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268 results about "Inorganic fluorine compounds" patented technology

Molecules containing fluorine may also exhibit hydrogen bonding (a weaker bridging link to certain nonmetals). Fluorine's chemistry includes inorganic compounds formed with hydrogen, metals, nonmetals, and even noble gases; as well as a diverse set of organic compounds.

Techniques for forming shallow junctions

Techniques for forming shallow junctions are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for forming shallow junctions. The method may comprise generating an ion beam comprising molecular ions based on one or more materials selected from a group consisting of: digermane (Ge2H6), germanium nitride (Ge3N4), germanium-fluorine compounds (GFn, wherein n=1, 2, or 3), and other germanium-containing compounds. The method may also comprise causing the ion beam to impact a semiconductor wafer.
Owner:VARIAN SEMICON EQUIP ASSOC INC

Surface treating agent for metallic materials

Disclosed is a surface treating agent for metallic materials that has various properties such as corrosion resistance and overcoating properties and, when used in coating-type surface treatment, particularly can form a film , which has excellent adhesion to the surface of metallic materials, and can fix, within the film, a component capable of functioning as a corrosion inhibitor for metallic materials. The surface treating agent for metallic materials comprises a silicic acid compound (A), an organoalkoxysilane (B), a metallic compound (C) containing at least one metal element selected from the group consisting of Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, and Zn, at least one compound (D) selected from the group consisting of phosphoric acid compounds and fluoro compounds, water (E), and an alcohol (F) produced upon hydrolysis of the organoalkoxysilan (B). The molar concentration (mol / L) of the alcohol (F) in the treating agent has been regulated in a predetermined range.
Owner:NIHON PARKERIZING

High resistance magnet and motor using the same

A magnet comprising grains of a ferromagnetic material whose main component is iron and a fluorine compound layer or an oxy-fluorine compound layer of fluoride compound particles of alkali metals, alkaline earth metals and rare earth elements, present on the surface of the ferromagnetic material grains, wherein an amount of iron atoms in the fluorine compound particles is 1 to 50 atomic %.
Owner:HITACHI LTD

Method for producing fluorine series compounds and white carbon black

The invention relates to a method utilizing waste gas containing fluoride in fertilizer production or fluorine-containing gas or sodium fluorosilicate in fluorine chemical production as raw materials to product series compounds of fluorine and white carbon black. The ammonium fluoride and / or ammonia are / is introduced into an absorption system to get a (NH4) 2SiF6 solution with the absorbing solution concentration of 25 to 37 percent or the ammonium fluoride and the sodium fluorosilicate react to get a reaction product of sodium fluoride crystallization, fluosilicic acid solution and septenary-fluorine compound NH4F.(NH4)2SiF6 crystallization. The absorption liquid or the reaction product is aminated to get precipitated silica (white carbon black) with the specific surface of 100-180m<2> / g, and the latter can get a sodium fluoride product and an NH4F solution with the concentration of 30 to 45 percent. The solution used as a starting point can nearly prepare all inorganic fluoride chemical products, and ammonium fluoride, sodium fluoride, potassium fluoride, ammonium bifluoride, cryolite, aluminum fluoride, sodium hydrogen diffluoride and hydrofluoric acid production, etc. are main. The method has simplicity, effectiveness and higher economic benefit, and simultaneously, fluorine and silicon in the waste gas containing fluoride of phosphate fertilizer for the pollution of environment can be basically eliminated, and basically no waste water, waste gas and waste residue are discharged.
Owner:夏克立

Measuring method for concentration of halogen and fluorine compound, measuring equipment thereof and manufacturing method of halogen compound

The present invention provided a method for measuring a halogen gas and / or a hydrofluorocarbon for the purpose of controlling the concentration of the halogen gas and / or the hydrofluorocarbon, in a plant producing a halogen compound or a perfluorocarbon, at a predetermined concentration level quickly, easily, and precisely for the control. The present invention provides also a measurement apparatus for the above measurement which has a compact structure, and in which the parts are exchangeable quickly and readily. The present invention provides further a process for producing a halogen compound or a perfluorocarbon employing the measurement method and the measurement apparatus. In particular, the present invention intends to provide a method for measuring safely and quickly a hydrofluorocarbon concentration in a mixed gas stream in a process of producing a perfluorocarbon by direct fluorination reaction of a hydrofluorocarbon and F2.
Owner:SHOWA DENKO KK

Packaged products including a personal care medium and a non-flammable volatile agent stored within an aerosol container

A packaged product includes a personal care medium, a propellant, and an aerosol container. The personal care medium and the propellant are stored with the aerosol container. At least one of the personal care medium and the propellant includes a non-flammable volatile agent that includes one or more organofluorine compounds. The one or more organofluorine compounds may include one or more trifluoropropene compounds, one or more tetrafluoropropene compounds, and / or one or more pentafluoropropane compounds.
Owner:EDGEWELL PERSONAL CARE BRANDS LLC

Surface-treating agent comprising inorganic/organic composite material

A surface treatment agent, which contains: (A) a hydrolyzable metal alkoxide or a hydrolyzate thereof, (B) a fluorocompound containing a perfluoroalkyl group and a functional group reactive with the hydrolyzable metal alkoxide (A), and (C) an adhesion improvement agent, can provide a film having transparency and durability while maintaining excellent soil releasability and low refractive index.
Owner:DAIKIN IND LTD

Aqueous glass frosting powder chemical composition and preparation method thereof

InactiveCN101531463APreserve appearance qualityReduce pollutionChemical compositionFiller Excipient
The invention discloses an aqueous glass frosting powder chemical composition containing a mixed material of an inorganic fluorine compound capable of generating fluorine ions in water, a solid acid compound capable of dissolving in water, an assistant and a filling agent, wherein the mixed material is doped with at least one surfactant; the adding amount of the inorganic fluorine compound is 20 to 90 percent of the total weight percentage of the frosting powder; the adding amount of the solid acid compound is 10 to 60 percent of the total weight percentage of the frosting powder; the adding amount of the filling agent is 1 to 30 percent of the total weight percentage of the frosting powder; the adding amount of the surfactant is 0.1 to 10 percent of the total weight percentage of the frosting powder; and during use, the water is 20 to 100 percent of the total weight percentage of the frosting powder to prepare frosting powder liquid. The technical scheme can avoid acid pollution of the production environment and natural environment because of the inevitable strong acid medium such as sulphuric acid and hydrochloric acid when frosting a glass product by using the prior glass frosting liquid.
Owner:上海多林玻璃技术有限公司

Method for treating surface of oxide glass with fluorinating agent

ActiveUS20100089096A1Low costExcellent adhesiveness without deterioration of the surface propertiesCoatingsOptical partsHydrogen fluorideInert gas dilution
To provide a novel fluorination treatment method whereby the surface of oxide glass can be treated for fluorination at low cost and with excellent adhesiveness.A method for treating the surface of oxide glass, which comprises contacting the surface of oxide glass with a gas of a fluorinating agent or a mixed gas having a fluorinating agent diluted with an inert gas, wherein the fluorinating agent is an elemental fluorine, or a fluorine compound capable of cleaving a bond between an oxygen atom and a metal atom in the framework of the oxide glass and forming a bond between a fluorine atom and the metal atom; and the concentration of hydrogen fluoride at the surface of oxide glass with which the fluorinating agent is in contact, is controlled to be at most 1 mol %.
Owner:ASAHI GLASS CO LTD

Surface treatment agent comprising inorganic-organic hybrid material

A surface treatment agent, which contains:(A) a hydrolyzable metal alkoxide or a hydrolyzate thereof,(B) a fluorocompound containing a perfluoroalkyl group and a functional group reactive with the hydrolyzable metal alkoxide (A), and(C) an adhesion improvement agent,can provide a film having transparency and durability while maintaining excellent soil releasability and low refractive index.
Owner:DAIKIN IND LTD

Environment-friendly separation and recovery method of fluorine in fluorine-containing waste liquid

The invention discloses an environment-friendly separation and recovery method of fluorine in a fluorine-containing waste liquid. According to the invention, a magnesium-containing compound is added into the fluorine-containing waste liquid as a precipitation agent, such that fluorine in the waste liquid is selectively precipitated; filtering is carried out, and fluorine-removed liquid and magnesium fluoride precipitate are obtained; the fluorine-removed liquid is used in waste water recycling; the magnesium fluoride precipitate is decomposed with sulfuric acid, such that a series of compounds of fluorine are obtained; decomposition residue is subjected to a dissolution-crystallization treatment, such that magnesium sulfate crystals are obtained; the obtained magnesium sulfate crystals are returned and recycled in the fluorine selective precipitation process; the crystallization mother liquor of magnesium sulfate is returned to the dissolution-crystallization process or the magnesium fluoride precipitation decomposition process. The method has the advantages of simple process, simple operation, low production cost, and good fluorine-removing effect. With the method, fluorine resource utilization is realized. The method also has the advantages of no fluorine-containing waste production and no three-waste emission.
Owner:CENT SOUTH UNIV

Process for producing bis(fluorosulfonyl)imide anion compound, and ion-pair compound

A process for producing a bis(fluorosulfonyl)imide anion compound by substituting a bis(chlorosulfonyl)imide anion compound, obtained from sulfamic acid, chlorosulfonic acid, and a halogenating agent, with fluorine is used as a process for producing a fluorine compound for use, for example, in the synthesis of battery electrolytes and ionic liquids. According to the above process, the inclusion of impurities can be reduced, and a high-purity fluorine compound of a bis(fluorosulfonyl)imide compound can be efficiently produced at a high yield. A base catalyst can be used in the reaction for substituting the bis(chlorosulfonyl)imide anion with fluorine. The base catalyst is preferably a nitrogen-containing compound.
Owner:DAI ICHI KOGYO SEIYAKU CO LTD

Waterproof, grease proof treating compound of fluorine silicon modified polyurethane, and preparation method

The present invention relates to a fluorosilicone modified polyurethane water-proofing oil-proofing finishing agent and its preparation method. Said invention also provides its chemical structure formula. It is characterized by that it uses perfluor-olefin, hydroxyl silicon oil, epoxyethane and diisocyanate as raw material and makes them undergo the process of synthesis treatment so as to obtain the invented emulsion-fluorosilicone modified polyurethane water-proofing oil-proofing finishing agent.
Owner:SHANDONG DONGYUE POLYMER MATERIAL

Semiconductor device having improved insulation film and manufacturing method thereof

A semiconductor device which has an interlayer insulating film comprised of molecules with silicon-oxygen bonds and silicon-fluorine bonds and contains a rare gas in concentration higher than 1011 atoms per cm2. The interlayer insulating film is preferably a fluorine-containing silicon oxide film which contains a rare gas. In a manufacturing process, an interlayer insulating is formed by a chemical vapor deposition from a material gas including a silicon-containing gas, a fluorine compound gas, a rare gas, and oxygen. The silicon-containing gas is preferably SiH4 gas, and the fluorine compound gas is preferably SiF4 gas. The flow rate of the rare gas is greater than three times the total flow rate of the SiH4 gas and SiF4 gas. The rare gas is at least one type of gas selected from neon (Ne), argon (Ar), krypton (Kr), and xenon (Xe).
Owner:MITSUBISHI ELECTRIC CORP

Etching composition for metal material and method for manufacturing semiconductor device by using same

The invention provides an etchant composition employed for selectively etching a metallic material in production of a semiconductor device from an insulating material having high dielectric constant, an insulating material of silicon oxide film or silicon nitride film, and a metallic material, characterized in that the etchant composition is an aqueous solution containing a fluorine compound, and a chelating agent having, in the molecular structure thereof, a phosphorus oxo-acid as a functional group; or is an aqueous solution containing a fluorine compound, a chelating agent having, in the molecular structure thereof, a phosphorus oxo-acid as a functional group, and an inorganic acid and / or an organic acid. The invention also provides a method for producing a semiconductor device employing the etchant composition. According to the invention, a metallic material can be etched selectively and efficiently.
Owner:MITSUBISHI GAS CHEM CO INC

Etchant compositions for nitride layers and methods of manufacturing semiconductor devices using the same

The invention provides etchant compositions for nitride layers methods of manufacturing semiconductor devices using the same. Tn etchant composition for nitride layers includes phosphoric acid in an amount ranging from about 80 weight percent to about 90 weight percent, a silicon-fluorine compound in an amount ranging from about 0.02 weight percent to about 0.1 weight percent, and a remainder of water, based on a total weight of the etchant composition. The silicon-fluorine compound includes a bond between a silicon atom and a fluorine atom (Si-F bonding). High-etching selectivity of being above 200 of nitride layers relative to oxide layers can be realized through utilization of the etchant compositions.
Owner:RAM TECH GROUP

Method for treating waste gas containing fluorochemical

A method for decomposing a fluorine-containing compound by contacting an exhaust gas 1 containing a fluorine-containing compound, such as C2F6, with aluminum oxide 3, such as gamma-alumina, which has been heated to a high temperature of, for example, 800° C. to 900° C. There may be such a necessary or larger number of moles of H2 that the fluorine atoms in the fluorine-containing compound become HF. The method has a high decomposition rate of a fluorine-containing compound, a long life, and involves minimal occurrence of CO.
Owner:EBARA CORP

Process method for producing fluorine compounds and silicon compounds by cleanly utilizing fluosilicic acid

The invention discloses a process method for producing fluorine compounds and silicon compounds by cleanly utilizing fluosilicic acid. The process method comprises the following steps of: preparing fluosilicic acid as a phosphorus chemical by-product into an anhydrous aluminum fluoride product, a sodium fluoride product and a cryolite product, and combining with other industrial waste silicon slags and aluminum slags to prepare a 4A zeolite product. The process method comprehensively utilizes the fluosilicic acid and has high resource recovery rate, wherein the recovery rate of the fluorine element reaches higher than 90 percent. Waste silicon dioxide slags generated in the process can be recycled to produce white carbon black and the 4A zeolite, and a mother liquor, a cleaning solution and waste gas which are generated in the production process are all recycled, thereby the environmental pollution is reduced, and the purposes of zero emission and no pollution are truly achieved, thus the method completely meets the requirement for clean production. The invention has the advantages of advanced production process, good product quality and high value, wherein the fluorine content of the aluminum fluoride is high and between 63-65 percent; the quality index of the obtained white carbon black meets the requirement on the standard of the chemical industry; and the quality of the 4A zeolite product meets the requirements on the national standard and the standard of European and American developed countries.
Owner:四川励志环保科技有限公司

Halogen-flame retardant and application thereof

The invention belongs to the field of flame retardant technology and provides a halogen-frame retardant. The halogen-flame retardant comprises a first component and a second component. The first component is composed of a main flame retardant and an auxiliary flame retardant. The main flame retardant is selected from a brominated flame retardant and a chlorinated flame retardant; and the auxiliaryflame retardant is a fluorine compound. The second component is a flame-retardant synergistic compound, selected from metal oxides of the group IIIA, IVA, VA metals in the periodic table of the elements or salt thereof, transition metal oxide, a silicon-based flame retardant, a phosphorus-based flame retardant and a nitrogen-based flame retardant. The invention also provides a resin composite material, an elastomer composite material and a relative formed body containing the halogen-frame retardant, a coating medium and related part or structural body, and an impregnated material. The invention has the following beneficial effects: the technical bias that fluoride cannot effectively perform the flame-retardant effectiveness and then cannot be used or is hard to be used as a flame retardant is corrected; the actual usage of the brominated flame retardant and / or the chlorinated flame retardant is reduced, and then the production difficulty of the flame retardant and the environmental pollution are reduced, and the color matching and cost control difficulty is reduced.
Owner:BENSONG ENG PLASTICS HANGZHOU

Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas

Apparatus and process for the abatement of fluorine and fluorine-containing compounds from gases containing same, such as effluent gas streams from semiconductor manufacturing operations, wherein a fluorocompound abatement medium is injected into the fluorocompound-containing gas. The fluorocompound abatement medium comprises at least one of steam, methane and hydrogen, with the proviso that when the fluorocompound abatement medium contains methane and / or hydrogen, the injection of the fluorocompound abatement medium is conducted under non-combustion conditions.
Owner:APPLIED MATERIALS INC

Graft oligomeric electrolytes

Disclosed are compositions prepared by free-radical-driven grafting onto hydrocarbons or hydrocarbon ethers of olefinically unsaturated fluorocarbons containing sulfonyl fluoride, fluorosulfonate, fluorosulfonimide, or fluorosulfonyl methide groups, wherein the grafting step is followed by a hydrolysis step in the case of sulfonyl fluoride.
Owner:EI DU PONT DE NEMOURS & CO

Semiconductor manufacturing process

Disclosed is a semiconductor manufacturing process, in which a fluorine radical-containing plasma is used to etch a hard mask and a layer therebeneath; and a treatment is carried out using a gas reactive to fluorine radicals for reacting with residual fluorine radicals to form a fluorine-containing compound and remove it. Thus, precipitates formed by the reaction of fluorine radicals and titanium components existing in the hard mask to cause a process defect can be avoided.
Owner:UNITED MICROELECTRONICS CORP

Fluorine-containing lithium ion battery positive electrode material and preparation method thereof

The invention discloses a fluorine-containing lithium ion battery positive electrode material. The fluorine-containing lithium ion battery positive electrode material comprises a high-nickel positiveelectrode material and a coating layer containing a poly-fluorine compound. The preparation method of the fluorine-containing lithium ion battery positive electrode material comprises the steps of (1)mixing the high-nickel positive electrode material and a salt solution containing the poly-fluorine compound to form a solid-liquid mixture, and performing reaction to obtain a mixture with the coating layer; and (2) drying the mixture with the coating layer and obtained in the step (1), and performing thermal processing in inert atmosphere to obtain the fluorine-containing lithium ion battery positive electrode material. With the fluorine-containing lithium ion battery positive electrode material provided by the invention, the residual alkali quantity on a surface of the high-nickel positiveelectrode material of the lithium ion battery is effectively reduced, the high- and low-temperature cycle property and the capacity of the high-nickel positive electrode material are improved, and the processing performance and the safety of the high-nickel positive electrode material are improved; and the preparation method is simple to operate, is low in cost and is suitable for mass production.
Owner:INST OF PROCESS ENG CHINESE ACAD OF SCI

Nonwoven materials coated with fluoropolymer and antimicrobial agent

An article having a nonwoven material and a coating contacting the nonwoven material, the coating comprising at least one fluorochemical and at least one antimicrobial agent. The fluorochemical comprises at least one fluoropolymer. The add-on value of the at least one antimicrobial agent on the nonwoven material is less than 0.75% and the coating provides at least a 4-log reduction within 5 minutes when measured using AATCC Method 100. The at least one antimicrobial agent is selected from the group consisting of a benzalkonium salt, a benzethonium salt, a octenidine salt, a chlorhexidine salt, free base chlorhexidine, triclosan and combinations thereof. The coating provides at least a 2-log reduction within 5 minutes when measured using AATCC Method 100.
Owner:ALLEGIANCE CORP

Chemical conversion solution for metal structure and surface treating method

The present invention provides a chemical conversion solution and the surface treating method for realizing high corrosion resistance and high coating adhesion of the metal surface, as well as high throwing power during electrodeposition, and generating no sludge.A chemical conversion solution comprising (A) at least one compound selected from water-soluble germanium compound, water-soluble tin compound, and water-soluble copper compound, (B) at least one compound selected from water-soluble titanium compound and water-soluble zirconium compound, (C) at least one water-soluble nitrate compound, (D) at least one compound selected from water-soluble aluminum compound and water-soluble magnesium compound, (E) at least one water-soluble zinc compound, and (F) at least one fluorine compound, and, the coating process for the metal structure.
Owner:HENKEL KGAA

Addition-cure fluoropolyether adhesive composition

A fluoropolyether adhesive composition comprising (A) a linear polyfluoro compound having at least two alkenyl groups and a perfluoropolyether structure in its main chain, (B) a fluorinated organohydrogensiloxane containing at least two SiH groups, but not alkoxy and epoxy groups, (C) a platinum group metal-based catalyst, (D) an organosilicon compound having at least one silicon-bonded alkoxy group, and (E) a hydrolytic catalyst can be cured to metal and plastic substrates through addition reaction.
Owner:SHIN ETSU CHEM IND CO LTD

Gas diffusion electrodes containing modified carbon products

Gas-diffusion electrodes containing modified carbon products are described wherein the modified carbon product is a carbon product having attached at least one organic group. The modified carbon product can be used for at least one component of the electrodes such as the active layer and / or the blocking layer. Methods to extend the service life of electrodes as well as methods to reduce the amount of fluorine containing compounds are also described.
Owner:EHDISON SPA

Method for producing fluorine compound

Provided is a method for producing 1,1,1,4,4,4-hexafluoro-2-butene that is efficient and appropriate for a flow-through reaction. Cis-1,1,1,4,4,4-hexafluoro-2-butene is obtained by isomerization of hexafluoro-1,3-butadiene using a catalyst and then continuous catalytic hydrogen reduction, and in addition cis-1,1,1,4,4,4-hexafluoro-2-butene can be obtained efficiently by carrying out all steps by means of a flow-through catalytic reaction.
Owner:NAT INST OF ADVANCED IND SCI & TECH
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