5594 results about "Trifluoromethyl" patented technology

A resist composition comprises a polymer comprising recurring units having formula (1) wherein R¹, R⁴, R⁷, and R¹⁴ are H or methyl, R², R³, R¹⁵, and R¹⁶ are H, alkyl or fluoroalkyl, R is F or H, R⁵ is alkylene, R⁶ is fluorinated alkyl, R⁸ is a single bond or alkylene, R¹⁰ and R¹¹ are H, F, methyl or trifluoromethyl, R¹² and R¹³ are a single bond, —O— or —CR¹⁸R¹⁹—, R⁹, R¹⁸, and R¹⁹ are H, F, methyl or trifluoromethyl, R¹⁷ is alkylene, X¹, X² and X³ are —C(═O)—O—, —O—, or —C(═O)—R²⁰—C(═O)—O— wherein R²⁰ is alkylene, 0≦(a-1)<1, 0≦(a-2)<1, 0≦(a-3)<1, 0<(a-1)+(a-2)+(a-3)<1, 0<b<1, and 0<(a-1)+(a-2)+(a-3)+b≦1.

A luminescence device is principally constituted by a pair of electrodes and an organic compound layer disposed therebetween. The layer contains a metal coordination compound represented by the following formula (1): wherein M denotes Ir, Rh or Pd; n is 2 or 3; and X1 to X8 independently denote hydrogen atom or a substituent selected from the group consisting of halogen atom; nitro group; trifluoromethyl group trialkylsilyl group having three linear or branched alkyl groups each independently having 1-8 carbon atoms; and a linear or branched alkyl group having 2-20 carbon atoms capable of including one or at least two non-neighboring methylene groups which can be replaced with -O-, -S-, -CO-, -CO-O-, -O-CO-, -CH=CH- or -C=C- and capable of including hydrogen atom which can be replaced with fluorine atom; with the proviso that at least one of X1 to X8 is a substituent other than hydrogen atom, and X2 and X3 cannot be fluorine atom at the same time.

The present invention relates to solid state forms, for example, crystalline forms of N-(4-(7-azabicyclo[2.2.1]heptan-7-yl)-2-(trifluoromethyl)phenyl)-4-oxo-5-(trifluoromethyl)-1,4-dihydroquinoline-3-carboxamide, pharmaceutical compositions thereof, and methods therewith.

Compounds of formula 1 are modulators of P2X3 useful for the treatment of pain and genito-urinary, gastrointestinal, and respiratory disorders:

wherein

• • R¹ is —C(═S)CH₃, pyridyl, pyrimidinyl, pyrazinyl, thiazolyl, furyl, furylcarbonyl, acetyl, or carbamoyl; R^2a and R^2b are independently H, methyl, or ethyl; R³ is H or methyl; Y is a bond, —(CR⁴R⁵)_n— or —CR⁴═CR⁵—; wherein R⁴ and R⁵ are each independently H or methyl and n is 1 or 2; X is N or CH; A is phenyl, 5-membered heterocyclyl, or 6-membered heterocyclyl; R⁶, R⁷ and R⁸ are each independently H, halo, lower alkyl, cycloalkyl, alkylthio, alkylthio-lower alkyl, alkylsulfonyl-lower alkyl, di(lower alkyl)amino-lower alkyl, morpholinyl-lower alkyl, 4-methyl-piperazinyl-methyl, trifluoromethyl, pyridyl, tetrazolyl, thiophenyl, phenyl, biphenyl, or benzyl (where thiophenyl, phenyl and benzyl are substituted with 0-3 lower alkyl, halo, sulfonamido, trifluoromethyl, lower alkoxy or lower alkylthio) or R⁶ and R⁷ together form a 5-membered or 6-membered carbocyclic or heterocyclic ring substituted with 0-3 substituents selected from the group consisting of lower alkyl, lower alkoxy, oxo, halo, thiophenyl-lower alkyl, phenyl, benzyl (where phenyl and benzyl are substituted with 0-3 lower alkyl, halo, sulfonamido, trifluoro-methyl, lower alkoxy, lower alkylthio, amino-lower alkyl, lower alkylamino-lower alkyl, or di(lower alkyl)amino-lower alkyl); and pharmaceutically acceptable salts thereof; wherein when R¹ is pyrimidin-2-yl, X is N, Y is a bond and A is oxazol-5-yl the carbon atom at position 4 in said oxazol-5-yl is not substituted by propyl when the carbon atom at position 2 in said oxazol-5-yl is substituted by substituted phenyl and the carbon atom at position 4 in said oxazol-5-yl is not substituted by phenyl when the carbon atom at position 2 is substituted by unsubstituted or substituted phenyl.

A coating composition is provided comprising: (i) a fluorinated polymer comprising (a) structural units having the formula (I):

—CR¹R²—CFX—  (I)

wherein R¹ and R² are each independently an alkyl group, a fluorine atom, a chlorine atom, a hydrogen atom or a trifluoromethyl group, and X is a fluorine atom, a chlorine atom, a hydrogen atom or a trifluoromethyl group, and (b) structural units comprising at least one type of crosslinkable functional group; (ii) a crosslinking agent; and (iii) a plurality of particles functionalized with a functional group, wherein the functional group on the particles is essentially non-reactive with the fluorinated polymer and with the crosslinking agent. Articles comprising a coating composition described in embodiments of the invention are also provided.

A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R¹ is H, F, methyl or trifluoromethyl, R², R³ and R⁴ are C₁-C₁₀ alkyl, alkenyl or oxoalkyl or C₆-C₁₈ aryl, aralkyl or aryloxoalkyl, or two of R², R³ and R⁴ may bond together to form a ring with S, A is a C₁-C₁₀ organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

Trifluoromethyl-substituted spirocyclic ketoenols of the formula (I) are provided

wherein

Het represents one of the groups

and G, V, W, X, Y, and Z are as defined in the specification. Also provides are processes for the preparation of the compounds. The compounds of formula (I) find use as pesticides.

Electrolyte solutions of soluble bifunctional redox dyes in molten salt solvent may be used to prepare electrooptic devices with enhanced stability toward ultraviolet radiation. The solvents include lithium or quaternary ammonium cations, and perfluorinated sulfonylimide anions selected from trifluoromethylsulfonate (CF₃SO₃⁻), bis(trifluoromethylsulfonyl)imide ((CF₃SO₂)₂N⁻), bis(perfluoroethylsulfonyl)imide ((CF₃CF₂SO₂)₂N⁻) and tris(trifluoromethylsulfonyl)methide ((CF₃SO₂)₃C⁻).

Penoxsulam, 2-(2,2-difluoroethoxy)-N-(5,8-dimethoxy [1,2,4]-triazolo[1,5-c]pyrimidin-2-yl)-6-(trifluoromethyl)benzenesulfonamide, is useful in controlling broadleaf weeds and sedges in turfgrass and in vine and orchard floors.

The invention relates to a 4-benzoyl pyrazole compound with herbicidal activity. The structural formula of the 4-benzoyl pyrazole compound with the herbicidal activity is as shown in specifications, wherein R1 in the structural formula is selected from hydrogen, methyl or ethyl, R2 in the structural formula is selected from methylsulfonyl, methoxyl, methylthio, fluorine, chlorine or cyan, R3 in the structural formula is selected from hydrogen, methyl, methyl fluoride, difluoromethyl or trifluoromethyl, R in the structural formula is selected from a five-membered heteroaromatic ring, a six-membered heteroaromatic ring, C1-C6 alkoxyl, aromatic hetero-oxy, six-membered aryloxy or six-membered aromatic amino, and hydrogen in the C1-C6 alkoxyl can be replaced by fluorine or chlorine; m and n are selected from 0 or 1 and cannot be 1 at the same time. A series of relatively efficient weed killers and plant growth regulators with relative good selectivity and safety are synthesized by introducing a fluorine-containing functional group to a pyrazole 3-site and chemically modifying a pyrazole 5-site.

Nitric oxide releasing oxindole prodrugs are described which are useful in methods of treating or preventing pain, inflammation, fever, or gastrointestinal lesions in a patient in need of such treatment, or of modifying an inflammatory disease or condition by favorably affecting the outcome thereof in said patient, wherein there is administered to said patient a therapeutically effective amount of a compound of Formula (I): and pharmaceutically acceptable salts thereof. In preferred embodiments, X is a covalent bond; RA and RB are both hydrogen; n is the integer 4; Y is -O-; Z is -NO2; RC is a member selected from the group consisting essentially of 5-Cl and 5-F; RD is a member selected from the group consisting essentially of 6-Cl and 6-F; and RE is a member selected from the group consisting essentially of benzyl, 2-furyl, 2-thienyl, 5-chloro-2-thienyl and 5-trifluoromethyl-2-thienyl.

The present patent application relates to compounds having formula (I) or a pharmaceutically acceptable salt thereof wherein one of R1, R2 and R3 is a non-cyclic acidic group having a pKa value below 8 or a group which is in vivo convertible to such a group; R4, R5 and the other two of the substituents R1, R2 and R3 are each independently selected from hydrogen, alkyl, cycloalkyl, cycloalkylalkyl, alkenyl, alkynyl, alkoxy, hydroxy, halogen, trifluoromethyl, trifluoromethoxy, cyano, nitro, amnino, and aryl, aralkyl, arylamino, aryloxy, aryl-CO-, or heteroaryl, wherein the aryl and heteroaryl groups may be substituted one or more times with substituents selected from alkyl, cycloalkyl, cycloalkylalkyl, alkenyl, alkynyl, hydroxy, alkoxy, halogen, trifluoromethyl, trifluoromethoxy, cyano, nitro and amino; or R3 and R4 or R4 and R5 together form a fused 4- to 7-membered carbocyclic ring which may be unsaturated, or partially or fully saturated, while the other substituents R1, R2, R3, R4 and R5 are as defined above; Y is -CO-, -CS-, -SO2-, or -C(=N-R8)-, wherein R8 is hydrogen, alkyl, or cyano; X is -NH-, -CH2-NH-, or -SO2-NH-; Z is NR6, O, -CH=CH-, -C=C-, -N=CH-, or -CH=N-; wherein R6 is hydrogen, or alkyl; R11, R12, R13, R14 and R15 are each independently selected from hydrogen, alkyl, cycloalkyl, cycloalkylalkyl, alkenyl, alkynyl, alkoxy, hydroxy, halogen, trifluoromethyl, trifluoromethoxy, cyano, nitro, amino, -NHSO2-R7, -COOR7, -SO2N(R7)2, -SO2OR7 and -CO-R7, wherein R7 is hydrogen alkyl, cycloalkyl, cycloalkylalkyl, alkenyl, alkynyl, aryl or aralkyl; and aryl, aralkyl, arylamino, aryloxy, aryl-CO-, or heteroaryl, wherein the aryl and heteroaryl groups may be substituted one or more times with substituents selected from alkyl, cycloalkyl, cycloalkylalkyl, alkenyl, alkynyl, hydroxy, alkoxy, halogen, trifluoromethyl, trifluoromethoxy, cyano, nitro and amino; or one of R11 and R12, R12 a

A polymer comprising recurring units of a sulfonium salt represented by formula (1) is provided as well as a chemically amplified resist composition comprising the same. R¹ is H, F, methyl or trifluoromethyl, R² to R⁴ are C₁-C₁₀ alkyl or alkoxy, R⁵ is C₁-C₃₀ alkyl or C₆-C₁₄ aryl, k, m and n are 0 to 3. The recurring units generate a sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition. The resist composition exhibits excellent resolution and a pattern finish with minimal LER.

Electrolyte solutions for electrochromic devices such as rear view mirrors and displays with low leakage currents are prepared using inexpensive, low conductivity conductors. Preferred electrolytes include bifunctional redox dyes and molten salt solvents with enhanced stability toward ultraviolet radiation. The solvents include lithium or quaternary ammonium cations, and perfluorinated sulfonylimide anions selected from trifluoromethylsulfonate (CF₃SO₃⁻), bis(trifluoromethylsulfonyl)imide ((CF₃SO₂)₂N⁻), bis(perfluoroethylsulfonyl)imide ((CF₃CF₂SO₂)₂N⁻) and tris(trifluoromethylsulfonyl)methide ((CF₃SO₂)₃C⁻). Electroluminescent, electrochromic and photoelectrochromic devices with nanostructured electrodes include ionic liquids with bifunctional redox dyes. Some of the electrolyte solutions color to red when devices employing the solutions are powered, leading to red or neutral electrooptic devices.

A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R¹ is H, F, methyl or trifluoromethyl, R², R³ and R⁴ are C₁-C₁₀ alkyl, alkenyl or oxoalkyl or C₆-C₁₈ aryl, aralkyl or aryloxoalkyl, or two of R², R³ and R⁴ may bond together to form a ring with S, A is a C₂-C₂₀ hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

A compound of the formula (1): FSO2CFXCF2O(CFXCF2O)nCF-(CF2Y)COF in which X is a fluorine atom, a chlorine atom or a trifluoromethyl group, Y is a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and n is a number of 0 to 5, preferably 0, 1 or 2, is converted to a compound of the formula (2): MOSO2CFXCF2O(CFXCF2O)2CF(CF2Y)COOM1 in which X, Y and n are the same as defined above, and M and M1 independently represent an alkali metal atom or an alkaline earth metal atom, and then a compound of the formula (2) is pyrolyzed at a temperature of 150 to 250° C. to obtain a compound of the formula (3): ASO2CFXCF2O(CFXCF2O)nCF=CF2 in which A is MO-, a hydroxyl group or a fluorine atom, and X and n are the same as defined above.

A permanent photoresist composition comprising: (A) one or more bisphenol A-novolac epoxy resins according to Formula I; wherein each group R in Formula I is individually selected from glycidyl or hydrogen and k in Formula I is a real number ranging from 0 to about 30; (B) one or more epoxy resins selected from the group represented by Formulas BIIa and BIIb; wherein each R₁, R₂ and R₃ in Formula BIIa are independently selected from the group consisting of hydrogen or alkyl groups having 1 to 4 carbon atoms and the value of p in Formula BIIa is a real number ranging from 1 to 30; the values of n and m in Formula BIIb are independently real numbers ranging from 1 to 30 and each R₄ and R₅ in Formula BIIb are independently selected from hydrogen, alkyl groups having 1 to 4 carbon atoms, or trifluoromethyl; (C) one or more cationic photoinitiators (also known as photoacid generators or PAGs); and (D) one or more solvents.

The present invention provides a compound having the structure: (structurally represented) wherein R₁, R₂, R₃, R₄, and R₅ are each independently H, halogen, CF₃ or C₁-C₄ alkyl; R₆ is H, OH, or halogen; B is a substituted or unsubstituted heterobicycle, pyridazine, pyrazole, pyrazine, thiadiazole, or triazole, wherein the heterobicycle is other than chloro substituted indole; and the pyrazole, when substituted, is substituted with other than trifluoromethyl, or a pharmaceutically acceptable salt thereof.

The present invention relates to substantially crystalline and solid state forms of N-(4-(7-azabicyclo[2.2.1]heptan-7-yl)-2-(trifluoromethyl)phenyl)-4-oxo-5-(trifluoromethyl)-1,4-dihydroquinoline-3-carboxamide (Form A-HCl, Form B, Form B-HCl, or any combination of these forms), pharmaceutical compositions thereof, and methods of treatment therewith.