The invention relates to a low-defect high-selection-ratio core-shell composite
abrasive material, a preparation method and a
polishing solution, and belongs to the technical field of chemical mechanical
polishing of integrated circuits, the low-defect high-selection-ratio core-shell composite
abrasive material comprises a multilayer structure formed by an inner core and an outer shell, and the inner core comprises alpha-phase aluminum
oxide particles and gamma-phase aluminum
oxide particles; the preparation method of the Al2O3-coated SiO2-
Betaine comprises the following steps of: mixing an inner core,
coating the outer shell with a
silicon oxide coating layer, performing
grafting modification on the surface of the
silicon oxide coating layer through a
betaine type zwitterionic compound to obtain Al2O3-coated SiO2-
Betaine, performing mixing on the inner core,
coating the outer shell, dispersing core-shell particles, preparing modifier
hydrolysate and performing surface
grafting to obtain the Al2O3-coated SiO2-
Betaine, and the Al2O3-coated SiO2-Betaine can be used for preparing a
polishing solution. Through the unique three-layer structure design of the
hard core, the soft shell and the
surface modification, high removal rate, low defect and controllable selection ratio are synchronously realized.