47 results about "Fluorinated hydrocarbons" patented technology

The invention belongs to the technical field of fuel cells, and discloses a metal organic framework material with proton conductivity and a preparation method and application thereof. Pyrazolo [3, 4-c] pyridine is used as a ligand, a binuclear cuprous cluster is used as a connection point, a two-dimensional layered structure is constructed through the ligand and the binuclear cuprous cluster, a cuprous multi-nitrogen heterocyclic metal organic framework is formed, the cuprous multi-nitrogen heterocyclic metal organic framework is oxidized, and the cuprous multi-nitrogen heterocyclic metal organic framework is obtained. Divalent copper ions and monovalent copper ions exist in the oxidized cuprous multi-nitrogen heterocyclic metal organic framework, and the metal organic framework material with proton conductivity is obtained. The proton conductivity of the metal organic framework material can be remarkably improved by adopting a metal post-synthesis modification oxidation technology, and the proton conductivity of the metal organic framework material is comparable with that of commercial Nafion, and an oxidized sample shows extremely high chemical stability; the problem of poor stability of a non-fluorinated hydrocarbon polymer proton exchange membrane and inorganic solid acid researched in the prior art is solved.

The purpose of the present invention is to provide: a radiation-sensitive composition capable of forming a resist film that can exhibit sensitivity and CDU at satisfactory levels when next-generation technology is applied and can suppress development defects; and a pattern formation method. The purpose of the present invention is also to provide a radiation-sensitive acid generator that can be applied to said radiation-sensitive composition. The present invention relates to a radiation-sensitive composition containing: a polymer (A) containing a structural unit (I) having an acid-dissociable group; a radiation-sensitive acid generator (B) represented by formula (1); and a solvent (C). (In formula (1): A is an (n1+n2+n3+1)-valent aromatic ring; R1 is a nitro group, a cyano group, a hydroxy group, an amino group, or a monovalent organic group; when there are multiple R1s, the multiple R1s are the same or different from one another; n1 is an integer of 1-5; n2 is an integer of 1-5; n3 is an integer of 0-5; m2 is an integer of 1-3; L is a single bond or an (m2+1)-valent linking group; Rf1 and Rf2 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1-20 carbon atoms; Rf3 and Rf4 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1-20 carbon atoms, or a monovalent fluorinated hydrocarbon group having 1-20 carbon atoms; when there are multiple Rf3s and multiple Rf4s, the multiple Rf3s and the multiple Rf4s may each be the same or different from one another; m1 is an integer of 0-10; and M+ is a monovalent onium cation.

A method comprises adding a fluoride anion scavenger to the waste stream, adding a base and then heating to de-fluorinate fluorinated hydrocarbons and liberating the fluoride ions, which are scavenge

A method of treating a process waste stream contaminated with fluorinated hydrocarbons, such as per- and / or polyfluoralkyl substances (PFAS), the method comprising: adding a fluoride anion scavenger (e.g. calcium hydroxide) to the process waste stream; adding a base (e.g. sodium hydroxide or lithium hydroxide) to the process waste stream; and heating the process waste stream after addition of the fluoride anion scavenger and the base to defluorinate the fluorinated hydrocarbons liberating fluoride anions which are scavenged by the fluoride scavenger. The heating step may be performed in the presence of a platinum group metal catalyst.

The purpose of the present invention is to provide a radiation-sensitive composition and a pattern formation method that enable formation of a resist film that, when a next-generation technology is applied, can exhibit sufficient levels of sensitivity and CDU and suppress development defects. Another purpose of the present invention is to provide a polymer and a compound applicable to the radiation-sensitive composition.　The present invention relates to a radiation-sensitive composition containing a solvent and a polymer containing a structural unit (I) having an acid-dissociable group and a structural unit (II) represented by formula (1). (In the formula (1), R1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. R2 is a divalent organic group having 1 to 50 carbon atoms. Z is an amide bond. R3 is a single bond or an organic group having 1 to 5 carbon atoms. Rf1 and Rf2 are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group, and at least one thereof is a fluorine atom or a fluorinated hydrocarbon group. When there are multiple Rf1s and multiple Rf2s, the multiple Rf1s and the multiple Rf2s are each the same or different. n is an integer of 1 to 3. M+ is a monovalent onium cation.)

Provided is a composition for a refrigerator, which is a mixture of a mixed refrigerant that has a low global warming potential and contains carbon dioxide, and a refrigerator oil that has excellent compatibility with the mixed refrigerant and that has excellent thermal stability with respect to the mixed refrigerant. The composition for a refrigerator contains a refrigerant mixture and a refrigerator oil containing a base oil, the refrigerant mixture containing a fluorinated hydrocarbon compound and carbon dioxide, and the base oil containing at least one selected from the group consisting of polyvinyl ethers and polyol esters.

The present invention provides a radiation-sensitive resin composition, a pattern forming method, and a radiation-sensitive acid generator, which can form a resist film that can exhibit sensitivity or LWR performance, DOF performance, pattern rectangularity, CDU performance, and pattern roundness at a sufficient level even when forming a resist pattern having a high aspect ratio. A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1); a resin including a structural unit having an acid-dissociable group; and a solvent. (In formula (1), R1, R2, and R3 are each independently a monovalent chain organic group having 1-10 carbon atoms. R4, R5, and R6 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group. When there are a plurality of R4, R5, and R6, the plurality of R4, R5, and R6 may be the same or different from each other. Rf1 is a fluorine atom or a monovalent fluorinated hydrocarbon group. When a plurality of Rf1 are present, the plurality of Rf1 are the same or different from each other. And m1 represents an integer of 0-8. And m2 represents an integer of 1-4. And Z + represents a monovalent radiation-sensitive onium cation. > # imgabs0 #

A process for recovering and upgrading unsaturated fluorinated hydrocarbons, comprises: a) providing a foam M1 consisting of pores containing a composition C1 comprising at least one unsaturated fluorinated hydrocarbon; b1) optionally grinding or compressing said foam M1 to form a ground foam or a compressed foam; b2) optionally recovering at least a portion of said composition C1; c) depolymerizing or dissolving said foam M1 provided in step a) or said ground or compressed foam obtained in step b1); d) recovering at least a portion of said composition C1 and optionally mixing the latter with said at least a portion of the composition recovered in step b2) to form a stream A comprising at least one unsaturated fluorinated hydrocarbon; e) recovering and separating said stream A into a plurality of streams of which at least one stream B1 comprises said at least one unsaturated fluorinated hydrocarbon.

To provide a production method by which a fluorohydrocarbon can be easily and efficiently produced in a vapor-phase flow mode without using a catalyst.SOLUTION: The method for producing a fluorohydrocarbon comprises: continuously supplying a first inert gas to a plasma device to form an electrical-discharge region; continuously circulating a feed gas comprising a second inert gas, a gaseous fluorinated inorganic compound and a compound represented by formula 1, CH3-R [where R is a hydrogen atom, a chlorine atom, a bromine atom, an iodine atom, or an organic group (which is not a hydrocarbon group)], around the electrical-discharge region in the plasma device; and continuously discharging the gases from the plasma device.SELECTED DRAWING: Figure 1

A resist composition including a base material component whose solubility in a developing solution is changed by an action of an acid and a compound represented by General Formula (d0). In Formula (d0), Rf represents a fluorinated hydrocarbon group; V0 represents a hydrocarbon group which may have a substituent or a single bond; Y0 represents a divalent linking group having an oxygen atom; I represents an iodine atom; x represents an integer of 1 to 4, y represents an integer of 1 to 4; 2≤x+y≤5 is satisfied; a total number of fluorine atoms contained in x pieces of Rf's is 5 or more; Mm+ represents a sulfonium cation or an iodonium cation; and m represents an integer of 1 or greater.

A highly fluorinated lubricant is configured to be adsorbed by an outer coating of a magnetic recording medium. The lubricant may have the following structure: R1-Rf-R1 wherein Rf is-CF2O (CF2CF2O) nCF2-, where n is from 1 to about 100, or Rf is-CF2CF2O (CF2CF2CF2O) sCF2CF2-,-CF2CF2O (CF2CF2CF2O) sCF2CF2-,-CF2CF2O [CF (CF3) CF2O] sCF2CF2-,-CF2O (CF2CF2O) r (CF2O) sCF2-, or-CF2O (CF2CF2O) sCF2-, and r, s are independently from 1 to about 100, and R1 is a fluorinated hydrocarbon having a functional group terminated with-OH.

A refrigerator oil composition may effectively suppress an increase in an acid value even when a ratio of an unsaturated fluorinated hydrocarbon compound (HFO) in a refrigerant is increased. Such a refrigerator oil composition can used for a refrigerant and may include one or more unsaturated fluorinated hydrocarbon compounds of formula (1):CxFyH  (1),wherein x is an integer of 2 to 6, y is an integer of 1 to 11, and z is an integer of 1 to 11, and one or more carbon-carbon unsaturated bonds are present in the molecule. The refrigerator oil composition may include a base oil (A), and one or more silicone compounds (B) selected from the group consisting of an unmodified silicone (B1) and a modified silicone (B2), wherein a content of the silicone compound (B) is 0.05% by mass or more based on the total amount of the refrigerator oil composition.

A method of treating a process waste stream contaminated with fluorinated hydrocarbons, the method comprising: adding a fluoride anion scavenger to the process waste stream; and contacting the process waste stream with a platinum group metal catalyst to defluorinate the fluorinated hydrocarbons liberating fluoride anions which are scavenged by the fluoride scavenger.

A polymer composition comprising a covalent triazine framework having the following structure:wherein: each asterisk (*) in A units denotes a point of covalent bonding with an asterisk in B units, and each asterisk (*) in B units denotes a point of covalent bonding with an asterisk in A units; r is an integer of 1-3; R is a fluorinated hydrocarbon containing at least two aromatic rings and at least one ether linkage between aromatic rings; the composition includes a multiplicity of A units and multiplicity of B units; and a portion of the connection points are terminated by endcapping nitrile groups. Also described are methods for producing the polymer and a microporous carbon material produced by pyrolysis of the porous polymer membrane. Also described are methods for using the polymer and microporous carbon material for gas or liquid separation, filtration, or purification.

A highly fluorinated lubricant configured to be adsorbed by an overcoat of a magnetic recording medium. The lubricant may have a structure:where Rf is —CF2O(CF2CF2O)nCF2— where n is from 1 to about 100, or Rf is —CF2CF2O(CF2CF2CF2CF2O)sCF2CF2—, —CF2CF2O(CF2CF2CF2O)sCF2CF2—, —CF2CF2O[CF(CF3)CF2O]sCF2CF2—, —CF2O(CF2CF2O)r(CF2O)sCF2—, or —CF2O(CF2CF2O)CF2—, and r, s are independently from 1 to about 100, and R1 is a fluorinated hydrocarbon having a functional group terminating in —OH.

Provided are an active energy ray-curable ink jet ink containing an acrylic resin which contains a constitutional unit A derived from a polymerizable compound A including at least one selected from the group consisting of a fluorinated hydrocarbon group, a polysiloxane group, and a hydrocarbon group having 12 or more carbon atoms, and contains a constitutional unit B derived from a polymerizable compound B having a polarity element of an HSP value of 4.8 MPa1 / 2 or more, and a polymerizable monomer, in which a content of the constitutional unit A is 40% by mass or less with respect to a total amount of the acrylic resin, and a content of the constitutional unit B is 15% by mass or more with respect to the total amount of the acrylic resin; and applications thereof.

A method for fabricating a transistor array substrate and a method for fabricating a display device are provided. The method of fabricating the transistor array substrate includes forming on a substrate, a material layer for an oxide semiconductor layer containing IGZO, forming a photoresist pattern on the material layer for the oxide semiconductor layer, and etching the material layer for the oxide semiconductor layer using an etching gas containing a fluorinated hydrocarbon gas represented by CxHyFz, wherein x, y and z are each integers from 1 to 10.

A radiation-sensitive composition includes: a first polymer comprising a structural unit (I) having an acid-dissociable group; a second polymer comprising a structural unit (i) represented by formula (f1); and a solvent. The acid-dissociable group has an iodo group. RK1 is a hydrogen atom, a fluorine atom, or the like; LY1 is a divalent hydrocarbon group having 1 to 10 carbon atoms; LY2 is —COO—* or —OCO—*, *is a bond on an Rf1 side; Rf1 is a monovalent hydrocarbon group having 1 to 10 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; Rf2 and Rf3 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; s is an integer of 0 to 3, and when Rf1 is the monovalent hydrocarbon group having 1 to 10 carbon atoms, s is an integer of 1 to 3.

A radiation-sensitive resin composition includes: an onium salt compound (1) represented by formula (1); an onium salt compound (2) different from the onium salt compound (1); a resin including a structural unit which includes an acid-dissociable group; and a solvent. W is a monovalent chain organic group having 1 to 40 carbon atoms, a monovalent cyclic organic group having 5 or less carbon atoms, or a monovalent group obtained by combining a monovalent chain organic group having 1 to 40 carbon atoms and a cyclic structure having 5 or less carbon atoms; R1 and R2 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; R3, R4, and R5 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 is an integer of 1 to 8; and Z+ is a monovalent radiation-sensitive onium cation.

A refrigerator oil composition, including a refrigerant containing one or more unsaturated fluorinated hydrocarbon compounds of the following general formula (1):CxFyHz  (1)where x is an integer of 2 to 6, y is an integer of 1 to 11, z is an integer of 1 to 11, and one or more carbon-carbon unsaturated bonds are present. The refrigerator oil composition further includes a base oil (A) selected from the group consisting of a polyalkylene glycol compound, a polyvinyl ether compound, a copolymer of poly(oxy)alkylene glycol or a monoether thereof and a polyvinyl ether, and a polyol ester compound, and an epoxy compound (B), where the epoxy compound (B) contains the following (B1) and (B2):(B1) at least one divalent group represented by the following formula (1),(B2) at least one ester group.

Provided are a particle including a polymer P including a bond U that is at least one selected from the group consisting of a urethane bond and a urea bond, and a hydrophilic group, a polymerizable monomer, and a moiety A that is at least one selected from the group consisting of a polysiloxane bond and a fluorinated hydrocarbon group; an aqueous dispersion; an ink jet ink; a film-forming method; and an image-forming method.

The present application relates to fluorinated hydrocarbon refining purification technical field, specifically to the purification device and method of pharmaceutical grade R134a, the device includes industrial grade R134a product tank, initial separation condenser, feed pump, degassing tower, rectifying tower, product condenser, adsorber and pharmaceutical grade product tank connected in turn, the purification method is: the raw material is condensed to remove non-condensable gas, the liquid phase enters the rectifying tower to remove light components, then enters the rectifying tower to remove heavy components and isomers, the gas phase condenses after the top of the rectifying tower and enters the adsorber filled with gradient fluorinated modified activated carbon, and the R1122 impurities and moisture are deeply removed, the present application adopts HF-N2 gradient concentration and temperature modification activated carbon, the micropore aperture is accurately controlled to 0.6-0.9nm and the polar C-F bond is formed on the surface, the double targeted capture of R1122 is realized, and finally the high-quality pharmaceutical grade R134a product with purity ≥99.99% and no R1122 detection is stably obtained.

The disclosure provides for covalent dual-functional inhibitors of peanut allergic reactions where the inhibitors include a targeting moiety comprising a peanut allergen protein epitope or mimotope peptide sequence, a reactive functional group capable of forming a site-directed covalent bond to the amine moiety of a lysine amino acid of an allergen reactive immunoglobulin, and a variable length spacer comprising oligomers of ethylene glycol monomers, amino acids, saccharides, hydrocarbons, fluorinated hydrocarbons, or a combination thereof, wherein the 10 spacer is conjugated by one or more amide bonds to the TM and the FG.

Through a refrigerant and the refrigerant comprising a component selected from the following general formula (1) C x F y H z ...(1) [In the aforementioned general formula (1), x is 2 to 6, y is 1 to 11, and z is an integer from 1 to 11, and the molecule has one or more carbon-carbon unsaturated bonds.] A refrigeration oil composition comprising one or more unsaturated fluorinated hydrocarbon compounds, and the refrigeration oil composition containing an epoxy compound (B) and a base oil (A) selected from polyalkylene glycols, polyvinyl ethers, copolymers of poly(oxy)alkylene glycols or their monoethers with polyvinyl ethers, and polyol esters, and the aforementioned epoxy compound (B) satisfies the following conditions (B1) and (B2), thereby providing a refrigeration oil composition that can effectively suppress the rise in acid value even when the ratio of unsaturated fluorinated hydrocarbon compounds (HFO) in the refrigerant is increased. (B1) The molecule has at least one divalent group represented by the following formula (1). (B2) The molecule has at least one ester group.

The invention provides a radiation-sensitive composition and a pattern forming method, wherein the radiation-sensitive composition can exert sensitivity or LWR performance, pattern rectangularity, CDU performance, pattern circularity, MEEF and exposure latitude at a sufficient level when a pattern is formed. A radiation-sensitive composition includes a first onium salt compound represented by formula (1), a second onium salt compound represented by formula (2), a polymer containing a structural unit having an acid-dissociable group, and a solvent. (In formula (1), A represents a (1 + n)-valent organic group having 1-40 carbon atoms; rf1 and Rf2 are each independently a hydrogen atom, a monovalent organic group having 1-20 carbon atoms, a fluorine atom, or a monovalent fluorinated hydrocarbon group; when there are a plurality of Rf1 and Rf2, the plurality of Rf1 and Rf2 are the same or different from each other. Wherein at least one of Rf1 and Rf2 is a fluorine atom or a monovalent fluorinated hydrocarbon group; r1 and R2 are each independently a hydrogen atom, a fluorine atom, or a monovalent organic group having 1-20 carbon atoms; when a plurality of R1 and R2 are present, the plurality of R1 and R2 are the same or different; m1 is an integer from 1 to 4; m2 is an integer of 0-4; n is an integer of 1-3; z1 + is a monovalent radiation-sensitive onium cation; wherein the number of fluorine atoms in Z1 + is 8 or less) (In formula (2), R4 represents a monovalent organic group having 1-40 carbon atoms in which a fluorine atom or a fluorinated hydrocarbon group is not bonded to an atom adjacent to a sulfur atom in SO3-; and Z2 + represents a monovalent organic cation).

Refrigerant is sealed in a refrigeration circuit. Refrigerant contains a first component and a second component. The first component consists of 1,1,2-trifluoroethylene. The second component consists of at least one selected from the group consisting of hydrocarbon having a carbon number not smaller than 1 and not larger than 5 and fluorinated hydrocarbon having a carbon number not smaller than 1 and not larger than 5. A content C1 based on a mass of the first component in refrigerant is not lower than 50 mass %. A percentage (C2 / C1)×100 of a content C2 based on a mass of the second component to the content C1 based on the mass of the first component in refrigerant is not lower than 15% and lower than 50%. The compressor is filled with compressor oil. Compressor oil is incompatible with the second component.

To provide an onium salt compound capable of exhibiting sensitivity, LWR performance, and CDU performance at a sufficient level.SOLUTION: An onium salt compound comprising a structure represented by the following formula (1-2): (In the formula, Rf1 and Rf2 are each F or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R1 is H, a monovalent hydrocarbon group having 1 to 20 carbon atoms, F, or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 to R7 are each H or a monovalent hydrocarbon group having 1 to 20 carbon atoms; n1 is an integer of 0 to 4; n2 is an integer of 0 to 4; provided that n1+n2 is an integer of 2 to 8; n3 is an integer of 0 to 5; X1 and X2 are each O or S; and Z+ is a monovalent radiation-sensitive onium cation).SELECTED DRAWING: None

A lithium borate compound represented by the following Formula (I). In Formula (I), each of R1, R2, and R3 independently represents a hydrocarbon group having from 1 to 20 carbon atoms, which may have a substituent. R10 represents a fluorine atom, a hydrocarbon-oxy group having from 1 to 10 carbon atoms, a hydrocarbon group having from 1 to 10 carbon atoms, or a fluorinated hydrocarbon group having from 1 to 10 carbon atoms.

A radiation-sensitive resin composition includes: a base resin comprising a structure unit having an acid-dissociable group; and a radiation-sensitive acid generator which comprises compounds represented by formula (2) and formula (3), and optionally a compound represented by formula (1). R1-R3 are each independently a group having a cyclic structure; X11-X32 are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group. At least one of X11 or X12, at least one of X21 or X22, and at least one of X31 or X32 are not a hydrogen atom, respectively. A11-A32 are each independently a hydrogen atom, or a hydrocarbon group having a carbon number of 1 to 20. The radiation-sensitive resin composition does not comprise a ketone-based solvent. The the radiation-sensitive resin composition does not comprise a monovalent onium cation other than an onium cation represented by formulas (X-1), (X-3), (X-4), or (X-5).

A novel method for producing an aqueous fluoropolymer dispersion is provided. The method comprises the steps of: reacting one or more fluoromonomers with a compound of the formula: TIFF0007792546000012.tif32131 and a non-fluorinated hydrocarbon compound represented by the formula (I) in water to obtain an aqueous fluoropolymer dispersion; a step of aqueously polymerizing one or more fluoromonomers in the aqueous fluoromonomer dispersion to obtain an aqueous fluoropolymer dispersion; a step of dispersing one or more fluoromonomers in the aqueous fluoropolymer dispersion or a dilution thereof to obtain a second aqueous fluoromonomer dispersion; and a step of aqueously polymerizing one or more fluoromonomers in the second aqueous fluoromonomer dispersion to obtain an aqueous fluoropolymer dispersion.