17 results about "Ammonium bifluoride" patented technology

The present application relates to a method for reducing the content of sulfur in aluminum fluoride, which comprises the following steps: uniformly mixing crude aluminum fluoride powder containing sulfate impurities with ammonium hydrogen fluoride powder to obtain a mixture; placing the mixture in a reactor and performing programmed temperature calcination under a protective atmosphere; discharging the sulfur and fluorine-containing volatile gas generated by calcination after treatment by an absorption system; cooling the calcined material to room temperature; washing the cooled material with water or blowing inert gas to remove residual ammonium salt or dust, and then drying to obtain a low-sulfur aluminum fluoride product. The in-situ HF generated by the decomposition of NH4HF2 is used for gas-solid reaction, which can effectively attack and convert stable sulfate impurities existing in various forms, has high desulfurization efficiency and is deep and thorough; the reaction conditions are mild, the main phase of the product is stable, the process flow is simple, and the energy consumption is low.

The application discloses a method and system for preparing ammonium bifluoride from hydrofluoric acid waste liquid, which comprises the following steps: (1) adding the hydrofluoric acid waste liquid into an electrolytic cell, transporting the electrolytic cell to a first reaction kettle after electrodepositing treatment, adding silicon dioxide, then stirring and reacting, and returning the generated silicon tetrafluoride and hydrofluoric acid into a spray tower to react and then return to the first reaction kettle, and then adding ammonia water to perform neutralization reaction; (2) filtering the solid-liquid mixture I, evaporating and drying the obtained filtrate I to obtain an ammonium nitrate product, and returning the obtained filter cake I to a second reaction kettle, adding ammonia water to adjust the pH value, and then stirring and reacting; (3) filtering the solid-liquid mixture II, returning the obtained filter cake II to the first reaction kettle for reuse, transporting the obtained filtrate II to a reactor, adding hydrofluoric acid to perform reaction, and then performing evaporation and drying treatment to obtain an ammonium bifluoride product. The method is simple in process, low in energy consumption, convenient to operate and convenient for industrialized production and application.

This invention relates to the field of galvanized steel wire technology, and proposes a high-strength galvanized steel wire and its preparation method. The preparation method of high-strength galvanized steel wire includes the following steps: activating the steel wire, then subjecting it to fluxing to obtain a pretreated steel wire; hot-dip galvanizing the pretreated steel wire, followed by passivation, to obtain high-strength galvanized steel wire; during fluxing, the flux consists of the following components by mass percentage: 20%~25% zinc chloride, 16%~20% ammonium chloride, 1.0%~2.0% additives, 1%~2% nickel chloride, 1%~2% lanthanum nitrate, 0.2%~0.5% ammonium bifluoride, with the balance being water; the additives are palmitamide propyl betaine and disodium lauryl sulfosuccinate. Through the above technical solution, the problem of insufficient wear resistance of galvanized steel wire in related technologies is solved.

This invention belongs to the field of ammonium bifluoride purification technology, and specifically relates to a multi-stage filtration mechanism for ammonium bifluoride purification. The mechanism includes a tank with protective components on its outer surface, a discharge port at the bottom, a feed port on one side of the top, a motor in the center of the top, a rotating shaft at the motor's output end, a centrifugal drum at the bottom of the shaft, a flow guide platform below the centrifugal drum, and a bag filter at the bottom of the flow guide platform. This invention, through the cooperation of the motor, centrifugal drum, flow guide platform, bag filter, and activated carbon adsorption plate, enables the filtration mechanism to perform multi-stage filtration, avoiding the problem of poor impurity separation when filtration and purification of ammonium bifluoride in the liquid phase. Furthermore, the cooperation of the protective frame, rubber damping plate, rotating rod, and pressure relief cylinder prevents the surface of the device from easily denting or cracking after external impact.

This invention discloses a radiation-resistant glass, its preparation method, and its application. The radiation-resistant glass comprises the following components in weight percentage: silicon dioxide 60%-70%; sodium oxide 13%-18%; zinc oxide 3%-6%; aluminum oxide 2%-6%; boron trioxide 1%-6%; strontium oxide 1%-3%; cerium dioxide 4.7%-5.5%; lanthanum trioxide / hafnium dioxide 1%-3%; and ammonium difluoride 0.3%-1%. The technical problem to be solved is to significantly improve the high-energy particle radiation protection and light transmittance of the glass by selecting a specific formulation.

This invention discloses an acidic silicon etching solution for effectively controlling etching brightness in the field of semiconductor material processing technology. The etching solution is composed of ammonium bifluoride, nitric acid, sulfuric acid, silver nitrate, surfactant, boron compound additives, and ultrapure water. The boron compound additives exhibit good solubility in the acidic etching solution, effectively regulating the attack of fluoride ions on the silicon surface oxide layer, thereby achieving control over the etching process and the regulation of the surface brightness after etching. The etching solution described in this invention can be used for acidic etching of both monocrystalline and polycrystalline silicon. By adjusting the composition and content of the boron compound additives, silicon etching effects with different brightness levels at the same time and similar brightness levels at different times can be achieved, meeting the etching index requirements for silicon surface state in different application scenarios.

This invention relates to a method for preparing aluminum fluoride from recycled cryolite, employing a short-process closed-loop process of "aluminum salt leaching – ammonium bifluoride precipitation – calcination conversion – water washing to remove sodium". Recycled cryolite is leached with an aluminum salt solution, followed by the direct addition of solid or solution of ammonium bifluoride to the resulting leachate, causing the aluminum to precipitate efficiently as a mixture of sodium ammonium fluoroaluminate and ammonium tetrafluoroaluminate or ammonium hexafluoroaluminate. Calcination converts the sodium component into a water-soluble form, followed by simple water washing to obtain high-purity aluminum fluoride. The mother liquor after precipitation can be recycled back to the leaching step after simple composition adjustment, thus achieving a closed-loop cycle of the leaching agent and reaction medium. This eliminates the generation of sodium fluoride-containing wastewater at the source and significantly reduces reagent consumption. This invention features an extremely short process flow, highly efficient closed-loop circulation, thorough aluminum-sodium separation, high product purity, high resource utilization rate, flexible process control, and significant environmental and economic benefits.

This application relates to the field of etching solution technology, specifically disclosing a BOE etching solution and its preparation method. The BOE etching solution comprises the following raw materials: hydrofluoric acid, ammonium fluoride, a metal corrosion inhibitor, a composite buffer regulator, perfluorobutyl polyoxyethylene ether, and ultrapure water; the metal corrosion inhibitor is a complex of benzotriazole-imidazolium-grafted polyethyleneimine and aminotrimethylenephosphonic acid; the composite buffer regulator includes ammonium hydrogen fluoride, boric acid, and amino acids. The BOE etching solution of this application can be used in back-end metal wiring processes such as integrated circuits, MEMS devices, and 3D NAND, and is particularly suitable for etching silicon dioxide containing tungsten, aluminum, and titanium metals. It features high etching rate, low metal corrosion, and excellent metal surface protection, effectively solving the technical pain points of existing BOE etching solutions, such as severe metal corrosion and difficulty in simultaneously achieving etching and protection.

The application provides a composition, a plugging removal system and a plugging removal method, the composition comprising sodium nitrite, a surfactant, sodium carbonate and ammonium hydrogen fluoride; the plugging removal system comprising a prepad, a gas generation agent, a spacer fluid, the composition and a displacement agent; and the plugging removal method comprising the following steps: sequentially injecting the prepad and the gas generation agent into a well; after 10 to 30 minutes, injecting the spacer fluid; after the injection of the spacer fluid is completed, after 10 to 30 minutes, sequentially injecting the composition and the displacement agent, and after reaction, opening the well and assisting in the removal by nitrogen.

This invention relates to the field of hydrometallurgy, specifically to a method for the stepwise recovery of copper and cobalt from high-copper-cobalt dolomite under an ammonia-based system. The method includes: desulfurization treatment of the high-copper-cobalt dolomite to obtain desulfurized high-copper-cobalt dolomite; ammonia leaching with an ammonia leaching agent to obtain ammonia leaching residue and ammonia leaching solution; ammonium salt co-calcination of the ammonia leaching residue with a roasting agent and additives to obtain roasted copper-cobalt slag; and water leaching of the roasted copper-cobalt slag to obtain water-leached residue and water-leached solution. This invention provides a stepwise recovery process for cobalt-containing dolomite; under mild ammonia leaching conditions, easily leached copper in the ore is preferentially recovered; the ammonium salt co-calcination disrupts the dolomite lattice, converting residual cobalt into soluble chlorides; and cobalt is then recovered through water leaching. The process is short, with low reagent consumption, high metal recovery rate, and environmental friendliness; the use of ammonium bifluoride and potassium chloride as co-calcination additives achieves efficient release and separation of cobalt; it significantly reduces cobalt loss in tailings and improves the comprehensive utilization rate of resources.

This invention relates to the field of wastewater recycling technology, specifically disclosing a method for the resource recovery of fluoride-containing ammonia wastewater generated in the tantalum-niobium hydrometallurgical industry. The recovery method provided by this invention treats the generated wash water and neutralization mother liquor to obtain low-concentration ammonia water, which can be reused in the tantalum-niobium hydrometallurgical production process, reducing the cost of tantalum-niobium hydrometallurgical production. Simultaneously, it yields high-purity ammonium sulfate and ammonium bifluoride products, realizing the recovery and utilization of valuable resources from the fluoride-containing ammonia wastewater.

The application relates to the technical field of titanium alloy, in particular to a special electroplating base nickel process for titanium alloy. The process comprises the following steps: firstly, removing oil from a titanium alloy base body through alkaline electrolysis; secondly, activating the titanium alloy base body in an activation solution compounded by hydrochloric acid and ammonium hydrogen fluoride at 20-25 DEG C for 20-45s, and then transferring the titanium alloy base body to an electroplating tank after washing; thirdly, electroplating in a cyanide-free base nickel electroplating solution containing nickel sulfate, nickel chloride, boric acid and modified sodium sulfate, controlling the pH value to be 3.5-4.5, the temperature to be 50-65 DEG C, the cathode current density to be 2-5 A / dm 2 , and adopting two-stage current density power supply. The modified sodium sulfate is prepared through freezing-out crystallization and heterogeneous nucleation technology, takes aluminum nitride as a nucleation core, adds sodium silicate, sodium dihydrogen phosphate and sodium tetraborate decahydrate for regulation and control, and finally obtains high-purity and uniform-particle-size crystals. The process is environment-friendly and cyanide-free, the plating layer has strong adhesion, high compactness, few defects and good batch consistency.

This invention relates to the field of etching solution technology, specifically to an etching solution composition for simultaneously etching a copper-molybdenum-niobium-amorphous silicon three-layer film, comprising: hydrogen peroxide, ammonium bifluoride, 2-mercapto-1,3,4-thiadiazole, imidazole, lactic acid, malic acid, adenine, tetraethylene glycol, and deionized water. This invention achieves Cu / MoNb / N... + Simultaneous etching of a-Si three-layer materials, using H2O2 as the oxidant, ABF as the fluorine source, and LA / MA organic acids, can simultaneously complete Cu oxidation complexation, MoNb oxidation dissolution, and N2 oxidation. + a-Si fluorine-based etching solves the problem of cumbersome step-by-step etching processes in traditional methods; it achieves three-layer patterning in a single liquid step, eliminating multiple liquid changes and cleaning steps, significantly improving process efficiency, and is suitable for the integrated wet etching needs of TFT and semiconductor devices.

The application provides a nitrogen-fluorine dual-element doped porous carbon material, a silicon-carbon negative electrode material and a preparation method of the silicon-carbon negative electrode material, and the preparation method of the porous carbon material comprises the following steps: mixing porous carbon with ammonium fluoride and / or ammonium bifluoride, and then performing gas phase deposition coating or liquid phase coating; and calcining the coated porous carbon material in a closed environment under an inert atmosphere, so that the nitrogen-fluorine dual-element doped porous carbon material is obtained. The application utilizes the characteristics of nanoscale micropores and super-large specific surface area of the porous carbon, simultaneously utilizes the low melting point and low boiling point properties of the ammonium fluoride and the ammonium bifluoride, adopts the method of gas phase deposition or liquid phase coating, obtains a uniform coated layer of the ammonium fluoride and the ammonium bifluoride, and then utilizes high-temperature calcination treatment to obtain the porous carbon material, which can simultaneously retain the characteristics of high specific surface area and nanoscale micropores, greatly reduces the expansion of the silicon-carbon negative electrode material when the silicon-carbon negative electrode material is prepared, guarantees the cycle performance of the material, and improves the rate performance of the obtained silicon-carbon negative electrode material.

The application is suitable for the technical field of titanium alloy surface treatment, and provides a nitric acid-free chemical polishing solution for titanium alloy and a preparation method thereof. Each 1L of the polishing solution comprises the following components: 100-150g of ammonium hydrogen fluoride, 150-250g of 50% concentration hydrogen peroxide, 200-350g of 85% concentration phosphoric acid, 60-120g of modified ethylene glycol, 10-20g of a composite stabilizer, 5-10g of a modified corrosion inhibitor, and water as the balance; the modified ethylene glycol is ethylene glycol modified by silane coupling agent KH550, and the modified corrosion inhibitor is a modified product of thiourea grafted maleic anhydride; through modification of raw materials and synergy of components, the application can improve the surface treatment effect of titanium alloy, completely eliminate the generation of toxic nitrogen oxide gas, avoid the decomposition of hydrogen peroxide and the excessive corrosion of titanium alloy, and is suitable for efficient and environmentally-friendly polishing of titanium alloy parts with complex shapes.

The present disclosure provides a method for treating a subterranean formation, may include injecting a treatment fluid into the subterranean formation, the treatment fluid including at least one of an inorganic acid or an organic acid, at least one of hydrofluoric acid or hydrofluoric acid precursor, and a precipitate inhibitor, and after injecting the treatment fluid into the subterranean formation, performing at least one of a fracturing treatment or a stimulation treatment. The inorganic acid includes at least one of hydrochloric acid or methanesulfonic acid. The treatment fluid can further include a blend of organic acids including at least one of citric acid, acetic acid, formic acid, or lactic acid. The hydrofluoric acid precursor includes at least one of ammonium bifluoride or ammonium fluoride. The precipitate inhibitor prevents precipitation of calcium fluoride and magnesium fluoride. The treatment fluid can be pumped in a single step without requiring a preflush treatment.