284 results about "Carbon number" patented technology

The invention provides an active carrier, a supported metallocene catalyst, a preparation method and application. The invention relates to an active carrier, which is used for loading a metallocene compound to form a loaded metallocene catalyst, and comprises a carrier body and an ether-modified aluminoxane compound loaded on the carrier body, the ether-modified aluminoxane compound is modified with at least one of an alkyl ether having an alkyl carbon chain having 10 or more carbon atoms and a crown ether. The aluminoxane compound is modified by ether, so that the usage amount of the aluminoxane compound when the active carrier is used for preparing the supported metallocene catalyst can be reduced, the preparation cost of the supported metallocene catalyst is further reduced, and the supported metallocene catalyst can maintain relatively high catalytic activity.

A pigment dispersion liquid containing a copolymer (A) having a first segment (a1) derived from a nitrogen-containing polymerizable unsaturated monomer having a tertiary amino group and / or a nitrogen-containing heterocyclic group, and a second segment (a2) derived from a polymerizable unsaturated monomer having a polyoxyalkylene chain, a hydrocarbon group-containing acidic compound (B), a pigment (C), and an aqueous solvent (D), and a hydrocarbon group-containing acidic compound (B) having a C5-23 saturated or unsaturated hydrocarbon group (b1) and at least one acid group (b2) selected from the group consisting of a carboxyl group, a phosphate group, a sulfonic acid group, and a phenol group.

The present invention provides a pressure-sensitive adhesive composition suitable for producing a pressure-sensitive adhesive sheet having a low glass transition temperature. The pressure-sensitive adhesive composition according to the present invention includes a β-1,3-glucan derivative G. The β-1,3-glucan derivative G has an acyl group a having a carbon number of 8 or more and an acyl group b having a carbon number different from the carbon number of the acyl group a, and the carbon number of the acyl group b is 8 or more. A pressure-sensitive adhesive sheet 1 according to the present invention is formed from the pressure-sensitive adhesive composition. A laminate 10 according to the present invention includes the pressure-sensitive adhesive sheet 1 and a substrate sheet 2.

The invention relates to the technical field of hydrogen storage of organic aromatic hydrocarbon molecules, in particular to a derivative of a benzopyrrole compound, a preparation method and application of the derivative, a hydrogen storage method and a hydrogen release method. The chemical structural formula of the derivative is selected from one of M1, M2, M3, M4, M5R and M5S, wherein when the chemical structural formula of the derivative is M1, M2, M3, M5R or M5S, A is selected from a saturated alkyl chain with the carbon number of 1-6 or an unsaturated alkyl chain with the carbon number of 2-6; when the chemical structural formula of the derivative is M4, A is selected from a saturated alkyl chain with the carbon number of 1-6, an unsaturated alkyl chain with the carbon number of 2-6 or boron. Compared with azacyclo-organic molecular materials (carbazoles and indoles) which exist in the field of organic hydrogen storage and are massively researched, the azacyclo-aromatic organic molecular material containing the double nitrogen atoms, which can generate a bridging structure between the double nitrogen atoms and can be used for hydrogen storage, is provided for the first time; and the material is large in hydrogen storage capacity and low in melting point.

A toner comprising a toner particle comprising a binder resin, wherein the binder resin comprises an amorphous polyester A and a crystalline polyester C; the amorphous polyester A has an amorphous polyester segment a1 and a2; the amorphous polyester segment a2 has a monomer unit of a specific alcohol a0; the crystalline polyester C is a polymer having a crystalline polyester segment c2 and a crystalline segment c1 bonded to the end of the crystalline polyester segment c2; the crystalline polyester segment c2 has a monomer unit of a specific alcohol b0; an absolute value of a difference between a carbon number of the linear aliphatic polyhydric alcohol a0 and a carbon number of the linear aliphatic polyhydric alcohol b0 is 4 or less; and SP values of the polyester segment a1 and a2, and the crystalline segment c1 and the crystalline polyester segment c2 satisfy specific relationships.

An electrolyte composition includes: a sulfonylimide compound represented by the following general formula (1) as an electrolyte salt; and an amidosulfuric acid component.LiN(X1SO2)(X2SO2)  (1)(where X1 and X2 are identical to or different from each other, and each represent a fluorine atom, an alkyl group with a carbon number of 1 to 6, or a fluoroalkyl group with a carbon number of 1 to 6).

A borate compound-containing composition soluble in hydrocarbon solvents. A composition containing base A, or a compound having a total carbon number of not less than 8 and represented by the formula (5):wherein R and R′ are each independently an optionally substituted C1-30 alkyl group, an optionally substituted C3-15 cycloalkyl group, or an optionally substituted C6-14 aryl group; anda borate compound represented by the following formula (1):wherein R1, R2, R3 and R4 are each independently a C6-14 aryl group substituted by one or more fluorine atoms or fluoro C1-4 alkyl groups; and[A-H]+ is a base A-derived cation. A method for producing a polymer, by polymerizing at least one kind of monomer selected from the group consisting of olefins and dienes by using the composition A as a cocatalyst.

A method for forming a photoresist pattern includes: (i) a step of forming a photoresist film on a support using a photoresist composition; (ii) a step of exposing the photoresist film; and (iii) a step of developing the exposed photoresist film to form a photoresist pattern, characterized in that the photoresist composition contains: a resin (A) whose solubility in the developer changes due to the action of an acid, an acid-generating agent (B) that generates acid upon exposure, a photodegradable alkali (D1), a solvent (S), and a compound (X) represented by the following formula (x-1), wherein the amount of solvent remaining in the photoresist film formed in step (i) is 910 ppm or more, wherein R 1 ~R 4 It is a hydroxyl group or an alkyl group having 1 to 5 carbon atoms, R 5 and R 6 It is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl group having 1 to 10 carbon atoms obtained by substitution with a hydroxyl group.

An object is to provide a method of producing a carboxylic acid fluoride at an increased product yield in a reaction system without forming HCl as a by-product, in other words, without forming a complex between HCl and a carboxylic acid fluoride as a product.The method comprising reacting a carboxylic acid chloride with a metal fluoride. In this production method, the carboxylic acid is a carboxylic acid having a carbon number of 1 to 7, the carboxylic acid is a carboxylic acid substituted with fluorine, or the carboxylic acid is trifluoroacetic acid.

An amido group-containing monomer composition contains 80.00 to 99.99 mass % of an amido group-containing monomer (a) of the following formula (1) and 0.01 to 20.00 mass % of a metal chelate complex (b) having carbonyl group as a ligand:wherein R1 represents a hydrogen atom or a methyl group, R2 represents a hydrocarbon group having a carbon number of 1 to 6, R3 represents a hydrocarbon group having a carbon number of 1 to 23, and R4 represents hydrogen or a methyl group.

This invention relates to: an aliphatic polyester containing structural units (a1) derived from an aliphatic diol having alkyl branches and a main chain having 3 or more carbon atoms and structural units (a2) derived from an aliphatic dicarboxylic acid, and satisfying specific conditions; a resin composition comprising the aliphatic polyester and a molded article thereof; a method for manufacturing the aliphatic polyester satisfying the specific structure and conditions; a block copolymer satisfying the specific structure and conditions; a resin composition comprising the block copolymer and a molded article thereof; and a method for manufacturing the block copolymer satisfying the specific structure and conditions (the specific structures and conditions are as described in the specification).

To provide a pressure-sensitive adhesive composition having anti-static performance and an excellent balance of adhesive strength between low and high speed peeling regions, and further being excellent in durability, reworkability, and anti-static property, a pressure-sensitive adhesive film, and a surface protective film of a polarizing plate.SOLUTION: A pressure-sensitive adhesive composition is formed of a copolymer containing a (meth)acrylate ester monomer having a 4-10C alkyl group (A), a hydroxy group-containing copolymerizable monomer (B), a carboxy group-containing copolymerizable monomer (C), and a polyalkylene glycol mono(meth)acrylate monomer (D), and further contains a 3 or more functional isocyanate compound (E), an anti-static agent (H), and a polyether-modified siloxane compound (I), and weight ratios of them based on (A) 100 are (B) 0.1-5.0, (C) 0.35-1.0, and (D) 1-20, and those based on copolymer 100 are (E) 0.5-5.0 and (I) 0.01-0.5.SELECTED DRAWING: None

Provided herein are renewable hydrocarbon compositions comprising n-paraffins and isoparaffins wherein the total amount of any C8-C16 isoparaffins is from 50 to 94 wt% of the total weight of the hydrocarbon composition, the hydrocarbon composition has a kinematic viscosity of from 3.7 to 8 mm2 / s at-20 DEG C, and the weighted average carbon number of the hydrocarbons in the hydrocarbon composition is from 12.1 to 14.2.

Provided are a fluorine-containing ether composition and a coating liquid which are capable of forming a surface layer having excellent water droplet slipping properties, and an article having a surface layer having excellent water droplet slipping properties. A fluorine-containing ether composition containing a fluorine-containing ether compound (A) and a fluorine-containing ether compound (B), the compound (A) and the compound (B) each having a poly (oxyperfluoroalkylene) chain, a perfluoroalkyl group bonded to one end thereof, and a group represented by formula (I), in the combination of the compound (A) and the compound (B) contained in the composition, the number of carbon atoms of the perfluoroalkyl group contained in the compound (A) is less than the number of carbon atoms of the perfluoroalkyl group contained in the compound (B), and the content of the compound (A) is 30-95 mass% with respect to the total amount of the compound (A) and the compound (B). In-SiRnL3-n (I), L is a hydroxyl group or a hydrolyzable group, R is a hydrogen atom or a monovalent hydrocarbon group, and n is an integer of 0-2.

The application relates to the technical field of fluorine-containing iodoalkane preparation, in particular to a preparation method of high-carbon-number diiodoperfluoroalkane, which comprises the following steps: reacting tetrafluoroethylene and elemental iodine to generate diiodotetrafluoroethane; and under the action of a catalyst, the diiodotetrafluoroethane is subjected to telomerization reaction with tetrafluoroethylene to generate high-carbon-number diiodoperfluorobutane and diiodoperfluorohexane; and the catalyst is a metal nickel catalyst supported on silicon dioxide. The metal nickel catalyst supported on silicon dioxide is used to make the diiodotetrafluoroethane and the tetrafluoroethylene subjected to telomerization reaction to obtain diiodoperfluoroalkane with higher carbon number. The application has the advantages of simple process, low reaction temperature and the like, and can significantly improve the yield of diiodoperfluorobutane and diiodoperfluorohexane.

A lubricating oil additive composition including: (i) a Broensted acid salt of at least one first amide compound, the Broensted acid salt being a salt of the first amide compound and a Broensted acid, the first amide compound being a monoamide of at least one fatty acid (a1), and at least one amine compound (a2), the amine compound (a2) being an oligomer of at least one alkanolamine (a3) represented by the general formula (1):in the formula, n is 1 or 2; R1 is C1-4 linear chain alkylene or C3-10 branched chain alkylene, the C3-10 branched chain alkylene having a main chain, the main chain having a carbon number of 2; and when n is 2, a plurality of R1's may be the same, and may be different from each other.

The present invention relates to a water-absorbing resin and a method for manufacturing the same. The method for manufacturing the same is to perform a polymerization reaction on an acid group-containing monomer using a specific amount of a foaming agent under pressure sealing to obtain a core layer having a specific surface porosity, and then perform a surface cross-linking reaction on the core layer using an acyclic monoterpene alcohol having a carbon number of 10 to 12 and a surface cross-linking agent, so that the water-absorbing resin obtained has both good water-absorbing properties and superior deodorizing efficacy.

An organic EL element using the compound represented by general formula (1) according to the present invention can be an organic EL element having high luminous efficiency and a long life. A compound for an organic electroluminescent element is represented by general formula (1). Here, Ad is an adamantyl group represented by general formula (2). X independently represents N, or CR1, at least one X represents N. R1 independently represents hydrogen or the like; ar1 represents a substituted or unsubstituted aromatic hydrocarbon group having 6-18 carbon atoms, or the like; r independently represents a substituted or unsubstituted aromatic heterocyclic group having 3-17 carbon atoms, or the like; l1 and L2 each independently represent a direct bond or the like; and a represents a substitution number and independently represents an integer of 0-4. And b-f each represents a substitution number and independently represents an integer of 0-4. Wherein b + c + d + e + f is greater than or equal to 1.

The present invention provides a non-fluorine-based (i.e., a non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine-based, non-fluorine- ), an article surface-treated with the surface treatment agent, and a method for forming a coating film by applying the surface treatment agent on a substrate. A non-fluorine-based surface treatment agent containing: (A) a non-fluorine-based hydrocarbon terminal group-containing compound having at least one C4-32 linear, branched or cyclic monovalent hydrocarbon group at a molecular chain terminal and having at least one reactive silyl group at another molecular chain terminal, and / or a partial reaction condensate thereof; and (B) a compound having a functional group and a silanol group or a hydrolyzable silyl group at a molecular chain terminal, or a compound having a silanol group or a hydrolyzable silyl group at both molecular chain terminals: 1-50 mass% of the total of component (A) and component (B).

The present application provides a liquid crystal compound, a liquid crystal composition, and an application and an element thereof. The liquid crystal compound has at least one property of stability to heat, a high clearing point, a low lower limit temperature of a liquid crystal phase, a small viscosity, a very large refractive index anisotropy, and excellent compatibility with other liquid crystal compounds, as a material used in an element for controlling electromagnetic waves in a range of 1 GHz to 10 THz. The liquid crystal composition contains the compound, and the element uses the composition, and electromagnetic wave control can be performed in a wide temperature range. A compound is represented by formula (1). For example, R 1 is an alkyl group having 1 to 12 carbon atoms; L 1 is fluorine; L 2 is hydrogen; L 3 is fluorine; L 4 is methyl; Y 1 is hydrogen; Y 2 is hydrogen; and n is 0.

To provide a release agent which has heat resistance at least equivalent to that of a coal-based wax such as a montan wax, and is excellent in mold releasability, and a resin composition.SOLUTION: A release agent contains a compound (I) obtained by reaction of a carboxy group of a composition (A) which contains 75 to 100 mass% of a compound (A') having 0 to 25 mass% of polyethylene and a saturated hydrocarbon chain having 24 or more average carbon numbers, having the one carboxy group, and having polydispersity Mz / Mn of 1.8 or less, and has polydispersity Mz / Mn of 1.8 or less, and a hydroxy group of a composition (B) which contains 75 to 100 mass% of a compound (B') having 0 to 25 mass% of polyethylene and a saturated hydrocarbon chain having 24 or more average carbon numbers, and having the one hydroxy group.SELECTED DRAWING: None

The invention relates to the field of rubber protective wax, and discloses bimodal rubber protective wax as well as a preparation method and application thereof, specifically, based on the total amount of hydrocarbons in the bimodal rubber protective wax, the content of n-alkane is 60-80wt%; on the basis of the total amount of hydrocarbons in the bimodal rubber protective wax, the content of alkane with the carbon number smaller than C22 is smaller than or equal to 10 wt%, the content of alkane with the carbon number smaller than C22 is 20-45 wt%, the content of alkane with the carbon number larger than C40 is 45-65 wt%, and the content of alkane with the carbon number larger than C40 is smaller than or equal to 15 wt%; the bimodal rubber protection wax has excellent anti-aging capability, and especially has strong anti-aging capability on rubber in an environment with a day and night temperature difference of greater than or equal to 20 DEG C.

Provided is a method for producing an olefin-containing composition, the method comprising a step of decomposing a plastic in the presence of a zeolite to produce an olefin-containing composition containing an olefin having 2 to 5 carbon atoms, and the zeolite is an MFI-type zeolite containing Rb +.

The purpose of the present invention is to provide: a radiation-sensitive composition which is capable of forming a resist film that can exhibit sensitivity, LWR, DOF, EL, PED, CDU, and pattern circularity at a sufficient level; and a pattern forming method. Another purpose of the present invention is to provide a radiation-sensitive acid generator that can be applied to the radiation-sensitive composition. The radiation-sensitive composition contains a solvent (E) and a polymer (A) containing a structural unit (I) having an acid-dissociable group, and at least the radiation-sensitive composition contains a radiation-sensitive acid generator (B) containing a partial structure represented by formula (a), or the polymer (A) contains a structural unit (VII) containing a partial structure represented by formula (a). (In formula (a), R1 represents a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxyl group, a thiol group, or a monovalent fluorine-free organic group; under the condition that a plurality of R1 exist, the plurality of R1 are the same or different; r2 and R3 are each independently a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxyl group, a thiol group, a halogen atom, or a monovalent organic group, or a C3-20 divalent alicyclic group in which R2 and R3 are bonded to each other and together with a carbon atom to which R2 and R3 are bonded; when a plurality of R2 and R3 are present, the plurality of R2 and R3 are the same or different; l is-C (= O) O-,-C (= O) NR5-or-OC (= O) O-; R5 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; a bond on the R41 side; r41 is a divalent organic group having a cyclic structure and having a heteroatom; m is an integer of 1-5; n is an integer of 0-4; the bond is a bond with the other part in the corresponding polymer (A) or radiation-sensitive acid generator (B); and M + represents a monovalent onium cation).

The present invention provides an organic film-forming composition, a pattern-forming method, and an organic film-forming compound and polymer. The solution provided by the present invention is an organic film-forming composition characterized by containing an organic film-forming material represented by the following general formula and an organic solvent. In the general formula, R1 is a hydrogen atom, an allyl group, or a propargyl group; R2 is a nitro group, a halogen atom, a hydroxyl group, an alkyloxy group having 1 to 4 carbon atoms, an alkynyloxy group having 2 to 4 carbon atoms, an alkenyloxy group having 2 to 4 carbon atoms, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a trifluoromethyl group, or a trifluoromethyloxy group; m = 0, 1, n = 1, 2, l = 0, 1, k is an integer from 0 to 2, W is a divalent organic group having 1 to 40 carbon atoms; and V each independently represents a hydrogen atom or a linking moiety.

The invention provides a radiation-sensitive composition and a pattern forming method. The radiation-sensitive composition can fully exert sensitivity or pattern rectangularity, pattern circularity, exposure latitude, focal depth, development defect inhibition, LWR and CDU when forming a resist pattern, and has good storage stability. A radiation-sensitive composition comprising: an onium salt compound represented by formula (1); a polymer; and a solvent. (In formula (1), Rf represents a halogen atom or a cyano group. And n represents an integer of 0-4. When n is 2 or more, the plurality of Rf are the same as or different from each other. R1 represents a monovalent organic group having 1-20 carbon atoms, a hydrogen atom, a halogen atom, a cyano group, or an alkyl fluoride group, said monovalent organic group being bonded to the carbon atom to which R1 is bonded via-COO-,-OCO-,-SO2-,-S-,-CO-,-O-CO-O-,-CONR '-, or-NR' CO-. R'each independently represents a hydrogen atom or a monovalent hydrocarbon group having 1-10 carbon atoms; and R1 represents a carbon atom to which R1 is bonded. In the formula, when n is 0, R1 is a halogen atom or a cyano group. And R2 is a hydroxyl group, a nitro group, an amino group, a carboxyl group or a monovalent organic group with 1-20 carbon atoms. And m represents an integer of 0-4. When m is 2 or more, the plurality of R2 may be the same as or different from each other. And n + m represents an integer of 0-4. Ar is a monovalent organic group having an aromatic ring having a ring member number of 5-40. And X is methylene,-O-,-CO-or-SO2-. Wherein, when X is a methylene group, the aromatic ring of Ar is directly bonded to S + in the formula, and R1 does not include a polymerizable group. And each of R41, R42, R43, R44, R45 and R48 independently represents a hydrogen atom, a hydroxyl group, a halogen atom or a monovalent organic group having 1-20 carbon atoms. And R46 and R47 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, or a monovalent organic group having 1-20 carbon atoms, or each represents a ring structure having 3-10 ring members in which R46 and R47 are bonded to each other and are configured together with the two carbon atoms to which these are bonded.) (In the formula, R46 and R47 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, or a monovalent organic group having 1-20 carbon atoms.

The present invention relates to an organic film forming material, a pattern forming method and a polymer. The object of the present invention is to provide an organic film forming material which does not impair the carbon content of the resin itself and which can exhibit high etching resistance and excellent distortion resistance, and to provide a pattern forming method using the organic film forming material and a polymer suitable for the same. The means for solving the object is an organic film forming material characterized by containing: (A) a polymer having a repeating unit represented by the following general formula (1), and (B) an organic solvent; in the general formula (1), AR1, AR2, AR3 and AR4 are benzene rings or naphthalene rings, W1 is a 4-valent organic group having a carbon number of 6 to 70 and having at least one or more aromatic rings, and W2 is a 2-valent organic group having a carbon number of 1 to 50.

A resin composition contains a maleimide compound (A) and a phosphorus-containing compound (B). The maleimide compound (A) includes a first maleimide compound (A1) having an alkyl group, of which a carbon number is equal to or greater than six, and / or an alkylene group, of which a carbon number is equal to or greater than six. The phosphorus-containing compound (B) includes a phosphorus-containing compound (B1) having a structure expressed by the following formula (b1), where s indicates an integer falling within a range from 1 to 10, Z indicates either an arylene group or an ester bond expressed by the following formula (b1.1), R1 to R3 each independently indicate either a hydrogen atom or a monovalent organic group, and * indicates a bond.

[Problem] To provide a polycarbonate diol or the like that is equivalent to petroleum-derived from plants and has excellent colorless transparency in appearance. [Solution] The polycarbonate diol has a repeating unit represented by formula (1) and a terminal hydroxyl group, and is characterized in that the integral value of a signal of 2.50-2.70 ppm is 0.01-1.0 when the integral value of a signal of 3.90-4.45 ppm is set to 1000 in a 1H-NMR spectrum measured using chloroform-d as a solvent and tetramethylsilane as a reference substance. (In the formula, R1 represents a divalent aliphatic hydrocarbon having 2-20 carbon atoms. )

Provided is an adhesive composition that can be used for multi-stage curing, that can obtain excellent adhesive properties in a low cross-linked state after one-time curing, that can be efficiently subjected to multi-stage curing even when the amount of active energy rays during curing is small, and that can be used for multi-stage curing. Alternatively, during curing, multi-stage curing can be efficiently performed using active energy rays in the visible light region, and after final curing, high elasticity of the adhesive layer can be achieved, and excellent adhesive properties, reliability, and shape stability can be obtained. A pressure-sensitive adhesive composition containing: an acrylic resin (A) having a glass transition temperature, calculated from dynamic viscoelasticity, of 12 DEG C to 40 DEG C; and a structural unit derived from an alkyl (meth) acrylate (a1) having an alkyl group having 5 or more carbon atoms, and a structural unit derived from an ethylenically unsaturated monomer (a3) containing an amide group.