2682 results about "Photosensitivity" patented technology

A light-sensitive lithographic printing plate comprising a hydrophilic substrate provided thereon with a layer sensitive to infrared light rays comprising (A) a polymer represented by the following general formula (I); (B) an organic acid and/or a cyclic acid anhydride; and (C) a light-heat conversion substance. The light-sensitive lithographic printing plate is excellent in the both printing durability and the developing latitude.

A photosensitive composition containing a compound capable of generating a specific acid having the plural number of sulfonic groups by irradiation with an actinic ray or a radiation and a pattern forming method using the same.

An image capturing lens assembly includes, in order from an object side to an image side: the first lens element with positive refractive power, the second lens element with refractive power, the third lens element with positive refractive power, the fourth lens element with refractive power, the fifth lens element with refractive power, and the sixth lens element with refractive power, at least one surface of the sixth lens element thereof being aspheric and having at least one inflection point. By such arrangement, total track length and the photosensitivity of the image capturing lens assembly can also be effectively reduced while retaining high image quality.

Provided is a photosensitive resin composition that is developable with an aqueous alkaline solution and is suitable for the production of a color filter for an image sensor. The composition comprises an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, colorants and a solvent. As the colorants, a pigment and a dye are used in combination. The use of the composition enables the formation of fine pixels that exhibit excellent color reproduction and contrast. Therefore, the composition can be used to produce a high-resolution color filter for an image sensor.

A novel Bragg grating filter in optical waveguiding fiber with suppressed cladding mode coupling and method of producing same is disclosed. The novel grating structure is induced in both the core and the cladding of the optical fiber irrespective of the photosensitivity of the core or cladding to actinic radiation. Such core and cladding of the optical fiber need not be chemically doped to support the grating. The method incorporates an ultra short duration pulse laser source. Electromagnetic radiation provided from the laser propagates to a diffractive element positioned a specific distance to the target material such that the diffracted electromagnetic radiation forms a 2-beam interference pattern, the peaks of which are sufficiently intense to cause a change in index of refraction.

There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymnerization initiator (b) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.

A light-sensitive lithographic printing plate comprises a hydrophilic substrate provided thereon with an infrared light-sensitive layer which comprises (A) an acetal polymer having a specific structure; (B) a polymeric compound carrying, on the side chains, fluorinated aliphatic groups in which the fluorinated aliphatic groups are those derived from fluorinated aliphatic compounds prepared by the telomerization or oligomerization; and (C) a light-heat conversion substance. The light-sensitive lithographic printing plate is excellent in the both printing durability and the developing latitude.

A radar device includes a light projecting part that generates laser light, a light projecting lens that converges the generated laser light to form a beam, a reflective mirror for reflecting the converged beam to project it in a specified search direction and for reflecting returning light from this search direction, a light receiving lens for converging the returning light reflected by the reflective mirror, and a scanning part for moving the beam in a scanning manner. There are two light receiving parts which are different in photosensitivity, and a synthesizing part outputs a synthesized signal formed by synthesizing output signals from these two light receiving parts.

Provided is a highly reliable resin black matrix, which has sufficient light-blocking characteristics, suppresses temperature increase due to heat generated by a TFT element and does not have failures of a TFT element substrate and fluctuation in liquid crystal drive. The maximum light transmittance of the resin black matrix in a wavelength range of 400 nm-700 nm is permitted to be 1% or less and the average light transmittance in a wavelength range of 850 nm-3,000 nm to be 60% or higher. Alternatively, the minimum light transmittance is permitted to be 50% or more.

An electrophotographic photosensitive member is constituted by disposing a protective layer and a photosensitive layer on an electroconductive support in this order. The protective layer is characterized by containing an electroconductive particles, fluorine-containing resin particles and a binder resin. The photosensitive layer is suitable for providing an electrophotographic apparatus showing excellent electrophotographic characteristics such as a high photosensitivity and a low residual potential and also providing good image forming properties under any environmental condition, improved pause memory characteristics and a decreased transfer memory.

A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength.

Methods for machining glass structures may be performed on fusion-drawn glass laminates having a core layer interposed between a first cladding layer and a second cladding layer. The core layer may be formed from a core glass composition having a core photosensitivity, the first cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity, and the second cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity. At least one of the core layer, the first cladding layer, and the second cladding layer is a photomachinable layer. The methods may include exposing a selected region of a photomachinable layer in the fusion-drawn laminate to ultraviolet radiation; heating the glass structure until the selected region crystallizes; and removing the crystallized material selectively from the photomachinable layer.

A photosensitive composition, comprises (A) a sulfonium salt represented by formula (I);

wherein Y₁, Y₂ and Y₃ each independently represents a nitrogen-containing heteroaryl group, an alkyl group, a cycloalkyl group, an aryl group or an alkenyl group, at least one of Y₁, Y₂ and Y₃ represents a nitrogen-containing heteroaryl group, and at least two of Y₁, Y₂ and Y₃ may combine with each other to form a ring; Xⁿ⁻ represents an n-valent non-nucleophilic anion; and n represents an integer of 1 to 3.

The invention relates to a multifunctional fabric capable of shielding ultraviolet rays and having lasting superhydrophobic performance and a preparation method thereof, belonging to the technical field of functional textile materials. According to the invention, the surface of the fabric is modified with an inorganic nanometer particle coating; then, the inorganic nanometer particle coating is cladded by an inert oxide barrier layer; finally, the fabric is subjected to functional modification of surface hydrophobization. Since the inert oxide barrier layer has an inhibiting effect on photosensitivity of inorganic nanometer particles, a manufactured textile material presents lasting superhydrophobic performance under strong ultraviolet irradiation for a long time, and the ultraviolet ray shielding index of the manufactured fabric is greater than 100. The prepared multifunctional fabric capable of shielding ultraviolet rays and having lasting superhydrophobic performance is applicable to a variety of fields, e.g. medical science, military, biology and the optoelectronics industry.

The present invention relates to an aqueous alkali-developable photosensitive polyimide precursor resin composition that is appropriate for highly heat-resistant transparent protection layers and insulation layers for liquid crystal display devices. In more detail, the present invention relates to a negative-type photosensitive transparent polyimide precursor resin composition manufactured in two steps. The first step is the manufacture of a transparent linear polyamic acid (A) from (a-1) one or more kinds of tetracarboxylic acid dianhydrides selected from alicyclic tetracarboxylic acid dianhydrides having 3 to 30 carbon atoms; and (a-2) one or more kinds of diamines selected from aliphatic, alicyclic, or non-conjugated aromatic diamines, having 3 to 30 carbon atoms, having one or more ethylenically unsaturated bonds at side chains as essential components; and the second step is the manufacture of reactive transparent polyimide precursors shown in the following Chemical Formula 1 according to the esterification reaction of the above polyamic acid (A) with ethylenically unsaturated compound (B) containing an epoxy group in the same molecule as the main component. The photosensitive transparent polyimide precursor resin compositions according to the present invention have a superior photosensitivity, and thus, may be used for transparent protection layers and insulation layers of liquid crystal display devices having superior heat resistance, chemical resistance, mechanical strength, and electricity insulation.

A wide-angle optical lens assembly comprises, in order from an object side to an image side: a first lens element with a negative refractive power having concave image-side surface, a second lens element with a positive refractive power, a third lens element with a positive refractive power, and a fourth lens element with a positive refractive power having convex image-side surface, at least one surface of the fourth lens element thereof being aspheric. By such arrangement, total track length and photosensitivity of the wide-angle optical lens assembly can be effectively reduced while retaining large field of view and superb image quality.

A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation:

Z-A-X—B—R   (I)

wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.