369results about "Detergent solvents" patented technology

Laundry additive compositions that include a metal sequestration agent and that may be characterized by an acidic pH. Related methods of treating a fabric, for example with a wash liquor and a rinse liquor, with such compositions and / or agents. Uses of such laundry additive compositions.

The invention relates to the technical field of laundry detergents, and particularly discloses a concentrated laundry detergent capable of stably dispersing microcapsule essence and a preparation method of the concentrated laundry detergent. An organic polyurethane compound with a specific carbamate structure (the general formula is RNHCOOR ') is adopted as a suspending agent, the compound constructs a three-dimensional network structure through intermolecular hydrogen-bond interaction, the hydrogen bond donor / acceptor density of a carbamate unit is higher than that of existing suspension systems such as polyamide and hydrogenated castor oil, and the system is endowed with remarkable thixotropic characteristics. Under the action of shearing force, the network is dissociated, and the viscosity is reduced; and after the shearing force is removed, the hydrogen bond is quickly reconstructed, the viscosity rises again, rheological yield stress is generated, and stable anchoring of the high-load suspended matter is achieved. Meanwhile, due to the characteristic of high melting point of the organic polyurethane compound, the high-temperature processing condition can be tolerated, and the phenomenon of hot roughing is avoided. In addition, the hydrolysis resistance of the carbamate bond ensures the long-term stability of the suspension system in an environment with pH of 6-10 and in the presence of lipase.

Disclosed herein is a safe formulation for a multi-purpose cleaning solution. Each ingredient included in the formulation may be on the EPA Safer Ingredients List. The formulation may be used to clean a variety of surfaces including glass and sensitive surfaces such as electronic screens, touchscreens, computer monitors and flat screen TVs. The formulation may also be used to clean a variety of other surfaces including stainless steel, dry erase boards, and composite materials incorporated into household surfaces and interior and exterior surfaces of automobiles, planes, boats, and the like. The formulation may also be used to clean interior and exterior surfaces of campers, trailers, satellite lenses, hospitals, offices, schools, and other places having multiple surfaces.

A hard surface cleaning composition comprising: (a) 0.1 to 60 wt % of a surfactant system; (b) 0.1 to 40 wt % of a solvent, wherein the solvent is selected from the group consisting of a lower alkanol, a benzyl alcohol, a lower alkyl ether, a glycol, an aryl glycol ether, a lower alkyl glycol ether, a glycerol ketal, an ester, a hydrocarbon / ester blend, a dibasic ester, a linear alcohol ethoxylate, a branched alcohol, oxo alcohol ethoxylate, and combinations thereof; and (c) optionally 0.001 to 10 wt % of a lipase.

This invention relates to compositions and methods for cleaning and peeling. This disclosure provides a composition for cleaning or peeling materials from a substrate. The composition includes a primary solvent and a co-solvent. The co-solvent includes one or more caprolactam-derived solvents.

To provide a liquid detergent composition for toilet having excellent wiping property and washing power and excellent spreading property of flowing water in view of the circumstance where in a flush toilet, when water is flushed into a toilet bowl, water is required to spread over a wide area on the surface of the toilet bowl (excellent spreading property of flowing water), and by spreading water over a wide area on the surface of the toilet bowl, dirt adhering to the toilet bowl can be washed further satisfactorily.SOLUTION: The composition comprises a component (A): a surfactant, a component (B): a specific compound and a component (C): a polymer having a repeating unit (c1) derived from a monomer having a quaternary ammonium group. The mass ratio represented by the component (A) / the component (C) is preferably 0.2 to 12.SELECTED DRAWING: None

The present invention provides a concentrated laundry detergent composition comprising: a solvent system wherein the solvent system is a mixture of water and a non-aqueous solvent; a cleaning surfactant; wherein the cleaning surfactant comprises a blend of: a nonionic surfactant; an anionic alcohol ethoxysulfate surfactant of formula I, wherein R1 and R2 are each independently a C1-16 alkyl group; wherein the sum of carbon atoms in R1 and R2 is from 7 to 17; wherein M + is a negatively charged cation that balances the-SO3-anion of formula I; and wherein n is 1 in 95 mol% to 100 mol% of the anionic alcohol ethoxysulfate surfactant of formula I; wherein the concentrated laundry detergent composition comprises lt based on the weight of the concentrated laundry detergent composition; and 10% by weight of water.

The present invention relates to detergents and cleaning compositions comprising a degreasing agent, an effective amount of a specific type of degreasing enhancer, such as an alkanediol having a carbon chain of 5 to 14 carbon atoms, glyceryl caprylate, 4-hydroxyacetophenone, ethylhexylglycerin, tropolone, or a mixture of the aforementioned degreasing enhancers, and a surfactant, as well as the use of the aforementioned detergents and cleaning compositions for preparing detergents and cleaning products for household, institutional and industrial applications. Furthermore, the present invention relates to methods for treating stained and / or soiled substrates using the detergents and cleaning compositions according to the present invention. In addition, the present invention relates to the use of specific enhancing substances, as defined herein, for enhancing the degreasing power of degreasing detergents and cleaning compositions and for improving the cleaning performance of degreasing detergents and cleaning compositions. Furthermore, the present invention relates to a method for enhancing the degreasing power of degreasing detergents and cleaning compositions and improving the cleaning performance of degreasing detergents and cleaning compositions by adding an effective amount of a specific degreasing enhancer, for example, an alkanediol having a carbon chain of 5 to 14 carbon atoms, glyceryl caprylate, 4-hydroxyacetophenone, ethylhexylglycerin, tropolone, or a mixture of the aforementioned degreasing enhancers, to the aforementioned detergents and cleaning compositions. Finally, the present invention relates to the use of at least one degreasing enhancer, for example, an alkanediol as defined herein, glyceryl caprylate, 4-hydroxyacetophenone, ethylhexylglycerin, tropolone, or a mixture of the aforementioned degreasing enhancers as defined herein, as a substitute for a degreasing agent and / or a solubilizer.

The invention relates to a liquid detergent containing, based on the total weight thereof, a) 22 to 50 wt.% anionic surfactant; b) 0.1 to 8 wt.% gluconic acid salt; c) 0 to 2 wt.% antioxidant; d) 5 to 25 wt.% organic solvent; e) 0.1 to 15 wt.% water; f) less than 0.1 wt.% organic phosphonate, and g) 0.01 to 5 wt.% perfume composition.

SOLVENT COMPOSITIONS The present invention relates to a solvent composition for solvent-based paints or other coatings characterized in that it comprises a combination of dimethyl glutarate and at least one other compound selected from isobutyl acetate, ethyl lactate, dimethyl 2-methylglutarate, 2-methyltetrahydrofuran, ethyl acetate, cyclopentyl methyl ether, dithoxymethane, dimethyl carbonate, dimethyl succinate, benzyl alcohol, dimethyl adipate, and glyceryl triacetate. Fig. 1

The application provides a low pour point nonionic surfactant and a preparation method thereof, which is composed of the following raw materials in parts by weight: C13 isomeric fatty alcohol polyoxyethylene ether 18-30 parts, reverse EO / PO block copolymer 10-20 parts, sodium diisooctyl sulfosuccinate 1-7 parts, sodium dodecyl sulfonate 1-5 parts, glyceryl laurate 1-5 parts, isopropyl alcohol 5-10 parts, and propylene glycol 1-5 parts; the formula is constructed based on a nonionic surfactant as a main body, ion surfactants and additives are introduced, and the system is optimized, so that a low pour point nonionic surfactant with excellent adsorption capacity and decontamination capacity is obtained.

The need for a liquid hand dishwashing composition which is more environmentally sustainable while also providing a desired viscosity and being readily diluted in cold water, is met by formulating the liquid hand dishwashing detergent composition using alkyl glycol sulfate anionic surfactant and optionally further anionic surfactant in a weight ratio of from 1:1 to 1:0.

This invention employs a washing solution containing solvents and metal removal agents. The washing solution contains two or more solvents, the distance between the Hansen solubility parameter of the washing solution and the Hansen solubility parameter of dimethylacetamide (HSP distance) is less than 1.0, and the content of metal impurities is 0.1 × 10⁻¹¹ parts by mass relative to the total of 100 parts by mass of the aforementioned solvents and metal removal agents. ‑9 10 or more by weight 2 ×10 ‑6 The amount is less than a certain percentage by weight. The washing solution described herein can improve the removal of impurities and dirt.

The present invention provides a method for removing edge beads on a wafer associated with a resist coating containing a metal-containing resist composition. [Solution] In a corresponding apparatus for processing a wafer, the method comprises the step of spin-coating a wafer 150 with a metal-based resist composition 158, and then applying a first bead edge rinse solution along the wafer edge. The edge bead solution comprises an organic solvent and an additive comprising a carboxylic acid, an inorganic fluorinated acid, a tetraalkylammonium compound, or a mixture thereof. Alternatively or in addition, the method comprises the step of applying a protective composition 154 to the wafer 150 before performing the edge bead rinse. The protective composition is a sacrificial material or an anti-adhesion material and is applied only to the wafer edge, or, in the case of a protective composition, over the entire wafer.

The application discloses a photoresist stripping agent composition containing a sulfur alkyl single-head quaternary phosphonium salt quaternary phosphonium salt, a preparation method and application thereof. The composition comprises, in parts by weight, 1-5 parts of the sulfur alkyl single-head quaternary phosphonium salt, 65-75 parts of an organic solvent, 10-15 parts of an organic alcohol amine, 1.5-5 parts of a corrosion inhibitor, 0.1-0.5 parts of a defoaming agent and 1-2 parts of a wetting agent. The stripping agent has the advantages of fast stripping speed, strong stripping capacity, maintained stripping performance at a lower temperature, low corrosiveness to various substrates such as metals, silicon and silicon oxide, good water solubility, easy cleaning and good application prospect in the fields of semiconductor wafer cleaning and the like.

The present invention provides a method for cleaning an object surface, the method having enzyme activity even in cases where an enzyme and a surfactant of a high concentration are used in combination, while exhibiting excellent cleansing properties for dirt adhering to an object surface of a dish or the like and containing a solid fat without being affected by the hardness (for example, 0-20° dH (German degree of hardness)) of water that is used for the cleaning.　The present invention provides a method for cleaning an object surface, wherein a cleaning liquid that is obtained by diluting a liquid detergent composition, which contains water and the component (a), component (b), component (c) and component (e) described below, with water is brought into contact with an object surface. Component (a): a sulfosuccinic acid alkyl ester or a salt thereof Component (b): one or more surfactants that are selected from among semi-polar surfactants and amphoteric surfactants Component (c): a nonionic surfactant Component (e): an enzyme

The need for a liquid hand dishwashing composition which is more environmentally sustainable while also providing a desired viscosity and being readily diluted in cold water, is met by formulating the liquid hand dishwashing detergent composition using alkyl glycol sulfate anionic surfactant and optionally further anionic surfactant in a weight ratio of from 1:1 to 1:0.

The present invention relates to detergents and cleaning compositions comprising an enzyme, an effective amount of a particular type of enzyme enhancer, such as an alkanediol having a carbon chain of 5 to 14 carbon atoms, glyceryl caprylate, 4-hydroxyacetophenone, ethylhexylglycerin, tropolone, or a mixture of the aforementioned enzyme enhancers, and a surfactant, as well as the use of the aforementioned detergents and cleaning compositions for preparing detergents and cleaning products for household, institutional and industrial applications. Furthermore, the present invention relates to a method for treating stained and / or soiled substrates using the enzyme detergents and cleaning compositions according to the present invention. In addition, the present invention relates to the use of certain substances, as defined herein, for enhancing the performance of enzymes in detergents and cleaning compositions and / or for improving the cleaning performance of detergents and cleaning compositions. Finally, the present invention relates to a method for enhancing the enzyme performance in detergents and cleaning compositions and / or improving the cleaning performance in detergents and cleaning compositions by adding an effective amount of a specific enzyme enhancer, for example, an alkanediol having a carbon chain of 5 to 14 carbon atoms, glyceryl caprylate, 4-hydroxyacetophenone, ethylhexylglycerin, tropolone, or a mixture of the aforementioned enzyme enhancers, to the aforementioned detergents and cleaning compositions.

The present invention relates to a composition for removing post-etch residues from a substrate, the substrate comprising a surface of a molybdenum layer, the composition comprising: (a) 10 to 60% by mass of a water-miscible organic solvent; (b) 4 to 15 mass% C1 to C 12 amine (c) 0.5 to 4 mass% C4 to C 16 Quaternary ammonium hydroxide; (d) 0.1 to 5 mass% of C2 to C 10 Polyols; (e) 0.01 to 3% by mass of polyethyleneimine; and (f) water Includes.

To provide a dry cleaning solution that exhibits high cleaning power and is easy to use. [Solution] A dry cleaning solution comprising (A) hydrogen peroxide, (B) a nonionic surfactant, (C) water, and a dry cleaning solvent, wherein when cleaning an object to be cleaned using the dry cleaning solution, the concentration of (A) relative to the mass of the object to be cleaned is 0.01 to 0.72% owf, the concentration of (B) relative to the object to be cleaned is 0.12 to 7.8% owf, and the concentration of (C) relative to the object to be cleaned is 0.3 to 10.8% owf.

The present disclosure relates to multi-purpose cleaning compositions, methods of manufacturing the multi-purpose cleaning compositions, and methods of using the multi-purpose cleaning compositions to clean a surface. Beneficially the multi-purpose cleaning compositions are capable of removing soil and providing antimicrobial activity. The compositions are especially useful on hard surfaces and are preferably low streaking.

The present invention relates to a method for making a soluble unit dose sheet article.

Role of a cleaning textile for cleaning printing cylinders of a printing system, wherein the cleaning textile is impregnated with a cleaning agent composition, the cleaning agent composition comprising an organic solvent and a cellulose solubilizer, wherein the organic solvent is a propylene glycol oligomer, which is di(propylene glycol)propyl ether, and wherein the roller (12) is inserted into a removable sealing bag (15) which is designed to seal the roller (12) of cleaning textile (13) in order to prevent the cleaning agent composition from evaporating before use, wherein the sealing bag (15) is tubular and is made of a multilayer plastic film.

Proposed is a treatment solution that has excellent photoresist releasability and excellent storage stability, particularly storage stability at low temperatures, and that is thus very highly practical. Provided is a treatment solution comprising (A) a quaternary ammonium salt represented by general formula (1), (B) an alkanolamine, and (C) a glycol-based solvent. (1): [NR1R2R3R4]+[OH]- In the formula, R1, R2, R3, and R4 may be the same or different from each other and are each a C1-6 alkyl group, a C7-10 arylalkyl group, or a C6-10 aryl group.

The invention belongs to the technical field of organic fluorine polymer synthesis, and discloses perfluoropolyether with narrow molecular weight distribution and a preparation method and application thereof.The method comprises the steps that in an aprotic polar solvent, phosphazene organic super base and anhydrous hydrogen fluoride or perfluoroalcohol are mixed according to the molar ratio of 1: 0.5-1: 1.5, and a mixture is obtained; forming in situ a non-metallic active initiation complex containing large-volume counter cations; at the temperature of-50 DEG C to 10 DEG C, introducing a hexafluoropropylene oxide monomer into the initiation system, and carrying out anionic ring-opening polymerization until a preset number-average molecular weight is reached; after polymerization, maintaining a liquid phase, directly adding a perfluoroalkyl sulfonate end-capping reagent, and reacting at 20-80 DEG C to convert an active end group into an inert perfluoroalkyl ether end group; and performing post-treatment to obtain the perfluoropolyether product. The invention solves the problems of wide molecular weight distribution, low safety and high equipment cost in the traditional process, and the product is suitable for semiconductor vacuum pump oil and precise electronic cleaning agent, and has obvious industrial application value.

The disclosure provides a cleaning composition, comprising purified water, sodium ionized water, coconut oil, calcium oxide and an alkaline substance. A content of the purified water is greater than 50 wt %. A content of the sodium ionized water is 15 to 25 wt %. A content of the coconut oil is 3 to 7 wt %. A content of the calcium oxide is 0.5 to 2.5 wt %. A content of the alkaline substance is 7 to 13 wt %. The purified water, the sodium ionized water, the coconut oil and the alkaline substance account for less than or equal to 100 wt % of the total weight percentage of the cleaning composition. The disclosure further provides a preparation method of a cleaning composition.

The present invention is in the field of laundry cleaning compositions. In particular, it relates to a stable laundry cleaning composition that provides efficient cleaning in a shorter wash cycle and less amount of water. There is still a need for an improved stable laundry cleaning composition for cleaning laundry loads with ease. It is desired that such composition provides cleaning in a shorter washing cycle with reduced amount of water. It has been found that a poly-oxyethylene sorbitan alkyl ester having specific HLB values along with a solvent mix, an anionic surfactant and an alkoxylated alkanol provides a stable laundry cleaning composition, wherein the composition provides efficient cleaning in a single wash or rinsing cycle. The composition remains stable under various storage conditions.

The application discloses a photoresist degreasing agent composition containing a single-head quaternary phosphonium salt and a preparation method and application thereof. The composition comprises, in parts by weight, 1-5 parts of the single-head quaternary phosphonium salt, 65-75 parts of an organic solvent, 10-15 parts of an organic alcohol amine, 1.5-5 parts of an inhibitor, 0.1-0.5 parts of an antifoaming agent and 1-2 parts of a wetting agent. The degreasing agent has the advantages of fast degumming speed, strong degumming capacity, maintained degumming performance at a lower temperature, low corrosiveness to various substrates such as metals, silicon and silicon oxide, good water solubility, easy cleaning and good application prospect in the fields of semiconductor wafer cleaning and the like.