123 results about "Hydrofluorocarbon" patented technology

A method for cooling an information technology system, comprising: receiving a flow of at least a subcooled liquid phase change refrigerant; cooling the information technology system by sensible heat transfer in an evaporator, to produce at least gaseous refrigerant; and exchanging heat from the at least gaseous refrigerant from the evaporator to the subcooled liquid phase change refrigerant. The phase change refrigerant may be a hydrofluorocarbon ether having a boiling point of 30-65° C. at 1-12 bar.

A method for forming a high aspect ratio (HAR) structure during a HAR etch process, the method comprises sequentially or simultaneously exposing the substrate to a vapor of an etchant including one or more hydrofluorocarbon or fluorocarbon compounds or one or more hydrogen-containing molecules and an additive compound, the substrate having a film disposed thereon and a patterned mask layer disposed on the film; activating a plasma to produce activated one or more hydrofluorocarbon or fluorocarbon compounds or activated one or more hydrogen-containing molecules and an activated additive compound; and allowing an etching reaction to proceed between the film uncovered by the patterned mask layer and the activated hydrofluorocarbon or fluorocarbon compounds or the activated one or more hydrogen-containing molecules and the activated additive compound to selectively etch the film from the patterned mask layer, thereby forming the HAR patterned structure.

The invention discloses a triphenyl phosphate standard substance structure identification method, and relates to the technical field of fluorine-containing gas emission reduction, and the method comprises the following steps: obtaining a standardized analysis sample through fluorine-containing matrix separation, target substance enrichment and solvation treatment; a multi-dimensional chromatographic system and a heart cutting technology are adopted, and temperature programming optimization is combined to realize separation and purification of a sample; carrying out multi-dimensional structure analysis and confirmation by using gas chromatography-mass spectrometry, infrared spectroscopy and nuclear magnetic resonance technologies; a five-stage progressive identification algorithm is constructed, and systematic identification is realized by combining a confidence evaluation system and a fluorine-containing interference correction technology; establishing a structural integrity verification and purity quantitative evaluation standard, and outputting a standardized identification report; a method applicability database is established through multi-type fluorine-containing environment verification and process condition adaptability testing. The method effectively solves the problem of accurate identification of triphenyl phosphate in a complex fluorine-containing matrix, and realizes effective removal of interference components such as light gas, hydrofluorocarbon, perfluorinated compounds and the like.

The invention provides an LNG receiving station cold energy power generation system and method. The method comprises the steps that a first heat exchanger conducts heat exchange on liquid-phase LNG and a gaseous working medium; the second heat exchanger is used for carrying out heat exchange on the first gas-phase LNG and a low-grade heat source; the working medium circulating pump pressurizes the liquid working medium to obtain the pressurized liquid working medium; the third heat exchanger performs heat exchange on the pressurized liquid working medium and the low-grade heat source subjected to primary heat exchange to obtain a pressurized gaseous working medium; the expansion generator set uses the pressurized gaseous working medium to generate power; and the liquid working medium is a hydrofluorocarbon refrigerant. In this way, cold energy power generation can be achieved through a single circulation system without a complex technological process, and cost is low; as the working medium does not contain alkane elements, a corresponding auxiliary gas treatment system does not need to be arranged, and the cost is reduced; due to the good thermodynamic property of the hydrofluorocarbon refrigerant, the power generation efficiency of each ton of LNG cold energy is improved by 10%, and the power generation efficiency is ensured.

Disclosed are novel electrolytes, and techniques for making and devices using such electrolytes, which are based on compressed gas solvents. Unlike conventional electrolytes, disclosed electrolytes are based on “compressed gas solvents” mixed with various salts, referred to as “compressed gas electrolytes.” Various embodiments of a compressed gas solvent include a material that is in a gas phase and has a vapor pressure above an atmospheric pressure at room temperature. The disclosed compressed gas electrolytes can have wide electrochemical potential windows, high conductivity, low temperature capability and / or high pressure solvent properties. Examples of a class of compressed gases that can be used as solvent for electrolytes include hydrofluorocarbons, in particular fluoromethane, difluoromethane, tetrafluoroethane, and pentafluoroethane. Also disclosed are battery and supercapacitor structures that use compressed gas solvent-based electrolytes and techniques for constructing such energy storage devices. Techniques for electroplating difficult-to-deposit materials using compressed gas electrolytes as an electroplating bath are also disclosed.

To provide a novel composition suitable for use as an insulating medium or a refrigerant.SOLUTION: A composition comprises hexafluoroazomethane and at least one substance selected from the group consisting of hydrofluorocarbons, hydrofluoroolefins, hydrochlorofluoroolefins, chlorofluoroolefins, perfluoroolefins, nitrogen, oxygen, and carbon dioxide.SELECTED DRAWING: None

Mixtures configured to etch a thin film of an integrated circuit material are disclosed. The mixtures may include a first compound comprising one or more of: A, B, and C; and a second compound comprising one or more of: oxygen, argon, helium, nitrogen, octafluorocyclobutane (C4F8), hexafluorobutadiene (C4F6), carbonyl fluoride (COF2), difluoromethane (CH2F2), trifluoromethane (CHF3), carbon tetrafluoride (CF4), methyl fluoride (CH3F), octafluorocyclopentene (C5F8), 2,3,3,3-tetrafluoropro-l-ene (C3H2F4), 2,3,3,3-tetrafluoropro-l-ene (C3H2F4), hexafluoropropene (C3F6), hexafluorocyclopropane (C3F6), or 1,1,3,3,3-pentafhioropropene (C3HF5).

To provide a method capable of separating a monofunctional species, bifunctional species, etc. of a fluorinated ether compound having a polyfluoropolyether chain and a predetermined functional group in good yield and with high separation performance.A separation method for separating a compound represented by the formula (1) and a compound represented by the formula (2) from a mixture containing them by chromatography using a stationary phase and a mobile phase, wherein the mobile phase contains at least one type of specific solvent selected from a hydrofluoroolefin, a hydrochlorofluoroolefin, a chlorofluoroolefin, a cyclic hydrofluoroolefin, a cyclic hydrochlorofluoroolefin, a cyclic chlorofluoroolefin, a cyclic hydrofluorocarbon, a cyclic hydrochlorofluorocarbon, a cyclic chlorofluorocarbon and a perfluoroketone:A-(OX)m—O—Z—(R)n1  Formula (1)(R)n2—Z—(OX)m—O—Z—(R)n3  Formula (2)

This invention provides a plasma treatment method capable of forming a deposited film on the walls of a processing chamber and suppressing the diffusion of contaminants into a transport system. The plasma treatment method for plasma treating samples placed on a sample stage within a processing chamber includes: a first step of removing deposits in the processing chamber using plasma; a second step of depositing deposits in the processing chamber using a mixture of hydrofluorocarbon gas and argon (Ar) gas after the first step; a third step of selectively removing deposits from the sample stage using a mixture of oxygen (O2) gas and argon (Ar) gas after the second step; and a fourth step of plasma treating a predetermined number of samples after the third step.

This invention provides an etching method using silicon-containing hydrofluorocarbon. [Solution] The plasma dry etching method is based on the general formula: C x H y F z Si n (I) An etching gas mixture containing a compound having (1≦x≦6, 1≦y≦9, 1≦z≦15, n=1 or 2) is used, wherein the compound contains one or more methyl groups, and at least one methyl group is bonded to a Si atom. This method includes HAR dry etching processes, selective dry etching processes, and cyclic selective dry etching processes.

The invention relates to (i) a spinning fluid for flash spinning polyvinylidene fluoride (PVDF) or polyvinylidene fluoride blends from a spin dope comprising dichloromethane and a cyclic hydrofluorocarbon, and (ii) a method for producing a plexifibril of PVDF or PVDF blends using the spinning fluid.

The present invention relates to a process for the purification of a fluorocarbon from a mixture comprising said fluorocarbon and hydrogen, said process comprising a stage of bringing said mixture into contact with a membrane M1 to form a stream F1 comprising the fluorocarbon and a stream F2 comprising the hydrogen. The present invention also relates to a process for the production of trifluoroethylene. The present invention also relates to a process for the separation of a hydrofluoroolefin or of a hydrofluoroalkane from nitrogen by membrane separation. The present invention also relates to a process for the separation of trifluoroethylene from chlorotrifluoroethylene or from a hydrofluorocarbon.

An instrument-grade, blended hydrocarbon refrigerant gas that can be utilized in both existing air conditioning systems and that is suitable for air conditioning systems in hybrid vehicles and EV's. The instrument-grade blended hydrocarbon refrigerant gas is a mix of propane and butane, either iso-butane or n-butane, at a selected ratio and serves as an environmentally friendly substitute for hydrofluoro refrigerant gases such as hydrofluorocarbon refrigerant gas and hydrofluoro-olefin refrigerant gas.

Disclosed is a method for forming a high aspect ratio (HAR) structure in a substrate during a HAR etch process in a reaction chamber, the method comprising: sequentially or simultaneously exposing the substrate to a vapor of an etchant comprising a hydrofluorocarbon or fluorocarbon and an additive compound, the substrate is provided with a film arranged on the substrate and a patterned mask layer arranged on the film; activating the plasma to produce an activated hydrofluorocarbon or fluorocarbon and an activated additive compound; and allowing an etch reaction between the film uncovered by the patterned mask layer and the activated hydrofluorocarbon or fluorocarbon and the activated additive compound to selectively etch the film from the patterned mask layer, thereby forming a HAR patterned structure.

The present invention provides a method for producing a fluoropolymer, characterized in that the method comprises a step of producing a fluoropolymer by polymerizing a fluoromonomer containing tetrafluoroethylene, in a solution containing perfluorodiacyl peroxide and a fluorosolvent, by continuously adding the tetrafluoroethylene into a reaction vessel; the polymerization is suspension polymerization; the perfluorodiacyl peroxide is represented by the following formula (1); the fluorosolvent is at least one selected from the group consisting of perfluorocarbons, hydrofluorocarbons, and fluorine-containing ethers; the content of the perfluorodiacyl peroxide in the solution is 5 to 30 mass% relative to the total liquid; and the fluoropolymer has a polymerization unit based on tetrafluoroethylene.(C5F 11 COO)2(1), wherein the C5F 11 group is linear.

To provide a method for forming a high-aspect-ratio (HAR) structure during HAR etching processing to a substrate in a reaction chamber.SOLUTION: A method contains steps of: sequentially or simultaneously exposing a substrate to vapor of an etchant containing a hydrofluorocarbon or a fluorocarbon compound and an additive agent compound; providing a film to which the substrate is arranged thereon, and a patterned mask layer which is arranged onto the film; generating the hydrofluorocarbon or the fluorocarbon compound to be activated and the additive agent compound to be activated by activating a plasma; selectively etching the film from the patterned mask layer by progressing an etching reaction between a film that is not coated with the patterned mask layer and the activated hydrofluorocarbon or the fluorocarbon compound and the activated additive agent compound; and forming a high-aspect-ratio (HAR) patterned structure.SELECTED DRAWING: None

The present invention relates to a process for the purification of a fluorocarbon from a mixture comprising said fluorocarbon and hydrogen, said process comprising a stage of bringing said mixture into contact with a membrane M1 to form a stream F1 comprising the fluorocarbon and a stream F2 comprising the hydrogen. The present invention also relates to a process for the production of trifluoroethylene. The present invention also relates to a process for the separation of a hydrofluoroolefin or of a hydrofluoroalkane from nitrogen by membrane separation. The present invention also relates to a process for the separation of trifluoroethylene from chlorotrifluoroethylene or from a hydrofluorocarbon.

Disclosed are methods for forming a high aspect ratio (HAR) structure during a HAR etch process in a substrate in a reaction chamber, the method comprising:sequentially or simultaneously exposing the substrate to a vapor of an etchant including a hydrofluorocarbon or fluorocarbon compound and an additive compound, the substrate having a film disposed thereon and a patterned mask layer disposed on the film;activating a plasma to produce an activated hydrofluorocarbon or fluorocarbon compound and an activated additive compound; andallowing an etching reaction to proceed between the film uncovered by the patterned mask layer and the activated hydrofluorocarbon or fluorocarbon compound and the activated additive compound to selectively etch the film from the patterned mask layer, thereby forming the HAR patterned structure.

Disclosed are a method for controlling heating of an HVAC system for an electric vehicle and an HVAC system thereof. According to various embodiments, in an operation of the HVAC system including a main heating unit in which a first refrigerant circulates and an auxiliary heating unit in which a second refrigerant circulates, at least one of the first refrigerant and the second refrigerant may comprise at least one of: a natural refrigerant; a hydrofluorocarbon (HFC)-based refrigerant; a hydrofluoroolefin (HFO)-based refrigerant; a hydrochlorofluorocarbon (HCFC)-based refrigerant; a hydrocarbon-based refrigerant that is not a natural refrigerant; and a halon or a perfluorocarbon (PFC)-based refrigerant.

The present invention relates to (i) a spin fluid for flash spinning a polyvinylidene fluoride (PVDF) or polyvinylidene fluoride blends from a spin agent comprising dichloromethane and a cyclic hydrofluorocarbon, and (ii) to a process for the preparation of plexifilamentary fibrils of PVDF or PVDF blends using the spin fluid.

This invention provides a method and system for preparing trifluoropyruvate esters using a centrifugal method, relating to the field of organofluorine chemical synthesis technology. The centrifugal method for preparing trifluoropyruvate esters includes: circulating and spraying an alcohol-ether solution containing an aldehyde compound and a catalyst in a centrifugal reactor, and introducing hexafluoropropylene oxide to catalyze the reaction between the aldehyde compound and hexafluoropropylene oxide, yielding a reaction product; separating the reaction product into gas and liquid phases, and separating the gas phase product by distillation to obtain trifluoropyruvyl fluoride and hydrofluorocarbons; and esterifying the trifluoropyruvyl fluoride and alcohol in a microchannel reactor to obtain trifluoropyruvate esters. The centrifugal method for preparing trifluoropyruvate esters described in this invention has advantages such as simple and readily available raw materials, mild reaction conditions, and high conversion and yield.

The present invention relates to a process for preparing a refrigerant blend containing one or more purified hydrofluorocarbon compounds. [Solution] One or more hydrofluorocarbon compounds are recovered and purified from one or more refrigeration, air conditioning, or heat pump systems.

A sprayable aerosol adhesive formulation, the sprayable aerosol adhesive formulation comprising, based on the total weight of the sprayable aerosol adhesive formulation: 1) A bulk adhesive formulation comprising: a) 10-80 wt%, preferably 10-65 wt%, more preferably 10-40 wt%, most preferably 15-35 wt% of silyl modified polymer compounds; b) 0.5-5 wt%, preferably 0.8-3.5 wt% of at least one adhesion promoter; c) 0.5-5 wt%, preferably 0.8-3.5 wt% of at least one dehydrating agent; d) optionally 0-30 wt%, preferably 5-25 wt% of at least one plasticizer compound; e) optionally 0-60 wt% preferably 15-55 wt% and more preferably 30-50 wt% of at least one filler, f) optionally 0-20 wt%, preferably 1-15 wt% and even more preferably 2-10 wt% of at least one non-reactive diluent, and 2) A propellant comprising at least 70 wt% of a dimethyl ether propellant and optionally further comprising up to 30 wt% of butane, propane, isobutane, hydrofluorocarbon (HFC), hydrofluoro- oleofin (HFO),dry air, nitrogen or a combination based on the total weight of the propellant wherein based on the total weight of all silyl modified polymer compounds in the formulation, 80-100 wt%, preferably 90-100 wt% of the silyl modified polymer compounds have a viscosity in the range of 0,2 Pa.s to 8 Pa.s, preferably in the range of 0,4 Pa.s to 8 Pa.s, more preferably between 0.4 Pa.s and 5 Pa.s, and wherein the bulk adhesive formulation has a viscosity in the range of 0.1 Pa.s to 8 Pa.s, preferably 1 Pa.s to 7 Pa.s, more preferably in the range of 1.5 Pa.s to-6 Pa.s (the viscosity measured according to ISO 3219-2 in a plate – plate configuration at 200 micron gap after 24 hours at a shear rate of 10 s-1 and at room temperature), and wherein the bulk adhesive formulation comprises 2-10 wt% of at least one non-reactive diluent in case the bulk adhesive formulation comprises ≥ 15 wt% of at least one filler, and wherein at least 50 wt% of the silyl modified polymer compounds are silyl modified polyether compounds based on the total weight of all silyl modified polymer compounds in the bulk adhesive formulation, and wherein the weight ratio of the bulk adhesive formulation to propellant is between 40:60 to 90:10.

Provided is a method capable of separating 1-functional and 2-functional fluorine-containing ether compounds having a polyfluoropolyether chain and a prescribed functional group with good yield and high separation capacity. A separation method is a separation method for separating a compound represented by formula (1) and a compound represented by formula (2) from a mixture containing them using a chromatograph using a stationary phase and a mobile phase, wherein the mobile phase contains at least one specific solvent selected from the group consisting of hydrofluoroolefins, hydrochlorofluoroolefins, chlorofluoroolefins, cyclic hydrofluoroolefins, cyclic hydrochlorofluoroolefins, cyclic chlorofluoroolefins, cyclic hydrofluorocarbons, cyclic hydrochlorofluorocarbons, cyclic chlorofluorocarbons, and perfluoroketones.A‑(OX) m ‑O‑Z‑(R) n1 Formula (1) (R) n2 ‑Z‑(OX) m ‑O‑Z‑(R) n3 Formula (2)

A cryogenic etching method for forming an aperture comprises mounting the substrate in a reaction chamber, cooling the substrate to a temperature below 25°C, introducing an etching gas having general formulae Y3-CO-X, Y-(C=O)-X, R1-CO-X, R'-CO-R", R'-(C=O)-O-(C=O)-R", and COF-CxFyHz-COF wherein X and Y each is a halogen selected from F, Cl, Br, I; R1 is a fluorocarbon, hydrofluorocarbon, or hydrocarbon; R' and R" each is a fluorocarbon, hydrofluorocarbon, bromocarbon, hydrobromocarbon, chlorocarbon, hydrochlorocarbonor hydrocarbon, iodocarbon, hydroiodocarbon, into the reaction chamber; and x, y and z are integers, into the reaction chamber, converting the etching gas to a plasma, and allowing an etching reaction to proceed between the plasma and the one or more silicon-containing films so that the one or more silicon-containing films are selectively etched versus the patterned mask layer to form the aperture.

This application relates to the field of refrigeration systems, disclosing a refrigeration oil, a working fluid composition for refrigeration machines, and a refrigeration system. By adding a specific type of surfactant, this application significantly reduces the surface tension of the refrigeration oil, improves its compatibility with refrigerants such as hydrofluorocarbons, and reduces oil film formation or oil residue in the refrigeration system. The refrigeration oil described in this application has suitable viscosity and solubility viscosity, meeting the normal operating requirements of the compressor, while also effectively inhibiting the formation of oil film on the heat exchanger surface, thereby improving heat exchange efficiency. Furthermore, this refrigeration oil has good lubricity, low-temperature fluidity, and thermochemical stability, which can promote the circulation of the refrigeration oil in the refrigeration system pipeline, improve oil return efficiency, and extend the compressor's service life.

A method for selective plasma etching of silicon oxide relative to silicon nitride is described. The method includes providing a substrate containing a silicon oxide film and a silicon nitride film, and selectively etching the silicon oxide film relative to the silicon nitride film by: a1) exposing the substrate to a plasma-excited passivation gas containing carbon, sulfur, or both carbon and sulfur, wherein the plasma-excited passivation gas is free of fluorine or hydrogen, and b1) exposing the substrate to a plasma-excited etching gas containing a fluorine-containing gas. The method can further include an additional step a2) between a1) and b1): exposing the substrate to a plasma-excited additional passivation gas containing a fluorocarbon gas, a hydrofluorocarbon gas, a hydrochlorocarbon gas, a hydrochlorofluorocarbon gas, or a hydrocarbon gas or a combination thereof.

This method of producing a hydrofluoroolefin includes contacting a mixture including a hydrofluorocarbon and at least one selected from the group consisting of CXA1XA2═CXA3XA4, CXA5≡CXA6, and CXA7XA8XA9—CXA10XA11XA12 with a catalyst, and obtaining the hydrofluoroolefin by a dehydrofluorination reaction of the hydrofluorocarbon, each of XA1 to XA12 independently represents a hydrogen atom, a fluorine atom, a chlorine atom, or a hydrocarbon chain having 1 to 8 carbon atoms, at least one of XA1 to XA4 has at least one of a hydrogen atom or a chlorine atom, at least one of XA5 or XA6 has at least one of a hydrogen atom or a chlorine atom, and at least one of XA7 to XA12 has a halogen atom other than a fluorine atom.

Provided is a separation method with which a halogenated unsaturated hydrocarbon and a halogenated saturated hydrocarbon can be separated well.　In this separation method, an adsorbent and a composition containing a halogenated unsaturated hydrocarbon and a halogenated saturated hydrocarbon are brought into contact, the halogenated unsaturated hydrocarbon or the halogenated saturated hydrocarbon is selectively made to adsorb to the adsorbent, and the halogenated unsaturated hydrocarbon and the halogenated saturated hydrocarbon are separated. The halogenated unsaturated hydrocarbon is at least one type of halogenated unsaturated hydrocarbon selected from the group consisting of hydrofluoroolefins and hydrochlorofluoroolefins, the halogenated saturated hydrocarbon is at least one type of halogenated saturated hydrocarbon selected from the group consisting of hydrofluorocarbons and hydrochlorofluorocarbons, and the adsorbent is at least one type of adsorbent selected from [Fe2(O2)(dobdc)], [Co(AIN)2], and Co-gallate.

This invention provides an etching method using silicon-containing hydrofluorocarbon. [Solution] The plasma dry etching method is based on the general formula: C x H y F z Si n (I) An etching gas mixture containing a compound having (1≦x≦6, 1≦y≦9, 1≦z≦15, n=1 or 2) is used, wherein the compound contains one or more methyl groups, and at least one methyl group is bonded to a Si atom. This method includes HAR dry etching processes, selective dry etching processes, and cyclic selective dry etching processes.