23results about How to "Excellent developability" patented technology

The negative photosensitive resin composition for a spacer includes an alkali-soluble acrylate resin in which polymers each composed of Chemical Formula 1 and Chemical Formula 2 are mixed with each other, a crosslinked acrylic monomer having at least two acrylic double bonds, a photopolymerization initiator, a silicon-based compound including an epoxy group or an amine group, and a solvent, the chemical formula 1 is synthesized by polymerizing 4, 4 '-(9H-fluorene-9-subunit) bisphenol, chloropropane methyl, acrylic acid and 4, 4'-diphthalic anhydride, and the chemical formula 2 is synthesized by polymerizing 1, 1, 2, 2-4 (p-hydroxyphenyl) ethane, chloropropane methyl, acrylic acid and 4, 4 '-diphthalic anhydride.

The invention relates to a crystal form of a compound I, a preparation method of the crystal form, and application of the crystal form in preparation of iron deficiency related treatment medicines for treating anemia accompanied with or not accompanied with iron deficiency. The novel crystal form of the compound I provided by the invention has the advantages of high solubility, good chemical stability, solid stability, mechanical stability and humidity stability, simple preparation method, easiness in crystal form control, low production amplification cost and the like, and has important value for development of the medicine in the future. # imgabs0 #

The invention discloses a corrosion inhibition developing solution and a preparation method and application thereof.The corrosion inhibition developing solution is prepared from quaternary ammonium hydroxide, binary acid, organic amine, polyhydric alcohol, a wetting agent, a stabilizer and water, through the synergistic effect of all the components, the corrosion speed of the corrosion inhibition developing solution on a metal aluminum substrate is low, and the corrosion inhibition developing solution has the good corrosion inhibition effect on the metal aluminum substrate. The problem of poor patterns caused by development of metal sensitive to alkali can be improved, meanwhile, the developing performance of the developing solution is excellent, and the loss of an unexposed region is smaller. In addition, the photoresist which can be developed by the anti-corrosion developing solution disclosed by the invention can be in a negative type and a positive type, and the type of the photoresist is not specially limited. According to the invention, the developing solution is prepared by using the wetting agent, so that the surface tension of the whole developing solution system can be obviously reduced under the condition that no surfactant except quaternary ammonium hydroxide is used, and the defect that the surface tension of the traditional developing solution is too large and the photoresist cannot be fully infiltrated is overcome; and the developing effect is not influenced by excessive foam.

The invention belongs to the technical field of photocuring, and relates to a nitrocarbazole (ketone) oxime ester compound, a product containing the same and application of the nitrocarbazole (ketone) oxime ester compound. Specifically, compared with existing and commercial photoinitiators, the structure of the compound provided by the invention has the advantage that the photosensitive property, especially the photosensitive property under long wavelength, of the compound is improved.

The present invention relates to a sulfonic acid derivative of naphthalimide and a photo-acid generator and photoresist composition each containing the sulfonic acid derivative of naphthalimide, more specifically, to a sulfonic acid derivative of naphthalimide compound and a photo-acid generator and photoresist composition each containing the sulfonic acid derivative of naphthalimide compound, wherein the sulfonic acid derivative of naphthalimide compound has excellent absorbency to light of i-line (365 nm) wavelength, is very easy to prepare a polymerizable composition due to having very high solubility in an organic solvent, and has excellent thermal stability, and exhibits a good acid yield.

Disclosed are a photosensitive resin composition, use thereof, a display device, and a semiconductor device. The photosensitive resin composition comprises: an alkali-soluble resin, a polymerizable monomer different from the alkali-soluble resin, and a photoinitiator comprising at least one oxime ester compound represented by Formula I. The oxime ester compound represented by Formula I has high thermal stability, good solubility in solvents commonly used for preparing photosensitive resin compositions, and can impart good film-forming properties, developability, and photosensitivity to the photosensitive resin composition. The photosensitive resin composition is suitable for use in preparing photo-cured materials such as a photoresist for semiconductors, a colored photoresist, a photo-spacer, etc. The definitions of the substituents in Formula I are as described in the specification and claims.[Formula I]

An object of the present invention is to provide a resin composition which does not inhibit photocuring reaction in an exposure step, and can confer excellent alkaline developability in a development step, when used in the fabrication of a multilayer printed wiring board; and a resin sheet, a multilayer printed wiring board, and a semiconductor device. The resin composition of the present invention contains: a compound (A) represented by the following formula (1); and a compound (B) containing one or more carboxy groups, other than the compound (A) represented by the following formula (1): wherein each R1 independently represents a group represented by the following formula (2) or a hydrogen atom; and each R2 independently represents a hydrogen atom, or a linear or branched alkyl group having 1 to 6 carbon atoms, provided that at least one R1 is a group represented by the following formula (2): wherein -* represents a bonding hand.

The present invention addresses the problem of providing: a lithographic printing plate precursor which exhibits excellent on-press developability, exhibits excellent printing durability when formed into a lithographic printing plate, and is capable of suppressing the occurrence of fouling; a method for producing a lithographic printing plate using the lithographic printing plate precursor; and a printing method. This lithographic printing plate precursor is provided with an aluminum support and an image recording layer, and is characterized in that the aluminum support comprises an aluminum plate and an anodized film of aluminum disposed on the aluminum plate, and the anodized film is positioned closer to the image recording layer side than the aluminum plate. The anodized film has micropores extending in the depth direction from the surface on the image recording layer side, the aperture ratio by the micropores is 20-70%, the gradient a45 at the surface on the image recording layer side of the anodized film is 3-25%, and the arithmetic average roughness Ra at the surface on the image recording layer side of the anodized film is 0.25-0.60 [mu] m.

The application provides a thick film positive photoresist composition, a preparation method and application thereof. The thick film positive photoresist composition comprises 70-90 parts of a base resin, 10-30 parts of a photosensitive compound and 100-150 parts of a solvent A; the base resin comprises a benzophenone modified phenolic resin and optionally an unmodified phenolic resin; the mass percentage of benzophenone groups in the base resin is 0.8-7.5% based on 100% of the mass percentage of the base resin; the photosensitive compound comprises a non-benzophenone photosensitive compound and optionally a benzophenone compound; the mass percentage of the benzophenone compound is less than or equal to 3.0% based on 100% of the mass percentage of the photosensitive compound. The application improves the uniformity of the benzophenone structure in the thick film positive photoresist composition by designing the specific composition of the thick film positive photoresist composition, thereby improving the steepness of the photoresist and realizing the development of the pattern.

The utility model provides a flow choking film. The flow choking film comprises a micro-nano developing film, an endothelialization promoting coating and a hydrophilic coating, wherein the endothelialization promoting coating and the hydrophilic coating are sequentially arranged on the surface of the micro-nano developing film; and the thickness of the coating for promoting endothelialization is 50nm-8mu m. According to the utility model, the specific structural design is adopted for the flow choking membrane, namely, the endothelialization promoting coating and the hydrophilic coating are sequentially arranged on the surface of the micro-nano developing membrane, and the thickness of the endothelialization promoting coating is controlled to be within a specific range, so that the flow choking membrane has a good developing effect, and can inhibit thrombosis and promote endothelialization creeping of cells.

The present invention addresses the problem of providing a photosensitive resin composition set and the like capable of producing an optical waveguide having excellent developability and flame retardancy, a low shrinkage rate, and small optical transmission loss. The solution is that the photosensitive resin composition set comprises a resin composition for a core and a resin composition for a coating, the core resin composition and the coating resin composition each contain (A) a carboxyl group-containing resin, (B) an epoxy resin, (C) a photocurable resin, (D) a photopolymerization initiator, and (E) one or more flame retardants selected from the group consisting of phosphate ester compounds and phosphazene compounds. When the content (mass%) of the component (E) in the coating resin composition is represented by Eclad and the content (mass%) of the component (E) in the core resin composition is represented by Ecore, Eclad-Ecore satisfies 0.6 to 12 inclusive, and the content (mass%) of the component (E) in the coating resin composition is represented by Eclad and the content (mass%) of the component (E) in the core resin composition is represented by Ecore, the content (mass%) of the component (E) in the coating resin composition is represented by 100 mass%. The content (mass%) of the (E) component in the core resin composition is the content when the non-volatile component of the core resin composition is set to 100 mass%.

An object of the present invention is to provide a resin composition which has excellent photocurability for various active energy rays, in particular, an active energy ray including an h-line at a wavelength of 405 nm, without inhibiting photocuring reaction in an exposure step, and can confer excellent alkaline developability in a development step, when used in the fabrication of a multilayer printed wiring board; and a resin sheet, a multilayer printed wiring board, and a semiconductor device. The resin composition of the present invention is a resin composition containing: a maleimide compound (A) containing a constituent unit represented by the formula (1), and maleimide groups at both ends of the molecular chain; a photo initiator (B1) represented by the formula (2) and / or a photo initiator (B2) represented by the formula (3); and a photo initiator (C) represented by the formula (4):

The invention discloses a KOH developing solution composition for an integrated circuit. The composition is prepared from inorganic alkali, a developing enhancer, a cardanol Schiff base surfactant and high-purity water. The developing solution has the characteristics of excellent developing performance, good wettability, few metal impurities, small foam, no corrosion to a metal aluminum substrate, easiness in rinsing, no residue on a chip, no pollution to the environment and the like, and can meet the use performance and cleanliness requirements of a chip integrated circuit.

The invention provides a pyrazoline sensitizer, a preparation method of the pyrazoline sensitizer, a photosensitive resin composition containing the pyrazoline sensitizer and application of the photosensitive resin composition. The pyrazoline sensitizer has a structure as shown in a formula I; the pyrazoline sensitizer has an excellent sensitizing effect, and is good in compatibility with resin and the like, so that the photosensitive resin composition containing the sensitizer is short in curing time, the ultraviolet curing efficiency is remarkably improved, and the pyrazoline sensitizer is particularly suitable for a UV-LED light curing system.

The present invention discloses a regional information analysis system based on human-computer interaction, which relates to the technical field of regional information analysis, including a data acquisition unit, a terrain analysis unit, a road planning analysis unit, and a human-computer interaction module; at the data acquisition and analysis level, a grid network is used to establish acquisition nodes to obtain rich data, the terrain analysis unit can accurately evaluate the regional terrain level and undulation, and the road planning analysis unit determines the road planning route based on the data screening nodes, and the user can easily select the region to input keywords. The system determines the matching theme through natural language processing and word vector calculation, triggers the corresponding analysis unit, and displays the results intuitively and clearly, meets personalized needs, and improves information acquisition and decision-making efficiency; in terms of practicality, it is widely applicable to planning fields such as cities, transportation, and resource development, especially plays an important role in areas with complex terrain, accurately evaluates and plans, avoids waste of resources, and helps regional development and construction and transportation facilitation.

The invention discloses a developer for slowing down the corrosion of AlN substrate and a preparation method thereof. The developer comprises the following raw materials: quaternary ammonium hydroxide, a surfactant, a defoamer, an anticorrosive agent and water. In the process of preparing photoresist, the developer for slowing down the corrosion of AlN substrate of the invention has less corrosion to the AlN film in the bottom coating of the photoresist or in the area in contact with the photoresist, reduces the foam of the developer, enhances the development effect, and improves the yield rate of the product.

The invention provides a positive photosensitive resin composition, a photosensitive film, a resist film, a resist underlayer film, a resist permanent film, and a method for producing the film. The positive photosensitive resin composition contains the following components A to E. Component A: a novolac-type phenolic resin having an acetal group protecting group, the novolac-type phenolic resin containing a phenol structural unit derived from cresol and one or more aldehyde structural units derived from formaldehyde or salicylaldehyde; component B: a photoacid generator; component C: one or more resins selected from the group consisting of novolac phenolic resins, polyimide resins, and polybenzoxazole resins that do not have an acetal group protecting group; a component D: a naphthoquinone-type photosensitizer; and component E: a solvent.

The application discloses an etching process of screen cloth for silk screen printing, and relates to the technical field of silk screen printing.The etching process of screen cloth for silk screen printing comprises the following steps: S1, taking a silk screen and a screen frame according to printing requirements, cleaning, drying, tightly fixing the cleaned silk screen on the screen frame, and adjusting the tension to 20N-25N; S2, uniformly coating a photosensitive glue on the surface of the silk screen, drying, and obtaining a photosensitive film; S3, preparing a positive film according to printing requirements, combining the positive film with the photosensitive film, exposing under iodine gallium lamp light, then soaking in water, cleaning, and drying to obtain a developed screen printing plate; S4, checking the developed screen printing plate, repairing the missing part, and drying after repairing; and S5, smearing a curing agent on the surface of the repaired screen printing plate, curing, and obtaining the screen cloth.The photosensitive glue prepared by the application has good thermal stability and developing effect, and the prepared screen cloth has higher resolution.

An object of the present invention is to provide a resin composition and a resin sheet which have excellent photocurability for an active energy ray including an i-line with a wavelength of 365 nm in an exposure step, and can confer excellent alkaline developability in a development step, in the fabrication of a multilayer printed wiring board; and a high density printed wiring board and semiconductor device having a highly detailed resist pattern using the same. The resin composition of the present invention contains: a maleimide compound (A) containing a constituent unit represented by the following formula (1), and maleimide groups at both ends of the molecular chain; and a photo initiator (B) having an absorbance of 2.0 or more at a wavelength of 365 nm (i-line):

The present invention aims to provide a lithographic printing plate precursor having excellent on-press developability, good printing durability when made into a lithographic printing plate, and capable of suppressing the occurrence of slipping, as well as a method for manufacturing a lithographic printing plate using the lithographic printing plate precursor and a printing method. The lithographic printing plate precursor of the present invention comprises an aluminum support and an image recording layer, wherein the aluminum support comprises an aluminum plate and an aluminum anodized film disposed on the aluminum plate, the anodized film being located closer to the image recording layer side than the aluminum plate, the anodized film having micropores extending from the surface on the image recording layer side in the depth direction, the opening ratio based on the micropores being 20 to 70%, the steepness a45 on the surface on the image recording layer side of the anodized film being 3 to 25%, and the arithmetic mean roughness Ra on the surface on the image recording layer side of the anodized film being 0.25 to 0.60 μm.

The present application relates to a protein-drug conjugate, containing an antigen binding protein portion and a drug conjugate portion. The antigen binding protein portion comprises one or more antigen binding fragments, and at least two linker peptides are directly or indirectly connected to the antigen binding fragments. The two linker peptides can each independently contain a first cysteine Cys1 and a second cysteine Cys2. The drug conjugate portion is covalently bonded on Cys1. The present application further relates to a preparation method for the protein-drug conjugate, and a use for the protein-drug conjugate in preventing or treating tumors or other diseases.

The invention belongs to the field of visualization platforms, and particularly relates to a python-based geophysical data visualization platform and method.The python-based geophysical data visualization platform comprises a user interface module, a data management module and a visualization selection module, the data management module is connected with the user interface module, and the visualization selection module is connected with the data management module. The visual selection module is connected with the user interface module, the data management module comprises a data import module, a data export module, a data conversion module and a data preview module, the data import module is connected with the data management module, the data export module is connected with the data management module, and the data conversion module is connected with the data preview module. And the data conversion module is connected with the data management module. The method is reasonable in design, a user can modify the visualization effect in multiple links including colors, graph attributes, interpolation methods and the like, the user can obtain satisfactory visualization results conveniently, and analysis and explanation of geophysical data are facilitated.