767 results about "Sulfonium" patented technology

A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is derived.

There is disclosed a resist composition that remarkably improves the resolution of photolithography using a high energy beam such as ArF excimer laser light as a light source, and exhibits excellent resistance to surface roughness and side lobe under use of a halftone phase shift mask; and a patterning process using the resist composition. The positive resist composition at least comprises (A) a resin component comprising a repeating unit represented by the following general formula (1); (B) a photoacid generator generating sulfonic acid represented by the following general formula (2) upon exposure to a high energy beam; and (C) an onium salt where a cation is sulfonium represented by the following general formula (3), or ammonium represented by the following general formula (4); and an anion is represented by any one of the following general formulae (5) to (7).

Liquid radiation curable resins for additive fabrication comprising an R-substituted aromatic thioetber triaryl sulfonmm tetrakis(pentafluorophenyl)borate cationic photoinitiator is disclosed. A process for using the liquid radiation curable resins for additive fabrication and three-dimensional articles made from the liquid radiation curable resins for additive fabrication are also disclosed.

A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R¹ is H, F, methyl or trifluoromethyl, R², R³ and R⁴ are C₁-C₁₀ alkyl, alkenyl or oxoalkyl or C₆-C₁₈ aryl, aralkyl or aryloxoalkyl, or two of R², R³ and R⁴ may bond together to form a ring with S, A is a C₁-C₁₀ organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt.

In formula (1), R¹ represents a monovalent organic group, and Q⁺ represents a sulfonium cation or iodonium cation.

A metal oxide-containing film is formed from a heat curable composition comprising (A) a metal oxide-containing compound obtained through hydrolytic condensation between a hydrolyzable silicon compound and a hydrolyzable metal compound, (B) a hydroxide or organic acid salt of Li, Na, K, Rb or Cs, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The metal oxide-containing film ensures effective pattern formation.

A silicon-containing film is formed from a heat curable composition comprising (A) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst, and substantially removing the acid catalyst from the reaction mixture, (B) a hydroxide or organic acid salt of lithium, sodium, potassium, rubidium or cesium, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The silicon-containing film allows an overlying photoresist film to be patterned effectively. The composition is effective in minimizing the occurrence of pattern defects after lithography and is shelf stable.

A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.

A polymer comprising recurring units of a sulfonium salt represented by formula (1) is provided as well as a chemically amplified resist composition comprising the same. R¹ is H, F, methyl or trifluoromethyl, R² to R⁴ are C₁-C₁₀ alkyl or alkoxy, R⁵ is C₁-C₃₀ alkyl or C₆-C₁₄ aryl, k, m and n are 0 to 3. The recurring units generate a sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition. The resist composition exhibits excellent resolution and a pattern finish with minimal LER.

A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R¹ is H, F, methyl or trifluoromethyl, R², R³ and R⁴ are C₁-C₁₀ alkyl, alkenyl or oxoalkyl or C₆-C₁₈ aryl, aralkyl or aryloxoalkyl, or two of R², R³ and R⁴ may bond together to form a ring with S, A is a C₂-C₂₀ hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

Disclosed is an actinic ray curable ink-jet ink composition containing a photopolymerizable compound, a sulfonium salt (compound A) as a photoinitiator, which does not release benzene on actinic ray exposure, and a compound (compound B) as a sensitizing agent selected from the group consisting of (i) a polycyclic aromatic compound having a hydroxyl group, a substituted or unsubstituted aralkyloxy group or a substituted or unsubstituted alkoxy group, (ii) a carbazole derivative, and (iii) a thioxanthone derivative.

The combustion fume flowing in through line 1 is decarbonated by contacting with a solvent in column C2. The solvent laden with carbon dioxide is regenerated in zone R. The purified fume discharged through line 9 comprises part of the solvent. The method allows to extract the solvent contained in the purified fume. The purified fume is contacted in zone ZA with a non-aqueous ionic liquid of general formula Q⁺ A⁻; Q⁺ designates an ammonium, phosphonium and/or sulfonium cation, and A⁻ an anion likely to form a liquid salt. The solvent-depleted purified fume is discharged through line 17. The solvent-laden ionic liquid is regenerated by heating in evaporation device DE. The solvent separated from the ionic liquid in device DE is recycled.

A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.

A silicon-containing film is formed from a heat curable composition comprising (A-1) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst and removing the acid catalyst, (A-2) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of a basic catalyst and removing the basic catalyst, (B) a hydroxide or organic acid salt of lithium, sodium, potassium, rubidium or cesium, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The silicon-containing film allows an overlying photoresist film to be patterned effectively.

A sulfonium salt has formula (1) wherein R¹ is a monovalent hydrocarbon group except vinyl and isopropenyl, R², R³, and R⁴ are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl or may bond together to form a ring with the sulfur atom, and n is 1 to 3. A chemically amplified resist composition comprising the sulfonium salt is capable of forming a fine feature pattern of good profile after development due to high resolution, improved focal latitude, and minimized line width variation and profile degradation upon prolonged PED.

The invention provides an ionic liquid consisting of the anions of diimine (vikane) and (perfluoroalkglsulfonyl fluorosulfonyl group) imine and the cation of sulfonium salt, ammonium salt or phosphor salt, as well as method for preparing the ionic liquid through diimine (vikane) and (perfluoroalkglsulfonyl fluorosulfonyl group) imine alkali salt. The ionic liquid can be used as an electrolyte material and applied on the fields like secondary lithium ion batteries, super capacitors, etc.

The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region, where the photoresist performance is not adversely impacted by basic contaminants in the processing environment of the photoresist. The novel photoresist comprises a polymer, a photoactive compound, a basic compound that is a sulfonium or iodonium compound that is essentially nonabsorbing at the exposure wavelength of the photoresist, and a solvent composition. The invention further relates to a process for imaging such a photoresist in the deep ultraviolet region.

A positive resist composition comprising (A) a polymer comprising recurring units of a specific structure adapted to generate an acid in response to high-energy radiation and acid labile units, the polymer having an alkali solubility that increases under the action of an acid, and (B) a sulfonium salt of a specific structure exhibits a high resolution in forming fine size patterns, typically trench patterns and hole patterns. Lithographic properties of profile, DOF and roughness are improved.

Water-fastness in aqueous ink-jet inks containing water-soluble dyes is achieved by using a specific ionic species having a charge opposite to that on the dye molecule. Anionic dyes typically contain sulfonate (or carboxylate) anionic groups. Using at least one specific ionic species of opposite charge, specifically, phosphonium salts, causes the colorant components to "crash" or precipitate out of the water-based ink onto the print medium due to the formation of a suitable charge complex between the ionic parts of the dye and the opposite charge of the counter-ion species. Other positively charged salts, such as quaternary ammonium salts, carbonium salts, iodonium salts, sulfonium salts, and pyrillium salts may be used to improve aqueous dispersion stability and thus printability. Such additional cationic salt partially replaces the phosphonium salt(s). Alternatively, certain surfactants, such as aromatic ethoxylates, polyethylene oxide ethers, or polypropylene oxide ethers may be used to improve print quality.