This invention discloses a method for fabricating a high-efficiency Micro-
OLED structure, belonging to the field of
OLED display technology. Addressing the problems of insufficient brightness, severe large-angle scattering light loss, and bottlenecks in improving light extraction efficiency in existing
silicon-based Micro-OLEDs, this invention fabricates a
silicon dioxide /
silicon nitride bilayer dielectric layer on a
CMOS substrate. Utilizing the difference in
etching rates between the two
layers, a parabolic reflective bowl
anode is fabricated. The pixel definition layer, organic light-emitting layer, thin-film encapsulation layer, color filter layer, and planarization layer are then fabricated sequentially. Finally, a
microlens array coaxial with the reflective bowl is fabricated, forming a synergistic light-gathering
system. This invention can significantly reduce internal light loss in the device, significantly improve peak brightness and light extraction efficiency, is compatible with existing
mass production processes, and meets the high-brightness application requirements of AR / VR near-eye displays.