570results about "Anti-reflective coatings" patented technology

The embodiments of the invention are directed to coatings and their uses. More particularly, the embodiments of the invention are directed to coating compositions that include silane-based precursors that are used to form coatings through a sol-gel process. The coatings so formed are characterized by anti-reflective, abrasion resistant, and anti-soiling properties. The coatings also have extended weatherability to heat, humidity, and protection against ambient corrosives. The coatings formed from the compositions described herein have wide application, including, for example, use as coatings on the outer glass of solar cells.

Developable bottom antireflective coating compositions are provided.

Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. More specifically, the pH tuning agent strong influences the polymeric characteristics, the structural makeup and the spatial orientation that results in increasing the surface properties of the anti-reflective coating for optimal resist performance. In other words, a pH tuning agent that merely adjusts the pH of the spin-on material without influencing the mechanical properties and structural makeup of the spin-on composition or the coupled resist material is not contemplated herein. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

A hard coat film of the present invention comprises a hard coat layer, which is a cured coat layer, provided on at least one side of a transparent plastic film substrate, wherein a hard coat layer forming material comprises urethane acrylate (A); isocyanuric acid acrylate (B) and inorganic ultrafine particles (C), and has a high hardness and suppresses curling due to cracking and cure shrinkage.

A transparent anti-reflective article includes a transparent substrate having a first refractive index and a first surface. An anti-reflective layer is formed within the first surface of the transparent substrate through use of one of nanosphere lithography, deep ultra-violet photolithography, electron beam lithography, and nano-imprinting. The anti-reflective layer includes a subwavelength nano-structured second surface including a plurality of protuberances. Such protuberances have a predetermined maximum distance between adjacent protuberances and a predetermined height for a given wavelength such that the anti-reflective layer includes a second refractive index lower than the first refractive index to minimize light diffraction and random scattering therethrough. The predetermined height is approximately equal to a quarter of the given wavelength divided by the second refractive index.

A coating material capable of forming a high-quality thin film having a regulated refractive index; a coating film formed from the coating material; an antireflection coating comprising the coating film; an antireflection film to which the antireflection coating is applied; and an image display. The coating composition comprises (1) rutile-form titanium oxide having primary particle diameter of 0.01 to 0.1 mum and coated with an inorganic compound for reducing or eliminating the photocatalytic activity and with an organic compound having an anionic polar group and / or an organometallic compound, (2) a binder ingredient curable with an ionizing radiation, (3) a dispersant having an anionic polar group, and (4) an organic solvent. The coating film formed from the coating composition is suitable for forming a light-transmitting layer constituting or contained in a single- or multi-layer antireflection coating (17), in particular, a medium-refractive-index layer (18), high-refractive-index layer (19), or hard coat layer (16) having a high refractive index.

Provided is a film having a low refractive index, which can be formed under normal temperature and pressure while obtaining a lower refractive index, has excellent adhesion with a solid substrate, and does not lose geometric optical properties, such as the diffusibility or light-harvesting capability attributed to the microstructure. Also disclosed is a method for producing the same. The film having a low refractive index is obtained by causing an electrolyte polymer and microparticles to be alternately adsorbed on the surface of a solid substrate and bringing the resulting microparticle-laminated film into contact with a silicon compound solution in order to bond the solid substrate with microparticles and microparticles with microparticles. The silicon compound solution is selected from (1) the hydrolysis product of alkoxysilane (I) wherein the functional groups are formed from hydrolyzable groups and non-hydrolyzable organic groups, and the condensation reaction product thereof, (2) the hydrolysis product of a mixture of alkoxysilane (I) and alkoxysilane (II) wherein the functional groups are formed from hydrolyzable groups alone, and the condensation reaction product thereof; and (3) a mixture of hydrolysis product and condensation product thereof according to (1) and alkoxysilane (II).

A coating composition for the formation of a low refractive index layer, comprising: a fluorine-containing olefin-based polymer that has a polysiloxane segment represented by formula 1 in its main chain, has a fluorine content of 30 mass % or more, and contains a plurality of ethylenically unsaturated groups; and a hollow silica fine particle having an average particle diameter of 5 to 200 nm and a refractive index of 1.17 to 1.40: Formula 1: [wherein R1 and R2, which may be the same or different, each represents a hydrogen atom, an alkyl group, an alkyl halide group or an aryl group].

Glass coating materials and methods are disclosed for the coating of glass substrates used in the manufacturer of photovoltaic solar modules such that the coating enhances the reliability of the module by reducing its susceptibility to potential induced degradation (PID). Coating materials are disclosed that reduce soiling on the front surface of the glass; that increase the surface resistivity of the glass and that repel moisture and that seal the surface from the ingress of moisture. Further electrically conductive coatings are disclosed that reduce the electric field between the front and back surfaces of the glass and hence reduce ion mobility within the glass and transport from the interior glass surface to the solar cell. There are additional configuration choices for fine tuning associated with separately optimizing the exterior and interior glass coating. Finally, coating processes and methods are disclosed for coating glass substrates with the disclosed materials.

[Problem to be Solved]Provided is a coating composition excellent in antifouling properties, transparency and hydrophilicity and capable of maintaining surface hydrophilicity even at high temperature.[Solution]A coating composition containing(A) a metal oxide particle having a number average particle size of 1 nm to 400 nm, and(B) a polymer particle,in which the content of an aqueous-phase component in the component (B), represented by the following expression (I), is 20 mass % or less.The content of the aqueous-phase component (%)=(dry mass of a filtrate obtained by filtering the component (B) at a molecular cutoff of 50,000)×(100−total mass of solid content) / (mass of the filtrate−dry mass of the filtrate)×100 / the total mass of solid content  (I).

An organic-inorganic composite film containing an organic-inorganic composite including an inorganic compound particle and a polymer bonded to the inorganic compound particles. A percentage of voids in the film is 3 to 70 volume % with reference to a volume of the film.

A low-index silica coating may be made by forming silica sol comprising a silane and / or a colloidal silica. The silica precursor may be deposited on a substrate (e.g., glass substrate) to form a coating layer. The coating layer may then be cured and / or fired using temperature(s) of from about 550 to 700° C. A capping layer composition comprising an antifog composition including a siloxane and / or hydrofluororether may be formed, deposited on the coating layer, then cured and / or fired to form a capping layer The capping layer improves the durability of the coating. The low-index silica based coating may be used as an antireflective (AR) film on a front glass substrate of a photovoltaic device (e.g., solar cell) or any other suitable application in certain example instances.

Disclosed herein is a method of producing an antireflection thin film using a block copolymer and an antireflection thin film prepared by the method. Specifically, the present invention relates to a method of producing a nanoporous antireflection film by spin-coating using a block copolymer solution and subsequent processing and a preparation by the method. The antireflection film of the present invention is prepared by coating a substrate with a block copolymer and selectively removing at least one block in the coated block copolymer to produce a nanoporous thin film with a pore size of 5 to 100 nm. When the thin film is applied to a substrate, an antireflection substrate which has a very low reflectance within a broad range of wavelength can be prepared.

The present invention provides a method for preparing a glass substrate with antireflection functionality by applying a coating formulation that affords antireflection effects to a substrate comprising water, metalloid oxide nano particles that are dispersed in said water, and a hydroxide ion agent or fluoride ion agent that is introduced into said metalloid oxide nano particles at a mole ratio of 0.005˜2:1. The coating formulation of the present invention enables manufacture of a porous nano antireflection film with high transmittance following a more streamlined process than the prior art, obtaining an antireflection film with a high adhesive force between the film and substrate, and high durability by increasing particle-particle bonding and the bond strength between particles and substrate.

The invention relates to the technical field of solar photovoltaic glass and provides an antireflective coating solution, which comprises the following components in percentage by volume: 80.0-95.0% of silicon dioxide sol, 0.1-8.0% of titanium dioxide sol, 0.1-5.0% of zirconium dioxide sol, 0-3.0% of cerium dioxide and / or magnesium oxide and / or aluminum oxide sol, 0.1-3.6% of stabilizer, 0.1-3.8% of surface finishing agent, 0-8.0% of volatilization control agent, and 0.2-4.5% of processing assistants. The invention also provides a preparation method of the antireflective coating solution, photovoltaic glass prepared by adopting the antireflective coating solution, and a preparation method of the photovoltaic glass.

A light-shielding film for optical element includes at least a resin and a colorant. The light-shielding film for optical element has an average extinction coefficient of 0.03 or more and 0.15 or less as an average of extinction coefficients of the whole light-shielding film for light having wavelengths ranging from 400 to 700 nm.

Organic-inorganic composite material comprising:colloidal particles of at least one inorganic compound chosen from metal or metalloid oxides and oxyhydroxides, prepared by means of a process of hydrolysis-condensation in a protic or polar solvent, said particles having been surface-functionalised by reaction with an organic compound;and an organic or inorganic polymer.Process for preparing this composite material and optical material comprising a layer of this composite material.

Provided is a substrate having a surface that is at least partially laminated with a coating that provides the surface both anti-reflective and self-cleaning properties. The coating is characterized by low refraction, a contact angle of at least 150° and a sliding angle of at most 10°, and includes two components: (i) an anti-reflecting coating (ARC) component and (ii) a self-cleaning coating (SCC) component. Also provided is a method for providing a substrate having a surface that is at least partially laminated with an anti-reflecting (AR) self-cleaning (SC) coating, the method including providing a substrate with at least one surface and applying a coating onto at least a part of the at least one surface, the coating including an ARC component and a SCC component.

Embodiments of the invention relate generally to methods and compositions for forming porous low refractive index coatings on substrates. In one embodiment, a method of forming a porous coating on a substrate is provided. The method comprises coating a substrate with a sol-gel composition comprising at least one self assembling molecular porogen and annealing the coated substrate to remove the at least one self assembling molecular porogen to form the porous coating. Use of the self assembling molecular porogens leads to the formation of stable pores with larger volume and an increased reduction in the refractive index of the coating. Further, the size and interconnectivity of the pores may be controlled via selection of the self assembling molecular porogens structure, the total porogen fraction, polarity of the molecule and solvent, and other physiochemical properties of the gel phase.

There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask or a bottom anti-reflective coating, or a resist underlayer film causing no intermixing with a resist and having a dry etching rate higher than that of the resist. A film forming composition comprising a silane compound having an onium group, wherein the silane compound having an onium group is a hydrolyzable organosilane having, in a molecule thereof, an onium group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The composition uses as a resist underlayer film forming composition for lithography. A composition comprising a silane compound having an onium group, and a silane compound having no onium group, wherein the silane compound having an onium group exists in the whole silane compound at a ratio of less than 1% by mol, for example 0.01 to 0.95% by mol. The hydrolyzable organosilane may be a compound of Formula: R1aR2bSi(R3)4-(a+b). A resist underlayer film obtained by applying the composition as claimed in any one of claims 1 to 14 onto a semiconductor substrate and by baking the composition.

Coated article having antireflective property together with self cleaning, moisture resistance and antimicrobial properties can be prepared with a topmost layer of titanium oxide on an antireflective layer, which can be formed by a sol-gel process. The antireflective layer can comprise a porosity forming agent, or an alkyltrialkoxysilane-based binder. The antireflective coating can comprise silica and titania components, with pores to achieve low index of refraction and titania to achieve self-cleaning and antimicrobial properties.

The embodiments of the invention are directed to organosilane-based coating compositions having anti-reflective, anti-soiling, and self-cleaning properties; methods of forming of the coatings; and articles of manufacture that utilize the coatings. In some embodiments, the coating compositions comprise an organosilane or mixture of organosilanes, a solvent, optionally an acid catalyst, and optionally a low molecular weight polymer.

The invention provides a coating material containing silica fine particles, a siloxane compound, and a curing agent and giving an even coating film in the case it is used for forming a coating film. The invention gives a siloxane-based coating material excellent in storage stability and giving high surface hardness of a coating film when the coating material is used for forming the coating film. The invention also provides an optical article excellent in anti-reflection property and scratching resistance.

The present invention provides an anti-reflection film which has excellent optical properties at a low production cost. The anti-reflection film of the present invention has a low refractive index hard coat layer having low refractive index particles and a binder matrix which is formed by curing an ionizing radiation curable material on a transparent substrate. It is a feature of the anti-reflection film of the present invention that the low refractive index hard coat layer has two optically distinguishable layers from the transparent substrate side, namely, an intermediate layer and a localized layer wherein the low refractive index particles are localized, and the refractive index and optical thickness of the localized layer are in the range of 1.29-1.43 and in the range of 100-200 nm, respectively.

A method of producing a photovoltaic cell having a cover, comprising the steps of: providing a photovoltaic cell which comprises a crystalline silicon substrate; providing a transparent substrate; forming an antireflective coating on said transparent substrate to provide a coated transparent substrate; and covering the photovoltaic cell with said coated transparent substrate. The antireflective coating is a hybrid organic-inorganic material having an inorganic portion comprising silicon, oxygen and carbon, and further comprising an organic portion with organic groups connected to the inorganic portion. Methods of producing solar panels, coated glass substrates as well as antireflection coatings are disclosed as well as novel compositions of hybrid organic-inorganic materials.