The invention provides a photosensitive resin composition containing an alkynyl
anthracene photosensitizer and application of the photosensitive resin composition. A conjugated alkynyl functional group is introduced to the 9 and / or 10 position of a structural main body
anthracene ring of the
photosensitizer. Compared with the existing DBA
photosensitizer, the introduction of alkynyl expands the size of a
conjugated system, lengthens the maximum absorption
wavelength of molecules, improves the
initiation efficiency, is especially suitable for a photo-
initiation system under the 405nm illumination condition, reduces the
exposure energy, and also ensures good
solubility and compatibility of a formula; besides, compared with an existing DBA photosensitizer,
small molecule fragments cannot be generated and cannot be migrated to a
polyethylene film, and when an
electroplating procedure is carried out after
exposure and development, the fragments cannot be separated out to pollute
electroplating liquid, so that the undesirable phenomena of
short circuit, open circuit and the like of an anti-
corrosion pattern are avoided, and the yield of a product is remarkably improved; the method can be widely applied to the photo-curing fields of dry films, paints, coatings,
printing ink, forming materials and the like.