64 results about "Maximum intensity" patented technology

The invention discloses a correction method for saturation spectral line intensity in a laser spectrum, and relates to the technical field of spectral data analysis, the method comprises the following steps: identifying saturation characteristics in the spectrum, determining a saturation point based on an intensity threshold, and recording the original intensity of the saturation point; determining a target spectrum peak wavelength range containing a saturation point; eliminating saturation points from the wavelength range of the target spectrum peak, and retaining unsaturation points; fitting the unsaturated point through a nonlinear function to obtain the maximum fitting strength; if the maximum fitting strength is lower than the original strength, performing strength correction by adopting a linear extension mode by taking an unsaturated point as a reference, and otherwise, performing strength correction directly based on a fitting model; and outputting the corrected spectral intensity data, and calculating the maximum intensity of the spectral peak and the integral area of the spectral peak. According to the method, the accuracy of saturation judgment and the reliability of a correction result are improved, and a direct intensity data basis and core derivative parameters are provided for quantitative analysis.

The invention discloses a laser point cloud loopback detection method and device based on a complex scene and electronic equipment, and relates to the field of automatic driving, and the method comprises the steps: obtaining the intensity information of a point cloud; carrying out loopback detection according to the intensity information of the point cloud; wherein the step of obtaining the intensity information of the point cloud comprises the substeps of dividing the point cloud top view into a plurality of areas based on each frame of the point cloud top view; each region is represented by the maximum intensity value of the midpoint of the region, and a descriptor of the two-dimensional matrix is generated; loopback detection according to the intensity information of the point cloud comprises the following steps: judging whether the frames are loopback frames or not according to matching with the descriptors; the method further comprises the following steps: acquiring Euclidean distance threshold information; and according to the Euclidean distance threshold information, correcting a result of judging whether the frames are loopback frames or not.

A coated member of the present invention includes a substrate and a hard coating film that is formed on the surface of the substrate and includes a nitride or carbonitride of a metal element. A content of Al is 65 atom % or more and 85 atom % or less, a content of Cr is 15 atom % or more and 35 atom % or less, and a total content of Al and Cr is 90 atom % or more and 100 atom % or less in a total amount of the metal element and metalloid element contained in the hard coating film, and in an intensity profile obtained from a selected area diffraction pattern of a transmission electron microscope, a crystal plane exhibiting a maximum peak intensity is different between a vicinity of the substrate and a vicinity of the surface, in the vicinity of the substrate, a peak corresponding to a (111) plane or a (200) plane of a face-centered cubic lattice structure exhibits a maximum intensity, and in the vicinity of the surface, a peak intensity corresponding to a (220) plane is 0.6 times or more a larger one of a peak intensity corresponding to the (200) plane and a peak intensity corresponding to the (111) plane of the face-centered cubic lattice structure.

The invention discloses a plant factory spectrum dynamic generation method, and belongs to the technical field of plant factories. A plant factory spectrum dynamic generation method comprises the steps that S1, a target spectrum is determined, and the target spectrum is determined by a scientific research or production target; s2, decomposing and analyzing the target spectrum to obtain one or more peak values; s3, according to the peak value and a stored LED light emitting characteristic database, determining the type of the LED lamp beads forming the target spectrum; s4, according to the target intensity of each spectrum in the target spectrum, the corresponding maximum intensity in the system and the total light intensity, the control quantity of each LED lamp bead is calculated; s5, controlling a corresponding hardware circuit through a software instruction, and driving an LED lamp bead to output a target spectrum; the invention aims to solve the problems that in the prior art, the spectrum of a traditional lamp is fixed, different types of lamps need to be replaced if the spectrum needs to be adjusted, the operation is tedious, the cost is high, and the dynamic and rapid spectrum adjustment requirement is difficult to meet.

The application discloses a correction method for saturated spectral line intensity in laser spectroscopy, and relates to the technical field of spectral data analysis, wherein saturated characteristics in a spectrum are identified, a saturated point is determined based on an intensity threshold, and the original intensity of the saturated point is recorded; the wavelength range of a target spectral peak containing the saturated point is determined; the saturated point is removed from the wavelength range of the target spectral peak, and the unsaturated point is reserved; the unsaturated point is fitted through a nonlinear function, and the maximum intensity of the fitting is obtained; if the maximum intensity of the fitting is lower than the original intensity, the intensity is corrected in a linear extension mode based on the unsaturated point, otherwise, the intensity is directly corrected based on the fitting model; the corrected spectral intensity data are output, and the maximum intensity of the spectral peak and the integral area of the spectral peak are calculated. The application improves the accuracy of saturated determination and the reliability of correction results, and provides direct intensity data basis and core derivative parameters for quantitative analysis.

The invention provides a disinfection lighting device configured to provide device light along a main optical axis, said disinfection lighting device comprising: a first solid-state light source configured to emit white light: a second solid-state light source configured to emit violet light having a dominant peak wavelength in a wavelength range from 380 to 420 nm: a collimator configured to collimate said white light along the main optical axis into a white light beam having a first spatial light distribution having a first Full Width Half Maximum (FWHM1): a batwing optic configured to shape said violet light along the main optical axis into a batwing shaped light distribution, wherein the batwing shaped light distribution has a maximum intensity at an angle (α) with respect to said main optical axis: wherein said angle (α) of a maximum intensity of the batwing shaped light distribution is outside said first Full Width Half Maximum (FWHM1) of the first spatial light distribution of the white light beam.

The present invention provides a light-emitting device (1000), comprising: (i) n laser light sources (10), (ii) focusing optics (20), and (iii) a luminescent body (200), wherein: (A) the n laser light sources (10) are configured to generate laser light source light (11); wherein the focusing optics (20) are configured to focus the laser light source light (11) into a focused beam (21) of the laser light source light (11); wherein n≥2; (B) the luminescent body (200) comprises a luminescent material (210), wherein the luminescent body (200) is configured to be in an optical receiving relationship with the n laser light sources (10), wherein the luminescent material (210) is configured to convert at least a part of the laser light source light (11) into luminescent material light (211); (C) the n laser light sources (10) and the focusing optics (20) are configured to provide a spot (300) of the laser light source light (11) on the luminescent body (200) in an operating mode; wherein k groups of spots (300) each have a separately selected number m of spots (300), wherein two or more spots (300) within each group have partial overlap, wherein 2≤m≤n and 1≤k<n; and (D) wherein a first spot region (310) is defined by 10%-100% of the maximum intensity of the spot (300), wherein for at least one spot (300) within at least one of the k groups, it is applicable to overlap with at least another first spot region within the range of 5%-80% of its first spot region (310).

A coated cutting tool is provided with a hard coating film on a base material. The hard coating film is composed of a nitride or carbonitride containing 50 at% to 70 at% (inclusive) of Al, 20 at% to 50 at% (inclusive) of Cr, and 4 at% to 15 at% (inclusive) of Si with respect to the total amount of metal including semimetal. The atomic ratio (at%) A of a metal element including a semimetal and the atomic ratio (at%) B of nitrogen in the hard coating satisfy 1.07 lt; b / Alt; 1.30, 1.30. The hard coating film exhibits a maximum peak intensity caused by a (200) plane or a (111) plane of a cubic crystal in an intensity distribution determined from an X-ray diffraction pattern or a selected area diffraction pattern of a transmission electron microscope, and does not have a peak mainly composed of a hexagonal crystal in the intensity distribution determined from the selected area diffraction pattern.

A desk illuminating device with reduced sense of oppression and light flicker is provided. The desk illuminating device has a light source and a light guide portion including a light guide plate and guiding light emitted from the light source, wherein the light guide plate has a light incident surface for light from the light source to be incident, a first main surface that emits light incident from the light incident surface, and a second main surface opposite the first main surface, the first main surface is arranged substantially perpendicular to a setting surface of the desk illuminating device, when an axis that passes through the center of the first main surface and is perpendicular to the setting surface is set as a vertical axis, a direction parallel to the setting surface is set as 0° vertical in a surface that contains the vertical axis and is perpendicular to the setting surface, an angle upward compared to the parallel direction is set as a positive angle, and an angle downward compared to the parallel direction is set as a negative angle, an angle that becomes the maximum intensity in the light distribution of light emitted from the first main surface is 90° or more and less than 0°.

To provide a multilayer reflective film-provided substrate in which the thickness of a diffusion layer in the multilayer reflective film when heated is less likely to change. A multilayer reflective film-provided substrate for reflective mask blank, comprising a substrate, and a multilayer reflective film to reflect EUV light, wherein the multilayer reflective film has a structure such that low refractive index layers and high refractive index layers are alternately stacked; and in a diffraction chart obtained by X-ray diffraction measurement, a crystallite size calculated from a diffraction peak with a maximum intensity attributable to the low refractive index layers is more than 3.1 nm.

A lighting device includes a light source for emitting primary light, which is configured as a laser; and a light conversion unit including a light conversion element having at least one light-converting ceramic material, a front side, and a back side, a substrate which is directly or indirectly connected to the back side of the light conversion element, and a connector between the light conversion element and the substrate. The light conversion element is adapted to be illuminated with the primary light and to emit secondary light with a wavelength or wavelength range altered relative to the primary light. The primary light has a wavelength of less than 650 nm and the secondary light has a maximum intensity of emission at a wavelength of more than 650 nm.

The invention relates to a measurement arrangement (100) for measuring concentration of gold in a sample (102). The measurement arrangement (100) comprises: a sample container (104a, 104b); an X-ray radiation source unit (106) configured to produce a radiation beam (112); a primary filter (108) arranged between the X-ray radiation source unit (106) and the sample container (104a, 104b) so that the primary filter (108) is in a close vicinity to the sample container (104a, 104b), wherein the primary filter (108) is configured to act as a filter and as a secondary target configured to excite a first fluorescence radiation (114) in response to an irradiation of the primary filter (108) with the radiation beam (112); and a radiation detector unit (110) configured to obtain a second fluorescence radiation (116) being characteristic to gold in response to an irradiation of the sample (102) with the first fluorescence radiation (114), wherein the second fluorescence radiation (116) is obtained from a direction (202) substantially perpendicular to the direction (204) of the maximum intensity of the radiation beam (112). The invention relates also to a method for measuring concentration of gold in a sample (102).

The invention discloses a method for eliminating autocorrelation artifacts of a polarization sensitive optical coherence tomography image. Comprising the following steps: carrying out sample detection by using a PS-OCT (Polarization Sensitive Optical Coherence Tomography) system to obtain interference signals of two polarization channels; performing inverse Fourier transform on the interference signal of one channel to obtain an airspace signal of the interference signal; finding a self-correlation horizontal fringe artifact signal with the maximum intensity in the interference signals of the airspace, and setting the intensities of other positions to be zero; calculating an unwrapping phase of the self-correlation artifact in each A-scan, and taking a minimum value of the unwrapping phase as a reference phase; interpolating the spectral phases of the original interference signals of the two polarization channels according to a reference phase; and performing inverse Fourier transform and polarization parameter calculation to obtain an OCT intensity image and a polarization image with autocorrelation artifacts eliminated. According to the image phase information-based self-correlation artifact removal method, the self-correlation artifacts in the PS-OCT image can be effectively eliminated, additional hardware facilities do not need to be introduced, and the method is simple and effective.

A method of compensating for focus drift in a microscopy system includes receiving data representing a reference light signal reflected from a sample and received by an image sensor, identifying from the data a peak of the reference light signal, the peak having a maximum intensity value for the reference light signal, extracting a sub-region having a center from the data, the center being located at the peak, calculating a first harmonic of a Fourier transform of the extracted sub-region, estimating a peak position of the reference light signal based on a phase of the first harmonic, and moving the lens system of the microscopy system or the sample in the axial direction using the translation stage based on the estimated position. Also, a system compensating for focus drift in a microscopy system according to the above method.

A manufacturing method, etc. facilitating control of the waveguide's width and thickness in an optical component, the method including preparing a glass member, irradiating femtosecond laser light, and moving a laser light condensed point. The laser light has an energy amount causing the glass member's refractive-index-change and a flat-top-shaped intensity distribution. The beam-irradiation region is defined by a region having an area of 1 / e2 or more of the maximum intensity. The flat-top region is defined by a contour of a region of ½ or more of the maximum intensity and has an area of 0.45 times or more that of the beam-irradiation region. An angle between the beam-irradiation region and the scanning-direction is from 70° to 110°, and an angle between an orthogonal plane to the glass member's thickness direction and the scanning-direction is 20° or less.

A method of processing a transparent workpiece, comprising: directing a laser beam output by a beam source onto a phase-adjusting device such that the laser beam downstream of the phase-adjusting device is an Airy beam; and directing the Airy beam onto a surface of the transparent workpiece. The Airy beam forms an Airy beam focal region in the transparent workpiece, the Airy beam of the Airy beam focal region having a maximum intensity of 100 TW / cm 2 or less, the Airy beam of the Airy beam focal region inducing an absorption in the transparent workpiece, the induced absorption generating a bend defect in the transparent workpiece.

A slurry containing abrasive grains and water, in which the abrasive grains include cerium oxide particles, and at a peak P of a maximum intensity in a range of a diffraction angle 2θ=27.000 to 29.980 deg in an X-ray diffraction pattern of the cerium oxide particles, a ratio Wa / Wb of a peak line width Wa at an intensity of 10% of the maximum intensity and a peak line width Wb at an intensity of 50% of the maximum intensity is 2.50 to 3.30.

The invention relates to a method of MR imaging of an object (10) placed in an examination volume of an MR system (1). It is an object of the invention to provide a method that enables improved MR imaging using partial echo acquisition. The method of the invention comprises the steps of: subjecting the object (10) to an imaging sequence comprising a series of RF excitations, wherein an echo signal is generated in the presence of a readout magnetic field gradient in each repetition time interval between successive RF excitations, wherein phase-encoding magnetic field gradients (P, S) are switched in each repetition time interval to sample a pre-defined region of k-space; acquiring the echo signals from the object (10) as partial echoes with different readout polarities, each echo signal being associated with either a first direction of the readout magnetic field gradient or a second direction of the readout magnetic field gradient which is opposite to the first direction, wherein the echo signals associated with the first and / or the second direction sample k-space sparsely in at least one phase-encoding direction (P, S); and reconstructing an MR image from the acquired echo signals. Furthermore, the invention proposes to apply a shift in k-space in the readout direction to the acquired echo signal data and to reconstruct an intermediate MR image for each of a number of different shift values, wherein a final MR image is computed from these intermediate MR images by selecting, for each voxel of the final MR image, the voxel value with the maximum intensity from the set of intermediate MR images at the respective voxel position. Signal loss caused by phase variations of the acquired partial echo signals can be avoided in this way. Moreover, the invention relates to an MR system (1) and to a computer program to be run on an MR system (1).

Methods and systems for predicting signal quality. An analytical instrument support system receives preliminary sample data collected from a short scan of a sample. The analytical instrument support system determines a maximum brightness intensity level from the preliminary sample data. The analytical instrument support system determines a performance level based at least on the maximum brightness intensity level. The analytical instrument support system determines an intensity-time model including a plurality of intensity levels and a plurality of exposure times, based at least on deviations of one or more intensity linear models, the one or more deviations associated with the determined performance level. The analytical instrument support device determines a first maximum intensity level based at least on a first corresponding exposure time and the intensity-time model, or determines a first parametric exposure time based at least on a first corresponding intensity level and the intensity-time model.

Apparatus for processing wafer-shaped articles, the apparatus comprising: a support configured to support a wafer-shaped article; and a heating assembly comprising an array of LEDs configured to heat a wafer-shaped article supported by the support; wherein the LEDs are configured to emit light having a maximum intensity at a wavelength that is greater than or equal to 550nm and less than or equal to 980nm.

The non-contact distance measuring machine (1) that illuminates the measuring light from the interferometer (30) to the side from the front end of the probe (20) comprises: a cylindrical light generating unit (21) that converts the measuring light from the interferometer (30) into cylindrical light; an optical element group that makes the cylindrical light from the cylindrical light generating unit (21) light along the extension axis (E) of the probe (20); a planar light generating unit (24) that converts the light along the extension axis (E) into light radiating outward from the extension axis (E), and converts the light reflected from the surface of the object to be measured (W) and returning inward from the extension axis (E) into light along the extension axis (E); an orientation detection unit (28) that detects the orientation that becomes the maximum intensity in the light returning to the planar light generating unit (24); and a spatial light modulation unit (25) that limits the light returning to the planar light generating unit (24) to the orientation detected by the orientation detection unit (28).

The embodiment of the invention provides a weather radar calibration method and device, equipment and a storage medium, and is applied to the technical field of radar calibration. The method comprises the following steps: carrying out one-dimensional section fitting on the obtained maximum intensity values of a distance direction, an azimuth direction and a pitching direction of a target sampling point to obtain corresponding fitting values; respectively calculating a corresponding beam width value, a beam center value and an amplitude maximum value according to each fitting value based on a preset calculation formula; and then parabola fitting is carried out on the distance to obtain the maximum amplitude value on a distance profile, then two-dimensional curved surface fitting is carried out by adopting the maximum amplitude values of different orientations and pitching, and finally the actual maximum amplitude value corresponding to the metal ball is determined. In this way, the accuracy and practicability of metal ball calibration can be remarkably improved.

The invention discloses a millimeter wave radar enhanced point cloud-based human body action recognition method, which comprises the following steps of: firstly, processing a radar echo signal through frame difference processing, 2D-FFT and a secondary density clustering algorithm, and enhancing the quality of a three-dimensional point cloud; then, organizing continuous seven frames of point clouds into a time sequence sample at a sliding step length of 2, independently performing voxelization processing on each frame of point clouds, performing maximum intensity projection frame by frame along the Y axis and the X axis, and generating a double-view projection image sequence of XOZ and YOZ planes; and finally, inputting the double-view-angle image sequence into an improved DVP-TransNet network which adopts double-branch ResNet50 to perform feature extraction, adaptively fusing double-view-angle features through a trainable weight module, and capturing time sequence dynamic features by using a Transformer encoder to finally realize high-precision classification of human body actions. According to the method, the action recognition accuracy rate up to 99.67% is achieved in a complex environment.

An apparatus for curing a coating composition disposed on a glass optical fiber. The apparatus includes a reflector having an interior surface that delineates a boundary of a cavity, the interior surface including a plurality of portions, each of the portions extending along a different curved profile. Further, each of the plurality of portions is configured to reflect curing light such that the reflected curing light is concentrated to a curing zone within the cavity, such that all of the reflected curing light within the curing zone has an intensity that is about 60% or greater relative to a maximum intensity of the reflected curing light. A fiber location of the glass optical fiber is positioned within the curing zone. Additionally, the plurality of portions includes at least a first portion and a second portion, the first portion having a different degree of curvature than the second portion.

Semiconductor laser (1) with - at least one surface-emitting semiconductor laser chip (4) comprising a semiconductor layer sequence (40) with at least one active zone (41) for generating laser radiation (L) and comprising a light-emitting surface (44) oriented perpendicular to a growth direction (G) of the semiconductor layer sequence (4) and at which the semiconductor laser chip (4) emits the laser radiation (L), and - a diffractive optical element (3) configured to expand and disperse the laser radiation (L), wherein - an optically effective structure (33) of the diffractive optical element (3) made of a material with a refractive index of at least 1.65, based on a wavelength of maximum intensity of the laser radiation (L), - the optically effective structure (33) is located on a side of the diffractive optical element (3) facing the semiconductor laser chip (4), and - a connecting means (5) for the diffractive optical element (3) is located at an edge of the diffractive optical element (3), such that the light exit surface (44) is at least partially free of the connecting means (5) and such that a gap (6) is formed at least partially between the diffractive optical element (3) and the light exit surface (44); wherein (i) the connecting element (5) is applied directly to the light-emitting surface (44) in a frame-like manner and is in direct contact with the diffractive optical element (3); or (ii) the semiconductor laser chip (4) has a growth substrate (2) on which the semiconductor layer sequence (40) is epitaxially grown, wherein the connecting means (5) and the semiconductor layer sequence (40) are arranged laterally spaced apart from each other on the growth substrate (2) and wherein the connecting means (5) is in direct contact with the growth substrate (2) and the diffractive optical element (3).

To impart X-ray opacity to an "existing structural color-based dental curable composition" including a polymerizable monomer and specific inorganic spherical particles, which has been known to provide a cured body that expresses a structural color having a predetermined color tone independent of the incidence angle of light, without adversely affecting the expression of an expected structural color or transparency in the cured body. The "existing structural color-based dental curable composition" is blended with a predetermined amount of an X-ray opaque filler formed of organic-inorganic composite particles in each of which a predetermined amount of rare earth metal fluoride particles that the full width at half maximum of the maximum intensity peak derived from the rare earth metal fluoride particles measured by an X-ray diffraction measurement method is 0.3° or more are dispersed in a resin matrix. A refractive index difference between the resin matrix and the polymerizable monomer of the "existing structural color-based dental curable composition" is 0.1 or less.

The invention relates to a headlight for a vehicle, comprising a light source unit (1) comprising a number of light sources (5), an optical unit (2.1, 2.2, 2.3, 2.4, 2.5, 2.6) comprising a number of imaging elements for generating a light distribution (L1, L5) in a vehicle front area (13), the light source unit (1) having a predetermined size, the optical unit (2.2, 2.3, 2.4, 2.5, 2.6) having a high distortion (D), and the optical unit (2.1, 2.2, 2.3, 2.4, 2.5, 2.6) having a high distortion (D). The light source unit (1) is configured such that the light distribution (L1, L5), in the region (14) of the light distribution, has a predetermined maximum intensity (Imax) within the light distribution, an illumination width (A5) which is greater than the illumination width (A1) when the light source unit (1) is imaged by means of an optical unit (2.1) having distortionless imaging.

Title: Method for mapping and analyzing at least one element of interest and associated device. The invention relates to a method for mapping and analyzing at least one element of interest contained in a sample (150) by optical emission spectrometry on a laser-produced plasma (160), comprising: - a step of producing a plasma (160) by focusing a laser beam (120) onto a surface of the sample (150); - a step of collecting optical emission from the plasma (160), defining an intensity signal; - a step of processing and analyzing the optical emission; and - characterized in that, during the processing and analysis step, the intensity signal is studied over its entire duration to identify a maximum intensity value. Figure for the abstract: Fig. 2

A device including a first solid-state light source configured to emit white light; a second solid-state light source configured to emit violet light having a dominant peak wavelength in a wavelength range from 380 to 420 nm; a collimator configured to collimate the white light along the main optical axis into a white light beam having a first spatial light distribution with a first Full Width Half Maximum (FWHM1); and a batwing optic configured to shape the violet light along the main optical axis into a batwing shaped light distribution with a maximum intensity at an angle α with respect to the main optical axis, such that the angle α is outside the first FWHM1.

The objective of this invention is to provide a light-absorbing anisotropic film capable of producing an image display device with excellent display performance and durability, as well as a laminate using the light-absorbing anisotropic film and an image display device. The light-absorbing anisotropic film of this invention is a light-absorbing anisotropic film used in an image display device, formed using a liquid crystal composition containing a liquid crystal compound and a dichroic substance. The relationship between the maximum intensity Imax in the thickness direction of the light-absorbing anisotropic film and the intensity Isur1 on the surface of the light-absorbing anisotropic film corresponding to the visual recognition side of the image display device, for a signal originating from the dichroic substance detected by time-of-flight secondary ion mass spectrometry, satisfies the following equation (I-1): 2.0 ≤ Imax / Isur1 … (I-1).