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45results about How to "Reduce interference fringes" patented technology

Method for detecting content of substitutional carbon and interstitial oxygen in monocrystalline silicon

The invention discloses a method for detecting the content of substitutional carbon and interstitial oxygen in monocrystalline silicon, and belongs to the field of semiconductor material examination and analysis. The method includes the steps that a reference silicon wafer and a sample silicon wafer are placed on a sample fixing rack for repeated transmission-reflection measuring accessories, and p-linear polarization infrared beams are used for executing N times of the transmission-reflection process; the p-linear polarization infrared beams arrive at an infrared detector, infrared absorption spectrograms are obtained, the difference value of the absorbance of the position where the absorption peak of the substitutional carbon and the interstitial oxygen on the infrared spectrogram of the sample silicon wafer is located and the absorbance of the position where the absorption peak of the substitutional carbon and the interstitial oxygen on the infrared spectrogram of the reference silicon wafer is located is calculated, namely the absorbance of the substitutional carbon and the interstitial oxygen in the sample silicon wafer is obtained; the concentration of the substitutional carbon and the interstitial oxygen can be obtained according to the one-time Brewster infrared transmission equation and the Lambert-Beer law. By the adoption of the method, the monocrystalline silicon with the thickness being 0.1-2.0 mm can be measured, and the measuring accuracy is high.
Owner:NANJING XIUKE INSTR CO LTD

Glass cover plate machining method and polishing machine related to glass cover plate machining

The invention discloses a glass cover plate machining method and a polishing machine related to glass cover plate machining, and relates to the glass machining technology. The polishing machine comprises at least two jig discs a fixing disc device, a turnover mechanism, a polishing device and a lifting device, wherein each jig disc is provided with at least two jigs for fixing a glass cover plate;the fixing disc device is fixed to a turnover shaft rod of the turnover mechanism; the turnover mechanism comprises a power device for driving the turnover shaft rod, and the turnover shaft rod is used for driving a first fixing disc and a second fixing disc to turn at the same time; the polishing device is used for polishing the glass cover plates; and the lifting device is used for driving a polishing carpet layer and the glass cover plates arranged on the fixing disc device to contact during polishing treatment or go away from each other during non-polishing treatment. Through the polishing machine provided by the invention, interference fringes in the camera shooting hole forming zones of the glass cover plates can be decreased, and the optical requirements for the camera shooting hole forming zones of the glass cover plates are met.
Owner:深圳市信濠光电科技股份有限公司

Brightness enhancement film manufacturing method, backlight module, flat panel display and electronic device

The invention discloses a brightness enhancement film manufacturing method, a backlight module, a flat panel display and an electronic device. With a method of, after a press roller and a substrate are provided, heating the substrate, using the press roller to roll the surface to be rolled and forming at least one first rough surface on the rough bottom by using a roughening treatment method, or amethod of, before the press roller rolls the surface to be rolled, forming at least one first rough surface on the rough bottom by using a roughening treatment method, the light-incident surface of the brightness enhancement film has a multi-layered rough surface structure, and the light emitted from the light source is necessary to pass through the multi-layered rough surface when passing through the brightness enhancement film manufactured by the brightness enhancement film manufacturing method provided by the invention, thereby enhancing the diffusion of the light incident. The brightnessenhancement film manufacturing method provided by the invention greatly enhances the haze of the light-incident surface of the brightness enhancement film and is beneficial to reduce the occurrence ofwater ripples and interference fringes. Moreover, since the substrate in the embodiment does not need to be doped with particles, the adverse effect on assembly yield is reduced.
Owner:惠州市聚飞光学材料有限公司
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