The invention relates to an etchant composition and an etching method, wherein, the etchant composition comprises any two components of oxidants, acid and salt, and the pH value of the etchant composition is between 1 and 7. The oxidant components are selected from hydrogen peroxide, ammonium persulfate, potassium persulfate and ceric ammonium nitrate; the acid components are selected from chloric acid, perchlorate, acetic acid, nitric acid, hydrofluoric acid, sulfuric acid and oxalic acid, and the salt components are selected from ammonium fluoride, ammonium bifluoride, diammonium phosphate, ammonium phosphate, ammonium chloride and perfluorinated octyl sulfanilic acid (C8F17SO3NH4).