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987results about "Organic non-surface-active detergent compositions" patented technology

Treatment liquid and substrate treatment method

A treatment liquid for a semiconductor device contains water, a removing agent, and a copolymer. The copolymer has a first repeating unit having at least one group selected from a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit. A substrate treatment method using the treatment liquid is also provided.
Owner:FUJIFILM CORP

Film stripping liquid and preparation method thereof

The invention provides a film stripping liquid and a preparation method thereof. The film stripping liquid is composed of a solubilizer, a metal corrosion inhibitor, a surface leveling agent and an organic solvent. Wherein the solubilizer can be a combination containing benzene series, so that the solubility of the photoresist in an organic solvent can be improved, and the service life of the stripping liquid is prolonged. The surface leveling agent is one or more of 1, 3-propylene glycol, 2-phenyl-1, 3-propylene glycol and 2-amino-1, 3-propylene glycol, and is used for improving the uniformity of the film stripping liquid in the film stripping process and avoiding the uneven concave-convex phenomenon on the surface of the photoresist. The metal corrosion inhibitor can be selected from azole or polyphenol compounds and can inhibit corrosion of metals such as Cu and Ag in the film stripping process; and the organic solvent is a combination of xylene and dichloromethane and is mainly used for dissolving and removing the expanded and fallen photoresist. According to the film stripping liquid provided by the invention, the glue stripping speed can be increased, the glue stripping uniformity can be remarkably improved, in addition, metals can be effectively protected from being corroded, and the corrosion speed of the metals such as Cu and Ag is controlled to be limited below 1 A / min.
Owner:HUBEI SINOPHORUS ELECTRONIC MATERIALS CO LTD

Cleaning fluid and cleaning method

To provide: a cleaning fluid having improved removability of stains due to organic impurities: and a cleaning method using the cleaning fluid.SOLUTION: Provided is a cleaning fluid, comprising a solvent and a metal remover. The cleaning fluid includes two or more kinds of solvents, the distance (HSP distance) between the Hansen solubility parameter of the cleaning fluid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the total content of organic matter selected from the group consisting of organic acid polymers, organic acid esters, and ketone bodies is 0.1×10-9 pts.mass or more to 105×10-6 pts.mass or less relative to 100 pts.mass in total of the solvent and the metal remover.SELECTED DRAWING: None
Owner:TOKYO OHKA KOGYO CO LTD

Cleaning lubricant for textile machinery

The invention discloses a cleaning lubricant for textile machinery. The cleaning lubricant comprises the following components in percentage by weight: 6-14% of petroleum ether, 16-26% of solvent oil, 6-14% of alkane oil, 16-26% of 120 # solvent oil, 31-39% of butane gas and 1-9% of dimethyl silicone oil. The invention belongs to the technical field of textile, and particularly relates to a cleaning lubricant for textile machinery, which can clean greasy dirt and dirt on each movable part of a textile mill, a blowing workshop, a drawing workshop, a roving workshop and a spinning workshop. The cleaning lubricant has the technical effects of rust removal, lubrication, rust prevention, wear resistance and non-sticking to all movable parts during cleaning, and the lubricating period of the cleaning lubricant is long.
Owner:DINGZHOU HUALONG TEXTILE MASCH COMPONENTS CO LTD

Cleaning fluid and cleaning method

To provide: a cleaning fluid having improved removability of stains due to impurities: and a cleaning method using the cleaning fluid.SOLUTION: Provided is a cleaning fluid, comprising a solvent and a metal remover. The cleaning fluid includes two or more kinds of solvents, the distance (HSP distance) between the Hansen solubility parameter of the cleaning fluid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the content of metal impurities is 0.1×10-9 pts.mass or more to 102×10-6 pts.mass or less relative to 100 pts.mass in total of the solvent and the metal remover.SELECTED DRAWING: None
Owner:TOKYO OHKA KOGYO CO LTD

Processing liquid and substrate processing method

The present invention addresses the problem of providing a processing liquid for a semiconductor device, said processing liquid having excellent corrosion resistance with respect to a metal-containing layer, excellent removability of an object to be removed, and excellent solubility in a post-processing liquid. The present invention also addresses the problem of providing a method for processing a substrate using the processing liquid. This processing liquid for a semiconductor device contains water, a remover, and a copolymer, the copolymer having a first repeating unit having at least one group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit.
Owner:FUJIFILM CORP

Water-based flux cleaning agent for integration

The invention discloses a water-based flux cleaning agent for integration, and belongs to the field of semiconductor cleaning agents. The water-based flux cleaning agent is prepared from the following raw materials in percentage by weight: 30-50% of alcohol ether solvent, 1-5% of organic amine, 3-5% of gemini imidazoline corrosion inhibitor and 40-70% of deionized water, wherein the sum of the weight percentages of the raw materials is 100%. According to the water-based flux cleaning agent, the imidazoline corrosion inhibitor is adopted, so that a remarkable cleaning effect on flux residues, soldering paste and fine particles on a semiconductor electronic device is achieved, meanwhile, the brightness of welding spots can be maintained, the surface insulation performance is good, the metal surface of an IPM module can be effectively prevented from being oxidized, and the service life of the IPM module is prolonged. The cleaning agent is especially suitable for cleaning pollutants in the welding process of semiconductor chips, chip type capacitors and circuit substrates.
Owner:FUJIAN YOUDA ENVIRONMENTAL PROTECTION MATERIAL CO LTD

Flexible disassembling adhesive for new energy automobile battery and preparation method of flexible disassembling adhesive

The invention provides a new energy automobile battery flexible disassembling adhesive and a preparation method thereof, and belongs to the technical field of new energy automobile batteries, the flexible disassembling adhesive comprises the following components by weight: 45-50 parts of deionized water; 8 to 10 parts of gamma-butyrolactone; 5 to 8 parts of propylene glycol methyl ether acetate; 2 to 3 parts of microencapsulated lipase; 2 to 3 parts of nano cellulose immobilized protease; 6 to 8 parts of urea peroxide; 0.5 to 1 part of nano manganese dioxide; 0.7 to 1.1 parts of a sodium citrate / sodium lactate buffer solution; 1.5 to 2.5 parts of polyvinylpyrrolidone K30; 0.8 to 1.2 parts of hydroxypropyl methyl cellulose; 0.05 to 0.1 part of a graphene oxide nanosheet; 0.5 to 0.8 part of a benzotriazole derivative; 0.1 to 0.3 part of sodium molybdate; 6 to 8 parts of sorbitol; and 5-7 parts of ascorbic acid. The flexible disassembly adhesive solves the problems of low efficiency, serious environmental pollution, high safety risk and low material recovery rate in traditional battery disassembly.
Owner:ZHONGSHAN JINGCHENG ENVIRONMENTAL PROTECTION TECHNOLOGY CO LTD

Oxa-hydrofluoroether compound as well as synthesis method and application thereof

The invention belongs to the technical field of fluorine-containing fine chemical synthesis, and particularly relates to an oxa-hydrofluoroether compound and a synthesis method and application thereof. The invention relates to an oxa-hydrofluoroether compound, the structure of the oxa-hydrofluoroether compound is shown as a formula (1): # imgabs0 #, in which Rf is F or CF3; r is methyl or ethyl; n is an integer from 1 to 3; according to the oxa hydrofluoroether compound disclosed by the invention, oxygen atoms are embedded into a fluorocarbon chain structure, so that fluorine-containing chain segments of hydrofluoroether are more diversified, and the structure is not limited by a perfluorocarbon chain structure any more; according to the oxa-hydrofluoroether compound, oxygen atoms play a role in reducing surface tension, and the more the oxygen atoms are, the lower the surface tension is; compared with other hydrofluoroether solvents, the hydrofluoroether solvent has higher permeability and better cleaning effect; according to the oxa-hydrofluoroether compound, on one hand, oxygen atoms are embedded into a fluorocarbon chain structure, and on the other hand, the fluorocarbon chain contains branched chains, so that the oxa-hydrofluoroether compound is easy to degrade, and the environmental friendliness is improved.
Owner:ZHEJIANG NOAH FLUOROCHEMICAL CO LTD +1

Formula, preparation method and application of novel environment-friendly plastic brightening cleaning agent

The invention relates to the technical field of plastic surface treatment, in particular to an environment-friendly novel plastic brightening cleaning agent formula and a preparation method and application thereof. The formula consists of 25-35% of a high-polarity compound propylene carbonate, 5-15% of a moderate-polarity compound ethyl acetate and 55-65% of a low-polarity compound dimethyl carbonate according to a specific weight ratio, and during preparation, under the protection of nitrogen, the three components are stirred for 20-30 minutes at the temperature of 20-30 DEG C at the speed of 200-400 rpm, and are sealed in an HDPE (High-Density Polyethylene) barrel after being filtered by 0.5 mu m. The bright cleaning agent has low toxicity (VOCsilt; 50 g / L), rapid volatilization (the surface drying time is less than or equal to 3 minutes) and high biodegradability (gt; the sulfate crystals of the lead-acid storage battery shell can be efficiently removed (the wiping removal rate after spraying is gt; and moreover, the glossiness is obviously improved to be more than or equal to 85 GU (an incidence angle of 60 degrees). The method is simple in process, meets the international environmental protection standard (such as GB 38508-2020), is suitable for industrial production and multi-scene application, has efficient cleaning and environmental protection safety, and is suitable for industrial production and multi-scene application.
Owner:CHANGXING XINGYING GLASS FIBER TECH CO LTD

Cleaning liquid and cleaning method

PCT designated stage expiredWO2025094856A1Organic detergent compounding agentsAnionic surface-active compoundsOrganic acidKetone bodies
The present invention employs a cleaning liquid containing a solvent and a metal remover. In the cleaning liquid, two or more solvents are included, the distance (HSP distance) between the Hansen solubility parameter of the cleaning liquid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the total content of an organic substance selected from the group consisting of organic acid multimers, organic acid esters, and ketone bodies is 0.1 × 10-9 parts by mass or more and 105 × 10-6 parts by mass or less with respect to 100 parts by mass of the total of the solvent and the metal remover. This cleaning liquid improves removal of organic impurities.
Owner:TOKYO OHKA KOGYO CO LTD

Cleaning agent composition and water dilution type cleaning agent

To provide a novel cleaning agent composition that exhibits excellent cleanability, is less corroded by articles containing metals such as aluminum, and is capable of removing a copper oxide film.SOLUTION: There is provided a cleaning agent composition including: 3-amino-4-octanol (A); at least one type of organic phosphorus compound (B) selected from the group consisting of acidic phosphate esters (B1), organic phosphonic acids (B2), and salts thereof; and optionally, water (C).SELECTED DRAWING: None
Owner:ARAKAWA CHEM IND LTD

Azeotropic or azeotrope-like compositions for solvent and single-phase or two-phase cleaning applications

The invention discloses a series of azeotropic or azeotrope-like compositions for solvent and single-phase or two-phase cleaning applications, and the formula of the azeotropic or azeotrope-like compositions mainly comprises trans-1, 2-dichloroethylene and hexafluoropropylene dimer; the composition may include at most one of 1, 1, 2, 2-tetrafluoroethyl-2, 2, 2-trifluoroethyl ether or 1, 1, 2, 3, 3, 3-hexafluoropropyl-2, 2, 2-trifluoroethyl ether, for example, 60 to 80% by mass of trans-1, 2-dichloroethylene, 20 to 40% by mass of hexafluoropropylene dimer or 60 to 65% by mass of trans-1, 2-dichloroethylene, or may also include any at most one of 1, 1, 2, 2-tetrafluoroethyl-2, 2, 2-trifluoroethyl ether or 1, 1, 2, 3, 3, 3-hexafluoropropyl-2, 2, 2-trifluoroethyl ether, for example, 60 to 80% by mass of trans-1, 2-dichloroethylene, 20 to 40% by mass of hexafluoropropylene dimer or 60 to 65% by mass of 1, 1, 2, 2- 25 to 30% by mass of a hexafluoropropylene dimer; and 10 to 15% by mass of any one of HFE347 or HFE449. According to the present invention, the component capable of generating the azeotrope-like composition with the trans-1, 2-dichloroethylene component can inhibit the flash point of the trans-1, 2-dichloroethylene component so as to improve the safety performance of transportation, storage and use. The multi-component composition described by the formula can be used for high-efficiency degreasing of metal parts or high-efficiency cleaning of precise devices in the metal processing process, can also be used as a solvent, a degreasing agent, a desoldering agent or a drying agent and the like, and can meet multiple application requirements.
Owner:SHANGHAI FLUORO IND CO LTD

Cleaning composition, application thereof and electronic device

The invention provides a cleaning composition and application thereof and an electronic device, the cleaning composition comprises a charge modifier, a corrosion inhibitor, a pH regulator and a solvent, the charge modifier comprises a sulfonic acid compound, the corrosion inhibitor comprises an amino compound, and the amino compound contains amino and / or secondary amino, hydroxyl and carboxyl; the pH value of the cleaning composition is 1-4. The special charge modifier and the corrosion inhibitor are selected for matching, and the cleaning composition is controlled within a proper pH value range, so that the metal surface corrosion of the leveling workpiece can be effectively inhibited, and the residual nano abrasive on the surface of the leveling workpiece can be effectively removed; further, the cleaning composition with excellent cleaning effect and corrosion protection effect is obtained. When the composite material is applied to preparation of electronic devices, the comprehensive performance of the electronic devices can be improved.
Owner:ZHUHAI CORNERSTONE TECH CO LTD

Detergent tablets

The invention relates to a detergent tablet comprising from 5 to 20 percent by weight citric acid or a salt thereof and from 3 to 25 percent by weight sodium benzoate and a surfactant. The invention also relates to a method of forming a wash liquor by combining a detergent tablet with water in a container. The invention also relates to the use of a detergent tablet to create a washing liquor for cleaning surfaces.
Owner:UNILEVER IP HLDG BV +2

Process for treating a fabric and related compositions

Laundry additive compositions that include a metal sequestration agent and that may be characterized by an acidic pH. Related methods of treating a fabric, for example with a wash liquor and a rinse liquor, with such compositions and / or agents. Uses of such laundry additive compositions.
Owner:PROCTER & GAMBLE CO

Vapor generator chemical cleaning agent and cleaning method based on compound EDTA (Ethylene Diamine Tetraacetic Acid)

The invention discloses a steam generator chemical cleaning agent based on composite EDTA and a cleaning method, the steam generator chemical cleaning agent comprises a main cleaning agent, a corrosion inhibitor, a reducing agent, a dissolution promoter, a defoaming agent, a pH regulator and water, by means of the cleaning agent and the cleaning method, the cleaning time of a steam generator can be shortened, the dirt dissolution rate of a heat transfer pipe is high, and the corrosion amount is extremely low.
Owner:XIAN THERMAL POWER RES INST CO LTD

Composition and application thereof, and preparation method of semiconductor device

The invention provides a composition, application thereof and a preparation method of a semiconductor device. The composition comprises the following components in percentage by mass: 5-50% of a first aprotic organic solvent; 5%-30% of a second aprotic organic solvent; 0.01%-5% of an acid; 0.15%-5% of a corrosion inhibitor; 10%-85% of water; the corrosion inhibitor comprises amino acid with the molecular weight larger than or equal to 100. The composition provided by the invention can be mixed with an oxidizing agent for use, etching residues on the surface of a patterned substrate can be effectively cleaned after mixing, a part of a hard mask on the patterned substrate can be selectively removed while a metal material in the patterned substrate is effectively protected, and the etching selection ratio of the hard mask to the metal material is improved.
Owner:ZHUHAI CORNERSTONE TECH CO LTD

Laundry care additive particles

A composition including a plurality of particles, a process for treating laundry using such particles, and a process of making such particles, wherein the particles include: about 25% to about 99% by weight water-soluble carrier; and a plurality of capsules dispersed in the water-soluble carrier, wherein the capsules comprise a core and a shell surrounding the core and the core includes perfume raw materials; wherein the shell includes a polymeric material that is the reaction product of chitosan derived from an aqueous phase and a cross-linking agent.
Owner:PROCTER & GAMBLE CO

Efficient bio-based multifunctional cleaning agent for agriculture-light complementary photovoltaic panel and preparation method of efficient bio-based multifunctional cleaning agent

The invention discloses an efficient bio-based multifunctional cleaning agent for an agricultural-photovoltaic complementary photovoltaic panel and a preparation method of the efficient bio-based multifunctional cleaning agent, and belongs to the technical field of photovoltaic panel cleaning agents. The cleaning agent is prepared from the following raw materials in percentage by mass: 30 to 50 weight percent of a component A, 30 to 50 weight percent of a component B and 20 to 40 weight percent of a component C, on the basis of the total mass of the cleaning agent, the component A is prepared by mixing 15-30 wt% of a biological enzymolysis complexing agent, 10-20 wt% of nanocellulose gel and 5-10 wt% of a zwitterionic surfactant; the component B is prepared by mixing 10 to 20 weight percent of plant source synergist, 5 to 15 weight percent of nano titanium dioxide and 5 to 15 weight percent of environment-friendly solvent system; the component C is prepared by mixing 10 to 20 weight percent of intelligent response additive and 10 to 20 weight percent of biodegradable slow-release carrier. The intelligent cleaning agent has triple functions of self-cleaning, ecological restoration and intelligent response, and is used for solving the problems of poor environmental protection property, poor low-temperature effect and the like of the existing photovoltaic panel cleaning agent.
Owner:XIAN THERMAL POWER RES INST CO LTD +1

Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound

An object of the invention is to provide a method of cleaning semiconductor substrates that is excellent in abrasive particle removing performance with respect to semiconductor substrates having undergone CMP, as well as a cleaning liquid for semiconductor substrates having undergone CMP. The invention provides a method of cleaning semiconductor substrates, the method comprising a cleaning step of cleaning, by use of a cleaning liquid, a semiconductor substrate having undergone CMP using a polishing liquid containing abrasive particles. The semiconductor substrate contains metal, and the cleaning liquid has a pH of more than 7 at 25° C. The cleaning liquid comprises: a chelating agent; a specific component A; and an anticorrosive. The method satisfies Condition 1 that a product of a contact angle ratio obtained by a specific test method 1 and a specific degree of agglomeration obtained by a specific test method 2 is not more than 15.
Owner:FUJIFILM CORP

Composition for selectively removing oxide compounds and etching residues of Co and / or Cu

Described are compositions for selectively removing oxide compounds and etching residues of one or both of Co and Cu in the presence of one or more of Co, Cu, W, Ru, and Mo, methods for using the compositions for selectively removing oxide compounds and etching residues of one or both of Co and Cu in the presence of one or more of Co, Cu, W, Ru, and Mo in a process for manufacturing a semiconductor device, and a method for manufacturing a semiconductor device comprising selectively removing oxide compounds and etching residues of one or both of Co and Cu in the presence of one or more of Co, Cu, W, Ru, and Mo.
Owner:BASF SE

Multifunctional windshield washer fluid as well as preparation method and application thereof

The invention discloses multifunctional windshield washer fluid as well as a preparation method and application thereof. The windshield washer fluid contains siloxane with terminal reactive groups. The windshield washer fluid provided by the invention has good anti-icing performance, the adhesion strength of ice on the glass surface after the windshield washer fluid is applied is reduced by more than 10 times, and the windshield washer fluid has obvious anti-icing effect. The glass water disclosed by the invention can be sprayed at the temperature of-20 DEG C, so that an anti-fouling and anti-icing coating can be quickly formed on the surface of glass to meet the requirement of keeping the surface of the glass clean at low temperature in winter, and the low-adhesion effect of a solid pollution agent on the surface of the glass can be realized under extreme conditions; the deicing device is suitable for simple and rapid deicing of the glass surface in a glass icing environment in winter in northern China. A coating formed by the windshield washer fluid is small in surface tension and excellent in lubricating property, the friction force between glass and a wiper blade can be reduced, and then the service life of a windscreen wiper is effectively prolonged.
Owner:INST OF CHEM CHINESE ACAD OF SCI

Composite acid, preparation method and method for cleaning glass rainbow spots by using composite acid

The invention belongs to the field of fine chemicals and glass storage, and particularly relates to composite acid, a preparation method and a method for cleaning glass rainbow spots through the composite acid. The preparation method comprises the following steps: sequentially adding 3-5% of acetic acid, 0.1-0.2% of fatty alcohol-polyoxyethylene ether, 0.3-0.5% of disodium ethylene diamine tetraacetate, 0.5-1.5% of hydrofluoric acid, 1.5-3% of concentrated sulfuric acid and the balance of water to a proper amount of water, and uniformly mixing to obtain a composite acid; the method comprises the following steps: completely immersing glass with rainbow spots in a thermal composite acid solution, taking out the glass, cleaning the glass until no composite acid solution is left, adding calcium carbonate into waste liquid after cleaning is completed, and discharging the waste liquid after the pH value of the waste liquid is qualified. The glass cleaning agent has an efficient and comprehensive decontamination effect on glass rainbow spots, impurity ions difficult to remove are not introduced, and cleaned glass is high in light transmittance, low in haze and small in damage to a glass body.
Owner:SHAANXI UNIV OF SCI & TECH

Detergent composition, detergent and method for regenerating an aluminum hydroxide-based lithium sorbent

The present application relates to the field of aluminum hydroxide-based lithium adsorbent, and discloses a cleaning agent composition, a cleaning agent and a regeneration method of aluminum hydroxide-based lithium adsorbent. The cleaning agent composition of the present application contains an aluminum flocculant, an ammonium salt, lithium chloride, a citrate, an acid and an emulsifier. The cleaning agent of the present application ensures the cleaning effect, and the adsorption performance of the cleaned adsorbent can be restored to more than 96% of the original adsorption capacity, and the adsorbent has no obvious solution loss.
Owner:BYD CO LTD

Powder for dry-cleaning of hands

The invention relates to a dry-cleaning powder for hands, comprising a mixture of at least starch, an oil, a polysaccharide and semolina. The invention also relates to the process for the preparation of the dry-cleaning powder for hands, wherein a mixture comprising at least starch, an oil, a polysaccharide and semolina is mixed at a temperature between 0°C and 50°C and ambient pressure. The invention furthermore relates to the use of the cleaning powder for cleaning the hands without using water, and as first aid food.
Owner:SOAP-P GMBH

Cleaning composition with molybdenum etching inhibitor

The present disclosure relates to removal compositions for at least partially removing postchemical mechanical polishing (post-CMP) residues from the surface of a microelectronic device. The removal compositions comprise an aqueous base composition and various molybdenum etching inhibitors that reduce the amount of molybdenum removed from the surface of the microelectronic device compared to the aqueous base composition.
Owner:ENTEGRIS INC