Etching liquid composition and etching method

Abstract

The invention relates to an etchant composition and an etching method, wherein, the etchant composition comprises any two components of oxidants, acid and salt, and the pH value of the etchant composition is between 1 and 7. The oxidant components are selected from hydrogen peroxide, ammonium persulfate, potassium persulfate and ceric ammonium nitrate; the acid components are selected from chloric acid, perchlorate, acetic acid, nitric acid, hydrofluoric acid, sulfuric acid and oxalic acid, and the salt components are selected from ammonium fluoride, ammonium bifluoride, diammonium phosphate, ammonium phosphate, ammonium chloride and perfluorinated octyl sulfanilic acid (C8F17SO3NH4).

Description

technical field [0001] The invention relates to an etching solution composition and an etching method, in particular to an etching solution composition and an etching method for silver or silver alloy. Background technique [0002] At present, metals or alloys such as chromium, silver, molybdenum, copper, aluminum, palladium, platinum, titanium, etc. are often used as conductive materials in semiconductor manufacturing or flat panel display manufacturing. [0003] In the past, etching compositions containing acids and oxidants were often used to etch aluminum, chromium or silver metals and their alloys, but because the degree of etching required and the types of metals to be etched are also different, most of them rely on appropriate methods. After selecting the type of acid and oxidizing agent, adjust the appropriate concentration to achieve the best etching effect. [0004] Although there are a variety of etchant compositions for silver alloys at present, such as the etch...

AI Technical Summary

Problems solved by technology

[0004] Although there are a variety of etchant compositions for silver alloys at present, such as the etching compositions proposed in the Taiwan Patent No. I226386 and the No. 0593634 patent; Diameter loss (Critical dimensionloss, CD-loss) up to 2μm or more

However, driven by the trend of refinement of everything, the width of the metal lines in the display is only 3-5 μm at most. Therefore, once the known etching solution is used, as long as there is a slight error in the etching time, patterns may occur The entire disappearing condition does not apply

[0005] In addition, the etching composition proposed in U.S. Patent No. US 2003 / 0168431A1 and Taiwan Patent I226386; the oxidizing agent used is easy to decay in acidic and alkaline environments, so the service life of the etching solution composition is mostly only hours and cannot be used for a long time, which makes the cost of related manufacturing impossible to reduce

Images