465 results about "Light sensitivity" patented technology

Vacuum-integrated photoresist-less methods and apparatuses for forming metal hardmasks can provide sub-30 nm patterning resolution. A metal-containing (e.g., metal salt or organometallic compound) film that is sensitive to a patterning agent is deposited on a semiconductor substrate. The metal-containing film is then patterned directly (i.e., without the use of a photoresist) by exposure to the patterning agent in a vacuum ambient to form the metal mask. For example, the metal-containing film is photosensitive and the patterning is conducted using sub-30 nm wavelength optical lithography, such as EUV lithography.

The invention relates to a photodynamic antibacterial fiber as well as a preparation method and application thereof. The preparation method of the photodynamic antibacterial fiber comprises the following steps: S1, preparing a bismuth sulfide / Michelene composite material; s2, mixing the bismuth sulfide / Michelene composite material with spinning slices, a coupling agent, a lubricant and a nucleating agent to obtain a mixture; and S3, carrying out melt electrostatic spinning on the mixture. The Bi2S3 / MXene composite material is prepared by coupling an n-type direct band gap semiconductor Bi2S3 with excellent photosensitivity and good absorption capability in a wide wavelength with MXene with excellent conductivity, relatively strong light absorption and conversion capability and good biocompatibility, so that the electron hole separation efficiency and the light absorption capability of the semiconductor can be effectively improved; the Bi2S3 / MXene composite material which can realize full-wave-band photodynamic antibiosis and has high ROS yield is constructed, so that the antibiosis efficiency of the prepared fiber is improved.

A photosensitive composition of a developable relief precursor includes at least one ethylenically unsaturated monomer as component E, at least one photoinitiator or photoinitiator system as component P, at least one water soluble and / or water dispersible binder as component B, and optionally, one or more additives as component A. Component E includes at least one ionic group and component E is present in an amount of 0.1 to 30 wt %, based on the total weight of the photosensitive composition.

The invention provides a display panel and a display device, the display panel comprises a substrate, and a shading layer, a first semiconductor layer and a second semiconductor layer which are arranged on the substrate, the first semiconductor layer is provided with a first active part of a driving transistor, and the second semiconductor layer is provided with a second active part of a driving transistor; a third active part of the compensation transistor and a fourth active part of the first initialization transistor are formed on the second semiconductor layer, the light shielding layer comprises a first light shielding pattern, a second light shielding pattern and a third light shielding pattern which are arranged at intervals in the first direction, and a first light shielding part on the first light shielding pattern can shield the first active part; a second shading part on the second shading pattern can shade the third active part, and a third shading part on the third shading pattern can shade the fourth active part, so that the third active part of the compensation transistor and the fourth active part of the first initialization transistor are prevented from being influenced by light; therefore, the photosensitivity and the electrical property of the compensation transistor and the first initialization transistor are improved.

The invention relates to alkali-soluble light-cured resin and a preparation method thereof, a light-cured resin composition, a photosensitive dry film and a semiconductor device. The structural formula of the alkali-soluble light-cured resin is shown as a formula (I) or a formula (II), wherein in the formula (I), R1 is selected from one of a single bond, an oxygen atom, a sulfonyl group and an organic group with 1-30 carbon atoms; in the formula (I) and the formula (II), n is a natural number greater than or equal to 0; r2 is selected from organic groups with 1-50 carbon atoms; r3 is selected from an aromatic organic group or an aliphatic organic group; r4 is selected from organic groups containing unsaturated carbon-carbon double bonds; and R5 is selected from carboxyl-containing organic groups. A molecular chain of the alkali-soluble light-cured resin contains a photosensitive group, an imide structure and an alkali-soluble group, on one hand, the thermal mechanical property of the alkali-soluble light-cured resin can be enhanced, and on the other hand, the alkali-soluble light-cured resin can form a uniform and stable resin glue solution in a solvent, so that the comprehensive performance of the alkali-soluble light-cured resin is improved.

The invention discloses a method for detecting acrylamide in coffee based on colorimetric and photo-thermal dual modes of MXene / MOFs nano-enzyme, and belongs to the technical field of chemical analysis and detection.According to the method, LiF and HCl are used for etching Ti3AlC2 to obtain Mxene, a solvothermal method is adopted for synthesizing Mn / Fe-MIL-NH2, Mxene coated Mn / Fe-MIL-NH2 nano-enzyme is obtained in a self-assembly mode, the Mxene coated Mn / Fe-MIL-NH2 nano-enzyme has peroxidase-like activity and photo-thermal performance, and the Mxene coated Mn / Fe-MIL-NH2 nano-enzyme can be used for detecting acrylamide in coffee in the colorimetric and photo-thermal dual modes. Under irradiation of near-infrared light 808 nm, peroxidase-like activity of the Mxene-coated Mn / Fe-MIL-NH2 nano-enzyme is improved, due to addition of acrylamide, the speed of oxidizing a substrate TMB by the Mxene-coated Mn / Fe-MIL-NH2 nano-enzyme is increased, meanwhile, the temperature of the oxidized TMB with photosensitive performance is also increased, and the method has the advantages of being high in sensitivity, high in specificity, easy to operate, rapid and the like.

The invention relates to the technical field of machine vision detection, particularly discloses a mechanical part surface defect vision detection system, and aims to solve the problems of blind areas, environment light sensitivity, insufficient tiny defect detection capability and the like in the detection of complex curved surface high-reflection parts. Comprising an optical imaging module, a geometrical morphology sensing module, a dynamic polarization regulation and control module, an image fusion and enhancement module and a defect identification and decision module. The three-dimensional morphology of the surface of the part is sensed in real time, the imaging polarization state is dynamically regulated and controlled according to the three-dimensional morphology, multi-frame polarization image fusion and digital diffraction enhancement processing are combined, full-coverage and high-contrast detection of the complex curved surface part is achieved, motion blur is effectively restrained, and the detection capacity of sub-pixel-level tiny defects and the system environment adaptability are improved.

The invention belongs to the technical field of photoinitiators, and particularly relates to a ketoxime ester photoinitiator as well as application and a photosensitive combination thereof. Compared with the prior art, the novel photoinitiator has the advantages that by introducing a sulfone phenyl specific structure to a ketoxime ester group and the like, excellent photosensitivity can be shown in the optical wavelength range of 280-400 nanometers, and compared with OXE-01 and OXE-02 commonly used in the market, the novel photoinitiator can show better photoinitiation efficiency under an ultraviolet visible (UV-Vi s) LED light source.

The invention provides an image processing method and device, electronic equipment, a computer readable storage medium and a computer program product. The method comprises the following steps: performing light sensation parameter prediction processing on an input image to obtain a light sensation parameter of the input image; determining an expected color temperature corresponding to the light sensation parameter from a corresponding relationship between the candidate light sensation parameter and the candidate expected color temperature; determining the current color temperature of the input image, and determining the color temperature error rate of the input image based on the expected color temperature and the current color temperature; updating the light sensation parameter based on the color temperature error rate to obtain an updated light sensation parameter; and adjusting the input image through the updated light sensing parameter to obtain an adjusted input image. According to the invention, the accuracy of the image color temperature can be improved.

The invention discloses a photosensitive metal-organic coordination nanocage material as well as preparation and application thereof. The photosensitive metal-organic coordination nanocage material comprises a photosensitive ligand, metal ions and counter anions. According to the metal-organic coordination nanocage material, pure water can be decomposed into hydrogen and hydrogen peroxide only through ultrasound and illumination under the condition that a sacrificial agent is not added, and the metal-organic coordination nanocage material has efficient piezoelectric electro-catalytic performance.

The invention discloses an image facial feature extraction and fusion method and system and a memory, and the method comprises the steps: carrying out the feature extraction of a source role facial image, and generating a basic feature map and an identity feature vector; performing decoupling processing on the basic feature map by taking the identity feature vector as a control condition, and separating an expression feature channel and an illumination feature channel; inputting the decoupled expression feature channel and illumination feature channel into a scene perception gating network, and generating an adaptive fusion feature map in combination with the target scene image; executing Poisson fusion and generative adversarial refinement on the adaptive fusion feature map, and outputting an optimized fusion image; through a decoupling mechanism guided by an identity feature vector, texture distortion and illumination sensitivity are avoided, a scene perception gating network dynamically adjusts a feature fusion weight, cross-scene adaptability is remarkably improved, poisson-generative adversarial two-stage fusion introduces antagonism refinement on the basis of gradient domain optimization, boundary splicing traces are eliminated, and the fusion precision is improved. And high-fidelity and cross-scene facial feature fusion is realized.

The invention discloses an accurate view field distortionless scanning high-resolution microscopic imaging method and device based on position feedback. The piezoelectric deflection mirror system is used for replacing a traditional scanning system, a position feedback signal of the deflection mirror is utilized, clock signals of light source switching and signal detection are obtained, the light source is controlled to be turned on when the deflection mirror is located at a target view field and turned off when the deflection mirror is located at other positions, and therefore the view field is accurately controlled, and the scanning precision is improved. The photosensitive sample can be protected on the hardware level, so that the utilization rate of the sample is improved; position feedback signals of the deflection mirror under different voltage amplitudes and different scanning frequencies are processed, a linear section proportion which can be considered to be in distortionless scanning imaging in a scanning stroke is extracted, the variable is deduced, a more accurate fitting relational expression is provided, and the linear section proportion is calculated. A correct voltage amplitude capable of enabling a target view field to be in a linear section in a scanning stroke is applied to the deflection mirror, so that distortionless target view field scanning is realized. The method and the device have a wide application range.

The invention relates to the technical field of image data processing, in particular to a display screen defect detection method and system based on machine vision, and the method comprises the steps: obtaining a to-be-detected image and a plurality of comparison images, and obtaining a plurality of defect detection results based on the light sensitivity of the comparison images; the method comprises the steps of determining the abnormal degree of a pixel point according to the gray value of the to-be-detected image and an exponential function constructed by the difference between the gray value of any pixel point in the to-be-detected image and the gray average value of pixel points in all contrast images, correcting the gray value of the pixel point based on the correction amplitude determined by the abnormal degree and a preset positive feedback rule to obtain a correction value, and outputting the correction value. And calculating the cosine similarity between the one-dimensional vector of the correction value of each pixel point in the to-be-detected image and the one-dimensional vector of the gray average value of each pixel position in all the comparison images, and performing defect detection on the to-be-detected display screen according to a comparison result of the cosine similarity and a preset threshold value. According to the invention, the accuracy of defect detection on the display screen can be improved.

An array substrate is disclosed. The array substrate includes a semiconductor layer integrated with a PIN photoelectric diode and an active area. The PIN photoelectric diode includes a P-type semiconductor area, an N-type semiconductor area, and an I-type semiconductor area defined between the P-type semiconductor area and the N-type semiconductor area. A gate electric current is introduced at a location corresponding to the I-type semiconductor area, so as to enhance light sensitivity.

The invention discloses a two-dimensional organic / inorganic heterojunction photoelectric nerve component and a preparation method thereof, and belongs to the technical field of photoelectric devices. According to the invention, a TMDC material MoS2 is transferred to a substrate through a mechanical stripping method, then a film electrode is plated on a MoS2 layer through an electron beam lithography method, and finally a single-layer Me-PTCDI crystal is epitaxially grown on the MoS2 layer through a back-off method to form the heterojunction. Due to the formation of the MoS2 / Me-PTCDI heterojunction, the photoelectric nerve device has excellent photosensitivity and light adaptability, and can simulate reactions of retinal essential photosensitive ganglion cells under different illumination; the device can make current change under the stimulation of light pulses so as to simulate the generation and action of human melatonin, and can realize visual adaptation in bright and dark environments under the regulation and control of grid voltage, and the device has a wide application prospect in the field of automatic driving due to the corresponding characteristics.

The invention discloses negative photosensitive polyamic acid, photosensitive resin and a preparation method and application of the negative photosensitive polyamic acid and the photosensitive resin. The negative photosensitive polyamic acid is prepared from diamine and a dianhydride compound as monomers through end capping of anhydride containing a norbornene group; the photosensitive resin is formed by mixing negative photosensitive polyamide acid, polythiol and a photoinitiator, and is applied to preparation of photoresist, photosensitive packaging adhesive, photocuring adhesive and the like; the photosensitive resin is subjected to ultraviolet curing and gradient imidization to prepare negative photosensitive polyimide cross-linked through polythiol, and the negative photosensitive polyimide has good thermal performance and photosensitive performance; the photosensitive resin is used for preparing photoresist and is a solution-developed negative photosensitive polyimide system, alkenyl of a polyamide acid terminal chain and sulfydryl of polythiol are subjected to a click reaction to construct a cross-linking point, the solubility of polyamide acid in an exposure area in an alkaline solution is reduced, a negative pattern is obtained, the preparation method is simple, and the cost is low. The pattern resolution and sensitivity are high, and the method is expected to be well applied to the fields of optics and electronics.

The embodiment of the invention provides a display panel and a display device. The display panel comprises a pixel driving circuit, the pixel driving circuit comprises a silicon semiconductor transistor, an oxide transistor and a storage capacitor which are electrically connected, and the display panel comprises a first active layer, a first gate layer and a second active layer which are sequentially arranged in a stacked mode. A grid electrode of the oxide transistor, a grid electrode of the silicon semiconductor transistor and a first pole plate of the storage capacitor are located on a first grid electrode layer, an active pattern of the oxide transistor and a second pole plate of the storage capacitor are located on a second active layer, and the first grid electrode layer can be adopted to form a bottom grid of the oxide transistor. The active pattern of the transistor in the second active layer is prevented from being influenced by light, so that the photosensitivity and the electrical property of the transistor are improved, the performance of the display panel is improved, and the electrical property improvement effect of the oxide transistor is good due to the fact that the distance between the first gate layer and the second active layer is small.

The invention provides a light generating system (1000) comprising one or more light generating devices (100), wherein each of the one or more light generating devices (100) are configured to generate device light (101), wherein the light generating system (1000) is configured to generate system light (1001) comprising the device light (101) of at least one light generating device (100), wherein the light generating system (1000) is configured to provide (in an operational mode) system light (1001) according to the following characteristics: (A) during a first time period t1 the system light (1001) is white light having a radiant flux Φ11 in a first wavelength range and a radiant flux Φ12 in a second wavelength range; (B) during a second time period t2 the system light (1001) is light having a radiant flux Φ21 in the first wavelength range and a radiant flux Φ22 in the second wavelength range; (C) during a third time period t3 the system light (1001) is light having a radiant flux Φ31 in the first wavelength range and a radiant flux Φ32 in the second wavelength range; (D) Φ21<Φ11 and Φ31<Φ11; (E) Φ22>Φ12, and Φ32<Φ12; (F) t2 is selected from the range of 1 second-30 minutes; and t1>t2; and (G) the first wavelength range is 380 nm-λ1 and the second wavelength range is λ1-780 nm, wherein λ1 is selected from the range of 485-550 nm.

The present invention provides an organic electric element including a metal patterning layer formed on the outside of a metal electrode and an electronic device thereof, and by forming a patterning auxiliary photosensitive layer made of a material with excellent photosensitivity under the metal patterning layer, it is possible to easily measure the thickness of the metal patterning layer.

The invention discloses a photoresist composition and a patterning method thereof, the photoresist composition comprises an organic solvent, a free radical photoinitiator, a co-initiator and a film-forming monomer, the film-forming monomer is metal oxygen cluster and metal oxide nanoparticles, the mass percentage content of the film-forming monomer is 1-30%, the mass percentage content of the co-initiator is 1-30%, and the mass percentage content of the film-forming monomer is 1-30%. The mass percentage content of the free radical photoinitiator is 0.01%-3%, the mass percentage content of the auxiliary initiator is 0-10%, and the mass percentage content of the organic solvent is 57%-98.99%. According to the photoresist composition introduced with the free radical photoinitiator, free radicals are efficiently generated under illumination, cross-linking polymerization of double bonds on the surfaces of metal oxygen clusters and metal oxide nanoparticles is promoted, the photosensitive performance is greatly improved, excellent sensitivity is shown in extreme ultraviolet, electron beams and visible light (within the light source range of 250-600 nanometers), and high-precision photoetching patterning is achieved.

2.1. To increase the resolution of quasi-confocal line scanning microscopes with a main beam splitter for coupling the illumination and detection beam paths, the "re-scan" method involves descanning the sample light in the detection beam path by the illuminating beam deflection unit. After descanning, the sample light is scanned again in the detection beam path by moving it across the sensor behind the confocal aperture by a second beam deflection unit in a direction transverse to the linear focus. To increase resolution in the longitudinal direction, the illumination line can be structured. This optical arrangement has the disadvantage of significant light losses due to the large number of optical interfaces that must be passed through. 2.2. A microscope in which the illuminating beam deflection unit is optically positioned between the light source and the main beam splitter, allowing the sample light to reach the sensor away from the illuminating beam deflection unit (non-descanned), is more light-sensitive and flexible. A control unit, in one operating mode, moves the sample light beam across the sensor using only the second beam deflection unit. Depending on the operating mode, synchronization with the first beam deflection unit may be provided. 2.3. Due to its high light sensitivity, the microscope is particularly suitable for fluorescence microscopy.

The invention provides a novel light-sensitive channel protein VR2.0 and application thereof. The photosensitive channel protein VR2.0 series provided by the invention has an obvious treatment effect in treatment of retina photoreceptor cell degenerative diseases. The novel light-sensitive channel protein has higher light sensitivity, fast dynamics and low side effect; under the same light stimulation condition, the response frequency is fast, and stable current signals can be kept under high frequency response. The application provides a better choice for developing photogenetic therapy for retina photoreceptor cell degenerative diseases, and has important application and popularization values.

The invention discloses a preparation method and application of a PDMS photoresist based on femtosecond laser two-photon polymerization. The feasibility of a photoresist formula is verified through micro-nano structure processing. The preparation method of the photoresist comprises the following steps: dissolving isopropyl-9H-thioxanthone and 2-isopropyl thioxanthone in tetrahydrofuran, so as to form a photoinitiator solution; then mixing the PDMS precursor with a photoinitiator solution, stirring for 12 hours in a dark place to ensure the uniformity, and removing bubbles through THF evaporation and ultrasonic treatment to finally obtain the high-quality PDMS photoresist. According to the method, by accurately controlling the ratio of the photoinitiator to the PDMS, the photosensitivity and the processability of the photoresist are remarkably improved. And in combination with a femtosecond laser two-photon polymerization technology, micro-nano processing of a high-resolution (submicron-level) three-dimensional complex structure is realized, and the method is suitable for the fields of micro-fluidic chips, biomedical devices, optical devices and the like.

The invention discloses a naphthyl derivative for regulating and controlling photoresponse through thermal phase change as well as a preparation method and application of the naphthyl derivative. The naphthyl derivative is (2Z, 4E)-2-(3-chlorphenyl)-5-(7-(dimethylamino) naphthalene-2-yl) pent-2, 4-diphenyl nitrile, the naphthyl derivative can be crystallized in a solvent to obtain a Y crystal form, the Y crystal form shows light inertia and can generate unique SCSC phase change when being heated to be close to a melting point, the Y crystal form can be converted into a photosensitive Y conversion crystal form through the thermal phase change, and the Y conversion crystal form can be used for preparing a photosensitizer. And conversion from light inertia to light sensitivity is realized. The Y transformation crystal form can also be obtained through solvent method crystallization. The Y transformation crystal form is combined with PVA to prepare the composite film, and the obtained composite film can be bent and twisted without influencing the light response performance, and is expected to be used for an optical brake. The surface of the composite film is further coated with conductive silver paste, so that the composite film has conductivity, and then the composite film is connected into a patch circuit to be made into a light-operated switch which is expected to be applied to the fields of molecular robots and the like.

A system for calibrating the light sensitivity of a camera includes a light emitter for emitting a light pulse, a fiber splitter for receiving the light pulse via an input port and providing first and second portions of the light pulse to respective first and second output ports, and a light collector for receiving the first portion from the first output port and converting the first portion to a first signal representative of a light characteristic of the first portion. A first fiber optic cable connects the light emitter and the input port, a second fiber optic cable connects the first output port and the light collector, and a third fiber optic cable has a first cable end connected with the second output port and a second cable end for emitting the second portion of the light pulse for capture by the camera. A related method is also provided.

To provide a solid-state imaging device, a manufacturing method thereof, and an electronic device that can obtain a large signal integration charge amount and stable optical sensitivity during signal integration without requiring cooling and without a decrease in gain, and can also realize a lower interface bandwidth.SOLUTION: A pixel 200 is formed by a photoelectric conversion film 210 that converts light into a photo-generated current, and a semiconductor pixel circuit 220. The photoelectric conversion film 210 and the semiconductor pixel circuit 220 are stacked and electrically coupled within the pixel 200, and the photoelectric conversion film 210 has sensitivity to infrared (NIR). The semiconductor pixel circuit 220 is configured to include a pixel analog circuit 230 that detects the photo-generated current, a sample and hold circuit 240, an ADC 250, an in-pixel logic 260, a digital memory 270, and the like.SELECTED DRAWING: Figure 3

The invention relates to the technical field of optical encryption, and discloses a photosensitive polyurethane film with a surface relief grating pattern and a preparation method and application thereof.The method comprises the steps that in an ice bath and inert atmosphere, toluene diisocynate and a dihydropyridine photosensitizer monomer are added into N, N-dimethylformamide, and a mixture is obtained; the preparation method comprises the following steps: adding the raw materials into a mixed solvent of N, N-diethyl formamide and dimethyl sulfoxide, and then dropwise adding 1, 4-dibutanol; removing the ice bath, and reacting at the temperature of room temperature to 60 DEG C to obtain a photosensitive polyurethane solution; spin-coating the photosensitive polyurethane solution on a substrate, and drying to obtain a photosensitive polyurethane film; and exposing the designed mask plate on the surface of the photosensitive polyurethane film. According to the invention, the non-covalent interaction difference of the polymer-dihydropyridine / pyridine part can be constructed to realize effective surface patterning, and the generation of a two-dimensional ordered grating-shaped wrinkle structure with a sinusoidal phase is realized on the surface of the polyurethane film in a wrinkling manner in combination with an optical anti-counterfeiting technology, so that pattern anti-counterfeiting is realized.

The present invention discloses an LDI laser-cured solder mask ink and a preparation method thereof, and relates to the technical field of PCB ink. An LDI laser-cured solder mask ink comprises a main agent and a thermosetting agent, wherein the main agent comprises 50-63 parts of a photocurable resin, 12-24 parts of an active diluent, 8-12 parts of a photoinitiator, 0.3-0.45 parts of a light stabilizer and other auxiliary agents, specifically, the photocurable resin comprises a mixture of epoxy acrylate resin and polyurethane acrylate, and the photoinitiator comprises a mixture of one or more of photoinitiator 819, photoinitiator 907 and photoinitiator ITX. By utilizing a specific ratio of photocurable resin in combination with a photoinitiator having a high addition amount and ultraviolet long-wave photosensitivity, the obtained solder mask ink not only has the characteristics of high sensitivity, but also has low exposure energy required during curing, and can be fully adapted to LDI laser curing technology.

The invention belongs to the field of exhibition light control, and particularly relates to an exhibition space light environment parameter optimization regulation and control method and system based on illumination perception, and the method comprises the steps: firstly building a three-dimensional model through obtaining exhibition semantic information and spatial constraints, extracting an exhibit light sensitivity level and spatial fluctuation information, and dividing an illumination control region sequence according to the exhibit light sensitivity level and the spatial fluctuation information; fusing the photosensitive damage rate and the importance degree of the exhibit, and determining a dynamic target optical parameter control interval set; the method comprises the following steps: constructing a hierarchical target mapping function of a fusion fit degree, exhibition experience and an energy-saving index, and dynamically setting main and auxiliary control functions in different time periods according to a control index priority factor; and solving the optimal optical parameter set of each time period by adopting an optimization search algorithm, and carrying out inversion to obtain an optical parameter control index. According to the method, self-adaptive balance optimization of the exhibition light environment among multiple targets of cultural relic preventive protection, audience visual experience and system energy-saving efficiency is realized.

The invention discloses a water turbidity detection method and device, and aims to solve the problems that a photoelectric sensor of an existing portable water turbidity meter is usually made of a semiconductor material, has photosensitivity, has dark current, is sensitive to external environment light and has large test errors. Respectively recording the output frequencies f0 and f1 of the high-precision QCM sensor when the light beam passes through the standard water body of the standard sample tube and the water body to be detected of the detected sample tube and then irradiates the high-precision QCM sensor, then converting the output frequencies f0 and f1 into corresponding illumination intensities I1 and I2, and finally obtaining a turbidity value S according to a turbidity value calculation formula. The sampled QCM sensor does not generate dark current and is not easily influenced by external environment light, so that the problem that the detection precision is influenced due to the fact that a photoelectric sensor based on a PN junction is sensitive to the external environment light is solved. The frequency (time) is a physical quantity with the highest test precision at present, and the method has higher precision.