779 results about "Compounds of fluorine" patented technology

This invention relates to an improved process for the selective etching of TiN from silicon dioxide (quartz) and SiN surfaces commonly found in semiconductor deposition chambers equipment and tools. In the process, an SiO₂ or SiN surface having TiN thereon is contacted with XeF₂ in a contact zone to selectively convert the TiN to a volatile species and then the volatile species is removed from the contact zone. XeF₂ can be preformed or formed in situ by reaction between Xe and a fluorine compound.

Disclosed is a surface treating agent for metallic materials that has various properties such as corrosion resistance and overcoating properties and, when used in coating-type surface treatment, particularly can form a film , which has excellent adhesion to the surface of metallic materials, and can fix, within the film, a component capable of functioning as a corrosion inhibitor for metallic materials. The surface treating agent for metallic materials comprises a silicic acid compound (A), an organoalkoxysilane (B), a metallic compound (C) containing at least one metal element selected from the group consisting of Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, and Zn, at least one compound (D) selected from the group consisting of phosphoric acid compounds and fluoro compounds, water (E), and an alcohol (F) produced upon hydrolysis of the organoalkoxysilan (B). The molar concentration (mol/L) of the alcohol (F) in the treating agent has been regulated in a predetermined range.

A resin composition for a mold used in forming micropatterns comprises (A) 40 to 90 parts by weight of an active energy curable urethane-based oligomer having a reactive group; (B) 10 to 60 parts by weight of a monomer reactive with the urethane-based oligomer, (C) 0.01 to 200 parts by weight of a silicone or fluorine containing compound, based on 100 parts of the sum of the components (A) and (B); and (D) 0.1 to 10 parts by weight of a photoinitiator, based on 100 parts of the sum of the components (A), (B) and (C). The inventive resin composition can be easily cured by the action of an active energy ray, and the organic mold fabricated therefrom is easily lifted off from a master without irreversible adhesion or generation of defects and have excellent dimensional and chemical stabilities.

Oxides such as those commonly used in interlevel dielectrics may be removed employing a liquid composition containing a fluoride-containing compound and an organic solvent. Preferred compositions are substantially nonaqueous and include an anhydride. Improved methods for selective removal of oxides, especially for removal of silicon oxides where pre-exposed (or conductive metal - containing) features are present, where metal (conductive metal - contaimg) features are to be exposed by the desired oxide removal, or where the silcon oxide otherwise contacts metal (or conductive metal - containing) features are provided.

A magnet comprising grains of a ferromagnetic material whose main component is iron and a fluorine compound layer or an oxy-fluorine compound layer of fluoride compound particles of alkali metals, alkaline earth metals and rare earth elements, present on the surface of the ferromagnetic material grains, wherein an amount of iron atoms in the fluorine compound particles is 1 to 50 atomic %.

The polymer for cosmetics produced by polymerizing (A) a fluorine-containing (meth)acrylate, and (B) at least one silicon-containing polymerizable compound selected from the group consisting of a mercapto-modified silicone, an azo group-containing silicone and a polymerizable silane can be blended easily in cosmetic preparations and can form a film excellent in a water proofing property, a water- and oil-repellency, feelings in use and safety. This copolymer for cosmetics can improve the drawbacks of fluorine compound-treated powders.

A slurry for use in chemical mechanical polishing (CMP) of a metal layer. The CMP slurry includes an abrasive, a plurality of oxidizing agents, a stabilizer including an organic acid having a carboxyl group, a corrosion inhibitor which suppresses corrosion of a metal, a fluorine compound which reduces a difference in removal rates of a metal layer and a barrier layer, and deionized water. The plurality of oxidizing agents include a second oxidizing agent which oxidizes the metal and a first oxidizing agent which restores an oxidizing ability of the second oxidizing agent.

One method includes applying to a post-manufactured textile material a liquid composition resulting from a combination of ingredients. The ingredients include one or more anti-fading compounds, one or more anti-soiling compounds, one or more silicon-based compounds, and one or more carrying media. One composition is a liquid composition resulting from a combination of ingredients, with the ingredients including a benzotriazole, a fluorocarbon, an organosiloxane, and odorless mineral spirits.

A surface treatment agent, which contains: (A) a hydrolyzable metal alkoxide or a hydrolyzate thereof, (B) a fluorocompound containing a perfluoroalkyl group and a functional group reactive with the hydrolyzable metal alkoxide (A), and (C) an adhesion improvement agent, can provide a film having transparency and durability while maintaining excellent soil releasability and low refractive index.

A cored electrode to form a weld bead with little or no gas tracking. The cored electrode includes a metal sheath and a fill composition. The filling composition includes a slag forming agent and at least one fluorine containing compound.

Fluoroalcohol compounds of formula (4) are prepared by reacting a fluorine compound of formula (1) with reducing agents or organometallic reagents of formulas (2) and (3) wherein R¹ is H or a monovalent C₁-C₂₀ hydrocarbon group in which any —CH₂— moiety may be replaced by —O— or —C(═O)—, R² is H or a monovalent C₁-C₆ hydrocarbon group, R³ and R⁴ are H or a monovalent C₁-C₈ hydrocarbon group, and M¹ is Li, Na, K, Mg, Zn, Al, B, or Si. From the fluoroalcohol compounds, fluorinated monomers can be produced in a simple and economic way, which are useful in producing polymers for the formulation of radiation-sensitive resist compositions.

To provide a fluorinated compound, which can readily form a thin film having a hydrophobic/hydrophilic pattern, by employing an ultraviolet light having a relatively low energy.

A thin film having a hydrophobic/hydrophilic pattern is formed by irradiating a thin film formed by employing a fluorinated compound represented by the following formula 1 (in the formula 1, each of R¹, R², R³ and R⁴ which are independent of one another, is a hydrogen atom, a halogen atom or a monovalent organic group, provided that at least one of them is a monovalent organic group having fluorine atoms, and R⁵ is a hydrogen atom or a monovalent organic group, R⁶ is a monovalent organic group, and A is a hetero atom) with ultraviolet light.

A resist composition for immersion exposure including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon irradiation, and a fluorine-containing compound (C) having a group represented by general formula (c) shown below and containing at least one fluorine atom:

wherein Q represents a group in which one hydrogen atom has been removed from a monovalent hydrophilic group; and R¹ represents a hydrocarbon group of 2 or more carbon atoms which may have a fluorine atom.

The present invention provides a positive active material for a secondary lithium battery, a method of preparing the positive active material, and a secondary lithium battery including the positive active material, wherein the positive active material includes a lithium metal composite oxide core represented by the following Chemical Formula 1, and a coating layer including a fluorine compound and positioned at a shell of the lithium metal composite oxide core.

Li_wNi_xCo_yMn_1-x-y-zM_zO₂  [Chemical Formula 1]

(1.2≦w≦1.5, 0<x<1, 0≦y<1, 0.5≦1-x-y-z, and M is at least one metal selected from the group consisting of Al, Mg, Fe, Cu, Zn, Cr, Ag, Ca, Na, K, In, Ga, Ge, V, Mo, Nb, Si, Ti, and Zr).

A process for producing a bis(fluorosulfonyl)imide anion compound by substituting a bis(chlorosulfonyl)imide anion compound, obtained from sulfamic acid, chlorosulfonic acid, and a halogenating agent, with fluorine is used as a process for producing a fluorine compound for use, for example, in the synthesis of battery electrolytes and ionic liquids. According to the above process, the inclusion of impurities can be reduced, and a high-purity fluorine compound of a bis(fluorosulfonyl)imide compound can be efficiently produced at a high yield. A base catalyst can be used in the reaction for substituting the bis(chlorosulfonyl)imide anion with fluorine. The base catalyst is preferably a nitrogen-containing compound.

A polymerizable fluorinated compound having formula (2a) or (2b) wherein R¹ and R² are H or C₁-C₂₀ alkyl or fluoroalkyl, R³ is H, F or C₁-C₄ alkyl or fluoroalkyl, and R is H or a protective group is polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light of wavelength≦300 nm, alkali development amenability, and dry etch resistance.

A step (1) of heating a fluoronickel compound to release a fluorine gas, a step (2) of allowing a fluorine gas to be occluded into a fluorinated compound, and a step (3) of heating the fluoronickel compound and reducing an inner pressure are conducted in a container, respectively, at least once, and thereafter a high-purity fluorine gas is obtained in the step (1). Also, a step (5) of heating a fluoronickel compound and reducing an inner pressure and a step (6) of allowing a fluorine gas reduced in a hydrogen fluoride content to be occluded into the fluoronickel compound are conducted in a container having a fluorinated layer formed on its surface, respectively, at least once, the step (5) is further conducted, and thereafter a fluorine gas containing impurity gases is contacted with the fluoronickel compound to fix and remove the fluorine gas, and the impurities are analyzed by gas chromatography.