The present invention provides a composition and the
photo curing property, closing property, demoulding property, residual film property, pattern shape, screening character (I), screening character (II) and
etching property of which are all excellent. The photo-curing composition according to the invention includes the following components: (a) a polymerized compound, (b) a photopolymerization evocating agent and / or photo-acid generating agent with the
mass percentage between 0.1 to 15 percent, (c) at least one surfactant selected from
fluorine-containing surfactant,
siloxane surfactant and
fluorine-containing
siloxane surfactant, besides (d) the
viscosity of the composition is between 3 to 18 Pa*s at 25 degree centigrade, wherein, the (a) polymerized compound contains (e) a polymerized
unsaturated monomer and the
skin initial stimulus index (PII value) of which is below 4.0, and the (f) a polymerized
unsaturated monomer and the
viscosity of which is below 30 mPa*s at 25 degree centigrade, and the content of the polymerized
unsaturated monomer is above 50
mass percentage, (wherein, the polymerized unsaturated
monomer of the (e) and the polymerized unsaturated
monomer of the (f) can be the polymerized unsaturated
monomer which are same at some parts or totally).