811results about How to "Low process temperature" patented technology

A CVD method for forming a silicon nitride film includes exhausting a process chamber (8) that accommodates a target substrate (W), and supplying a silane family gas (HCD) and ammonia gas (NH₃) into the process chamber, thereby forming a silicon nitride film on the target substrate by CVD. Said forming a silicon nitride film on the target substrate alternately includes a first period of performing supply of the silane family gas (HCD) into the process chamber (8), and a second period of stopping supply of the silane family gas.

The invention provides homogeneous small spherical particles of low molecular weight organic molecules, said small spherical particles having a uniform shape, a narrow size distribution and average diameter of 0.01-200 μm. The invention further provides methods of preparation and methods of use of the small spherical particles. These small spherical particles are suitable for applications that require delivery of micron-size or nanosized particles with uniform size and good aerodynamic or flow characteristics. Pulmonary, intravenous, and other means of administration are among the delivery routes that may benefit from these small spherical particles.

A low cost, scalable backplane for black and white or color optical displays comprises a multi-membrane plastic structure on which is printed or deposited row and column drivers to form a matrix of micro electromechanical (MEM) switches. Each switch controls the state of a pixel in the optical display device. Critical to successful long-term operation, the backplane includes the controlled application of voltages to each switch so that the display functions correctly and display life is maximized. The MEM switches include a substantially non-pliable membrane and a substantially flexible membrane both of which include electrodes that when energized will create electrostatic forces that attracts the flexible membrane to the non-pliable membrane. The MEM switches are manufactured in an array with a pitch that provides a sufficient number of switches to drive an optical display device and each switch may be latched to eliminate the need to constantly refresh the device.

Shaped, composite bodies are provided. One portion of the shaped bodies comprises an RPR-derived porous inorganic material, preferably a calcium phosphate. Another portion of the composite bodies is a different solid material, preferably metal, glass, ceramic or polymeric. The shaped bodies are especially suitable for orthopaedic and other surgical use.

A molded structure comprises a decorative film or substrate, and an adjacent injection molded polymeric base comprising a substantially transparent cycloaliphatic polyester resin which may have an opening for exposing the transparent polymeric base resin to the exterior of the molded article, and a process for making the molded structure is described.

An insulating film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas containing a silane family gas, a second process gas containing a nitriding gas or oxynitriding gas, a third process gas containing a boron-containing gas, and a fourth process gas containing a carbon hydride gas. A first step performs supply of the first process gas and a preceding gas, which is one of the third and fourth process gases, while stopping supply of the second process gas and a succeeding gas, which is the other of the third and fourth process gases. A second step performs supply of the succeeding gas, while stopping supply of the second process gas and the preceding gas. A third step performs supply of the second process gas while stopping supply of the first process gas.

Medical devices having at least a component, such as a catheter balloon, stent cover and vascular graft, formed of ultrahigh molecular weight polyolefin, such as ultrahigh molecular weight polyethylene. The device component is formed from ultrahigh molecular weight polyethylene that has been processed so that it is microporous and has an oriented node and fibril structure. The device component expands compliantly at low strains and are substantially less compliant at higher strains. The invention also comprises methods for making such medical devices, including the steps of compacting a polyethylene powder and deforming it to impart the oriented structure.

The present invention is directed to a method of making an inclusion complex comprising an acylated cyclodextrin host molecule and a guest molecule, wherein the method comprises the steps of: a)contacting the acylated cyclodextrin host molecule and the guest molecule to form an inclusion complex; and b) precipitating the inclusion complex in an aqueous medium. The present invention is further directed to an inclusion complex comprising an acylated cyclodextrin host molecule and a guest molecule, wherein the guest molecule comprises from about 2% (wt.) to about 15% (wt.) of the inclusion complex. Moreover, the present invention relates to a composition comprising a polymer and an inclusion complex, wherein the inclusion complex comprises an acylated cyclodextrin host molecule and a guest molecule and medical devices and solid pharmaceutical compositions comprised thereof.

A low cost, scalable backplane for electrophoretic displays comprising a multi-membrane plastic array of micro electromechanical (MEM) switches. Each switch controls the state of a pixel in the electrophoretic display device. Each switch may be latched to eliminate the need to constantly refresh the device and each switch may function as an enunciator

The invention provides antimicrobial compositions comprising one or more acid and one or more organic diol. In one embodiment, the invention's compositions have an acidic pH. The compositions may optionally further contain one or more oxidizing agent (including stabilized oxidizing agent and/or unstabilized oxidizing agent), and/or one or more surfactant. In particular embodiments, the acid lacks one or both of —NH group and —NH₂ group. The invention's compositions are useful in all stages of handling agricultural products, in hospitals, and in commercial and household applications.

The related manufacture method for full-solid photochromic device comprises: with sol-gel method, preparing the transparent conductive layer, the photochromic layer, the ion conductive layer and the ion storage layer in turns; then assembling together. Compared with prior art, this invention is low cost and easy controlled, and fit to large-scale industrial production.

The disclosed subject matter provides a method and structure for obtaining ultra-low surface recombination velocities from highly efficient surface passivation in crystalline silicon substrate-based solar cells by utilizing a bi-layer passivation scheme which also works as an efficient ARC. The bi-layer passivation consists of a first thin layer of wet chemical oxide or a thin hydrogenated amorphous silicon layer. A second layer of amorphous hydrogenated silicon nitride film is deposited on top of the wet chemical oxide or amorphous silicon film. This deposition is then followed by annealing to further enhance the surface passivation.

A transistor which withstands a high voltage and controls large electric power can be provided. A transistor is provided which includes a gate electrode, a gate insulating layer over the gate electrode, an oxide semiconductor layer which is over the gate insulating layer and overlaps with the gate electrode, and a source electrode and a drain electrode which are in contact with the oxide semiconductor layer and whose end portions overlap with the gate electrode. The gate insulating layer includes a first region overlapping with the end portion of the drain electrode and a second region adjacent to the first region. The first region has smaller capacitance than the second region.

A polyamide moulding composition with the following constitution is described:

• (a) from 40 to 90% by weight of a copolyamide, where this is composed of
• (a1) 1,6-hexanediamine and 1,10-decanediamine and also
• (a2) terephthalic acid and at least one other polyamide-forming monomer selected from the group of: dicarboxylic acid having from 8 to 18 carbon atoms, laurolactam, aminolauric acid, and/or mixtures thereof;
• (b) from 10 to 40% by weight of macromolecular plasticizers, with the proviso that these can have been replaced to some extent by low-molecular-weight plasticizers;
• (c) from 0 to 20% by weight of additives and/or added substances.

Uses of this type of moulding composition are also described, in particular for the production of a fuel line, cooling line, oil line or urea line for the automobile sector, as also are production processes to give mouldings.

One aspect of the invention is directed to a balloon catheter with a multilayered polymeric sleeve at the rapid exchange intermediate section, having an outer layer formed of a polymer with a relatively low processing temperature (i.e., melting temperature for semi-crystalline polymers or glass transition temperature for amorphous polymers), and having an inner layer.

This disclosure concerns a process and apparatus for reclamation of waste polystyrene-type materials for reuse within the specification ranges of the input polystyrene-type material. The disclosed process and apparatus include dissolution of the waste polystyrene-type materials in a dissolve section utilizing a reusable solvent having a low boiling point and high vaporization rate, removal of solid contaminants in one or more filter sections, devolatilization of the dissolved polystyrene and recovery of the polystyrene-type material in a solid form in a recovery section. Preferably the process and apparatus provide a closed system and include recycling and reuse in the process of the vaporized solvent. The maximum temperature in the recovery section is 190° C. The reusable solvent is preferably environmentally safe and has a low boiling point and high vaporization rate. n-Propyl bromide, or environmentally safe mixtures thereof, including mixtures with isopropyl alcohol, is the preferred reusable solvent.

Electrically tunable Fabry-Perot interferometers which are produced with micromechanical (MEMS) technology. Producing interferometers with prior art processes includes costly and complicated production phases. Therefore, it has not been possible to apply interferometers in consumer mass products. According to the present solution, the Fabry-Perot cavity is made by removing a sacrificial layer (112) which has been polymer material. A mirror layer (113, 117-120) which is produced above the sacrificial layer can be made with atomic layer deposition technology, for example. According to a preferable embodiment, electrodes (106b, 115b) of the mirror structures are formed by using sputtering or evaporation. With the present solution it is possible to avoid the above mentioned problems related with prior art.

The invention relates to a nucleating agent and a method for preparing the nucleating agent, wherein the nucleating agent is used for reducing the dimension of the foaming hole and improving the density of the foaming hole when a supercritical fluid foaming agent (such as carbon dioxide or nitrogen) is used for producing thermoplastic foaming products. The raw materials of the nucleating agent mainly consists of an organic montmorillonite, a thermoplastic resin and a supercritical fluid foaming agent; the specific weight of the nucleating agent master batches is controlled within 100+/-5% of that of the thermoplastic resin. The method has the advantages that a supercritical fluid foaming method is adopted to prepare the nucleating agent master batches which have approximate specific weights to the resin material adopted by the subsequent foam forming, thus facilitating the subsequent injection foam forming and extrusion foam forming; and the carbon dioxide or nitrogen in supercritical state is used for reducing the viscosity of the carrier resin during the mixing process, the dispersion uniformity of the peeled sandwich montmorillonite in the carrier resin is reinforced, the process temperature is reduced, the layer spacing of the sandwich nano-montmorillonite which may be not peeled is increased and the sufficient peeling is realized.

The invention discloses a processing method of a differential type high-precision accelerometer. The accelerometer comprises an upper electrode cover plate, a movable silicon structural assembly with a beam-mass block structure and a lower electrode cover plate which are sequentially connected from top to bottom. The method comprises the following steps of: processing the upper electrode plate and the lower electrode plate by using a glass sheet or a monocrystalline silicon wafer as a substrate; processing the movable silicon structural assembly with the beam-mass block structure by using a double-device-layer SOI (Silicon-On-Insulator) monocrystalline silicon wafer as a substrate; and connecting the upper electrode plate and the lower electrode plate which are processed by using the substrates with the movable silicon structural assembly based on a bonding mode. In the invention, only one monocrystalline silicon wafer is adopted to process the movable silicon structural assembly, thereby avoiding the condition that a frequently used high-temperature silicon-silicon bonding process is used for preparing the movable silicon structural assembly, reducing the process difficulty, lowering the highest process temperature and eliminating bonding stress problems introduced by silicon-silicon bonding; and moreover, the beam-mass block structure has generality.

Disclosed is a method of forming a silicon nitride film which can form a silicon nitride film having a high film stress at a low process temperature. The method includes the steps of (a) supplying dichlorosilane into a reaction chamber containing a process object, thereby allowing chemical species originated from dichlorosilane as a precursor to be adsorbed on the process object; (b) hydrogenating chlorine contained in the chemical species, thereby removing the chlorine from the chemical species; and (c) supplying ammonia radicals into the reaction chamber, thereby nitriding the chemical species, from which the chlorine has been removed, by the ammonia radicals to, deposit resultant silicon nitride on the process object, wherein the steps (a), (b) and (c) are performed repeatedly for plural times in that order, thereby a silicon nitride film of a desired thickness is formed on a semiconductor wafer.