180 results about "Light sensitivity" patented technology

The invention relates to the technical field of machine vision detection, particularly discloses a mechanical part surface defect vision detection system, and aims to solve the problems of blind areas, environment light sensitivity, insufficient tiny defect detection capability and the like in the detection of complex curved surface high-reflection parts. Comprising an optical imaging module, a geometrical morphology sensing module, a dynamic polarization regulation and control module, an image fusion and enhancement module and a defect identification and decision module. The three-dimensional morphology of the surface of the part is sensed in real time, the imaging polarization state is dynamically regulated and controlled according to the three-dimensional morphology, multi-frame polarization image fusion and digital diffraction enhancement processing are combined, full-coverage and high-contrast detection of the complex curved surface part is achieved, motion blur is effectively restrained, and the detection capacity of sub-pixel-level tiny defects and the system environment adaptability are improved.

The invention discloses an image facial feature extraction and fusion method and system and a memory, and the method comprises the steps: carrying out the feature extraction of a source role facial image, and generating a basic feature map and an identity feature vector; performing decoupling processing on the basic feature map by taking the identity feature vector as a control condition, and separating an expression feature channel and an illumination feature channel; inputting the decoupled expression feature channel and illumination feature channel into a scene perception gating network, and generating an adaptive fusion feature map in combination with the target scene image; executing Poisson fusion and generative adversarial refinement on the adaptive fusion feature map, and outputting an optimized fusion image; through a decoupling mechanism guided by an identity feature vector, texture distortion and illumination sensitivity are avoided, a scene perception gating network dynamically adjusts a feature fusion weight, cross-scene adaptability is remarkably improved, poisson-generative adversarial two-stage fusion introduces antagonism refinement on the basis of gradient domain optimization, boundary splicing traces are eliminated, and the fusion precision is improved. And high-fidelity and cross-scene facial feature fusion is realized.

The present invention provides an organic electric element including a metal patterning layer formed on the outside of a metal electrode and an electronic device thereof, and by forming a patterning auxiliary photosensitive layer made of a material with excellent photosensitivity under the metal patterning layer, it is possible to easily measure the thickness of the metal patterning layer.

A system for calibrating the light sensitivity of a camera includes a light emitter for emitting a light pulse, a fiber splitter for receiving the light pulse via an input port and providing first and second portions of the light pulse to respective first and second output ports, and a light collector for receiving the first portion from the first output port and converting the first portion to a first signal representative of a light characteristic of the first portion. A first fiber optic cable connects the light emitter and the input port, a second fiber optic cable connects the first output port and the light collector, and a third fiber optic cable has a first cable end connected with the second output port and a second cable end for emitting the second portion of the light pulse for capture by the camera. A related method is also provided.

The invention belongs to the field of exhibition light control, and particularly relates to an exhibition space light environment parameter optimization regulation and control method and system based on illumination perception, and the method comprises the steps: firstly building a three-dimensional model through obtaining exhibition semantic information and spatial constraints, extracting an exhibit light sensitivity level and spatial fluctuation information, and dividing an illumination control region sequence according to the exhibit light sensitivity level and the spatial fluctuation information; fusing the photosensitive damage rate and the importance degree of the exhibit, and determining a dynamic target optical parameter control interval set; the method comprises the following steps: constructing a hierarchical target mapping function of a fusion fit degree, exhibition experience and an energy-saving index, and dynamically setting main and auxiliary control functions in different time periods according to a control index priority factor; and solving the optimal optical parameter set of each time period by adopting an optimization search algorithm, and carrying out inversion to obtain an optical parameter control index. According to the method, self-adaptive balance optimization of the exhibition light environment among multiple targets of cultural relic preventive protection, audience visual experience and system energy-saving efficiency is realized.

The invention discloses a photoresponse biomass-based material for removing organic-inorganic combined pollution in water as well as a preparation method and application of the photoresponse biomass-based material. The preparation method specifically comprises the following steps: (1) designing a photosensitive functional monomer; (2) preparing a biomass macromolecular initiator; (3) preparing the photoresponse biomass adsorbent; and (4) preparing the photoresponse biomass-based intelligent material. The photoresponse biomass-based material prepared by the method is rich in raw material source, green and environment-friendly, can be used for adsorption of composite pollutants (such as heavy metal / organic matter composite pollution and the like) in the environment, and can simultaneously realize desorption of the pollutants, photocatalytic degradation of the pollutants and regeneration of an adsorbent under the illumination condition; the defects that the traditional adsorbent regeneration process is complicated, secondary pollution is easy to generate, the repeated utilization rate of the adsorbent is low and the like are effectively overcome, and wide application prospects are achieved.

The invention discloses an ancient building repairing auxiliary system based on a color quantization technology, and relates to the technical field of ancient building special decoration. The acquisition module is used for acquiring a dust light transmission attenuation coefficient determined according to the dust concentration and a target attenuation coefficient, determining a reference brightness ratio of the current brightness to the dust-free standard brightness by a standard reference plate and a preset temperature and humidity compensation factor, and calculating an environment illumination value; according to the identified average reflectivity of the material, 1 minus the mirror reflection ratio and the surface roughness, endowing different weight values, and then adding to determine a material optical value of the material; dividing the product of the environment illumination value, the material optical value and a preset material photosensitivity correction factor by 100 to obtain a comprehensive illumination value; driving an execution unit to execute different strategies according to the comprehensive illumination value; therefore, the problem that some tiny flaws cannot be accurately positioned during repair defect detection due to different on-site environments after the ancient building is preliminarily repaired can be solved, and the method is simple, effective and easy to use.

The invention relates to the field of film-forming resins for CTP plate coatings, in particular to a film-forming resin for a CTP plate coating and a preparation method of the film-forming resin, and aims to solve the problems of the film-forming resin for the CTP plate coating in the aspects of photosensitive resin, adhesive force and oxidation resistance. The preparation method comprises the following steps: carrying out free radical copolymerization on three monomers of tert-butyl acrylate, acrylic acid and phenyl methacrylate to prepare a series of intermediate copolymers, and reacting glycidyl methacrylate with carboxyl in the intermediate copolymers to introduce photocurable double bonds. By adding the modified antioxidant and the modified high-adhesion promoter, the performance of the CPT plate can be greatly improved, so that the film-forming resin of the prepared CTP plate coating is comprehensively improved in five key indexes of light sensitivity, imaging resolution, printing resistance, storage life and scene adaptability of the CPT plate, and the film-forming resin is particularly suitable for modern printing requirements of high precision, long plate number and multiple scenes; and material support is provided for cost reduction and benefit increase in the printing industry.

The present application provides a display panel and a display device. A light-shielding layer of the display panel comprises a first light-shielding portion, a second light-shielding portion and a third light-shielding portion, wherein the first light-shielding portion can perform light shielding on a first active portion of a driving transistor, the second light-shielding portion can perform light shielding on a third active portion of a compensation transistor, and the third light-shielding portion can perform light shielding on a fourth active portion of a first initialization transistor, thereby improving the photosensitivity and electrical properties of the compensation transistor and the first initialization transistor.

This invention discloses a photosensitizer, an i-line photoresist containing the photosensitizer, and a preparation method thereof. The preparation method of the i-line photoresist composition disclosed in this invention includes the following steps: uniformly mixing the components of the i-line photoresist composition, wherein the i-line photoresist composition includes the following components: phenolic resin, photosensitizer, silicone leveling agent, and organic solvent; wherein the photosensitizer is composed of photosensitizer A and photosensitizer B. The i-line photoresist composition prepared using the photosensitizer of this invention produces photoresist patterns with high photosensitivity and resolution when used in i-line lithography.

This invention discloses a coumarin-linked conjugated porous polymer, its preparation method, and its applications. The preparation method includes: subjecting a homogeneous mixture containing o-hydroxybenzaldehyde monomer, phenylacetonitrile monomer, solvent, and catalyst to a Knauven-Gail condensation reaction to obtain the coumarin-linked conjugated porous polymer. The coumarin used in this invention to prepare the coumarin-linked conjugated porous polymer is a highly planar molecule. Its full conjugation extends the absorption wavelength to the visible light region and enhances π-electron excitation, thus exhibiting strong photosensitivity. The resulting series of coumarin-linked highly conjugated nanoarray conjugated porous polymers possess high porosity and a fully conjugated structure, making them highly efficient for applications in photocatalysis, fluorescence sensing, and optoelectronic devices.

The application discloses a naphthyl derivative for regulating photoresponse through thermal phase change and a preparation method and application thereof. The naphthyl derivative is (2Z,4E)-2-(3-chlorophenyl)-5-(7-(dimethylamino)naphthalen-2-yl) penta-2,4-diphenyl nitrile, and Y crystal forms can be obtained by crystallization in solvents, wherein the Y crystal forms exhibit photo-inertness, and a unique SCSC phase change occurs when the Y crystal forms are heated to the vicinity of a melting point, the thermal phase change can make the Y crystal forms transform into Y transition crystal forms exhibiting photosensitivity, and the conversion from photo-inertness to photosensitivity is realized. The Y transition crystal forms can also be obtained by crystallization through a solvent method. The Y transition crystal forms are combined with PVA to prepare a composite film, the obtained composite film can be bent and twisted without affecting photoresponse performance, and the composite film is expected to be applied to a light brake. Further, conductive silver paste is coated on the surface of the composite film to make the composite film conductive, and the composite film is connected to a patch circuit to prepare a light-controlled switch, and the light-controlled switch is expected to be applied to the field of molecular robots.

The present invention is directed to a method for printing a micro-scaled or nano-scaled XUV and / or X-ray Diffractive optic (1), including the following steps: a) providing a material (2) with a first component (2a) being photo-sensitive and being polymerizable by two-photon-absorption, b) providing data (3) of a desired geometrical structure (4) of the optic (1) and creating at least one trajectory (8) corresponding to the data (3) of the desired structure (4) of the optic (1), c) providing a high-intensity energy beam (5), in particular a laser beam, wherein the beam (5) comprises a focus (F) having a position being adjustable to a plurality of positions (F1, F2, <, Fp) being coincident with the at least one trajectory (8), d) polymerization of the material (2) by two-photon-absorption at a first position (Fn) of the focus (F), thereby creating a first voxel (vn1n2n3) of the structure (4) of the optic (1), adjusting the position of the focus (F) from the first position (Fn) to a subsequent position (Fn+1) of the focus (F) along the at least one trajectory (8) and repeating step d) at the subsequent position (Fn+1) of the focus (F), wherein a distance (d) between each of the positions (F1, F2, <, Fp) of the focus (F) and at least one of the rest of the positions (F1, F2, <, Fp) of the focus (F) is smaller than a mean diameter (vd) of the voxels produced at these positions with respect to their dimension parallel to the distance (d).

The invention relates to a super-crosslinking photosensitive material as well as a preparation method and application thereof. According to the photosensitive material, photosensitive molecules such as 2, 4, 5, 6-tetra (9-carbazolyl)-isophthalonitrile, 1, 3-dicyano-2, 4, 5, 6-tetra (diphenylamino)-benzene, anthraquinone, thioxanthone and the like are used as a basic structural unit as a skeleton; according to the preparation method, p-xylylene dichloride, 1, 4-di (bromomethyl) benzene, 1, 3, 5-tri (bromomethyl) benzene or biphenyl xylylene dichloride is used as a cross-linking agent, and photosensitive molecules are bonded with the cross-linking agent to obtain the super-crosslinked photosensitive material with the photosensitive property. The photosensitive material is applied to the asymmetric alpha-hydroxylation reaction of beta-keto ester, and an asymmetric alpha-hydroxylation reaction process with oxygen as an oxidizing agent is developed. The method provided by the invention is environment-friendly and has relatively high stereoselectivity.

The invention discloses a method for manufacturing a redistribution layer. The method comprises the following steps of: gluing a photosensitive dielectric material on a carrier plate; the method comprises the following steps of: exposing a hole by adopting a full exposure mode, and exposing a circuit by adopting a half exposure mode; developing and forming patterns of the hole and the circuit at the same time; making a seed layer; electroplating; in the exposure step, the hole is exposed in a full-exposure mode, then the circuit is exposed in a half-exposure mode, compared with the prior art, a layer of photoresist is omitted in the process, exposure and development are conducted, and the overall technological process steps and cost are greatly reduced.

This utility model discloses a nursing medication preparation teaching workbench, belonging to the field of teaching equipment technology. It aims to solve the technical problems of high light leakage risk and insufficient light-blocking effect of traditional light-blocking measures. The workbench includes a table body with lifting mechanisms arranged on both sides inside. A teaching mechanism is connected to the lifting mechanisms and is located in the middle of the table body. The teaching mechanism includes an outer frame, inside which is an inner frame. A cavity is formed between the inner and outer frames, and sliding rails are arranged on both sides inside the cavity. This utility model, through the design of a top plate and a light-blocking curtain structure, allows the top plate, along with the light-blocking curtain mounted on its lower surface, to extend from the cavity when the outer frame is raised from inside the table body, forming a dark space. This space reduces external light, facilitating students' medication preparation operations with photosensitive drugs and reducing the risk of photolysis reactions caused by light exposure.

Disclosed are a frontside illuminated image sensor and a method of manufacturing the same. More particularly, a frontside illuminated image sensor and a method of manufacturing the frontside illuminated image sensor include a light scattering portion in a substrate, configured to increase a path of incident light, thereby preventing cross-talk between adjacent pixels and increasing light sensitivity.

The invention discloses a BCB photoresist and a preparation method thereof, and belongs to the technical field of photoresists. Comprising the following raw materials in parts by weight: 60-70 parts of modified BCB resin, 20-30 parts of a solvent, 1-3 parts of anthraquinone-2-sodium sulfonate and 5-9 parts of triallyl isocyanurate. Wherein the modified BCB resin is prepared from the following raw materials: 4-vinyl benzocyclobutene, p-divinyl benzene, an RAFT (Reversible Addition-Fragmentation Chain Transfer) reagent and an anti-impact modifier, and the anti-impact modifier not only improves the impact resistance of the cured photoresist, but also has photosensitivity and broadens the ultraviolet response range; sodium anthraquinone-2-sulfonate is added into the raw materials of the BCB photoresist as a nano sensitizer, so that the ultraviolet absorption is further enhanced, and the developing contrast is improved; in conclusion, the photoresist prepared by the invention has both impact resistance and photosensitivity, is stable in performance, and has important application value in the technical field of photoresist.

The invention discloses a screening method for transparent bottled health-care wine containers, and aims to solve the problem that active ingredients of transparent bottled health-care wine are degraded due to illumination. According to the method, 200-700nm is taken as a research range, and the 200-700nm is divided into a plurality of equal-width sub-wavebands; detecting the absorbance sum Ak of the health-care wine in each sub-wave band and the average light transmittance Tk of the container in the corresponding sub-wave band; the equivalent light transmittance Te is calculated through a formula, the lower the Te value is, the better the protection effect of the containers on the light stability of the wine body is, and the containers with Te smaller than or equal to a preset threshold value are screened. According to the method, the light transmission characteristic of the container and the light sensitivity characteristic of the wine body are coupled, the evaluation accuracy is superior to the traditional single wavelength / average light transmittance index, the stability of active ingredients of the health wine in storage and display can be ensured, and the container practicability and the product quality are both considered.

The present invention concerns a new gene therapy approach to increase light-sensitivity in degenerating cones in advanced stages of rod-cone dystrophy (RCD) mediated by G-protein-gated-K+ channel (GIRK), in particular GIRK1 F137S, activated by G proteins recruited by cone opsin expressed in degenerating cones.

The invention provides a chip structure and method for rapid hybrid bonding, the chip structure for rapid hybrid bonding comprises a first chip structure and a second chip structure to be bonded, the surface of the first chip structure is provided with a first passivation layer and first metal bumps protruding out of the first passivation layer; the surface of the second chip structure is provided with a second passivation layer, a photosensitive organic dielectric layer and second metal bumps, the photosensitive organic dielectric layer covers the second passivation layer, and the photosensitive organic dielectric layer is in an uncured or incompletely cured state; the second metal bumps are exposed on the surfaces of the second passivation layer and the photosensitive organic dielectric layer, and the surfaces of the second metal bumps are lower than the surface of the photosensitive organic dielectric layer. According to the invention, the speed and effect of hybrid bonding can be optimized.

The invention discloses a preparation method and application of a functional degradable soybean oil-based bionic porous composite bone scaffold. The method comprises the following steps: taking epoxidized soybean oil acrylate as a bio-based base material, compounding isobornyl methacrylate to improve the defects of high viscosity and low photosensitivity of the bio-based base material, adding a photoinitiator containing ethyl 2, 4, 6-trimethylbenzoyl phenyl phosphonate and phenyl bis (2, 4, 6-trimethylbenzoyl) phosphine oxide, compounding, and carrying out aging treatment to obtain base resin; mixing calcium lignosulphonate into the base resin to prepare composite photosensitive resin, and printing a triple-period extremely-small curved surface structure through a digital light processing technology and a 3D printing technology to finally obtain the functional degradable soybean oil-based bionic porous scaffold. The scaffold has calcium lignosulphonate-mediated controllable photo-thermal response behaviors of near-infrared light illumination regulation and bone scaffold component dependence under the condition of simulating the in-vivo environment of a human body, so that a controllable photo-thermal response-mediated remote shape memory function is realized, and meanwhile, a mild, safe and controllable photo-thermal curative effect can also be realized. Besides, calcium lignosulphonate promotes degradation of the composite scaffold by preferentially dissolving and generating a microporous structure on the surface of a matrix while improving the hydrophilic performance of the scaffold, and continuously releases calcium ions, so that the scaffold shows enhanced biomineralization ability and promotes cell proliferation and osteogenic differentiation. The research provides a solution with potential for the soybean oil-based biological photosensitive material in the digital light processing preparation technology and the multi-functional application of the bionic porous bone scaffold so as to deal with complex and irregular bone defects.

The application discloses a morphology-controllable sulfur-functionalized metal organic framework catalytic material and a preparation method and application thereof, ligands of the catalytic material are thiophene-2,5-dicarboxylic acid, a metal source is bismuth salt, and the MOFs material has different morphologies, including micro-flower spherical, spiderweb and micro-flower, by adjusting the ratio of the metal and the ligand. A series of S-MOFs materials are prepared by using thiophene-2,5-dicarboxylic acid as an organic ligand containing S atoms and using bismuth salt as a metal source, the performance of the catalytic material in a spiderweb shape is obviously improved compared with the performance of other morphologies, and meanwhile, the preparation experiment process is simple. Bi-TDCs with different ligand and metal ratios show different ultrasonic-light synergistic catalytic activities. The incorporation of S atoms makes the material have photosensitivity, and the utilization efficiency of visible light is increased.

The invention discloses a hospital sunlight illumination adjusting system and method based on patient work and rest rhythms, and relates to the technical field of light path control, and the method comprises the steps: obtaining patient type information and drug administration records through a hospital information system; meanwhile, acquiring a current indoor spectrum, an optical fiber distribution node state, external sunlight incident intensity and spectral characteristics and a state event trigger signal from an environment sensor network; feature preprocessing and coding are carried out on edge nodes, an SVM model is called to carry out light sensitivity prediction, and light sensitivity scores for current initial partition patients and scenes are generated; adjusting the initial partition through a self-adaptive partition strategy to obtain a light source control partition; and setting an optical fiber shunting algorithm according to the light sensitivity score to obtain an optical fiber shunting weight and path of each light source control partition. According to the invention, the problems that the hospital lighting system lacks room-level real-time adaptability and neglects the influence of the medication state of the patient and the light environment difference in the room are solved.

The invention provides a positive photoresist composition as well as a preparation method and application thereof, and the positive photoresist composition comprises the following components in parts by weight: 100 parts of modified phenolic resin, 0.5-10 parts of a diazonaphthoquinone compound and 0.01-0.1 part of a photoacid generator, the molecular structure of the modified phenolic resin comprises a structure as shown in a formula I. Phenolic resin with a specific structure is matched with a diazonaphthoquinone compound and a photoacid generator, so that the resolution and photosensitivity of the photoresist can be effectively improved on the premise of ensuring low film residue rate of the photoresist, a PEB process is not needed, the morphology of the photoresist is not influenced by trace alkali in air after development, and the service life of the photoresist is prolonged. And the industrial requirements of low cost and high performance are met.

This invention discloses a chemiluminescence gas sensor based on polyoxometalates (POMs), and relates to its fabrication method and application. The sensor is suitable for detecting ammonia at room temperature. The gas sensor includes an adapter base and a sensing element, wherein the sensing element consists of interdigitated electrodes and a sensitive material loaded on the electrode surface. This sensitive material is a composite material of POMs and SnO2. POMs, as excellent electron acceptors, possess good redox properties, thermal stability, and photosensitivity. When combined with SnO2, they can effectively suppress electron-hole recombination, thereby significantly improving the gas-sensing performance of the semiconductor material. Compared with existing technologies, the sensor provided by this invention exhibits high response characteristics to ammonia at room temperature, while also demonstrating excellent selectivity and repeatability.

This invention discloses a photosensitizer, an i-line photoresist containing the photosensitizer, and a preparation method thereof. The photosensitizer disclosed in this invention is composed of photosensitizer A and photosensitizer B. The i-line photoresist composition prepared using the photosensitizer of this invention exhibits high photosensitivity and resolution when used in i-line lithography.

The application discloses a kind of low shrinkage 3D printing zirconia ceramic and its preparation process, select photosensitive polyimide, photosensitive polyimide has imine ring and photosensitive group on high molecular chain, with excellent photosensitivity, thermal stability, low volume shrinkage and other advantages, product system does not need to add photo initiator, can be directly completed curing under ultraviolet irradiation, avoid the volatilization or decomposition of photo initiator in workpiece during debinding, resulting in ceramic shrinkage, cracking and other problems;And optimize the ratio of dispersing agent and plasticizer in product system, reduce the viscosity of slurry, while increasing solid content, reduce shrinkage after sintering, and ensure the flowability of slurry and printing precision.In addition, combined with flash sintering process, inhibit grain growth coarsening, realize nanoscale dense structure, reduce internal defects, the zirconia ceramic prepared by the application is defect-free, dense structure, grain size is smaller, less than 1 μm, and has excellent fracture toughness and higher relative density.

The application discloses a kind of high transparent rare earth nanoparticles / cage polysilsesquioxane composite photoresist and its preparation method and application, the photoresist includes the composite matrix consisting of cage polysilsesquioxane, multifunctional acrylate and photoinitiator, and the rare earth nanoparticles modified by bifunctional ligand.The bifunctional ligand anchors nanoparticles by first functional group, and forms chemical bonding with matrix by second functional group, realizes the atomic level uniform dispersion of nanoparticle.The photoresist has very high optical transparency, high-efficiency up-conversion luminescence performance and very high ultraviolet photosensitivity.Its preparation process is simple, without high-temperature expensive equipment, can be adapted to a variety of photo-curing technology realizes the integration precision forming of complex three-dimensional structure luminescence device, has wide application prospect in integrated photonics device field.

The invention relates to a preparation method of a tetrahydroxy tetraphenyl ethylene photoinitiator. According to the method, tetrahydroxy tetraphenyl ethylene and a diazo naphthoquinone sulfonyl chloride compound are subjected to a condensation reaction to prepare the diazo naphthoquinone photoinitiator, and the photolysis rate of the diazo naphthoquinone photoinitiator is tested. The preparation method specifically comprises the following steps: in an organic solvent, taking tetrahydroxy tetraphenyl ethylene and diazonaphthoquinone sulfonyl chloride as raw materials, and carrying out esterification condensation reaction under the action of a catalyst to obtain the tetrahydroxy tetraphenyl ethylene photoinitiator. The tetrahydroxy tetraphenyl ethylene photoinitiator synthesized by the invention has the following advantages: compared with the traditional photoinitiator, the light sensitivity is obviously improved; the ultraviolet absorption capability is stronger, and the photosensitive performance is more excellent.