The invention discloses a photoetching
machine multi-light-source cooperative high-precision
exposure control system, and relates to the technical field of photoetching
machine control. Initial energy parameters of all light sources are obtained, a
coupling feature set of energy change and
light spot morphology change is constructed, and
light intensity errors, phase errors and
light spot distortion errors are used as input, so that a multi-light-source cooperative high-precision
exposure control system is constructed; respectively generating an inter-light-source
time sequence offset matrix and a
light source energy compensation matrix, constructing a
light source collaborative error model through matrix superposition and eigenvalue
decomposition, inputting
exposure disturbance obtained by real-time monitoring of a photoetching
machine into the error model, and obtaining a primary compensation amount; a final target
exposure compensation parameter is obtained by adopting a quadratic optimization
algorithm under a constraint condition, and
light source energy output, a light path phase and a pulse trigger
time sequence are cooperatively adjusted according to the target
exposure compensation parameter, so that energy deviation,
phase drift and
time sequence mismatch can be reduced at the same time, the exposure stability and the pattern forming precision are remarkably improved, and the image forming precision is improved. The method is suitable for high-resolution and multi-light-source photoetching equipment.