Measuring device and measuring method for stitching interference of planar sub-aperture

Abstract

The invention provides a measuring device and a measuring method for stitching interference of a planar sub-aperture. The measuring device comprises an interferometer, an interferometer splicing displacement table, an interferometer inclination adjusting platform, a measured member splicing displacement platform, a measured member inclination adjusting platform, a measured member, a supporting platform and a control system. The measuring device and the measuring method have advantages of high sub-aperture positioning precision, high measurement precision and full automatic measurement.

Description

technical field [0001] The invention relates to the field of plane shape interferometry, in particular to a plane shape sub-aperture splicing interferometry device and measurement method. Background technique [0002] The sub-aperture splicing interferometry technology can realize the measurement of large-aperture optical components at low cost, while retaining the high spatial resolution and high precision of small-aperture measurement. In 1982, C.J.Kim of the Optical Center of the University of Arizona in the United States first proposed the concept of subaperture splicing interferometry (1. [C.Kim, J.Wyant. Subaperture test of a large flator a fast aspheric surface[J].Opt.Soc.Am ., 1981, 71:1587]). In 1985, T.W.Stuhlinger proposed the discrete phase method, using the optical phase measurements of a large number of discrete points distributed on the sub-aperture to describe the wavefront. This idea is a new milestone in the development of sub-aperture testing and the prot...

AI Technical Summary

Problems solved by technology

However, the measurement error of a single sub-aperture will also accumulate during the splicing process, and improving the detection accuracy of a single sub-aperture is a prerequisite for achieving high-precision splicing

For the sub-aperture splicing measurement system, the measurement accuracy of a single sub-aperture will be affected by various factors such as the number of interference fringes caused by the pitch and yaw error of the splicing stage, the change of the splicing position, and the standard mirror shape. For example, when the interference fringes In many cases, due to the influence of the return error of the interferometer, coma aberration will be introduced into the detection results of the single sub-aperture; due to the pitch and yaw of the spliced ​​stage, the splicing position of the single sub-aperture will deviate from the ideal splicing position, and the measurement result will be introduced. error

These error factors are not considered in the existing splicing detection technology, which affects the measurement accuracy of a single sub-aperture. Improving the splicing measurement accuracy of a single sub-aperture requires the combination of the structure of the splicing measurement device and the measurement method.

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