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780 results about "Sulfonium" patented technology
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A sulfonium ion, also known as sulphonium ion or sulfanium ion, is a positively charged ion (a "cation") featuring three organic substituents attached to sulfur. These organosulfur compounds have the formula [SR₃]⁺. Together with a negatively charged counterion, they give sulfonium salts. They are typically colorless solids that are soluble in organic solvent.
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
ActiveUS20080102407A1Feature size of to decreaseSmall feature sizeOrganic chemistryPhotosensitive materialsResistHigh energy
A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is derived.
Owner:SHIN ETSU CHEM IND CO LTD
Positive resist composition and patterning process
ActiveUS20080153030A1Good storage stabilityHigh resolutionOrganic chemistryPhotosensitive materialsHigh energyPhotoacid generator
There is disclosed a resist composition that remarkably improves the resolution of photolithography using a high energy beam such as ArF excimer laser light as a light source, and exhibits excellent resistance to surface roughness and side lobe under use of a halftone phase shift mask; and a patterning process using the resist composition. The positive resist composition at least comprises (A) a resin component comprising a repeating unit represented by the following general formula (1); (B) a photoacid generator generating sulfonic acid represented by the following general formula (2) upon exposure to a high energy beam; and (C) an onium salt where a cation is sulfonium represented by the following general formula (3), or ammonium represented by the following general formula (4); and an anion is represented by any one of the following general formulae (5) to (7).
Owner:SHIN ETSU CHEM IND CO LTD
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
ActiveUS7569326B2Improve featuresMask fidelityOrganic chemistryPhotosensitive materialsResistHigh energy
A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is derived.
Owner:SHIN ETSU CHEM IND CO LTD
Liquid radiation curable resins for additive fabrication comprising a triaryl sulfonium borate cationic photoinitiator
Liquid radiation curable resins for additive fabrication comprising an R-substituted aromatic thioetber triaryl sulfonmm tetrakis(pentafluorophenyl)borate cationic photoinitiator is disclosed. A process for using the liquid radiation curable resins for additive fabrication and three-dimensional articles made from the liquid radiation curable resins for additive fabrication are also disclosed.
Owner:DSM IP ASSETS BV
Sulfonium salt-containing polymer, resist composition, and patterning process
ActiveUS20090269696A1Promote divisionHigh sensitivity and resolutionPhotosensitive materialsRadiation applicationsResistAryl
A polymer comprising recurring units having formulae (1), (2) and (3) is provided as well as a chemically amplified resist composition comprising the same. R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or C2F5, A is an optionally fluorine or oxygen-substituted divalent organic group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or may form a ring with the sulfur atom, N=0-2, R8 is H or alkyl, B is a single bond or optionally oxygen-substituted divalent organic group, a=0-3, b=1-3, and X is an acid labile group. The polymer generates a strong sulfonic acid which provides for effective cleavage of acid labile groups in a chemically amplified resist composition.
Owner:SHIN ETSU CHEM IND CO LTD
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
ActiveUS20100055608A1Promote divisionImproved in pattern density dependencyOrganic chemistryOrganic compound preparationResistAryl
A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C10 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.
Owner:SHIN ETSU CHEM IND CO LTD
Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method
ActiveUS20100035185A1Stable structureImprove solubilityOrganic chemistryOrganic compound preparationResistOrganic group
A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt.In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
Owner:CENT GLASS CO LTD
Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method
ActiveUS20090136869A1Sufficient etching resistanceImprove accuracySilicon organic compoundsOther chemical processesOrganic acidOrganic solvent
A metal oxide-containing film is formed from a heat curable composition comprising (A) a metal oxide-containing compound obtained through hydrolytic condensation between a hydrolyzable silicon compound and a hydrolyzable metal compound, (B) a hydroxide or organic acid salt of Li, Na, K, Rb or Cs, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The metal oxide-containing film ensures effective pattern formation.
Owner:SHIN ETSU CHEM IND CO LTD
Infrared absorbing compounds and their use in imageable elements
Infrared absorbing compounds are disclosed. The compounds are co-polymers that comprise covalently attached ammonium, sulfonium, phosphonium, and / or iodonium cations, and infrared absorbing cyanine anions that have two to four sulfonate groups and / or sulfate groups, and / or infrared absorbing oxonol anions. The infrared absorbing compounds can be used in aqueous developable lithographic printing plate precursors.
Owner:KODAK POLYCHROME GRAPHICS
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C2-C20 hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.
Owner:SHIN ETSU CHEM CO LTD
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
ActiveUS20070238300A1Sufficient etching resistanceImprove accuracyPhotosensitive materialsSemiconductor/solid-state device manufacturingResistAmmonium compounds
A silicon-containing film is formed from a heat curable composition comprising (A) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst, and substantially removing the acid catalyst from the reaction mixture, (B) a hydroxide or organic acid salt of lithium, sodium, potassium, rubidium or cesium, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The silicon-containing film allows an overlying photoresist film to be patterned effectively. The composition is effective in minimizing the occurrence of pattern defects after lithography and is shelf stable.
Owner:SHIN ETSU CHEM IND CO LTD
Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
ActiveUS7611817B2Not to amplify distortionAdditive manufacturing apparatusOrganic compound preparationBenzenePolymer science
Novel aromatic sulfonium salt compounds of general formula (I), photo-acid generators comprising the same, and photo-polymerizable compositions containing the same, capable of providing stereolithographic resin compositions which do not suffer from the hindrance to curing by oxygen, can easily give shaped articles having desired sizes by virtue of the high accuracy thereof in curing, can attain a satisfactory curing depth owing to the high sensitivity thereof for radiant energy and can be employed for wide usage, such as photoresist and ink for foods-packing medium, since the release of benzene is suppressed; and a stereolithographic process, using said stereolithographic resin composition.
Owner:ADEKA CORP
Positive resist composition and pattern formation method using the same
InactiveUS20070224540A1Improve performanceHigh sensitivityPhotosensitive materialsRadiation applicationsActinic RaysSulfonium
A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.
Owner:FUJIFILM CORP
Sulfonium salt-containing polymer, resist composition, and patterning process
ActiveUS20090233223A1Promote divisionLow LERElectric discharge tubesPhotosensitive materialsResistHigh energy
A polymer comprising recurring units of a sulfonium salt represented by formula (1) is provided as well as a chemically amplified resist composition comprising the same. R1 is H, F, methyl or trifluoromethyl, R2 to R4 are C1-C10 alkyl or alkoxy, R5 is C1-C30 alkyl or C6-C14 aryl, k, m and n are 0 to 3. The recurring units generate a sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition. The resist composition exhibits excellent resolution and a pattern finish with minimal LER.
Owner:SHIN ETSU CHEM IND CO LTD
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
ActiveUS20100099042A1Promote divisionImproved in pattern density dependencyOrganic chemistryPhotosensitive materialsResistAryl
A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C2-C20 hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.
Owner:SHIN ETSU CHEM IND CO LTD
Actinic ray curable ink-jet ink composition, image formation method employing the same, and ink-jet recording apparatus
ActiveUS20050113483A1Stable formImprove accuracyLiquid surface applicatorsOrganic chemistryBenzeneCompound a
Disclosed is an actinic ray curable ink-jet ink composition containing a photopolymerizable compound, a sulfonium salt (compound A) as a photoinitiator, which does not release benzene on actinic ray exposure, and a compound (compound B) as a sensitizing agent selected from the group consisting of (i) a polycyclic aromatic compound having a hydroxyl group, a substituted or unsubstituted aralkyloxy group or a substituted or unsubstituted alkoxy group, (ii) a carbazole derivative, and (iii) a thioxanthone derivative.
Owner:KONICA MINOLTA MEDICAL & GRAPHICS INC
Method of decarbonating a combustion fume with extraction of the solvent contained in the purified fume
InactiveUS20060188423A1High purityNitrogen compoundsUsing liquid separation agentPhosphoniumPhysical chemistry
The combustion fume flowing in through line 1 is decarbonated by contacting with a solvent in column C2. The solvent laden with carbon dioxide is regenerated in zone R. The purified fume discharged through line 9 comprises part of the solvent. The method allows to extract the solvent contained in the purified fume. The purified fume is contacted in zone ZA with a non-aqueous ionic liquid of general formula Q+ A−; Q+ designates an ammonium, phosphonium and / or sulfonium cation, and A− an anion likely to form a liquid salt. The solvent-depleted purified fume is discharged through line 17. The solvent-laden ionic liquid is regenerated by heating in evaporation device DE. The solvent separated from the ionic liquid in device DE is recycled.
Owner:INST FR DU PETROLE
Positive resist composition and patterning process
ActiveUS20090202943A1Feature size of to decreaseSmall feature sizePhotosensitive materialsRadiation applicationsResistHigh energy
A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.
Owner:SHIN ETSU CHEM IND CO LTD
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
ActiveUS20080026322A1Sufficient etching resistanceImprove accuracyPhotosensitive materialsSemiconductor/solid-state device manufacturingAmmonium compoundsPtru catalyst
A silicon-containing film is formed from a heat curable composition comprising (A-1) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst and removing the acid catalyst, (A-2) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of a basic catalyst and removing the basic catalyst, (B) a hydroxide or organic acid salt of lithium, sodium, potassium, rubidium or cesium, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The silicon-containing film allows an overlying photoresist film to be patterned effectively.
Owner:SHIN ETSU CHEM IND CO LTD
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
ActiveUS8057985B2Promote divisionHigh resolutionOrganic chemistryOrganic compound preparationArylResist
A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C20 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.
Owner:SHIN ETSU CHEM IND CO LTD
Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process
ActiveUS20100143830A1Minimized in line width variationMinimized in pattern profile degradationOrganic compound preparationElectric discharge tubesArylSulfur
A sulfonium salt has formula (1) wherein R1 is a monovalent hydrocarbon group except vinyl and isopropenyl, R2, R3, and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl or may bond together to form a ring with the sulfur atom, and n is 1 to 3. A chemically amplified resist composition comprising the sulfonium salt is capable of forming a fine feature pattern of good profile after development due to high resolution, improved focal latitude, and minimized line width variation and profile degradation upon prolonged PED.
Owner:SHIN ETSU CHEM IND CO LTD
Photosensitive composition and pattern-forming method using the photosensitive composition
Owner:FUJIFILM CORP +1
Ionic liquid prepared through diimine (vikane) and (perfluoroalkglsulfonyl fluorosulfonyl group) imine alkali salt
InactiveCN101747243APromote hydrolysisLow melting pointElectrolytic capacitorsGroup 5/15 element organic compoundsSulfoniumLithium-ion battery
The invention provides an ionic liquid consisting of the anions of diimine (vikane) and (perfluoroalkglsulfonyl fluorosulfonyl group) imine and the cation of sulfonium salt, ammonium salt or phosphor salt, as well as method for preparing the ionic liquid through diimine (vikane) and (perfluoroalkglsulfonyl fluorosulfonyl group) imine alkali salt. The ionic liquid can be used as an electrolyte material and applied on the fields like secondary lithium ion batteries, super capacitors, etc.
Owner:HUAZHONG UNIV OF SCI & TECH
Fluoroarylsulfonium photoacid generators
InactiveUS20090182172A1Rapid sensitizationImprove efficiencyGroup 3/13 element organic compoundsPhosphorus organic compoundsCationic polymerizationPhotoacid
The present invention discloses a new class of triarylsulfonium salt photoacid generators (PAGs), which are thermally stable and can be activated by long wavelength UV or visible light. The sulfonium PAGs of the present invention are additionally soluble in monomers that can be polymerized by cationic polymerization chemistry, and mixtures of said sulfonium PAGs and monomers can be stored for long periods of time without undergoing polymerization. Furthermore, typical holographic recording media comprising one of these sulfonium PAGs, polymerizable monomer(s), a sensitizing dye, and a binder can be stored for long periods of time without exhibiting significant loss of recording sensitivity. Preferred sulfonium PAGs of the present invention are sulfonium PAGs substituted with one or more fluoro or fluoroalkyl groups.
Owner:APRILIS
Method of decarbonating a combustion fume with extraction of the solvent contained in the purified fume
InactiveUS7459134B2High purityNitrogen compoundsUsing liquid separation agentPhosphoniumPhysical chemistry
The combustion fume flowing in through line 1 is decarbonated by contacting with a solvent in column C2. The solvent laden with carbon dioxide is regenerated in zone R. The purified fume discharged through line 9 comprises part of the solvent. The method allows to extract the solvent contained in the purified fume. The purified fume is contacted in zone ZA with a non-aqueous ionic liquid of general formula Q+ A−; Q+ designates an ammonium, phosphonium and / or sulfonium cation, and A− an anion likely to form a liquid salt. The solvent-depleted purified fume is discharged through line 17. The solvent-laden ionic liquid is regenerated by heating in evaporation device DE. The solvent separated from the ionic liquid in device DE is recycled.
Owner:INST FR DU PETROLE
Photoresist composition for deep UV radiation
The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region, where the photoresist performance is not adversely impacted by basic contaminants in the processing environment of the photoresist. The novel photoresist comprises a polymer, a photoactive compound, a basic compound that is a sulfonium or iodonium compound that is essentially nonabsorbing at the exposure wavelength of the photoresist, and a solvent composition. The invention further relates to a process for imaging such a photoresist in the deep ultraviolet region.
Owner:MERCK PATENT GMBH
Positive resist composition and patterning process
ActiveUS20120135350A1High resolutionImprove propertiesPhotosensitive materialsPhotomechanical exposure apparatusSolubilityHigh energy
A positive resist composition comprising (A) a polymer comprising recurring units of a specific structure adapted to generate an acid in response to high-energy radiation and acid labile units, the polymer having an alkali solubility that increases under the action of an acid, and (B) a sulfonium salt of a specific structure exhibits a high resolution in forming fine size patterns, typically trench patterns and hole patterns. Lithographic properties of profile, DOF and roughness are improved.
Owner:SHIN ETSU CHEM IND CO LTD
Sulfonium salt, photo-acid generator, and photosensitive resin composition
ActiveUS8617787B2Increase photosensitivityImprove compatibilityOrganic compound preparationPhotosensitive materialsHalogenAlkoxy group
There is provided a sulfonium salt having high photosensitivity to the i-line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy(poly)alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m1 to m6 each represent the number of occurrences of each of R1 to R6, m1, m4, and m6 each represent an integer of 0 to 5, m2, m3, and m5 each represent an integer of 0 to 4, and X− represents a monovalent polyatomic anion].
Owner:SAN APRO
Preparation of permanent color inks from water-soluble colorants using specific phosphonium salts
Water-fastness in aqueous ink-jet inks containing water-soluble dyes is achieved by using a specific ionic species having a charge opposite to that on the dye molecule. Anionic dyes typically contain sulfonate (or carboxylate) anionic groups. Using at least one specific ionic species of opposite charge, specifically, phosphonium salts, causes the colorant components to "crash" or precipitate out of the water-based ink onto the print medium due to the formation of a suitable charge complex between the ionic parts of the dye and the opposite charge of the counter-ion species. Other positively charged salts, such as quaternary ammonium salts, carbonium salts, iodonium salts, sulfonium salts, and pyrillium salts may be used to improve aqueous dispersion stability and thus printability. Such additional cationic salt partially replaces the phosphonium salt(s). Alternatively, certain surfactants, such as aromatic ethoxylates, polyethylene oxide ethers, or polypropylene oxide ethers may be used to improve print quality.
Owner:HEWLETT PACKARD DEV CO LP
Processing for eliminating sulfur-containing compounds and nitrogen-containing compounds from hydrocarbon
InactiveUS7198712B2Increase contentReduce sulfur contentPhysical/chemical process catalystsElectrolysis componentsSolubilityPhosphonium
For desulfurization and, if necessary, for denitrification of hydrocarbon fractions the hydrocarbon mixture is brought into contact with a non-aqueous ionic liquid of general formula Q+A−, wherein Q+ is a ammonium, phosphonium or sulfonium cation, that contains at least one alkylating agent of the formula RX−, making it possible to form ionic sulfur-containing derivatives (and, if necessary, nitrogen-containing derivatives) that have a preferred solubility in the ionic liquid; and the ionic liquid is separated from the hydrocarbon mixture that is low in sulfur and nitrogen by decanting.
Owner:INST FR DU PETROLE
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