681results about How to "Improve anti-reflection effect" patented technology

A method employing a photolithography mask for producing microtextured antireflective surfaces is disclosed. The photolithography mask is used during the exposure of photoresist to a pattern of ultraviolet light. The exposed photoresist is subsequently processed to obtain a microtextured surface possessing antireflective properties. The antireflective surface profile comprises an array of sub-micron protuberances that may reside in a periodic arrangement, a quasiperiodic arrangement, or in an arbitrary non-periodic arrangement. The antireflective surface is designed for visible light. It may be scaled-up to large areas, and is suitable for replication into inexpensive polymer materials.

A hard coat film includes a transparent plastic film substrate; and a hard coat layer, wherein the hard coat layer is formed of a composition for forming a hard coat layer, the composition containing the following component (A), component (B), and an organic solvent:

Component (A): a polyrotaxane,

Component (B): a monomer having two or more ethylenically unsaturated groups.

A liquid crystal display device comprising: a first protective film; a first polarizing film; an optical compensation region; a liquid crystal cell comprising a liquid crystal layer and a pair of substrates sandwiching the liquid crystal layer; a second polarizing film; and a second protective layer, in this order, wherein at a black display, liquid crystal molecules in the liquid crystal layer are aligned in parallel with surfaces of said pair of substrates, an antiglare layer is provided to at least one of the first protective film and the second protective layer, and the antiglare layer has a haze value attributable to internal scattering of from 5 to 35%, and a haze value attributable to surface scattering of from 1 to 10%.

An anti-reflection coating comprising a mesoporous silica coating composed of mesoporous silica nano-particles formed on a substrate or a dense coating formed on the substrate, the mesoporous silica coating having a refractive index of more than 1.10 and 1.35 or less.

An optical film comprises: a transparent plastic film substrate; and a cured layer having a dry thickness of 100 nm or more, formed by coating a curable composition comprising: a low refractive index fine particle having a refractive index of 1.50 or less; and a binder, wherein the low refractive index fine particle is unevenly distributed in the cured layer to a surface portion on the side opposite the transparent plastic film substrate.

Disclosed are a super-hydrophobic anti-reflection substrate and its manufacturing method. The super-hydrophobic anti-reflection substrate comprises: a basement, an antireflective film positioned on the surface of the basement and a low surface energy coating positioned on the surface of the antireflective film, wherein the antireflective film has a moth eye structure. The manufacturing method of the super-hydrophobic anti-reflection substrate comprises the following steps of: providing the basement; forming the antireflective film having the moth eye structure on the surface of the basement; and forming the low surface energy coating on the surface of the antireflective film. Light transmittance of the antireflective film can be further raised through formation of the low surface energy coating on the surface of the antireflective film.

Disclosed is an encapsulation barrier stack, capable of encapsulating a moisture and/or oxygen sensitive article and comprising a multilayer film, wherein the multilayer film comprises: one or more barrier layer(s) having low moisture and/or oxygen permeability, and one or more sealing layer(s) arranged to be in contact with a surface of the at least one barrier layer, thereby covering defects present in the barrier layer, wherein the one or more sealing layer(s) comprise(s) a plurality of encapsulated nano-particles, the nanoparticles being reactive in that they are capable of interacting with moisture and/or oxygen to retard the permeation of moisture and/or oxygen through the defects present in the barrier layer. The encapsulation of the particles can be obtained by polymerising a polymerisable compound (a monomeric or a polymeric compound with polymerisible groups or) cross-linking a cross-linkable compound on the surface of the reactive nanoparticles.

The invention discloses a solar cell with a composite dielectric passivation layer structure and a preparation process thereof. A silicon oxide film, an alumina film and a silicon nitride or silicon oxynitride film are deposited in turn on the front, back and sides of a p-type silicon substrate to form a composite dielectric film on the whole surface, and windows are opened locally to lead electrodes out. Through aluminum oxide, silicon dioxide, silicon oxynitride, silicon nitride with different refractive indexes and a back surface passivation layer with a laminated structure of the materials, the back surface recombination rate is greatly reduced, the back reflectivity is improved, the CTM of a module is reduced, and the light attenuation and heat-assisted light attenuation and the anti-PID performance of the cell are improved. The structure can be made on a boron/gallium-doped p-type monocrystalline silicon, p-type polycrystalline silicon or p-type monocrystalline-silicon-like substrate, and a passivation method based on the composite dielectric film passivation structure can be used to manufacture PERC cells, double-sided PERC+ cells and imbricate PERC cells. Based on the preparation process steps and sequence, the corresponding preparation mode and the process parameter range of the laminated structure, the making of the cell can be well completed.

In this method for producing an anti-reflective film, pores are formed on a surface of a polymer molding material to continuously change a refractive index and then reduce reflectance, in which anodic oxidized porous alumina, in which pores having a tapered shape and whose pore diameter continuously changes, are formed by repeating anodic oxidation at about the same formation voltage and pore diameter enlargement treatment, is used as a mold, or a stamper, which is produced by using the anodic oxidized porous aluminum as a mold, is used as a mold.

The invention discloses a method for manufacturing a porous pyramid-type silicon surface light trapping structure for a solar cell and belongs to the technical field of solar cell. The method comprises the following steps of: after cleaning a silicon wafer, manufacturing a pyramid structure surface by using an alkali etching technology; and manufacturing the porous pyramid-type surface light trapping structure by combining a noble metal nanoparticle catalyzing and etching process. The average reflectivity of a porous pyramid-type silicon surface light trapping structure manufactured by the method within a spectral range of 300 to 1000nm is reduced to 3.3 percent, so that a new technical measure is provided for improving the efficiency of a silicon solar cell; and when the method is used, the conventional alkali etching process and the noble metal nanoparticle assistant etching process are comprehensively utilized, the characteristics of a wet etching method are kept, and a higher anti-reflective effect of the silicon surface is achieved.

The present invention relates to an anti-reflective coating film. This anti-reflective coating film shows more improved interface adhesion and scratch resistance, which can be manufactured by a simple process.

Provided is a method for forming a resist lower layer material for use in a multilayer resist process, especially two-layer resist process or three-layer resist process, having a function of neutralizing an amine contaminant from a substrate, thereby reducing a harmful effect such as trailing skirts of a resist pattern of an upper layer resist. Specifically, there is provided a material for forming a lower layer of a chemically amplified photoresist layer comprising a crosslinkable polymer and a thermal acid generator that can generate an acid by heating at 100° C. or greater and is represented by the general formula (1a):

R¹CF₂SO₃⁻(R²)₄N⁺,   (1a)

as well as a resist lower layer substrate comprising a resist lower layer formed using said material.

The invention belongs to the technical field of nano-grade material preparation, and especially relates to a preparation method of a wear-resistant antireflective coating comprising mesopores, and a wear-resistant antireflective coating comprising mesopores prepared with the method. According to the invention, a cheap and easy-to-obtain common glass sheet is adopted as a substrate; tetraethyl orthosilicate, ammonia water, anhydrous ethanol, cetyl trimethyl ammonium bromide and water are adopted as raw materials; with a simple solution deposition method, a sealed reaction is carried out for 16-48h in a baking oven with a temperature of 40-80 DEG C; and a templating agent CTAB is removed with a calcination method, such that the wear-resistant antireflective coating comprising mesopores is obtained. The glass sheet coated with the coating can endure scratch test with a 6H pencil. Light transmittance of the glass sheet coated with the coating can be improved from 91.3% to 99.4%. The wear-resistant antireflective coating preparation method is simple, and cost is low. The obtained wear-resistant antireflective coating has the advantages of excellent performances, good durability, wide application range, and the like.

The invention relates to anti-reflection coated glass, in particular to aid-base resistance anti-reflection coated glass. The aid-base resistance anti-reflection coated glass comprises a glass base board and an anti-reflection film arranged on the surface of the glass base board, wherein the anti-reflection film is composed of high refractive index layers and low refractive index layers arranged in staggered and overlapped mode. The aid-base resistance anti-reflection coated glass is characterized in that three layers in the anti-reflection film are an outmost layer, a second layer and a third layer in sequence from the outmost layer to the inner. The outmost layer is 1.9-2.4 in refractive index and 3-20nm in geometry thickness and is chosen from a nitride of silicon (Si) or at least one of oxides of titanium (Ti), zirconium (Zr) and hydrogen fluoride (Hf). The second layer is 1.4-1.7 in refractive index and 50-85nm in geometry thickness. The third layer is 1.9-2.5 in refractive index and 100-180nm in geometry thickness. The aid-base resistance anti-reflection coated glass has the advantages that the anti-reflection film is provided not only with good aid-base resistance, but also with good mechanical tolerance and a good anti-reflection effect, and the anti-reflection film is coated on a single face of glass so that reflectivity of the glass can be reduced by more than 2% and even by more than 3%.

A coated substrate is provided with a scratch-resistant anti-reflective coating. The anti-reflective coating is designed as an optical interference coating that has at least two low refractive index layers and at least one high refractive index layer. The high refractive index layer is a transparent hard material layer and includes crystalline aluminum nitride with a hexagonal crystal structure with a (001) preferred orientation. The low refractive index layers include SiO2. The low refractive index layers and high refractive index layers are arranged alternately.

An electrically conductive optical element is provided with a substrate having a surface, structures which are convex portions or concave portions in the shape of a cone and which are arranged in large numbers on the surface of the substrate with a minute pitch less than or equal to the wavelength of the visible light, and a transparent, electrically conductive layer disposed on the structures. The aspect ratio of the structure is 0.2 or more, and 1.3 or less, the transparent, electrically conductive layer has a surface following the structures, the average layer thickness D_m1 of the transparent, electrically conductive layer at the top portion of the structure is 80 nm or less, and the surface resistance of the transparent, electrically conductive layer is within the range of 50Ω/□ or more, and 500Ω/□ or less.

The invention discloses solar glass self-cleaning antireflection paint and a production method thereof. In the solar glass self-cleaning antireflection paint, poly silicon dioxide is used as a main antireflection component, low reflection titanium dioxide is used as an auxiliary antireflection component and a photocatalyst, antimony doped tin oxide, titanium phosphate, silicon phosphate, phosphoric acid and antimony doped tin phosphate are used as a self-cleaning synergist, an antistat and an antireflection membrane enhancer, and deionized water is used as a solvent. The production method comprises the step: a porous silicon dioxide shell generated through ethyl silicate hydrolysis is covered with the anatase titanium dioxide photocatalyst, the antimony doped stannic oxide antistat and other synergist components. The problem that antireflection performance and the self-cleaning performance of conventional solar glass self-cleaning antireflection paint can offset each other is solved, the power generating efficiency of a solar cell can be improved and stabilized greatly, and the maintenance management cost of the solar cell can be reduced.

The present invention provides an anti-reflection film which has excellent optical properties at a low production cost. The anti-reflection film of the present invention has a low refractive index hard coat layer having low refractive index particles and a binder matrix which is formed by curing an ionizing radiation curable material on a transparent substrate. It is a feature of the anti-reflection film of the present invention that the low refractive index hard coat layer has two optically distinguishable layers from the transparent substrate side, namely, an intermediate layer and a localized layer wherein the low refractive index particles are localized, and the refractive index and optical thickness of the localized layer are in the range of 1.29-1.43 and in the range of 100-200 nm, respectively.

The present invention relates to a composition for forming anti-reflective coating for use in a lithography process in manufacture of a semiconductor device which comprises polymer (A) having a weight average molecular weight of 5,000 or less, and a polymer (B) having a weight average molecular weight of 20,000 or more. The composition provides an anti-reflective coating for use in a lithography which is excellent in step coverage on a substrate with an irregular surface, such as hole or trench, has a high anti-reflection effect, causes no intermixing with a resist layer, provides an excellent resist pattern, and has a higher dry etching rate compared with the resist layer.

The invention discloses a double-layer passivating method for a crystalline silicon solar battery, comprising the following steps: (1) selecting a silicon chip, cleaning, and polishing or texturing; (2) growing Al2O3 on the silicon chip obtained in step (1) by an ALD (atomic layer deposition) or PECVD (plasma enhanced chemical vapor deposition) method, wherein the refractive index is 1.5-1.7, the thickness is 10-80nm; (3) growing SiNx on the silicon chip obtained in step (2) by the PECVD or PVD (physical vapor deposition) method, wherein the refractive index is 1.9-2.2, the thickness is 30-150nm; and (4) annealing the sample obtained in step (3) at the temperature of 200-600 DEG C in the atmosphere of N2 or a hydrogen argon gas mixture for 1-30 minutes to obtain a double-layer passivated dielectric film. The passivating method provided by the invention can reduce the surface recombination velocity of the silicon chip to below 10cm/s, can be well applied to surface passivation of a crystalline silicon solar battery, and obtains high conversion efficiency.