint and coatings.

A composition and related process for removing paint from a substrate in which the composition contains an aprotic polar solvent, an ether-containing compound, an evaporation retarder and a solvent for the evaporation retarder.