This application discloses an aqueous stripping solution, its preparation method, and its application, belonging to the field of
photoresist technology. The aqueous stripping solution comprises amines,
alcohol ether solvents, polyols, surfactants, and
metal resists. The amines swell the
photoresist, the
alcohol ether solvents have good permeability, significantly reducing the adhesion between the
photoresist and the substrate, and the surfactants reduce the
surface tension at the photoresist-substrate interface. Combining the amines,
alcohol ether solvents, and surfactants enhances the penetration efficiency of the stripping solution into the photoresist, accelerates the photoresist stripping rate, and thus improves the photoresist stripping effect, thereby increasing product yield. Furthermore, the polyols can form
hydrogen bonds with
hydrogen atoms in water molecules, binding water molecules, reducing water
evaporation, and maintaining high stability of the stripping solution during heating, extending its service life. In addition, the
metal resists reduce damage to the
metal substrate caused by the stripping solution.