Polishing solution and polishing method

A technology of polishing liquid and hydrofluoric acid, which is applied in the field of optical processing and manufacturing, can solve the problems that the surface roughness is only 260nm, the crystal nucleus dissolution of glass-ceramics is not considered, and the chemical polishing of glass-ceramics is less, so as to achieve high polishing efficiency Effect

Inactive Publication Date: 2015-08-26
NO 717 INST CHINA MARINE HEAVY IND GRP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] There are very few public reports about the chemical polishing of glass-ceramics. The polishing (neutralization) liquid of the chemical polishing of glass-ceramics reported by Jiao Lingyan et al. The crystallization nuclei of glass-ceramics are dissolved, and the surface roughness after polishing is only 260nm

Method used

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  • Polishing solution and polishing method
  • Polishing solution and polishing method
  • Polishing solution and polishing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] A kind of polishing liquid, the mass ratio of each component is ammonium bifluoride: hydrofluoric acid: hydrochloric acid: nitric acid: glycerol: ethylene glycol: hexadecyltrimethylammonium chloride=26~29:24~28: 9~10: 4~5: 20~22: 8~10: 0.1~0.5.

[0033] The preparation steps are: a), prepare each component according to the above mass ratio, b), weigh the solid substance ammonium bifluoride and cetyltrimethyl ammonium chloride with a balance according to the formula; c), measure hydrogen with a graduated cylinder Fluoric acid, hydrochloric acid, nitric acid, glycerol, ethylene glycol, all poured into the polytetrafluoroethylene tank and mixed; d), slowly add all the solid mixture in step b) to the mixed solution in step c), during the adding process Stir well in the medium to form a transparent chemical polishing solution.

Embodiment 2

[0035] The difference from Example 1 is that the mass ratio of each component is ammonium bifluoride: hydrofluoric acid: hydrochloric acid: nitric acid: glycerol: ethylene glycol: cetyltrimethylammonium chloride = 28:26 :10:4:22:10:0.1.

Embodiment 3

[0037] A polishing liquid, the mass ratio of each component is: ammonium fluoride: hydrofluoric acid: hydrochloric acid: nitric acid: glycerol: ethylene glycol: cetyltrimethylammonium chloride = 32~35: 24~ 26: 9~10: 4~5: 18~20: 6~8: 0.1~0.5.

[0038] During preparation, a) prepare the components according to the above mass ratio, b) weigh the solid ammonium fluoride and cetyltrimethylammonium chloride with a balance according to the formula; c) measure hydrofluoride with a graduated cylinder Acid, hydrochloric acid, nitric acid, glycerol, ethylene glycol, all poured into a polytetrafluoroethylene tank and mixed; d), slowly add all the solid mixture in step b) to the mixed solution in step c), during the addition process Stir well to form a transparent chemical polishing solution.

[0039] The technical principle of the present invention is: in the chemical polishing liquid HF2-, F- and HF coordination are identical, the concentration of HF in the chemical polishing liquid can...

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Abstract

The invention discloses a polishing solution which comprises fluorine salt, a hydrofluoric acid, an inorganic strong acid and an additive, wherein the fluoride salt is one or two of ammonium fluoride and ammonium bifluoride; the inorganic strong acid is at least one of hydrochloric acid, nitric acid and sulfuric acid; the additive is a mixture of glycerol, ethylene glycol and cetyltrimethyl ammonium chloride; the invention further discloses a preparation process of the polishing solution and an application of the polishing solution for polishing optical microcrystal glass parts mainly comprising Li-Al-Si. According to the invention, the problem that the traditional polishing methods cannot realize the chemical polishing of complex structural parts is solved effectively, the removal rate of polishing can be controlled strictly through the polishing time, and the polishing is controllable.

Description

technical field [0001] The invention belongs to the field of optical processing and manufacturing, and relates to a chemical polishing technology for glass-ceramic parts, in particular to a polishing liquid and a polishing method. Background technique [0002] Glass-ceramics is a new type of optical material developed in the 1960s. It has good mechanical properties and chemical stability at relatively high temperatures, and has been widely used in many fields. [0003] With the development of optoelectronic technology, higher requirements are put forward for optical components, especially for special structural parts. Glass parts with complex shapes and structures or fine and thin glass parts and glass surfaces with narrow gaps or holes must be smooth, and at the same time, defects such as residual stress and subsurface damage caused by mechanical processing must not be allowed. [0004] Traditional mechanical polishing cannot realize the polishing of complex structure part...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
Inventor 汤英童杨长城管祥彪王鹏袁顺山
Owner NO 717 INST CHINA MARINE HEAVY IND GRP
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