Disclosed in the present application is a
hydrofluoric acid regeneration method for photovoltaic waste acid. The method comprises the following steps: S1, light component removal, involving: introducing a liquid containing
hydrofluoric acid to be treated into a light component removal
tower, wherein the
tower bottom temperature of the light component removal
tower is 100-105°C, and the tower top temperature is 70-80°C, subjecting the liquid to be treated to a light component removal treatment by means of the light component removal tower, discharging the
water vapor, which is generated by means of light component removal, via the tower top of the light component removal tower, discharging the generated light component removal liquid, which is generated by means of light component removal, via the tower bottom of the light component removal tower, and introducing same into a first rectification tower; and S2, rectification, involving: the tower bottom temperature of the first rectification tower being 110-115°C, and the tower top temperature being 98-105°C, rectifying the generated light component removal liquid by means of the first rectification tower, discharging HF and
water vapor, which are generated by means of rectification, via the tower top of the first rectification tower, condensing same to form
hydrofluoric acid, and discharging the distillate, which is generated by means of rectification, via the tower bottom of the first rectification tower. By means of the present application, hydrofluoric acid in the hydrofluoric acid waste liquid can be recycled, and compared with the prior art, the situation where
fluorine resources are wasted is effectively avoided.