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75results about "Organic non-surface-active detergent compositions" patented technology

Cleaning composition with molybdenum etching inhibitor

The present disclosure relates to removal compositions for at least partially removing postchemical mechanical polishing (post-CMP) residues from the surface of a microelectronic device. The removal compositions comprise an aqueous base composition and various molybdenum etching inhibitors that reduce the amount of molybdenum removed from the surface of the microelectronic device compared to the aqueous base composition.
Owner:ENTEGRIS INC

Cleaning composition and method of using the same

The present invention provides a cleaning composition that can be used to clean semiconductor substrates. [Solution] The cleaning composition described herein mainly comprises at least one organic acid and at least one anionic polymer.
Owner:FUJIFILM ELECTRONIC MATERIALS U S A INC

Method for cleaning PFA bottles

The application discloses a cleaning method for PFA bottles, which comprises the following steps: multiple static washing of the PFA bottles with clean water; first dynamic washing of the PFA bottles with a first cleaning solution, wherein the first cleaning solution comprises propylene glycol methyl ether acetate and cyclopentanone; second dynamic washing of the PFA bottles with a second cleaning solution, wherein the second cleaning solution comprises propylene glycol methyl ether acetate and N-methyl pyrrolidone; third dynamic washing of the PFA bottles with a third cleaning solution, wherein the third cleaning solution comprises nitric acid and hydrogen peroxide; and fourth dynamic washing of the PFA bottles with a fourth cleaning solution, wherein the fourth cleaning solution comprises nitric acid and hydrochloric acid. The application has the beneficial effect of providing a cleaning method for PFA bottles, which effectively removes residues in the bottles by using multiple composite cleaning solutions.
Owner:SHANGHAI BERENSON ANALYTICAL INSTR TECH SERVICE CO LTD

Stripping solution and method for stripping resin

To provide a peeling solution that can effectively remove resin. [Solution] This stripping solution contains water, an organic solvent having a δP value of 5.0 to 11.9, a δH value of 4.3 to 15.8, and a δD value of 15.9 to 18.6, and an alkaline compound having a pH of 12 or higher in the aqueous phase.
Owner:NAGASE CHEMTEX CORPORATION

Washing solution and washing method

This invention employs a washing solution containing solvents and metal removal agents. The washing solution contains two or more solvents, the distance between the Hansen solubility parameter of the washing solution and the Hansen solubility parameter of dimethylacetamide (HSP distance) is less than 1.0, and the content of metal impurities is 0.1 × 10⁻¹¹ parts by mass relative to the total of 100 parts by mass of the aforementioned solvents and metal removal agents. ‑9 10 or more by weight 2 ×10 ‑6 The amount is less than a certain percentage by weight. The washing solution described herein can improve the removal of impurities and dirt.
Owner:TOKYO OHKA KOGYO CO LTD

Lipid removal in detergents

The invention relates to lipid removal enhancers that may be used alone or in concert with lipase in detergents for removal of lipid stains, such as fats and oils, from surfaces, such as textiles, with an increased benefit-risk ratio.
Owner:NOVOZYMES AS

Biodegradable graft polymers

To provide novel graft polymers that, when used in compositions such as cleaning compositions, have beneficial properties with respect to biodegradability and / or their cleaning behavior. [Solution] The present invention relates to a novel graft polymer, the graft polymer comprising a block copolymer skeleton (A) as a graft base, the block copolymer skeleton (A) having polymer side chains (B) grafted thereto. The polymer side chains (B) are obtained by polymerization of at least one vinyl ester monomer (B1) and optionally an additional monomer, N-vinylpyrrolidone (B2). Most preferably, the block copolymer skeleton (A) is a triblock copolymer of polyethylene oxide (PEG) and polypropylene oxide (PPG). The present invention further relates to a method for obtaining such a graft polymer, the method preferably carried out by free radical polymerization. Furthermore, the present invention relates to the use of such graft polymers in, for example, fabrics and home care products. Another subject of the present invention is the fabrics and home care products themselves that contain such graft polymers.
Owner:BASF SE

Cleaning agent composition, cleaning material, and method of cleaning mold for molding

A cleaning agent composition contains a main material for the cleaning agent composition and an amine compound which includes an amino group located at a position other than an end of the a molecular chain, and a content rate of moisture is 8% by mass or less.
Owner:RESONAC CORP

Cleaning composition

PCT designated stageWO2026103552A1Organic non-surface-active detergent compositionsInorganic non-surface-active detergent compositionsWaferPhysical chemistry
Disclosed in the present invention is an alkaline cleaning composition comprising a complexing agent, an organic amine compound, and a pH adjusting agent. The addition of a complexing agent enables same to form a complexing bond with cerium oxide, inhibiting the combination of cerium oxide and a silicon oxide surface, and having the function of reversing the charge of the positively charged cerium oxide particles, such that the cerium oxide particles and the wafer surface form a strong repulsive effect under alkaline conditions. The addition of the organic amine compound can improve the ability of the cleaning solution to remove cerium oxide particles. The cleaning composition disclosed in the present invention can effectively remove cerium oxide particles adhered to the surface of TEOS, and after cleaning, the number of particles observed under SEM characterization is less than 3.
Owner:ANJI MICROELECTRONICS TECH (SHANGHAI) CO LTD

Air pollutant neutralizers with odor absorbing feature to improve room air

The invention relates to an air pollutant neutralization cleaner (air cleaner) for absorbing pollutants and neutralizing odors to improve indoor air, comprising an amino acid complex at least comprising bio-L-arginine, L-lysine, L-glutamine and L-proline and a zinc ricinoleate-based compound of up to 10%, wherein the overall formulation contains exclusively natural ingredients.
Owner:NEUTEC CHEM +1

Compositions and methods for reducing interaction of abrasive particles with a cleaning brush

Methods of removing abrasive particles from a polymer surface, such as from a cleaning brush used in a post-chemical mechanical treatment cleaning step; and related cleaning solutions.
Owner:ENTEGRIS INC

Washing liquid and washing method

According to the invention, a cleaning solution containing a solvent and a metal remover is adopted. The cleaning solution contains two or more solvents, and the distance (HSP distance) between the Hansen solubility parameter of the cleaning solution and the Hansen solubility parameter of dimethylacetamide is 1.0 or less. The total content of an organic substance selected from the group consisting of an organic acid polymer, an organic acid ester, and a ketone body is from 0.1 * 10 <-9 > parts by mass to 105 * 10 <-6 > parts by mass (inclusive) per 100 parts by mass of the total of the solvent and the metal remover. According to the washing liquid, the removal performance of organic impurity dirt can be improved.
Owner:TOKYO OHKA KOGYO CO LTD

A photovoltaic panel cleaning system based on a deep eutectic solvent and a preparation method and a cleaning process thereof

The application provides a photovoltaic panel cleaning system based on a eutectic solvent and a preparation method and a cleaning process thereof, the cleaning system comprising a hydrophobic oil dissolving module and a hydrophilic phase transition stripping module, the hydrophobic oil dissolving module being a eutectic solvent DES configured by a solid fatty acid and a liquid fatty acid, and the similar solubility principle is used to target soften and dissolve complex oil stains and dust on the surface of the photovoltaic panel; the hydrophilic phase transition stripping module is a polyether amine D230 aqueous solution, and the oil stains are converted into water-soluble micelles and completely stripped from the surface of the panel by electrostatic and hydrogen bond interaction with fatty acid molecules. The application has high decontamination efficiency, extremely low water consumption in operation, realizes zero corrosion and zero swelling on the photovoltaic anti-reflection film and the encapsulating adhesive film, and has excellent environmental protection benefits and industrial economic value.
Owner:QUZHOU ZHONGBANG PAINT CO LTD

Personal care composition formed with glyceride ester crystals having improved coacervate properties

Personal care compositions including glyceride ester crystals, a surfactant, a cationic polymer, and a liquid carrier are disclosed. The personal care compositions can form a greater quantity of coacervate than similar compositions without the glyceride ester crystals and can exhibit excellent feel during use. Methods of preparing the personal care compositions are also disclosed.
Owner:PROCTER & GAMBLE CO

Cleaning method

To provide a cleaning method which is excellent in resin mask removability.SOLUTION: A cleaning method includes a step of peeling a resin mask from an object to be cleaned to which a resin mask is attached using a detergent composition. The detergent composition is a detergent composition containing a quaternary ammonium hydroxide (component A), amino alcohol (component B), aromatic alcohol (component C), and water (component D). A mass ratio D / C of the component D to the component C in the detergent composition is less than 10. The object to be cleaned to which the resin mask is attached is a substrate having a cured resin mask on a surface having metal wiring having a line width of a thin line part of 5 μm or more and 35 μm or less and a thickness of a thickest part of 40 μm or more and 80 μm or less.SELECTED DRAWING: None
Owner:KAO CORP

Washing machine and method for controlling same

PendingEP4667641A4Dry-cleaning apparatusOther washing machines
Provided is a washing machine including: a storage chamber configured to store carbon dioxide in a gaseous state; an additive container configured to store an additive; a mixing chamber configured to mix the carbon dioxide in the gaseous state supplied from the storage chamber with the additive supplied from the additive container and pressurize the carbon dioxide and the additive, which are mixed with each other, to generate a mixed solution in a liquid state; a washing chamber configured to wash laundry using the mixed solution supplied from the mixing chamber; and a distillation chamber configured to accommodate the mixed solution discharged from the washing chamber and vaporize the carbon dioxide from the mixed solution therein, wherein the additive lowers a vapor pressure of the mixed solution to maintain the mixed solution in a liquid state at pressures of 10 bar or less.
Owner:SAMSUNG ELECTRONICS CO LTD

Azeotropic and azeotrope-like compositions of perfluoroheptene and fluoroethers and uses thereof

The present disclosure provides azeotropic and azeotrope-like compositions comprised of perfluoroheptene and several fluoroethers. The present disclosure also provides for methods of use for the azeotropic and azeotrope-like compositions. Methods of use include removing a residue from the surface of an object, deposition of a lubricant on the surface of an object such a magnetic media device, and a method of cooling an electronic component comprising at least partially immersing an electrical component in a working fluid and transferring heat from the electrical component.
Owner:CHEMOURS CO FC LLC THE

Cleaning solution and cleaning method for surface of CVD-SiC component

PendingCN122256086AOrganic/inorganic per-compounds compounding agentsOrganic non-surface-active detergent compositionsChemical industrySurface cleaning
The present application relates to the chemical industry field, specifically to a kind of CVD-SiC component surface cleaning solution and cleaning method, including following cleaning solution: HS cleaning solution, JHS cleaning solution and SS2 cleaning solution;The present application is by developing from HS cleaning solution, JHS cleaning solution and SS2 cleaning solution special cleaning system, and designs four-step sequential cleaning process matched with it, realizes the targeted removal and synergistic purification of different types of pollutants.Compared with prior art, the method achieves efficient and thorough non-destructive cleaning, precise and controllable step-by-step action, comprehensive solution of complex pollution, perfect protection of substrate surface and stable and reliable process, and has wide application prospect in semiconductor substrate preparation, high-end optical elements and precision parts manufacturing and other fields.
Owner:ANHUI SIXIANG SEMICON MATERIAL TECH CO LTD

Cleaning solution for perovskite-coated cutting tool and cleaning method and cleaning solution device for cutting tool

This invention discloses a cleaning solution and a cleaning method and device for perovskite coating cutters. The cleaning method for the coating cutter includes the following steps: controlling the coating cutter to descend until the lip tip is completely submerged below the surface of the cleaning solution in the immersion tank; controlling the liquid supply pump to repeatedly draw in and expel the cleaning solution at high frequency, rapidly dissolving and removing crystalline particles from the cutter and its internal cavity, resulting in a clean and residue-free cutter. This invention uses a cleaning solution with the same properties as the perovskite coating solution used in the production process to repeatedly rinse the coating cutter at high frequency. On one hand, cleaning with the cleaning solution can effectively remove crystalline blockages from the cutter's slit channels and lip, improving coating quality and stability; on the other hand, cleaning with the cleaning solution can achieve online cleaning, eliminating the need for manual disassembly and assembly of the cutter, avoiding cross-contamination, reducing downtime, and improving coating efficiency.
Owner:CHANGZHOU S C EXACT EQUIP

Corrosion-reducing cleaning agent composition

To provide a detergent composition for reducing the corrosion of a hard surface including a metal surface of aluminum and / or anodized aluminum, the composition designed to reduce the corrosion of the metal surface of aluminum and / or anodized aluminum due to washing; a method for reducing the corrosion of a metal surface of aluminum and / or aluminum alloys; and a method for reducing the corrosion of a metal surface of aluminum and / or anodized aluminum due to (a) component.SOLUTION: A detergent composition for reducing the corrosion of a hard surface including a metal surface of aluminum and / or anodized aluminum, comprises (a) an aminocarboxylic acid type chelator, (b) at least one selected from lactic acid, malic acid, tartaric acid, citric acid, and salts thereof, and water.SELECTED DRAWING: None
Owner:KAO CORP

Cleaning agent composition, cleaning aerosol, and method for cleaning a soiled portion

The present invention relates to a cleaning agent composition which is excellent in cleaning property and does not corrode plastic substrates such as polycarbonate and polystyrene which are not resistant to solvents. The cleaning agent composition of the present invention comprises the following (A) to (C) components, the mass ratio of the (A) component and the (B) component being 11:89 to 99:1, (A) cis-1-chloro-3,3,3-trifluoropropene, (B) one or more compounds selected from the group consisting of hydrofluoroolefins, hydrofluorocarbons and hydrofluoroethers which do not contain a chlorine atom, and (C) a hydrocarbon solvent.
Owner:THREE BOND CO LTD

Washing machine and method of controlling the same

ActiveUS12644220B2Dry-cleaning apparatusOther washing machinesLaundry washing machineDistillation
Provided is a washing machine including: a storage chamber configured to store carbon dioxide in a gaseous state; an additive container configured to store an additive; a mixing chamber configured to mix the carbon dioxide in the gaseous state supplied from the storage chamber with the additive supplied from the additive container and pressurize the carbon dioxide and the additive, which are mixed with each other, to generate a mixed solution in a liquid state; a washing chamber configured to wash laundry using the mixed solution supplied from the mixing chamber; and a distillation chamber configured to accommodate the mixed solution discharged from the washing chamber and vaporize the carbon dioxide from the mixed solution therein, wherein the additive lowers a vapor pressure of the mixed solution to maintain the mixed solution in a liquid state at pressures of 10 bar or less.
Owner:SAMSUNG ELECTRONICS CO LTD

A halogen-free vulcanized polysulfide adhesive remover

ActiveCN117625324BAqueous liquid non-soap compositionsOrganic non-surface-active detergent compositionsPlasticizerPolysulfide
The present application provides a halogen-free curing polysulfide glue remover, which is simple to configure and easy to prepare, contains only one substance at least, and is compatible when being multi-component, and only needs simple stirring; the raw material is easy to obtain, convenient to store and transport, safe and non-toxic; the acid and the plasticizer can be directly purchased, transported conveniently and safely, and non-toxic; the solidification point is low, the flash point is not low, the application is relatively safe; the toxicity is extremely small, and it is more environmentally friendly; the remover is very friendly to the parts to be removed, and is not easy to cause the metal substrate to rust and corrode; the operation is safe: it can be used at room temperature, and the risk coefficient of the glue removal operation is low; the glue removal effect is good, and the cured polysulfide glue can be removed without residue or directly dissolved, basically without damage to the adhered material; it can be reused, widely applied, suitable for large polysulfide glue factories, suitable for various factories and scenes needing glue removal, and also suitable for individual glue removal.
Owner:HANGZHOU JOINLEADER NEW MATERIALS CO LTD

A cleaning solution

PendingCN122256085AOrganic non-surface-active detergent compositionsInorganic non-surface-active detergent compositionsEtchingOrganic solvent
The present application provides a cleaning solution, comprising: organic solvent, organic base, metal corrosion inhibitor, chelating agent, oxidizing agent and water. The present application uses the cleaning solution added with reasonable proportion of organic base, metal corrosion inhibitor, chelating agent and oxidizing agent, which can remove titanium nitride hard mask and photoresist etching residues, inhibit corrosion to copper, cobalt and non-metal (low-k dielectric material), and prolong the service life of the cleaning solution.
Owner:NINGBO ANJI MICROELECTRONICS TECHNOLOGY CO LTD

Peracid compositions with conductivity monitoring capability

Peroxycarboxylic acid compositions comprising compatible ionic compounds to deliver conductivity signals to enable monitoring of the peroxycarboxylic acid concentration by conductivity when diluted for use are disclosed. Methods of measuring peroxycarboxylic acid concentration by conductivity are also disclosed. Beneficially, conductivity measurement allows a user to determine concentration of the peroxycarboxylic acid at a point of use without cumbersome titration steps to determine the concentration providing various benefits at an application of use.
Owner:ECOLAB USA INC

Industrial cleaning fluid for oil removal

PCT designated stageWO2026132491A1Organic detergent compounding agentsDetergent solventsActive agentGlycol ethers
A multiphase system comprising: (A) a polar solvent comprising a C1-10 alkylene glycol ether; (B) one or more apolar solvents having a water solubility of less than 2 g in 1,000 g of water at 25 °C; (C) optionally one or more liquid esters having a water solubility of less than 2 g in 1,000 g of water at 25 °C; (D) one or more amphiphilic liquid compounds; (E) optionally one or more tensides; and (F) optionally one or more additives.
Owner:INTELLIGENT FLUIDS GMBH