429 results about "Sulfonium" patented technology

The invention provides a self-heating tempering and valuable metal partition recycling method for copper smelting slag. The method comprises the steps that S1, a slag tempering agent is prepared from industrial sulfate waste and a low-cost carbonaceous reducing agent; s2, in the copper smelting matte smelting deslagging process, a tempering agent is added into molten slag, and phase adjustment reaction is completed through latent heat of the molten slag; s3, after the slag is slowly cooled, classifying the upper part and the lower part of materials in the slag ladle, and performing conventional crushing, ore grinding and flotation on the upper part to recover valuable metals; and S4, the lower part of sulfonium-rich slag enters a direct return smelting system or is crushed and levigated, and then copper concentrate is recycled through magnetic separation-reverse flotation. According to the copper smelting slag self-heating tempering and valuable metal partition recycling method, synergistic low-carbon treatment is conducted on copper smelting slag and sulfate waste residues according to the concept of treating waste with waste, the method has the advantages of being high in metal recycling rate, low in cost, environmentally friendly, simple in process and material and the like, good economic benefits and environmental benefits are achieved, and the industrial popularization difficulty is small.

The invention discloses a glass fiber reinforced polyurethane material and a preparation method thereof, and relates to the technical field of high polymer materials. When the glass fiber reinforced polyurethane material is prepared, bis (4, 4 '-dihydroxy) phenylacetylene reacts with bis (pinacolato) diboron and 4-bromopyridine in sequence to prepare an ultraviolet absorption monomer; the preparation method comprises the following steps: polymerizing polyether glycol, an ultraviolet absorption monomer, a sulfonium salt diol monomer and 1, 6-hexamethylene diisocyanate to prepare functional polyurethane; the preparation method comprises the following steps: polymerizing and coating a boron-containing flame-retardant monomer and bis (2-aminoethyl) phosphine on glass fibers to prepare pre-modified glass fibers; the pre-modified glass fiber and hydroxymethylated triazoline diketone are subjected to a reaction, and modified glass fiber is prepared; and uniformly mixing the functionalized polyurethane and the modified glass fiber, and carrying out injection molding to obtain the glass fiber reinforced polyurethane material. The glass fiber reinforced polyurethane material prepared by the invention has excellent anti-aging, antibacterial, flame-retardant, self-repairing and mechanical properties.

The purpose of the present invention is to provide: a novel resist material which contains (A) a heteropoly acid salt that has a modified defect site and is represented by general formula (I) or a mixture of such heteropoly acid salts, said salt or mixture having a cation moiety into which a sulfonium cation, sulfonium dication, or iodonium cation having one or more polar groups that have an acid dissociable group has been introduced; a pattern formation method; and a patterned structure. (I) (Am+)a(Bn+)b(C(am + bn)-)

The invention provides a series of novel monomolecular resin based on the metallocene compound, the monomolecular resin is used as a single-component non-chemical amplification photoresist, the problems of non-uniform distribution of an acid generator and an anti-acid diffusion agent, non-uniform acid diffusion and the like in a chemical amplification photoresist are avoided, and an obtained pattern has high resolution and low line width roughness. # imgabs0 #

The present invention relates to the field of material technology, and more specifically, to an onium salt compound, a photoacid generator, a photoresist composition, and a pattern forming method. The onium salt compound is a salt composed of anions and cations, wherein the cations are sulfonium cations or iodonium cations; the anion general formula is as shown in formula (B): In formula (B), R1 is an ester-containing group that can react with TMAH developer, R2 is a substituted or unsubstituted cycloalkane group with a carbon number of 6 to 10, and n is any integer between 1 and 3. ‑ The combination of fluorine atoms with high electron-withdrawing properties at relatively close positions can enhance the acidity, while introducing a cyclic hydrocarbon group with large spatial volume to reduce the diffusion of the acid; in addition, the addition of a group fragment with an ester group that can be cleaved by an alkaline developer can effectively reduce the development defects. The onium salt compound provided by the present invention is used as a photoacid generator to meet the current demand for high-resolution resist patterns, including low line width roughness (LWR) of the pattern and a smaller mask error enhancement factor (MEEF) of the line pattern, as well as fewer development defects.

A photoresist composition including one or more non-solvent alkali-insoluble base materials present in a combined amount of greater than 50 wt%, based on total solids of the photoresist composition; a non-polymeric ionic photoacid generator compound including an anion and an iodonium or sulfonium cation, wherein the anion is represented by Formula (1) as defined herein; and a solvent, wherein the photoresist composition is free of a photoacid generator that generates a photoacid having a higher acidity than a photoacid generated by the non-polymeric ionic photoacid generator compound.

To provide a chemically amplified negative resist composition having improved resolution in pattern formation and giving a resist pattern with good LER and pattern fidelity, and to provide a method for forming a resist pattern.SOLUTION: (A) a photoacid generator comprising an anion having the formula (A1) and a cation having a specific structure, and (B) a base polymer comprising a recurring unit having a specific structure with a phenolic hydroxyl group on a side chain.SELECTED DRAWING: None

The embodiment of the invention provides a sulfonium salt compound, a photoacid generator and a resist composition, and relates to the field of photoresist. The sulfonium salt compound disclosed by the embodiment of the invention has a specific structural general formula, and the sulfonium salt compound with the structural general formula can be completely soluble and uniformly dispersed in an organic solvent, so that the uniformity of the composition can be ensured when the sulfonium salt compound is used as the resist composition; when the sulfonium salt compound provided by the embodiment of the invention is used as a photoacid generator for the resist composition, a large steric hindrance group of the sulfonium salt compound can effectively reduce MEEF and improve the LWR performance of a photoetching pattern; and ester groups in the sulfonium salt compound enable the sulfonium salt compound to be easily decomposed, so that the influence on the environment can be reduced to the greatest extent.

To provide a resist composition with superior lithographic performance such as sensitivity and LWR, and also provide a sulfonium salt applicable as an acid generator in the resist composition, and an acid generator comprising the sulfonium salt.SOLUTION: The present invention provides a sulfonium salt represented by the general formula (1) where R1 is a hydrogen atom, a hydroxyl group, a carboxyl group, an electron-withdrawing group, an amino group, an optionally substituted C1-30 linear, branched-chain or cyclic alkyl group, a C2-30 linear, branched-chain or cyclic alkenyl group or the like; Ar is a C6-14 aryl group or a C3-20 heteroaryl group; the sulfonium salt in the formula has at least one iodine atom in the sulfonium cation structure; and X- is a monovalent anion.SELECTED DRAWING: None

The invention relates to the field of lubricating oil, in particular to wear-resistant lubricating oil and a preparation method thereof. Comprising the following raw materials: PAO (poly alpha olefin) synthetic oil, esterified castor oil-sucrose ester, octyl phenol, molybdenum dithiocarbamate, sulfurized isobutylene, zinc dialkyl dithiophosphate, calcium sulfonate and a nano graphene composite comb copolymer. In the lubricating system, esterified castor oil-sucrose ester molecules and a copolymer side chain form hydrophobic interaction through a hydrophobic end, and a hydrogen bond is formed between a hydrophilic end and the surface of the nano graphene, so that the rheological property and the dispersion stability are enhanced. The system forms a three-layer protection structure: a bottom layer provides bearing capacity by a nano graphene sheet layer, a middle layer forms a surface protection layer by esterified castor oil-sucrose ester molecules, and a top layer forms an elastic network by a copolymer side chain. In order to solve the problem that esterified castor oil-sucrose ester and a copolymer interfere with each other, octyl phenol is introduced as a compatibility improver, and the overall performance is optimized.

The invention discloses a fluorine release film for a high-viscosity silica gel protective film of an AF glass screen and a preparation method of the fluorine release film, and belongs to the technical field of unsaturated polyester, raw materials are uniformly mixed and coated on a PET base material, during high-temperature heat preservation, part of double bonds on a modified release agent and a modified filler can react with silicon-hydrogen bonds on hydrogen-containing silicone oil under the action of chloroplatinic acid, so that the fluorine release film is formed. The modified filler and the modified release agent are grafted by residual double bonds on the modified filler and the modified release agent under the action of 2, 4, 6-trimethylbenzoyl-diphenyl phosphine oxide through ultraviolet irradiation, so that the modified filler is more thoroughly contacted with polymer molecules, a stable conductive grid can be formed during raw material curing, and the conductivity of the conductive grid is improved. Meanwhile, under the action of triphenyl sulfonium hexafluorophosphate, an expanding monomer DB-TOSU is subjected to double-ring-opening polymerization to form bicyclic acetal, the bicyclic acetal is converted into carbonyl and hydroxyl, and the carbonyl and hydroxyl are matched with a polyhedral oligomeric silsesquioxane structure on the modified filler, so that the smoothness of the surface of the release film is ensured.

The invention discloses an anti-doodling superhard heat-insulating coating as well as a preparation method and application thereof, and relates to the technical field of heat-insulating coatings. The preparation method comprises the following steps: preparing ladder-type polysilsesquioxane from epoxy siloxane, then taking the ladder-type polysilsesquioxane and 2, 5-bis (trifluoromethyl)-3, 6-dioxaundecafluorononanoyl fluoride as raw materials, and successfully synthesizing fluorinated ladder-type polysilsesquioxane through chemical grafting of a fluorine-containing oligomer and the ladder-type polysilsesquioxane, so as to obtain the fluorinated ladder-type polysilsesquioxane. The preparation method comprises the following steps: preparing a fluorinated trapezoid polysilsesquioxane coating, mixing the fluorinated trapezoid polysilsesquioxane coating with a triaryl sulfonium hexafluoroantimonate mixture to prepare a fluorinated trapezoid polysilsesquioxane coating, and sequentially spin-coating a CWO coating and the fluorinated trapezoid polysilsesquioxane coating on a substrate for curing to obtain the anti-doodling superhard heat-insulating coating. The prepared anti-doodling superhard heat insulation coating has excellent anti-doodling performance, high hardness, good heat insulation effect and use stability, can be used for manufacturing energy-saving windows to prolong the service life of the energy-saving windows, and has important scientific research value and commercial application value.

The invention relates to a method for efficiently recovering valuable components of complex low-grade platinum-palladium-oxygen-sulfur mixed ore. The method comprises the following steps: (1) pretreating the low-grade platinum-palladium-oxygen-sulfur mixed ore to be treated; (2) carrying out primary enrichment on useful components; (3) secondary enrichment by a pyrogenic process; (4) performing different-structure ore making to obtain different-structure sulfonium ore; (5) separating different ores to obtain alloyed gold, silver-containing copper sulfide concentrate and nickel sulfide cobalt concentrate; (6) separating alloyed gold; and (7) respectively refining by-products copper and nickel. According to the method, the efficient recovery effect on the valuable components of the complex low-grade platinum-palladium-oxygen-sulfur mixed ore is remarkable, the recovery rates of the valuable components such as platinum, palladium, gold, silver, copper and nickel are all 60% or above, the recovery benefits are good, the process is stable, adaptability is high, and the method has important significance on comprehensive utilization of low-grade platinum-palladium ore resources poor in copper and nickel.

The invention provides a solar cell and a preparation method thereof, electric equipment and power generation equipment. The solar cell comprises an active layer, the active layer comprises a light absorption layer, a passivation layer and a first carrier transport layer which are sequentially stacked from bottom to top, the passivation layer comprises a passivator, the passivator comprises cations, and the cations comprise one or more of sulfonium ions and phosphonium ions. The solar cell has excellent photoelectric conversion efficiency and stability.

To provide a novel sulfonium salt which has superior solvent solubility and sensitivity to ultra-short wavelength light, and which exhibits acid generation by rapid decomposition upon ultra-short wavelength light irradiation.SOLUTION: The present invention provides a sulfonium salt represented by formula (1), wherein Rf1, Rf2, Rf11, and Rf12 represent F or a fluoroalkyl group; Ra represents a hydroxy group or the like; m and n represent integers of 1 or more, provided that m+n is an integer of 5 or less; and X- represents a monovalent counter anion.SELECTED DRAWING: None

The invention relates to a method for purifying an electronic-grade sulfonium salt photoacid generator. The method comprises the following steps: heating, preparing a photoacid generator stock solution, purifying through ion exchange resin, cooling, recrystallizing, carrying out solid-liquid separation, washing crystals and the like to obtain the high-purity photoacid generator, so that the metal content in the photoacid generator can be effectively reduced, the single metal content is less than 5ppb, and the yield is up to 80-90%. And mother liquor is collected and purified by resin and can be used for preparing photoacid stock solution again. The operation effectively reduces the use of an organic solvent and the generation of wastewater, can further improve the recrystallization yield, and meets the requirements of green and sustainable development.

To provide a resist material which has high sensitivity and improved LWR and CDU regardless of whether it is positive or negative, and a pattern forming method using the same.SOLUTION: The resist material contains a base polymer having a sulfonium salt or iodonium salt structure in which an arylsulfonic acid anion substituted with an iodine atom is bonded to the main chain.SELECTED DRAWING: None

The present invention provides: a novel heteropolyoxometalate having a modified lacunary site, obtained by modifying the lacunary site of a heteropoly anion having a lacunary site and by introducing an organic sulfonium cation, an organic sulfonium dication, or an organic iodonium cation as a counter cation of the heteropoly anion having the modified lacunary site; or a mixture thereof.

The invention relates to the fields of medicine, organic chemical industry and fine chemical industry, in particular to a method for synthesizing 1, 4-diketone by catalyzing alkenyl amide and alpha-carbonyl oxidized sulfonium ylide through photooxidation reduction. The preparation method comprises the following steps: under the protection of inert gas, reacting alkenyl amide and alpha-carbonyl oxidized sulfonium ylide serving as substrates in an organic solvent by taking a photosensitizer as a catalyst under the action of blue light irradiation and alkali at 30 DEG C for 18 hours to obtain an alkenyl amide alpha-carbonyl alkylate, and then hydrolyzing under an acidic condition to synthesize various asymmetric 1, 4-diketone compounds. The 1, 4-diketone compound is synthesized by a two-step method by taking alkenyl amide and alpha-carbonyl oxidized sulfonium ylide as initial raw materials, and the method has the remarkable advantages of wide substrate raw material sources, simplicity and convenience in operation, mild reaction conditions, high reaction efficiency, good universality, excellent functional group compatibility and the like.

The invention belongs to the technical field of aqueous zinc-iodine batteries, and particularly relates to an aqueous zinc-iodine battery with high area specific energy, quick charge and long service life and a preparation method. According to the high-area-specific-energy fast-charging long-life aqueous zinc-iodine battery provided by the invention, the aqueous zinc-iodine battery which is cooperatively modified by simultaneously introducing the organic sulfonium salt into the positive electrode and the electrolyte can stably provide the capacity of 3.3 mA h / cm < 2 > (the running duration exceeds 110 days, and the capacity retention rate is-100%) under the high load of 25 mg / cm < 2 >, and the ultrahigh rate performance of 100 mA / cm < 2 > is shown; a new scheme is provided for constructing the zinc-iodine battery with high magnification and long service life, and the zinc-iodine battery serves as an energy storage device with excellent performance and is applied to multiple fields such as peak regulation and frequency modulation of a power grid; the technical problem that a high-performance aqueous zinc-iodine battery is lacked in the prior art is solved.

The invention belongs to the technical field of organic chemical synthesis, and particularly relates to a novel method for synthesizing trifluoromethyl heteroaromatic hydrocarbon. The invention provides a novel method for synthesizing a trifluoromethyl heteroaromatic compound, the reaction system is mild, the substrate application range is wide, and the functional group compatibility is good. Specifically, in a rotating magnetic field, a metal conductor cuts magnetic induction lines to generate electron transfer, so that trifluoromethyl sulfosalt is reduced to generate trifluoromethyl free radicals, and the trifluoromethyl free radicals react with heteroaromatic hydrocarbon to synthesize trifluoromethyl heteroaromatic hydrocarbon. The method for synthesizing the trifluoromethyl heteroaromatic hydrocarbon comprises the following steps that firstly, heteroaromatic hydrocarbon, trifluoromethyl sulfosalt, a solvent and a metal rod are placed in a reaction tube and react in a multi-energy field coupling device, the magnetic field intensity (B) is set to be 0.01-3.00 T, the rotation frequency is set to be 5-50 Hz, the reaction time is set to be 1-24 h, finally, the trifluoromethyl heteroaromatic hydrocarbon is prepared, and the general formula of the trifluoromethyl heteroaromatic hydrocarbon is shown in the specification.

The present invention relates to a sulfonium sulfonate photoacid generator represented by Formula I, a synthesis method thereof, and a photoresist composition containing the photoacid generator. The photoacid generator of the present invention has a relatively large molecular weight, which can reduce diffusion of the photoacid generator during use, thereby improving the process window and edge roughness of the photoresist. Furthermore, the photoacid generator of the present invention is simple to prepare, and a high-purity product can be obtained through a simple recrystallization step. Furthermore, the photoacid generator of the present invention significantly improves the edge roughness and DOF of the resulting photolithographic pattern compared to existing photoacid generators for ArF lithography.

A chemically amplified positive resist composition containing a base polymer (A) which is a polymer whose solubility in an aqueous alkaline solution is increased by the action of an acid, contains a repeat unit containing an aromatic sulfonate anion having the formula (A1-1) and a sulfonium cation having the formula (A1-2) and a repeat unit having the formula (A2), and contains a polymer whose solubility in an aqueous alkaline solution is increased by the action of an acid.

A photoresist composition comprising one or more non-solvent alkali-insoluble substrates present in a total amount exceeding 50% by weight based on the total solids content of the photoresist composition, and a nonpolymeric ionic photoacid generator compound comprising an anion and an iodonium or sulfonium cation, wherein the anion is defined by formula (1) as defined herein. [Formula 1] TIFF2026528972000047.tif49166(wherein b is an integer from 1 to 4, and at least one R) 1 (This is a group that is substituted with a halogen.) A photoresist composition comprising a nonpolymeric ionic photoacid generator compound and a solvent, as represented by [formula].

The invention relates to a silicon-containing sulfonium salt compound, a silicon-containing composition for forming a resist underlayer film, and a pattern forming method. Provided are: a composition for forming a silicon-containing resist underlayer film, which is capable of forming a silicon-containing resist underlayer film that has an appropriate etching rate in a multi-layer resist method and is capable of improving LWR and CDU in an ultra-fine pattern; a silicon-containing sulfonium salt compound contained in the composition; and a pattern forming method using the composition. A silicon-containing sulfonium salt compound characterized by being a substance represented by general formula (A-1). [chemical] # imgabs0 #

To provide photoactive compounds, photoresist compositions including the same, and pattern formation methods.SOLUTION: Provided is a photoactive compound comprising an organic cation selected from the group consisting of iodonium cations and sulfonium cations, and an anion represented by any one of Formulae (5a) to (5c).SELECTED DRAWING: None

Provided is a method for producing a nickel powder with which it is possible to suppress the generation of linked particles in a liquid-phase synthesis method without hindering the reduction reaction of a nickel salt. A method for producing a nickel powder, the method including a step for starting a nickel precipitation reaction in a reaction solution in which a nickel salt, a metal having a lower ionization tendency than nickel or a salt thereof, a reducing agent, an alkali metal hydroxide, a sulfonium salt, and water are mixed, the sulfonium salt being used in an amount of 100 mol% or more relative to the nickel in the reaction solution.

The invention discloses a synthesis method of a polysubstituted internal alkenyl phosphine oxide derivative. Internal alkenyl sulfonium salt which is simple, easy to prepare and high in reaction activity is used as a raw material, diaryl phosphine oxide is used as a coupling reagent, and the Z / E isomer of the polysubstituted internal alkenyl phosphine oxide derivative is simply and efficiently synthesized through a displacement substitution reaction. Compared with the reported alkenyl phosphine oxide synthesis method, the method has the characteristics of stable raw material structure, low price, easiness in obtaining, very mild reaction conditions, simplicity in experimental operation, high reaction efficiency and good functional group compatibility, and two isomer products Z / E can be obtained through one-step separation and purification.

A photoresist composition comprising one or more alkali-insoluble, non-solvent base materials present in a combined amount of more than 50 wt% based on the total solids of the photoresist composition; a non-polymeric ionic photoacid generator compound comprising an anion and an iodonium or sulfonium cation, the anion being represented by formula (1); a photodegradable quencher, a basic quencher or a combination thereof and a solvent: where Ar 1 for a monocyclic or polycyclic aromatic C 3-60 -Group stands; L 1 L represents a single bond or one or more binary linkage groups. 1 is free of fluorine; Z 1 an anion-stabilizing group, wherein Z 1is designed in such a way that it forms an intramolecular non-covalent bond with the sulfonate anion group, forming a ring with 5 to 8 atoms; and the remaining substituents are defined as shown here.

The invention discloses a method for efficiently separating arsenic from an arsenic-containing material through smelting of an oxygen-enriched side-blown molten pool. The treated arsenic-containing material, a flux and reduction coal are subjected to batching, a mixed material obtained after batching is continuously put into an oxygen-enriched side-blown molten pool smelting furnace, and oxygen-enriched air and gas fuel are blown into the smelting furnace for heating and high-temperature smelting; the materials are subjected to melting, reduction and slagging reaction in the smelting furnace; along with the reaction in the smelting furnace, the melt in the furnace is settled and layered, and alloy, sulfonium, furnace slag and high-temperature flue gas are obtained; generated alloy and sulfonium are discharged through a siphon port, and obtained slag is discharged through a slag discharging port; most arsenic and part of metal are volatilized and oxidized and enter high-temperature flue gas; and the generated high-temperature flue gas is subjected to cooling, high-temperature dust collection, shock cooling, low-temperature dust collection and tail gas treatment and then is discharged after reaching the standard. According to the method, the processes of matched treatment of the arsenic-containing materials, strengthened smelting and segmented dust collection are adopted, so that the arsenic content of the obtained crude arsenic oxide accounts for 70-75% of the total amount of the arsenic entering the furnace, the content of other metals is low, and the separation effect of the arsenic is good.