45results about How to "Improve anti-reflection effect" patented technology

The invention belongs to the field of photovoltaic glass coatings, and particularly relates to a super-hydrophilic anti-reflection wear-resistant self-cleaning coating for room-temperature curing of photovoltaic glass, which takes nano silicon dioxide sol as a main film-forming agent to cure and form a film and comprises the following raw materials in parts by weight: 55-90 parts of deionized water, 9-20 parts of nano silicon dioxide sol, 1-10 parts of a silane coupling agent and 0.001-1 part of nano titanium dioxide. The coating is prepared from the following components in parts by weight: 0.01-1 part of a surfactant, 0.01-1 part of modified polyvinyl alcohol, 0.01-1 part of water-based acrylic resin, 0.001-1 part of an antistatic agent, 1-5 parts of a curing agent, 1-5 parts of a flatting agent and 0.1-1 part of a wear-resistant agent. The super-hydrophilic anti-reflection wear-resistant self-cleaning coating has super hydrophilicity, the water contact angle is below 10 degrees, the hydrophilicity, the antistatic property, the anti-reflection property, the wear resistance and other properties of glass can be remarkably improved, and when the super-hydrophilic anti-reflection wear-resistant self-cleaning coating is applied to photovoltaic module glass, the photoelectric conversion efficiency in photovoltaic power generation can be improved.

The invention belongs to the technical field of films, and relates to an anti-dazzle anti-reflection anti-fingerprint film, which comprises a transparent support body, an anti-dazzle hardening coating and an anti-reflection coating, and the anti-dazzle hardening coating is obtained by coating and curing a coating liquid prepared from the following components in parts by mass: 1 to 40 parts of resin 1, 1.8 to 4.8 parts of resin 2, 0.75 to 3.25 parts of a photoinitiator and 0.3 to 1.75 parts of a thermal curing agent, the anti-glare coating is prepared from the following components in parts by weight: 0.75 to 4.75 parts of anti-glare particles, 0.25 to 1.25 parts of a flatting agent 1, 0.03 to 0.15 part of a flatting agent 2 and 44.05 to 76.12 parts of a solvent, the antireflection coating is obtained by coating and curing a coating liquid prepared from the following components in parts by mass: 0.47 to 1.8 parts of resin 2, 2.4 to 6.0 parts of resin 3, 0.12 to 0.75 part of a photoinitiator, 0.1 to 0.45 part of a thermal curing agent, 0.18 to 1.65 parts of a flatting agent 3, 0.56 to 2.4 parts of modified hollow silicon dioxide, 0.1 to 1.25 parts of a wetting dispersant and 85.7 to 95.74 parts of a solvent. According to the technical scheme provided by the invention, the anti-glare and low-reflection coating has good anti-fingerprint performance, coating adhesive force and friction resistance while having anti-glare and low-reflection performance.

The invention relates to a photovoltaic cell and a preparation method thereof, and the method comprises the steps: sequentially forming a plurality of aluminum oxide passivation layers on a substrate through trimethylaluminum, oxygen and water vapor, the ratio of the oxygen flow to the water vapor flow for forming the next aluminum oxide passivation layer is smaller than the ratio of the oxygen flow to the water vapor flow for forming the previous aluminum oxide passivation layer, so that the refractive index of the next formed aluminum oxide passivation layer is smaller than that of the previous formed aluminum oxide passivation layer; the refractive index of the prepared multi-layer aluminum oxide passivation layer is reduced from the side close to the substrate to the side far away from the substrate, so that the prepared multi-layer aluminum oxide passivation layer has a good antireflection effect, and the photoelectric conversion efficiency of the finally prepared photovoltaic cell can be improved.

The invention relates to the technical field of optical thin films, and provides an optical thin film and a preparation method thereof.The preparation method comprises the steps that S100, polyimide, polycarbonate and polymethyl methacrylate are blended and then subjected to melt extrusion, and a base film layer is obtained; and S200, sequentially performing plasma treatment and sputtering treatment on the base film layer to obtain the optical thin film, wherein S200 comprises the following steps: S210, adopting oxygen as plasma gas, performing plasma treatment on the base film layer, and cooling to room temperature to obtain a first intermediate film layer; s220, carrying out first sputtering treatment on the first intermediate film layer by adopting a silicon dioxide target material in an argon atmosphere to obtain a second intermediate film layer; and S230, carrying out second sputtering treatment on the second intermediate film layer by adopting a titanium target material in a mixed gas atmosphere of argon and oxygen to obtain the optical thin film. According to the method, material blending, plasma treatment and sputtering treatment are adopted, and the overall performance of the optical thin film is remarkably improved.

The invention provides a high-pressure air combustion stamping fracturing coal rock experiment system and a use method, and relates to the technical field of rock mechanics test equipment, the high-pressure air combustion stamping fracturing coal rock experiment system comprises a high-pressure air combustion stamping fracturing device and a variable-size coal rock true triaxial experiment device, the high-pressure gas generator is used for generating high-pressure gas so as to realize impact fracturing of coal and rock masses; the invention discloses a variable-size coal rock true triaxial experiment device which is used for carrying out true triaxial pressurization unloading experiments on coal rock masses with different sizes. And the variable-size coal rock true triaxial experimental device is connected with the high-pressure air combustion stamping fracturing device through a breather pipe. The high-pressure air combustion stamping fracturing device generates high-pressure shock waves and ultrahigh-pressure high-temperature gas within a short time to impact and fracture the coal rock mass, and compared with a traditional fracturing technology, the coal-rock mass fracturing device has the characteristics that the fracturing pressure is great, fracture lines generated by rock breaking are more complex, and the permeability increasing effect on the coal seam is more remarkable.

The present application belongs to the technical field of coal seam permeability improvement in underground coal mine drilling, and provides a coal seam permeability improvement device and method for low-permeability coal seam in underground coal mine by temperature-variable jet flow, which comprises a jet flow nozzle installed at the outlet of a high-pressure water pipe, the inlet of the high-pressure water pipe being connected with a high-pressure water pump, and the high-pressure water pump being connected with a rapid heater; the jet flow nozzle is further connected with a liquid nitrogen generator through a vacuum heat insulation pipe, the inlet end of the liquid nitrogen generator being connected with a nitrogen generator, the outlet end being connected with the inlet end of a liquid nitrogen storage tank, the outlet of the liquid nitrogen storage tank being connected with a liquid nitrogen tank group, the outlet end of the liquid nitrogen tank group being connected with a cryogenic pump, and the outlet of the cryogenic pump being connected with the jet flow nozzle through a vacuum heat insulation pipe; the device effectively increases the fissure size of the drilling, improves the coal seam permeability, and increases the gas production. Meanwhile, a liquid nitrogen production device is used to directly produce liquid nitrogen, which is low in cost and can be reused. The method is simple and easy to operate, can effectively solve the loss of liquid nitrogen in the transportation process, improve the effect of liquid nitrogen on the coal body, and improve the coal seam permeability improvement effect.

The application discloses a batch preparation method of a silicon diamond infrared composite material and the silicon diamond infrared composite material, and the method comprises the following steps: taking a nano-diamond suspension as a crystal seed, and performing spin coating on a plurality of silicon substrates at 200-400 r / min for 10-30 s, and then performing high-speed spin coating, wherein the spin coating liquid is a diamond suspension; adopting an HFCVD method to deposit a diamond film on one side of the plurality of silicon substrates; the process parameters of the HFCVD method comprise that the distance between hot wires is 10-15 mm, the distance between the hot wires and the silicon substrates is 8-12 mm, and the temperature of the hot wires is 1000-1200 DEG C; and the diamond film is deposited on the other side of the plurality of silicon substrates. The method can batch-prepared diamond films with high antireflection performance and low surface roughness, realizes simultaneous processing of the plurality of silicon substrates in a single deposition, and greatly reduces equipment investment and preparation cost.

The present invention discloses a method for precise regional permeability enhancement of soft and thick coal seams by coordinated pressure relief and fracturing. The method optimizes the key parameters of hydraulic cavitation and hydraulic fracturing by calculating through a specific simulation method, realizes precise fracture creation and pressure relief and permeability enhancement of the coal seam, and optimizes the permeability enhancement effect of the coal seam. After determining the optimal parameters, segmented cavitation is performed in the coal seam according to the set optimal parameters to realize pressure relief of the coal seam, form disturbed fractures around the borehole, and improve the gas extraction effect. Then, segmented fracturing is performed in the roof rock layer of the soft coal seam by using a directional long borehole, so that the fractures extend downward into the soft coal seam, thereby forming a spatial three-dimensional fracture network in the soft coal seam. In this method, the internal stress distribution of the soft coal seam is first changed by the pressure relief cave, and then a three-dimensional fracture network is generated by the segmented fracturing and stress guidance. The segmented cavitation and segmented fracturing are combined, thereby realizing uniform pressure relief and permeability enhancement of the coal seam, and providing an advantageous channel for gas flow.

The application belongs to the technical field of material preparation, and particularly relates to a light-heat material with an antireflection coating and a preparation method thereof. Micron or nanometer magnetic particles are used as the core, and inorganic materials with antireflection function are used as the functional coating to coat the surface of the magnetic particles; wherein the functional coating is metal oxide or non-metal oxide with light reflection inhibiting function. The method is simple in operation, mild in reaction condition, and the prepared material has an antireflection coating, which can reduce the energy loss in the form of diffuse reflection on the surface of the material in the light-heat conversion process, and shows high energy conversion efficiency. In addition, the coating material is stable in chemical property, so that the prepared composite particles have certain oxidation resistance, and can be widely applied in the fields of paint and water treatment chemical industry.

The invention discloses a broadband wide-angle bionic anti-reflection composite structure and a preparation method thereof, comprising a base layer, a plurality of spherical top cone units and a plurality of mesh grid units, wherein the base layer is provided with a plurality of spherical top cone units and a plurality of mesh grid units, wherein a mesh grid unit is connected between each two adjacent spherical top cone units, and the plurality of spherical top cone units cooperate with the plurality of mesh grid units to form a plurality of open groove structures on the surface of the base layer; by arranging a mesh grid unit between two adjacent spherical top cone units, the arrangement of the spherical top cone units can be broken, so that the spherical top cone units cooperate with the mesh grid units in a disordered state, thereby expanding the angle range of light reflection; and at the same time, the mesh grid structure can further enhance the overall structure's ability to control light, so that more light is gathered between the spherical top cone units and the mesh grid units, thereby further improving the anti-reflection performance of the structure.

Provided are a polarizing plate and an optical display device including the same, the polarizing plate including: a polarizer; and a first phase difference layer and a second phase difference layer sequentially stacked on a lower surface of the polarizer, in which a slow axis of a stack of the first phase difference layer and the second phase difference layer forms 111 DEG to 113 DEG with respect to a light transmission axis of the polarizer, and a front-side linear phase difference value of the stack measured from the front side at a wavelength of 550 nm is 140 nm to 160 nm, and when the stack is rotated by + / -40 DEG around a slow axis of the stack as a rotation axis at a wavelength of 550 nm, a tilt linear difference value of the stack is 145 nm to 170 nm.

The application discloses a kind of preparation methods for high transparent polyethylene film additive, belong to polyethylene technical field, to solve the technical problems of high transparent polyethylene film in prior art, high production cost, aging resistance performance needs to be further provided, including nucleating agent grafting quaternary ammonium salt modified nanosilica and low-density polyethylene are mixed, initiator is added, by melt grafting reaction in twin-screw extruder, reaction is finished, extrusion, cooling, granulation, obtain intermediate I;Intermediate I, antioxidant 168, antioxidant 1076, zinc stearate, antistatic agent 1800 and mustard acid amide are mixed, to obtain high transparent polyethylene film additive;The high transparent polyethylene film additive prepared in the application is mixed with low-density polyethylene, and the processing performance is good, to obtain the high transparent polyethylene film with lower cost;This film not only has good transparency and tensile property, but also has good aging resistance.

The present invention relates to a method of manufacturing a single-layered ultra-thin film anti-reflection sticker by a soft etching process, and an ultra-thin film anti-reflection sticker. To this end, the present invention provides a method of manufacturing an ultra-thin film anti-reflection sticker, characterized by comprising: a step of manufacturing a master mold, the master mold being a mold structure in which a plurality of hemispherical shapes are formed on an upper surface; a sticker material coating step of coating a sticker forming material on the upper surface of the master mold; a cured film covering step of covering a cured film on an upper surface of the sticker forming material; a curing step of curing the sticker forming material; a cured film removing step of removing the cured film from the sticker forming material; and a sticker peeling step of peeling the cured sticker forming material from the master mold, and the peeled sticker forming material is formed as a single-layered ultra-thin film anti-reflection sticker in which a plurality of anti-reflection structures are formed on an upper surface.

This disclosure relates to the field of solar cell manufacturing technology, and discloses a method for fabricating a solar cell and the solar cell itself. The fabrication method includes: providing a substrate layer with a first textured surface; forming an anti-reflection passivation layer on the surface of the substrate layer, the anti-reflection passivation layer conformally covering the first textured surface; laser-treating the anti-reflection passivation layer to form a second textured surface, the second textured surface including multiple micro-recesses; and forming a repair passivation layer on the laser-treated surface of the anti-reflection passivation layer to repair laser damage introduced by the laser treatment, the repair passivation layer conformally covering the second textured surface. This disclosure can ensure the passivation effect of the cell while improving the light-trapping effect of the cell surface.

The application relates to the technical field of coal seam permeability improvement, and provides a deep coal seam combined permeability improvement method and system. The combined permeability improvement method comprises the following steps: according to obtained coal seam parameters of a target coal seam, drilling two empty holes and a fracturing hole in the target coal seam; the two empty holes and the fracturing hole are located in the same horizontal coal seam; performing three times of grouting and hole sealing on the target coal seam; after the hole sealing is completed, performing once of hydraulic fracturing on the target coal seam, so that new fractures are generated in the target coal seam after the hydraulic fracturing; and adopting an air gun to cyclically perform high-pressure air pulse on the target coal seam to expand the fractures. Therefore, the development scale of the fractures is better increased, the gas enrichment area and the extraction blank area are reduced, the permeability improvement effect of the coal seam is better, the range is larger, and gas extraction is more thorough.

The present invention belongs to the technical field of coal mining, and specifically relates to a fracturing device and a hydraulic fracturing method of "drill-crack-cut-excite". The present invention installs a hydraulic fracturing component in the fracturing device, and uses a directional perforating component and an ultrasonic excitation component for auxiliary permeability enhancement. Through the technology of combining "hydraulic fracturing and hydraulic slitting", multiple cracks are generated inside the part to be fractured, and the ultrasonic excitation component is used to stimulate the internal crack water of the part to be fractured, thereby expanding the range of wetting of the internal crack water of the part to be fractured, and then completing the "drill-crack-cut-excite" operation of the part to be fractured, so that crack branches are formed inside the part to be fractured, thereby effectively enhancing the technical effect of hydraulic fracturing and solving the technical problem of poor hydraulic fracturing permeability enhancement effect in the prior art.

The utility model discloses an optical lens with strong anti-reflection performance, which comprises a base layer, an annular mounting groove is arranged in the middle of the periphery of the base layer, a first limiting groove is arranged on the upper surface of the base layer, a second limiting groove is arranged on the lower surface of the base layer, the first limiting groove is communicated with the annular mounting groove, and the second limiting groove is communicated with the annular mounting groove; the composite anti-reflection layer is arranged on the inner side of the base layer; the anti-fog layer is arranged on the outer side of the composite anti-reflection layer; the first refraction layer is arranged on the outer side of the base layer, the hardening layer is arranged on the outer side of the first refraction layer, the second refraction layer is arranged on the outer side of the hardening layer, the wear-resistant layer is arranged on the outer side of the second refraction layer, the third refraction layer is arranged on the outer side of the wear-resistant layer, the protective layer is arranged on the outer side of the third refraction layer, and the oil-resistant layer is arranged on the outer side of the protective layer. By arranging the composite anti-reflection layer, the first refraction layer, the second refraction layer and the third refraction layer, the anti-reflection performance of the lens is greatly enhanced.

The present invention relates to the field of coating, and specifically to a surface coating process for an optical component product, comprising the following steps: step 1, cleaning and drying a zinc selenide substrate to obtain a pre-treated zinc selenide substrate; step 2, preparing a coating material, the coating material comprising iridium indium selenide, zinc selenide, and yttrium fluoride, grinding and screening; step 3, placing the pre-treated zinc selenide substrate in a coating device, then adding the coating material, and coating layer by layer to obtain a coated optical component product. The process of the present invention is not only simple to operate, but also has a high quality of the obtained coating, and the coating has the advantages of being uniform and dense, having good adhesion, and being resistant to moisture and heat.

The present invention produces an optical laminate as follows: the absolute value of the arithmetic mean curvature Spc of the peak apex of the surface is set to 1.5 mm ‑1 The following anti-glare layer is laminated on at least one side of the light-transmitting substrate to adjust the transmission image clarity of the optical laminate to 85% or less. Alternatively, a low-refractive index layer is further laminated on the anti-glare layer. Alternatively, the optical laminate laminated with the low-refractive index layer has a light reflectance of 1.4 or less. The optical laminate can improve the anti-glare property.

The application discloses a coal seam permeability enhancement system and method based on zeolite-assisted carbon dioxide intensification cavitation, and relates to the technical field of gas extraction. The method first segments and blocks the drilling hole through a packer, and under the premise of hydraulic fracturing, combines high-speed rotation of an impeller, heating and temperature rise, and cooperation of zeolite powder porous gas release foaming and carbon dioxide medium, breaks the micro-pore structure of the coal body by means of high-energy shock waves generated by bubble collapse, breaks the fracturing water lock effect and penetrates the coal seam fracture network, and greatly improves the overall permeability of the coal seam. Secondly, after injecting high-pressure carbon dioxide gas into the coal rock mass, the free gas and water in the pore and fracture are gradually displaced by the pressure pushing, adsorption displacement and seepage migration effect. The technical problems of limited improvement of coal seam permeability, low concentration of extracted gas methane, and inhibition of gas desorption by water lock effect after hydraulic fracturing are solved.

The invention provides a silicon wafer etching solution. The silicon wafer etching solution comprises the following components: H2O2, HF, Cu (NO3) 2.3 H2O and H2O, the invention also provides a silicon wafer etching method, which comprises the following steps: S1, carrying out ultrasonic cleaning on a silicon wafer substrate to obtain a silicon wafer subjected to primary cleaning; s2, concentrated nitric acid with the mass concentration of 65-68% is added into ultrapure water in batches, and a nitric acid diluent is prepared; s3, placing the silicon wafer cleaned for the first time in the silicon wafer etching solution for etching to obtain an etched silicon wafer; s4, soaking the etched silicon wafer in a nitric acid diluent to remove the residual silicon wafer etching liquid, and cleaning the silicon wafer with deionized water to obtain a silicon wafer cleaned for the second time; and S5, soaking the silicon wafer cleaned for the second time in an HF solution, cleaning the silicon wafer with deionized water, and drying the silicon wafer to obtain the required silicon wafer. The silicon wafer etching method provided by the invention is simple in process and low in cost, and the etched silicon wafer is low in light reflectivity and good in light absorptivity.

The invention discloses a photoetching mask with a nanoscale graphical size and a preparation method of the photoetching mask. The photoetching mask comprises a transparent substrate with a first surface and a second surface, the first surface of the transparent substrate is provided with a mask layer, the mask layer is provided with a nanoscale graphical structure, and the second surface of the transparent substrate is provided with a photonic crystal anti-reflection layer; and the nano-scale patterned structure of the mask layer and the photonic crystal anti-reflection layer are obtained by etching after being impressed by a nano imprint template. The nano-imprinting mode is adopted for preparation, the manufacturing cost is low, the patterned minimum feature size line width of the mask can reach the nano level, and the mask can be used for preparing a chip structure with the nano-level line width. And secondly, the photonic crystal anti-reflection layer is arranged on the exposure surface, so that the anti-reflection performance of ultraviolet light can be improved, the exposure time is reduced in the photoetching process, the productivity is improved, the service life of an ultraviolet lamp component is prolonged, the reflection of the ultraviolet light is reduced, and certain help is provided for the light path uniformity of incident ultraviolet light.

The present application provides a method for preparing a solar cell and a solar cell, the method comprising providing a silicon substrate, the silicon substrate having a relative front and back surface; depositing a first dielectric layer on the front side; forming alternatingly distributed P regions and N regions on the back side, the formation of the alternatingly distributed P regions and N regions comprising etching doped silicon with an alkaline solution, etching the first dielectric layer with an alkaline solution, and forming depressions and / or micropores on the surface of the first dielectric layer away from the silicon substrate; depositing a second dielectric layer on the surface of the first dielectric layer away from the silicon substrate, the temperature for depositing the second dielectric layer being lower than the temperature for depositing the first dielectric layer. The present application deposits the first dielectric layer at a higher temperature, which can improve the passivation effect and anti-reflection effect of the first dielectric layer, and deposits the second dielectric layer at a lower temperature to repair defects on the first dielectric layer, thereby avoiding deterioration of the utilization rate of light by the solar cell.

The present application relates to the technical field of chip manufacturing, in particular to a high-speed photoelectric detector and a manufacturing method thereof, the antireflection film prepared based on the spraying process of the polymer has good antireflection effect on the communication waveband light signal, the external quantum efficiency of the photoelectric detector is increased, and the antireflection effect on the light signal is improved; meanwhile, the antireflection film prepared based on the spraying process of the polymer has good interface contact, the polymer releases thermal stress due to the periodic distribution of nano-pores when the temperature changes, the temperature influence on the photoelectric detector is reduced, and no defects are generated on the surface of the photoelectric detector, the influence of the degradation of the photoelectric detector is avoided, and the high-speed response characteristics of the photoelectric detector are ensured.

The invention discloses a hollow silicon dioxide nanoparticle, a preparation method thereof and an obtained product, the hollow silicon dioxide nanoparticle provided by the invention has an average hollow rate of 50%-70%, an average particle size of 20-80nm and a hydroxyl content of 16%-25% on the surface, the hollow silicon dioxide nanoparticle provided by the invention can exist stably, and the hollow silicon dioxide nanoparticle can be used as a hollow silicon dioxide nanoparticle. The hollow silicon dioxide nanoparticles are not easy to generate hard agglomeration or soft agglomeration and are dispersed in an organic system without generating precipitates, and in addition, the hollow silicon dioxide nanoparticles have a high cavity rate and a proper content of silicon hydroxyl, so that the refractive index of the particles is reduced, and the anti-reflection performance of the anti-reflection film is improved.

The invention relates to the technical field of micro display, and discloses a display panel and a display device.The display panel comprises light-emitting units arranged in an array, and each light-emitting unit comprises light-emitting areas of different colors and pixel definition structures arranged between the adjacent light-emitting areas; the first anti-reflection layer is arranged on one side, far away from the substrate, of the pixel definition structure; the lens layer is arranged on the side, away from the substrate, of the light-emitting unit, and the lens layer comprises micro lens structures in one-to-one correspondence with the light-emitting areas; and the second anti-reflection layer is arranged between any two adjacent micro lens structures. According to the invention, the first anti-reflection layer, the second anti-reflection layer and the third anti-reflection layer form a multi-stage anti-reflection path which works cooperatively, so that environmental stray light which enters from different angles can be absorbed and reduced layer by layer.

The present invention discloses a solar cell with a composite dielectric passivation layer structure and a preparation process thereof, wherein a silicon oxide film, an aluminum oxide film, a silicon nitride or a silicon oxynitride film composite dielectric film layer are sequentially deposited on the front, back and peripheral surfaces of a P-type silicon substrate, and a window is opened locally for electrode extraction. The back surface passivation layer of aluminum oxide, silicon dioxide, silicon oxynitride, silicon nitride with different refractive indices and their laminated structures of the present invention greatly reduces the back surface recombination rate, improves the back reflectivity, and simultaneously reduces the component CTM, improves the cell light decay and thermally assisted light decay performance, and anti-PID performance; the structure can be made on boron-doped or gallium-doped P-type monocrystalline silicon, P-type polycrystalline silicon and P-type quasi-monocrystalline silicon substrates, and is compatible with the passivation method based on the composite dielectric film passivation structure for manufacturing PERC cells, double-sided PERC+ cells and shingled PERC cells; the preparation process steps and sequence of the laminated structure, the corresponding preparation method and the process parameter range can well complete the cell production.

The invention relates to the field of coal mining, and discloses a coal seam anti-reflection nanofluid and active agent combined injection device which comprises a mounting frame, a pumping box is fixedly connected to the front side of the mounting frame, a first container and a second container are arranged at the bottom end of the rear side of the mounting frame, and an air pump is fixedly connected to the top of the rear side of the mounting frame; a partition plate is vertically arranged in the middle of the interior of the pumping box to form a first cavity and a second cavity, the top of the first cavity communicates with the top of the second cavity, piston blocks are slidably connected into the first cavity and the second cavity correspondingly, two vertical pipes are slidably connected to the top of the pumping box, and the bottom ends of the vertical pipes extend to the first cavity and the second cavity correspondingly. And a height adjusting mechanism is arranged at the top of the pumping box. The combined injection of the nanofluid and the active agent is accurately controlled, so that the anti-reflection effect and benefit are improved; the two methods are combined to achieve synergistic permeability increasing, the limitation of a single method is broken through, and a more efficient and more reliable technical means is provided for coal seam permeability increasing.

The application discloses a conductive silver paste for photovoltaic cells and a preparation method thereof. The conductive silver paste comprises the following raw materials in percentage: 65-85% of silver powder and 1-3% of modified binder, and the rest is an organic carrier. In the printing process of the conductive silver paste, the substances in the organic carrier contact the silver powder, so that the silver chelate in the organic carrier is fully contacted, and then a stable conductive path can be formed during baking. The modified binder is a lead-free glass formed by taking bismuth trioxide as a main raw material to form a bismuth-based glass. The addition of calcium fluoride in the raw material can reduce the water absorption of the bismuth-based glass, thereby ensuring the stability of the resistivity. The addition of titanium dioxide can exist in a quadruple coordination form, so that the Si-O-Si bond in the glass is changed into a Si-O-Ti bond, thereby forming an interconnected tetrahedral structure, increasing the network connectivity of the glass, and simultaneously increasing the antireflection effect of the glass and the utilization rate of light energy.

The invention relates to the field of coating, in particular to a surface coating process of an optical element product, which comprises the following steps: step 1, cleaning and drying a zinc selenide substrate to obtain a pre-treated zinc selenide substrate; 2, coating materials are prepared and comprise iridium indium selenide, zinc selenide and yttrium fluoride, and the coating materials are ground and sieved; and step 3, placing the pre-treated zinc selenide substrate in coating equipment, then adding a coating material, and carrying out layer-by-layer coating treatment to obtain a coated optical element product. The process is easy and convenient to operate, and the obtained coating film is high in quality and has the advantages of being uniform, compact, good in adhesiveness, resistant to damp and heat and the like.