The invention provides a radioactive matrix surface low-temperature
nickel plating device and method.The radioactive matrix surface low-temperature
nickel plating device comprises a cleaning box
assembly, the cleaning box
assembly comprises a cleaning box body, a cleaning sample table, an
ion source and a cleaning vacuumizing pipeline, an
ion cleaning cavity is formed in the cleaning box body, and the cleaning sample table is arranged in the cleaning box body; a gate plate is arranged between the
coating box
assembly and the cleaning box assembly, the
coating box assembly comprises a first box body and a first air inlet pipeline, and a first
coating cavity is formed in the first box body; through the arrangement of the cleaning box assembly,
ion cleaning of the whole surface of a workpiece can be achieved, natural
oxide on the surface is removed, a
metal substrate is exposed, the coating quality is improved, through the arrangement of the coating box assembly, the
retention time of gas in the first coating cavity is prolonged, and the coating quality is improved. And
coating deposition of a workpiece can be completed through sufficient reaction at a lower temperature, and the
binding force of a coating film can be improved.