161 results about "Carbon number" patented technology

A pigment dispersion liquid containing a copolymer (A) having a first segment (a1) derived from a nitrogen-containing polymerizable unsaturated monomer having a tertiary amino group and / or a nitrogen-containing heterocyclic group, and a second segment (a2) derived from a polymerizable unsaturated monomer having a polyoxyalkylene chain, a hydrocarbon group-containing acidic compound (B), a pigment (C), and an aqueous solvent (D), and a hydrocarbon group-containing acidic compound (B) having a C5-23 saturated or unsaturated hydrocarbon group (b1) and at least one acid group (b2) selected from the group consisting of a carboxyl group, a phosphate group, a sulfonic acid group, and a phenol group.

A borate compound-containing composition soluble in hydrocarbon solvents. A composition containing base A, or a compound having a total carbon number of not less than 8 and represented by the formula (5):wherein R and R′ are each independently an optionally substituted C1-30 alkyl group, an optionally substituted C3-15 cycloalkyl group, or an optionally substituted C6-14 aryl group; anda borate compound represented by the following formula (1):wherein R1, R2, R3 and R4 are each independently a C6-14 aryl group substituted by one or more fluorine atoms or fluoro C1-4 alkyl groups; and[A-H]+ is a base A-derived cation. A method for producing a polymer, by polymerizing at least one kind of monomer selected from the group consisting of olefins and dienes by using the composition A as a cocatalyst.

An object is to provide a method of producing a carboxylic acid fluoride at an increased product yield in a reaction system without forming HCl as a by-product, in other words, without forming a complex between HCl and a carboxylic acid fluoride as a product.The method comprising reacting a carboxylic acid chloride with a metal fluoride. In this production method, the carboxylic acid is a carboxylic acid having a carbon number of 1 to 7, the carboxylic acid is a carboxylic acid substituted with fluorine, or the carboxylic acid is trifluoroacetic acid.

This invention relates to: an aliphatic polyester containing structural units (a1) derived from an aliphatic diol having alkyl branches and a main chain having 3 or more carbon atoms and structural units (a2) derived from an aliphatic dicarboxylic acid, and satisfying specific conditions; a resin composition comprising the aliphatic polyester and a molded article thereof; a method for manufacturing the aliphatic polyester satisfying the specific structure and conditions; a block copolymer satisfying the specific structure and conditions; a resin composition comprising the block copolymer and a molded article thereof; and a method for manufacturing the block copolymer satisfying the specific structure and conditions (the specific structures and conditions are as described in the specification).

Provided herein are renewable hydrocarbon compositions comprising n-paraffins and isoparaffins wherein the total amount of any C8-C16 isoparaffins is from 50 to 94 wt% of the total weight of the hydrocarbon composition, the hydrocarbon composition has a kinematic viscosity of from 3.7 to 8 mm2 / s at-20 DEG C, and the weighted average carbon number of the hydrocarbons in the hydrocarbon composition is from 12.1 to 14.2.

Provided are a fluorine-containing ether composition and a coating liquid which are capable of forming a surface layer having excellent water droplet slipping properties, and an article having a surface layer having excellent water droplet slipping properties. A fluorine-containing ether composition containing a fluorine-containing ether compound (A) and a fluorine-containing ether compound (B), the compound (A) and the compound (B) each having a poly (oxyperfluoroalkylene) chain, a perfluoroalkyl group bonded to one end thereof, and a group represented by formula (I), in the combination of the compound (A) and the compound (B) contained in the composition, the number of carbon atoms of the perfluoroalkyl group contained in the compound (A) is less than the number of carbon atoms of the perfluoroalkyl group contained in the compound (B), and the content of the compound (A) is 30-95 mass% with respect to the total amount of the compound (A) and the compound (B). In-SiRnL3-n (I), L is a hydroxyl group or a hydrolyzable group, R is a hydrogen atom or a monovalent hydrocarbon group, and n is an integer of 0-2.

The application relates to the technical field of fluorine-containing iodoalkane preparation, in particular to a preparation method of high-carbon-number diiodoperfluoroalkane, which comprises the following steps: reacting tetrafluoroethylene and elemental iodine to generate diiodotetrafluoroethane; and under the action of a catalyst, the diiodotetrafluoroethane is subjected to telomerization reaction with tetrafluoroethylene to generate high-carbon-number diiodoperfluorobutane and diiodoperfluorohexane; and the catalyst is a metal nickel catalyst supported on silicon dioxide. The metal nickel catalyst supported on silicon dioxide is used to make the diiodotetrafluoroethane and the tetrafluoroethylene subjected to telomerization reaction to obtain diiodoperfluoroalkane with higher carbon number. The application has the advantages of simple process, low reaction temperature and the like, and can significantly improve the yield of diiodoperfluorobutane and diiodoperfluorohexane.

The present invention provides a non-fluorine-based (i.e., a non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine- ), an article surface-treated with the surface treatment agent, and a method for forming a coating film by applying the surface treatment agent on a substrate. A non-fluorine-based surface treatment agent containing: (A) a non-fluorine-based hydrocarbon terminal group-containing compound having at least one C4-32 linear, branched or cyclic monovalent hydrocarbon group at a molecular chain terminal and having at least one reactive silyl group at another molecular chain terminal, and / or a partial reaction condensate thereof; and (B) a compound having a functional group and a silanol group or a hydrolyzable silyl group at a molecular chain terminal, or a compound having a silanol group or a hydrolyzable silyl group at both molecular chain terminals: 1-50 mass% of the total of component (A) and component (B).

The present application provides a liquid crystal compound, a liquid crystal composition, and an application and an element thereof. The liquid crystal compound has at least one property of stability to heat, a high clearing point, a low lower limit temperature of a liquid crystal phase, a small viscosity, a very large refractive index anisotropy, and excellent compatibility with other liquid crystal compounds, as a material used in an element for controlling electromagnetic waves in a range of 1 GHz to 10 THz. The liquid crystal composition contains the compound, and the element uses the composition, and electromagnetic wave control can be performed in a wide temperature range. A compound is represented by formula (1). For example, R 1 is an alkyl group having 1 to 12 carbon atoms; L 1 is fluorine; L 2 is hydrogen; L 3 is fluorine; L 4 is methyl; Y 1 is hydrogen; Y 2 is hydrogen; and n is 0.

The invention relates to the field of rubber protective wax, and discloses bimodal rubber protective wax as well as a preparation method and application thereof, specifically, based on the total amount of hydrocarbons in the bimodal rubber protective wax, the content of n-alkane is 60-80wt%; on the basis of the total amount of hydrocarbons in the bimodal rubber protective wax, the content of alkane with the carbon number smaller than C22 is smaller than or equal to 10 wt%, the content of alkane with the carbon number smaller than C22 is 20-45 wt%, the content of alkane with the carbon number larger than C40 is 45-65 wt%, and the content of alkane with the carbon number larger than C40 is smaller than or equal to 15 wt%; the bimodal rubber protection wax has excellent anti-aging capability, and especially has strong anti-aging capability on rubber in an environment with a day and night temperature difference of greater than or equal to 20 DEG C.

Provided is a method for producing an olefin-containing composition, the method comprising a step of decomposing a plastic in the presence of a zeolite to produce an olefin-containing composition containing an olefin having 2 to 5 carbon atoms, and the zeolite is an MFI-type zeolite containing Rb +.

The purpose of the present invention is to provide: a radiation-sensitive composition which is capable of forming a resist film that can exhibit sensitivity, LWR, DOF, EL, PED, CDU, and pattern circularity at a sufficient level; and a pattern forming method. Another purpose of the present invention is to provide a radiation-sensitive acid generator that can be applied to the radiation-sensitive composition. The radiation-sensitive composition contains a solvent (E) and a polymer (A) containing a structural unit (I) having an acid-dissociable group, and at least the radiation-sensitive composition contains a radiation-sensitive acid generator (B) containing a partial structure represented by formula (a), or the polymer (A) contains a structural unit (VII) containing a partial structure represented by formula (a). (In formula (a), R1 represents a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxyl group, a thiol group, or a monovalent fluorine-free organic group; under the condition that a plurality of R1 exist, the plurality of R1 are the same or different; r2 and R3 are each independently a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxyl group, a thiol group, a halogen atom, or a monovalent organic group, or a C3-20 divalent alicyclic group in which R2 and R3 are bonded to each other and together with a carbon atom to which R2 and R3 are bonded; when a plurality of R2 and R3 are present, the plurality of R2 and R3 are the same or different; l is-C (= O) O-,-C (= O) NR5-or-OC (= O) O-; R5 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; a bond on the R41 side; r41 is a divalent organic group having a cyclic structure and having a heteroatom; m is an integer of 1-5; n is an integer of 0-4; the bond is a bond with the other part in the corresponding polymer (A) or radiation-sensitive acid generator (B); and M + represents a monovalent onium cation).

The invention provides a radiation-sensitive composition and a pattern forming method. The radiation-sensitive composition can fully exert sensitivity or pattern rectangularity, pattern circularity, exposure latitude, focal depth, development defect inhibition, LWR and CDU when forming a resist pattern, and has good storage stability. A radiation-sensitive composition comprising: an onium salt compound represented by formula (1); a polymer; and a solvent. (In formula (1), Rf represents a halogen atom or a cyano group. And n represents an integer of 0-4. When n is 2 or more, the plurality of Rf are the same as or different from each other. R1 represents a monovalent organic group having 1-20 carbon atoms, a hydrogen atom, a halogen atom, a cyano group, or an alkyl fluoride group, said monovalent organic group being bonded to the carbon atom to which R1 is bonded via-COO-,-OCO-,-SO2-,-S-,-CO-,-O-CO-O-,-CONR '-, or-NR' CO-. R'each independently represents a hydrogen atom or a monovalent hydrocarbon group having 1-10 carbon atoms; and R1 represents a carbon atom to which R1 is bonded. In the formula, when n is 0, R1 is a halogen atom or a cyano group. And R2 is a hydroxyl group, a nitro group, an amino group, a carboxyl group or a monovalent organic group with 1-20 carbon atoms. And m represents an integer of 0-4. When m is 2 or more, the plurality of R2 may be the same as or different from each other. And n + m represents an integer of 0-4. Ar is a monovalent organic group having an aromatic ring having a ring member number of 5-40. And X is methylene,-O-,-CO-or-SO2-. Wherein, when X is a methylene group, the aromatic ring of Ar is directly bonded to S + in the formula, and R1 does not include a polymerizable group. And each of R41, R42, R43, R44, R45 and R48 independently represents a hydrogen atom, a hydroxyl group, a halogen atom or a monovalent organic group having 1-20 carbon atoms. And R46 and R47 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, or a monovalent organic group having 1-20 carbon atoms, or each represents a ring structure having 3-10 ring members in which R46 and R47 are bonded to each other and are configured together with the two carbon atoms to which these are bonded.) (In the formula, R46 and R47 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, or a monovalent organic group having 1-20 carbon atoms.

The present invention relates to an organic film forming material, a pattern forming method and a polymer. The object of the present invention is to provide an organic film forming material which does not impair the carbon content of the resin itself and which can exhibit high etching resistance and excellent distortion resistance, and to provide a pattern forming method using the organic film forming material and a polymer suitable for the same. The means for solving the object is an organic film forming material characterized by containing: (A) a polymer having a repeating unit represented by the following general formula (1), and (B) an organic solvent; in the general formula (1), AR1, AR2, AR3 and AR4 are benzene rings or naphthalene rings, W1 is a 4-valent organic group having a carbon number of 6 to 70 and having at least one or more aromatic rings, and W2 is a 2-valent organic group having a carbon number of 1 to 50.

A resin composition contains a maleimide compound (A) and a phosphorus-containing compound (B). The maleimide compound (A) includes a first maleimide compound (A1) having an alkyl group, of which a carbon number is equal to or greater than six, and / or an alkylene group, of which a carbon number is equal to or greater than six. The phosphorus-containing compound (B) includes a phosphorus-containing compound (B1) having a structure expressed by the following formula (b1), where s indicates an integer falling within a range from 1 to 10, Z indicates either an arylene group or an ester bond expressed by the following formula (b1.1), R1 to R3 each independently indicate either a hydrogen atom or a monovalent organic group, and * indicates a bond.

A composition containing: (b) a compound represented by formula (1); and (c) a compound represented by formula (2) (excluding the compound represented by formula (1)) . (In formula (1), A, B, and C are hydrogen atoms, halogen atoms, hydroxyl groups, carboxyl groups, cyano groups, nitro groups, C1-20 alkyl groups optionally having substituents, or the like, and l, m, and n are each an integer of 1-4. (In formula (2), X represents a hydrogen atom, an optionally substituted alkyl group having 1-20 carbon atoms, or the like. And D and E are hydrogen atoms, halogen atoms, hydroxyl groups, carboxyl groups, cyano groups, nitryl groups, alkyl groups which optionally have substituent groups and have 1-20 carbon atoms, and alkoxy groups which optionally have substituent groups and have 1-20 carbon atoms. The two or more Ds and the two or more Es may be bonded to each other to form a monocyclic ring or a fused ring. And o and p are respectively integers from 1 to 4)

The present invention relates to a metal powder containing a metal of Au, Ag, Cu, or an alloy thereof, having an average particle size of 0.1 μm or more and 0.4 μm or less, and purity of 99.9% by mass or more. In this metal powder, a presence ratio, in terms of the number of particles, of non-spherical particles in the metal powder having a ratio (b / a) of a minor axis “a” and a major axis “b” of 3 or more is 1% or less. As a method for producing such a metal powder, in a wet reduction method including a metal colloid synthesis step and a metal powder granulation step of granulating metal colloidal particles into a metal powder, surfactants having alkyl groups having carbon numbers falling within specified ranges are preferably used as first and second dispersants in the metal colloid synthesis step and the metal powder granulation step.

The invention relates to a silicon-containing resist film forming composition and a pattern forming method. The present invention is a silicon-containing composition for forming a resist film, which forms an ultra-fine resist pattern having excellent LWR and CDU, which forms a resist film having high etching selectivity with an organic material, and which does not cause defects due to residues remaining after the completion of patterning, and a pattern forming method. A silicon-containing composition for forming a resist film, which contains a polysiloxane that contains at least one of a repeating unit represented by formula (A-1), a repeating unit represented by formula (A-2), and a partial structure represented by formula (A-3). (In the formula, R1 is a C1-30 monovalent organic group which may have a substituent and acts as a leaving group by heat, an acid or a base, a halogen atom, a hydroxyl group, a sulfo group, a nitro group or a carboxyl group, and R2 and R3 each independently represent a C1-30 monovalent organic group which may have a substituent.

Provided are a resin composition, and a molded body and a multilayer body using the resin composition. A resin composition which contains at least one type of chloride selected from the group consisting of chlorides of alkali metals and chlorides of alkaline earth metals, and which contains a xylylenediamine-based polyamide resin that contains a structural unit derived from a diamine and a structural unit derived from a dicarboxylic acid, 70 mol% or more of the diamine-derived structural units are derived from xylylenediamine, and 70 mol% or more of the dicarboxylic acid-derived structural units are derived from a C4-20 [alpha], [omega]-linear aliphatic dicarboxylic acid.

The present invention relates to a plasticizer composition comprising a plasticizer A comprising a phthalic acid diester represented by general formula (I) and a plasticizer B comprising an isosorbide diester (b1) represented by general formula (II). (In general formula (I), R1 and R2 each represents a linear or branched alkyl group having 8-14 carbon atoms, which may be the same or different from each other) (In general formula (II), R3 and R4 each represents a linear or branched alkyl group having different carbon numbers)

The invention relates to a composition for forming a wafer edge protection film, a method for forming a wafer edge protection film, and a method for forming a pattern. The present invention addresses the problem of providing a composition for forming a wafer edge protection film, said composition being capable of providing a wafer edge protection film that can exhibit excellent dry etching resistance and that can exhibit excellent uniform coating properties even on a wafer edge that is difficult to coat. The solution of this problem is to provide a composition for forming a wafer edge protective film, which is used for forming a wafer edge protective film at the peripheral edge of a substrate, and which is characterized by containing a polymer (A) represented by general formula (1) and a solvent. In the formula, W is-SO2-,-C (= O)-or-O-, R1, R2, R3, R4 and R5 are each independently a halogen atom, a monovalent organic group having 1-3 carbon atoms, or a hydroxyl group, and a, b, c, d and e are each independently an integer of 0-4.

The present invention addresses the problem of providing a photosensitive resin composition which has high sensitivity and is capable of forming a pattern in which the shrinkage of the pattern during a curing reaction performed after exposure / development is small, the photosensitive resin composition contains a polybenzoxazole precursor having a repeating unit represented by formula (1), and a photoacid generator. (R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1-6 carbon atoms, or a univalent acid-decomposable group having 1-120 carbon atoms, X represents a divalent linking group, and V represents a linear or branched divalent aliphatic hydrocarbon group having 1-3 carbon atoms or a divalent aliphatic hydrocarbon group represented by formula (9)) (n represents an integer of 0-11, m represents an integer of 1-12, n + m is 1-12, and R20 and R21 represent a hydrocarbon group having 2-4 carbon atoms when n = 0 and a hydrocarbon group having 1-4 carbon atoms when n is not equal to 0, and represent a bond node with an amide group).

The present invention relates to a process for the selective dehydrocyclization and aromatization of linear or branched hydrocarbons in the SAF range to aromatics in the SAF range.

A method of producing a fluorine-containing compound is a method of producing a compound (30) having partial structure (3) by an insertion reaction of compound (20) into compound (10) that has partial structure (1), in the presence of an ionic catalyst formed from a specific monovalent anion and a counter cation. In the formulas, * represents a bonding site, and X1 and R1 to R4 each independently represents a hydrogen atom, a fluorine atom, a chlorine atom, or an organic group having a carbon number of 1 to 20 which may have a substituent.

The present invention aims to provide a radiosensitive linear composition, a hardened film, a method for manufacturing the same, a semiconductor element, a display element, and a polymer that can produce a film with excellent adhesion. A radiosensitive linear composition comprises: a polymer containing a structural unit (I) having a base represented by formula (1), a photoacid generator, and an orthoester compound. In formula (1), R... 1 It can be a hydrogen atom, a halogen atom, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms. R 2 and R 3 Each of the following can be independently a hydrogen atom, a halogen atom, a hydroxyl group, an alkoxy group with 1 to 6 carbon atoms, an alkyl group with 1 to 10 carbon atoms, or a phenyl group. "*" indicates a bond.

Provided is a graft copolymer comprising a (meth)acrylate ester-based polymer block (A) having a reactive silicon group represented by the formula: -SiR1 3-aXa, and a (meth)acrylate ester-based polymer block (B) having a number average molecular weight of 7,000 or more. The (meth)acrylate ester-based polymer block (A) and the (meth)acrylate ester-based polymer block (B) are bonded in the order of A-B-A. A reactive silicon group equivalent in the graft copolymer is 0.15 mmol / g or more. A content of an alkyl (meth)acrylate ester contained in the polymer block (A), in which the carbon number of the alkyl is 7 or more, is 0-10 wt% in the graft copolymer. A content of an alkyl (meth)acrylate ester contained in the polymer block (A), in which the carbon number of the alkyl is 3 or less, is 25 wt% or more in the graft copolymer.

The invention discloses a method for preparing chain-length-controllable alkyl aromatic hydrocarbon by directionally converting thermoplastic plastic through a hierarchical pore MFI nanosheet supported ruthenium catalyst. The method comprises the following steps: mixing thermoplastic plastic, an MFI nanosheet carrier loaded ruthenium catalyst and cyclohexane, stirring and reacting for 9-18 hours in an inert atmosphere at the pressure of 0.1-1.0 MPa and the temperature of 230-250 DEG C to obtain alkyl aromatic hydrocarbon with controllable chain length, and controlling the ratio of the specific surface area of micropores to the sum of the specific surface areas of mesopores and macropores to be (0-1): (1.6-606) by controlling the stirring time to obtain the alkyl aromatic hydrocarbon with controllable chain length. The side chain length distribution of the obtained alkyl aromatic hydrocarbon main product is concentrated on 1-3 continuous carbon numbers in C2-C24, and the difference value of the number of carbon atoms is less than 3, so that the contradiction between the diffusion limitation of a macromolecular polymer and the product selectivity is effectively solved. The yield of the obtained alkyl aromatic hydrocarbon is up to 67.4-75.0%, the selectivity is up to 72.8-83.4%, and the industrial application value is remarkable.

The application belongs to the technical field of oil-water separation and emulsion demulsification, and relates to a super-hydrophobic activated carbon coating material and a preparation method and application thereof. The preparation method comprises the following processes: washing activated carbon to expose hydroxyl groups on the surface of the activated carbon; reacting the washed activated carbon with organic silane in an alkaline system containing water, so that the organic silane is hydrolyzed and chemically bonded with the hydroxyl groups on the surface of the activated carbon, and the organic silane grafted on the surface of the activated carbon is polymerized, to obtain super-hydrophobic activated carbon; wherein the alkyl carbon number of the organic silane is not less than 10; and the super-hydrophobic activated carbon is uniformly mixed with a resin binder in a solvent, to obtain the coating material. The coating material is prepared by using super-hydrophobic activated carbon, and has the advantages of low price, firmness and durability, excellent performance, simple preparation process and the like, and can be widely applied to the fields of oil-water separation and emulsion demulsification.

The present disclosure relates to a polyamide acid comprising diamine units and tetracarboxylic acid units, at least one selected from the diamine units and the tetracarboxylic acid units comprising a unit (X) having a group (X) comprising at least one non-aromatic hydrocarbon group, and the total carbon number of the at least one non-aromatic hydrocarbon group is 9 or more, and the content of the unit (X) is 12.0 mol% or more, based on the total amount of the diamine units and the tetracarboxylic acid units.

This invention provides an alkali-generating agent and a curable resin composition that exhibit excellent storage stability in a liquid, high catalytic activity at the desired curing temperature, and induce a curing reaction in a short time. An alkali-generating agent comprises a pyridinium cation and an anionic residue of an organic or inorganic acid, and is represented by the following formula (a). (In formula (a), A represents a divalent hydrocarbon group with 1 to 8 carbon atoms that may contain heteroatoms; R1 to R5 independently represent hydrogen atoms or electron-donating groups; R1 and R2, R2 and R3, R3 and R4, and R4 and R5 can be bonded to form a ring structure. R6 to R5...) 10 Each of the following groups independently represents a hydrogen atom, halogen atom, hydroxyl group, alkoxy group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, cyano group, sulfinic acid group, sulfonyl group, sulfonic acid group, phosphono group, oxophosphono group, phosphonyl group, phosphonate group, amino group, or ammonium group, R6 and R7, R7 and R8, R8 and R9, R9 and R 10 They can be bonded separately to form a ring structure.