1418results about "Organic non-surface-active detergent compositions" patented technology

The invention provides a rapid repairing method for an aerospace carbon fiber composite material, and belongs to the technical field of carbon fiber composite material repairing, in the aspect of cleaning, a special cleaning agent for self-research is free of damage and efficient, a preset cleanliness can be achieved by matching with a tool with a replaceable brush head, a foundation is laid for repairing, the damage is accurately measured by advanced detection equipment, the detection precision is 0.1 mm, and the detection efficiency is high. The repair material is scientific in formula and reasonable in component proportion, it can be guaranteed that the performance of a repaired part is close to that of an original part, the strict repair technology such as vacuum auxiliary pressure injection and autoclave curing guarantees sufficient curing and optimal performance of the material, and it is guaranteed that the quality reaches the standard through surface treatment and detection; all the devices of the equipment cooperate and are provided with intelligent systems, parameters can be regulated and controlled, the technology can be automatically adjusted, the structure meets special aviation requirements, carrying and operation are convenient, various scene requirements are met, and the equipment has great significance in guaranteeing aircraft operation and flight safety.

A treatment liquid for a semiconductor device contains water, a removing agent, and a copolymer. The copolymer has a first repeating unit having at least one group selected from a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit. A substrate treatment method using the treatment liquid is also provided.

The invention provides a film stripping liquid and a preparation method thereof. The film stripping liquid is composed of a solubilizer, a metal corrosion inhibitor, a surface leveling agent and an organic solvent. Wherein the solubilizer can be a combination containing benzene series, so that the solubility of the photoresist in an organic solvent can be improved, and the service life of the stripping liquid is prolonged. The surface leveling agent is one or more of 1, 3-propylene glycol, 2-phenyl-1, 3-propylene glycol and 2-amino-1, 3-propylene glycol, and is used for improving the uniformity of the film stripping liquid in the film stripping process and avoiding the uneven concave-convex phenomenon on the surface of the photoresist. The metal corrosion inhibitor can be selected from azole or polyphenol compounds and can inhibit corrosion of metals such as Cu and Ag in the film stripping process; and the organic solvent is a combination of xylene and dichloromethane and is mainly used for dissolving and removing the expanded and fallen photoresist. According to the film stripping liquid provided by the invention, the glue stripping speed can be increased, the glue stripping uniformity can be remarkably improved, in addition, metals can be effectively protected from being corroded, and the corrosion speed of the metals such as Cu and Ag is controlled to be limited below 1 A / min.

To provide: a cleaning fluid having improved removability of stains due to organic impurities: and a cleaning method using the cleaning fluid.SOLUTION: Provided is a cleaning fluid, comprising a solvent and a metal remover. The cleaning fluid includes two or more kinds of solvents, the distance (HSP distance) between the Hansen solubility parameter of the cleaning fluid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the total content of organic matter selected from the group consisting of organic acid polymers, organic acid esters, and ketone bodies is 0.1×10-9 pts.mass or more to 105×10-6 pts.mass or less relative to 100 pts.mass in total of the solvent and the metal remover.SELECTED DRAWING: None

The invention discloses a cleaning lubricant for textile machinery. The cleaning lubricant comprises the following components in percentage by weight: 6-14% of petroleum ether, 16-26% of solvent oil, 6-14% of alkane oil, 16-26% of 120 # solvent oil, 31-39% of butane gas and 1-9% of dimethyl silicone oil. The invention belongs to the technical field of textile, and particularly relates to a cleaning lubricant for textile machinery, which can clean greasy dirt and dirt on each movable part of a textile mill, a blowing workshop, a drawing workshop, a roving workshop and a spinning workshop. The cleaning lubricant has the technical effects of rust removal, lubrication, rust prevention, wear resistance and non-sticking to all movable parts during cleaning, and the lubricating period of the cleaning lubricant is long.

The invention discloses a pesticide residue scavenging agent. The feed additive is prepared from the following components in parts by weight: 90-110 parts of white hyacinth beans, 9-11 parts of papain, 90-110 parts of liquorice, 45-55 parts of folium isatidis, 25-35 parts of perilla leaves, 25-35 parts of fructus forsythiae, 25-35 parts of honeysuckle, 15-25 parts of rhizoma smilacis glabrae, 15-25 parts of ginkgo leaves, 4-6 parts of soybean protease, 9-11 parts of glutathione, 5-7 parts of amino-oligosaccharin, 9-11 parts of amylase and 7-9 parts of walnut peptide. The invention also discloses a preparation method of the pesticide residue scavenger. The method has the following outstanding effects: the method is easy to operate, low in cost, popular in price and remarkable in effect, and can reach the national safety agricultural product indexes.

To provide: a cleaning fluid having improved removability of stains due to impurities: and a cleaning method using the cleaning fluid.SOLUTION: Provided is a cleaning fluid, comprising a solvent and a metal remover. The cleaning fluid includes two or more kinds of solvents, the distance (HSP distance) between the Hansen solubility parameter of the cleaning fluid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the content of metal impurities is 0.1×10-9 pts.mass or more to 102×10-6 pts.mass or less relative to 100 pts.mass in total of the solvent and the metal remover.SELECTED DRAWING: None

The present invention addresses the problem of providing a processing liquid for a semiconductor device, said processing liquid having excellent corrosion resistance with respect to a metal-containing layer, excellent removability of an object to be removed, and excellent solubility in a post-processing liquid. The present invention also addresses the problem of providing a method for processing a substrate using the processing liquid. This processing liquid for a semiconductor device contains water, a remover, and a copolymer, the copolymer having a first repeating unit having at least one group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit.

The invention discloses a water-based flux cleaning agent for integration, and belongs to the field of semiconductor cleaning agents. The water-based flux cleaning agent is prepared from the following raw materials in percentage by weight: 30-50% of alcohol ether solvent, 1-5% of organic amine, 3-5% of gemini imidazoline corrosion inhibitor and 40-70% of deionized water, wherein the sum of the weight percentages of the raw materials is 100%. According to the water-based flux cleaning agent, the imidazoline corrosion inhibitor is adopted, so that a remarkable cleaning effect on flux residues, soldering paste and fine particles on a semiconductor electronic device is achieved, meanwhile, the brightness of welding spots can be maintained, the surface insulation performance is good, the metal surface of an IPM module can be effectively prevented from being oxidized, and the service life of the IPM module is prolonged. The cleaning agent is especially suitable for cleaning pollutants in the welding process of semiconductor chips, chip type capacitors and circuit substrates.

The invention discloses a photoresist stripping method, and relates to the technical field of semiconductors. The photoresist stripping method comprises the following steps: annealing a wafer to alloy a metal coating; soaking the wafer in a first organic solvent to soften the photoresist on the wafer; a second organic solvent and a third organic solvent are sequentially used for spraying the wafer, the second organic solvent comprises N-methyl pyrrolidone, and the volatility of the third organic solvent is higher than that of the second organic solvent; and drying the wafer. According to the photoresist stripping method provided by the invention, the photoresist on the wafer can be effectively removed, and meanwhile, the corrosion of NMP to the metal coating can be relieved, so that the yield of products can be improved.

The invention provides a new energy automobile battery flexible disassembling adhesive and a preparation method thereof, and belongs to the technical field of new energy automobile batteries, the flexible disassembling adhesive comprises the following components by weight: 45-50 parts of deionized water; 8 to 10 parts of gamma-butyrolactone; 5 to 8 parts of propylene glycol methyl ether acetate; 2 to 3 parts of microencapsulated lipase; 2 to 3 parts of nano cellulose immobilized protease; 6 to 8 parts of urea peroxide; 0.5 to 1 part of nano manganese dioxide; 0.7 to 1.1 parts of a sodium citrate / sodium lactate buffer solution; 1.5 to 2.5 parts of polyvinylpyrrolidone K30; 0.8 to 1.2 parts of hydroxypropyl methyl cellulose; 0.05 to 0.1 part of a graphene oxide nanosheet; 0.5 to 0.8 part of a benzotriazole derivative; 0.1 to 0.3 part of sodium molybdate; 6 to 8 parts of sorbitol; and 5-7 parts of ascorbic acid. The flexible disassembly adhesive solves the problems of low efficiency, serious environmental pollution, high safety risk and low material recovery rate in traditional battery disassembly.

The invention provides a stripping agent composition and a method for stripping a photoresist, wherein the stripping agent composition has good stripping performance and can inhibit corrosion of a lower contact surface during stripping of the photoresist. The stripping agent composition comprises an ether alcohol organic solvent (A), another organic solvent (B), an alkaline substance (C), a substrate corrosion inhibitor (D) and water (E). The other organic solvent (B) does not include an ether alcohol organic solvent. The alkaline substance (C) includes an organic base (C1), an inorganic base (C2), or a combination thereof. Based on 100 parts by weight of the total usage amount of the stripping agent composition, the usage amount of the ether alcohol organic solvent (A) is 7-70 parts by weight, and the usage amount of the base material corrosion inhibitor (D) is more than 0 part by weight and less than 18 parts by weight.

The invention belongs to the technical field of fluorine-containing fine chemical synthesis, and particularly relates to an oxa-hydrofluoroether compound and a synthesis method and application thereof. The invention relates to an oxa-hydrofluoroether compound, the structure of the oxa-hydrofluoroether compound is shown as a formula (1): # imgabs0 #, in which Rf is F or CF3; r is methyl or ethyl; n is an integer from 1 to 3; according to the oxa hydrofluoroether compound disclosed by the invention, oxygen atoms are embedded into a fluorocarbon chain structure, so that fluorine-containing chain segments of hydrofluoroether are more diversified, and the structure is not limited by a perfluorocarbon chain structure any more; according to the oxa-hydrofluoroether compound, oxygen atoms play a role in reducing surface tension, and the more the oxygen atoms are, the lower the surface tension is; compared with other hydrofluoroether solvents, the hydrofluoroether solvent has higher permeability and better cleaning effect; according to the oxa-hydrofluoroether compound, on one hand, oxygen atoms are embedded into a fluorocarbon chain structure, and on the other hand, the fluorocarbon chain contains branched chains, so that the oxa-hydrofluoroether compound is easy to degrade, and the environmental friendliness is improved.

The invention relates to the technical field of plastic surface treatment, in particular to an environment-friendly novel plastic brightening cleaning agent formula and a preparation method and application thereof. The formula consists of 25-35% of a high-polarity compound propylene carbonate, 5-15% of a moderate-polarity compound ethyl acetate and 55-65% of a low-polarity compound dimethyl carbonate according to a specific weight ratio, and during preparation, under the protection of nitrogen, the three components are stirred for 20-30 minutes at the temperature of 20-30 DEG C at the speed of 200-400 rpm, and are sealed in an HDPE (High-Density Polyethylene) barrel after being filtered by 0.5 mu m. The bright cleaning agent has low toxicity (VOCsilt; 50 g / L), rapid volatilization (the surface drying time is less than or equal to 3 minutes) and high biodegradability (gt; the sulfate crystals of the lead-acid storage battery shell can be efficiently removed (the wiping removal rate after spraying is gt; and moreover, the glossiness is obviously improved to be more than or equal to 85 GU (an incidence angle of 60 degrees). The method is simple in process, meets the international environmental protection standard (such as GB 38508-2020), is suitable for industrial production and multi-scene application, has efficient cleaning and environmental protection safety, and is suitable for industrial production and multi-scene application.

The present invention employs a cleaning liquid containing a solvent and a metal remover. In the cleaning liquid, two or more solvents are included, the distance (HSP distance) between the Hansen solubility parameter of the cleaning liquid and the Hansen solubility parameter of dimethylacetamide is 1.0 or less, and the total content of an organic substance selected from the group consisting of organic acid multimers, organic acid esters, and ketone bodies is 0.1 × 10-9 parts by mass or more and 105 × 10-6 parts by mass or less with respect to 100 parts by mass of the total of the solvent and the metal remover. This cleaning liquid improves removal of organic impurities.

To provide a novel cleaning agent composition that exhibits excellent cleanability, is less corroded by articles containing metals such as aluminum, and is capable of removing a copper oxide film.SOLUTION: There is provided a cleaning agent composition including: 3-amino-4-octanol (A); at least one type of organic phosphorus compound (B) selected from the group consisting of acidic phosphate esters (B1), organic phosphonic acids (B2), and salts thereof; and optionally, water (C).SELECTED DRAWING: None

The invention discloses a series of azeotropic or azeotrope-like compositions for solvent and single-phase or two-phase cleaning applications, and the formula of the azeotropic or azeotrope-like compositions mainly comprises trans-1, 2-dichloroethylene and hexafluoropropylene dimer; the composition may include at most one of 1, 1, 2, 2-tetrafluoroethyl-2, 2, 2-trifluoroethyl ether or 1, 1, 2, 3, 3, 3-hexafluoropropyl-2, 2, 2-trifluoroethyl ether, for example, 60 to 80% by mass of trans-1, 2-dichloroethylene, 20 to 40% by mass of hexafluoropropylene dimer or 60 to 65% by mass of trans-1, 2-dichloroethylene, or may also include any at most one of 1, 1, 2, 2-tetrafluoroethyl-2, 2, 2-trifluoroethyl ether or 1, 1, 2, 3, 3, 3-hexafluoropropyl-2, 2, 2-trifluoroethyl ether, for example, 60 to 80% by mass of trans-1, 2-dichloroethylene, 20 to 40% by mass of hexafluoropropylene dimer or 60 to 65% by mass of 1, 1, 2, 2- 25 to 30% by mass of a hexafluoropropylene dimer; and 10 to 15% by mass of any one of HFE347 or HFE449. According to the present invention, the component capable of generating the azeotrope-like composition with the trans-1, 2-dichloroethylene component can inhibit the flash point of the trans-1, 2-dichloroethylene component so as to improve the safety performance of transportation, storage and use. The multi-component composition described by the formula can be used for high-efficiency degreasing of metal parts or high-efficiency cleaning of precise devices in the metal processing process, can also be used as a solvent, a degreasing agent, a desoldering agent or a drying agent and the like, and can meet multiple application requirements.

The invention provides a cleaning composition and application thereof and an electronic device, the cleaning composition comprises a charge modifier, a corrosion inhibitor, a pH regulator and a solvent, the charge modifier comprises a sulfonic acid compound, the corrosion inhibitor comprises an amino compound, and the amino compound contains amino and / or secondary amino, hydroxyl and carboxyl; the pH value of the cleaning composition is 1-4. The special charge modifier and the corrosion inhibitor are selected for matching, and the cleaning composition is controlled within a proper pH value range, so that the metal surface corrosion of the leveling workpiece can be effectively inhibited, and the residual nano abrasive on the surface of the leveling workpiece can be effectively removed; further, the cleaning composition with excellent cleaning effect and corrosion protection effect is obtained. When the composite material is applied to preparation of electronic devices, the comprehensive performance of the electronic devices can be improved.

The invention belongs to the technical field of chemical engineering, and particularly relates to a cleaning method for a blocked material of a polycarbonate production device. According to the invention, a detergent is adopted to clean the blocking material in the polycarbonate production device, the detergent comprises 66-90 parts of phenol, 9.5-30 parts of diphenyl carbonate and 0.5-4 parts of a volatile basic catalyst, and the boiling point of the volatile basic catalyst is less than 130 DEG C. The detergent provided by the invention is used for cleaning blockage materials in the polycarbonate production device, does not introduce any impurities, meets the pressure-bearing requirement of the polycarbonate production device, and is good in actual cleaning effect, simple to operate and energy-saving.

The invention discloses a cleaning method for a mold jig for curing resin. The cleaning efficiency is improved, abrasion of the mold jig is reduced, the service life is prolonged, and the large-scale production requirement is met. The method is characterized in that a to-be-cleaned mold jig is immersed below the liquid level of a cleaning agent in a cleaning pool of an ultrasonic cleaning machine, and residual resin on the surface of the mold jig is removed through ultrasonic cleaning.

The invention discloses a solvent type cleaning agent for replacing dichloromethane, which is characterized by comprising the following components in parts by weight: 70-90 parts of hydrocarbon solvent D40; 0 to 15 parts of chlorinated methoxy fatty acid methyl ester; and 0-15 parts of butanediol diacetate, wherein the number of parts of the chloro-methoxy fatty acid methyl ester or butanediol diacetate is not 0 at the same time. Compared with the existing dichloromethane cleaning agent, the cleaning agent disclosed by the invention has the advantages of low toxicity, low volatilization amount, no corrosivity, low VOC (Volatile Organic Compounds), certain anti-rust capability and no key control pollutant CFC113, carbon tetrachloride and trichloroethylene.

The invention relates to a detergent tablet comprising from 5 to 20 percent by weight citric acid or a salt thereof and from 3 to 25 percent by weight sodium benzoate and a surfactant. The invention also relates to a method of forming a wash liquor by combining a detergent tablet with water in a container. The invention also relates to the use of a detergent tablet to create a washing liquor for cleaning surfaces.

The invention relates to a polyglycerol partial ester obtainable by esterification of a) a polyglycerol mixture, b) poly(hydroxycarboxylic) acid, c) at least one dicarboxylic acid having 6 to 12, preferably 9 to 10, carbon atoms, more preferably selected from azelaic acid and sebacic acid, and d) oleic acid.

Laundry additive compositions that include a metal sequestration agent and that may be characterized by an acidic pH. Related methods of treating a fabric, for example with a wash liquor and a rinse liquor, with such compositions and / or agents. Uses of such laundry additive compositions.

To provide a removal composition which is capable of satisfactorily removing a strong resist, and a polymer residue and a resist residue on a substrate for semiconductor device production, while reducing the toxicity to humans, and which is also capable of suppressing damage to a wiring metal.SOLUTION: The present invention relates to a nonaqueous composition which is used for removing a polymer residue, a resist, and / or a resist residue on a substrate for semiconductor device production by applying ultrasonic waves thereto, and which contains 80-100 mass% of diethylene glycol monoethyl ether or triethylene glycol monomethyl ether.SELECTED DRAWING: Figure 1

The invention discloses a steam generator chemical cleaning agent based on composite EDTA and a cleaning method, the steam generator chemical cleaning agent comprises a main cleaning agent, a corrosion inhibitor, a reducing agent, a dissolution promoter, a defoaming agent, a pH regulator and water, by means of the cleaning agent and the cleaning method, the cleaning time of a steam generator can be shortened, the dirt dissolution rate of a heat transfer pipe is high, and the corrosion amount is extremely low.

The invention provides a composition, application thereof and a preparation method of a semiconductor device. The composition comprises the following components in percentage by mass: 5-50% of a first aprotic organic solvent; 5%-30% of a second aprotic organic solvent; 0.01%-5% of an acid; 0.15%-5% of a corrosion inhibitor; 10%-85% of water; the corrosion inhibitor comprises amino acid with the molecular weight larger than or equal to 100. The composition provided by the invention can be mixed with an oxidizing agent for use, etching residues on the surface of a patterned substrate can be effectively cleaned after mixing, a part of a hard mask on the patterned substrate can be selectively removed while a metal material in the patterned substrate is effectively protected, and the etching selection ratio of the hard mask to the metal material is improved.

A composition including a plurality of particles, a process for treating laundry using such particles, and a process of making such particles, wherein the particles include: about 25% to about 99% by weight water-soluble carrier; and a plurality of capsules dispersed in the water-soluble carrier, wherein the capsules comprise a core and a shell surrounding the core and the core includes perfume raw materials; wherein the shell includes a polymeric material that is the reaction product of chitosan derived from an aqueous phase and a cross-linking agent.

The invention belongs to the technical field of filter element cleaning, and relates to a cleaning method of a coal mine hydraulic support electro-hydraulic control filter element, which comprises oil stain treatment, rubber treatment and / or gravel treatment and rust treatment. The oil stain treatment comprises soaking in an oil stain cleaning agent and drying; the rubber treatment comprises baking in an oven, ultrasonic treatment with a rubber cleaning agent, flushing with a high-pressure water gun and drying; the gravel treatment comprises oven baking, high-frequency vibrating screen vibration, ultrasonic cleaning, high-pressure water gun scouring and drying; the rust treatment comprises the steps of soaking in a rust removal cleaning agent, washing and drying. According to the cleaning method for the electro-hydraulic control filter element of the coal mine hydraulic support, blockages can be thoroughly removed, the cleaning success rate can reach 95%, the filter element of the filter can be reused, and the cost is saved for a mine; the consumed time is shorter, the efficiency is higher, and the cost is reduced.

The invention discloses an efficient bio-based multifunctional cleaning agent for an agricultural-photovoltaic complementary photovoltaic panel and a preparation method of the efficient bio-based multifunctional cleaning agent, and belongs to the technical field of photovoltaic panel cleaning agents. The cleaning agent is prepared from the following raw materials in percentage by mass: 30 to 50 weight percent of a component A, 30 to 50 weight percent of a component B and 20 to 40 weight percent of a component C, on the basis of the total mass of the cleaning agent, the component A is prepared by mixing 15-30 wt% of a biological enzymolysis complexing agent, 10-20 wt% of nanocellulose gel and 5-10 wt% of a zwitterionic surfactant; the component B is prepared by mixing 10 to 20 weight percent of plant source synergist, 5 to 15 weight percent of nano titanium dioxide and 5 to 15 weight percent of environment-friendly solvent system; the component C is prepared by mixing 10 to 20 weight percent of intelligent response additive and 10 to 20 weight percent of biodegradable slow-release carrier. The intelligent cleaning agent has triple functions of self-cleaning, ecological restoration and intelligent response, and is used for solving the problems of poor environmental protection property, poor low-temperature effect and the like of the existing photovoltaic panel cleaning agent.