Light solidifying composition and pattern forming method using the same

Abstract

The present invention provides a composition and the photo curing property, closing property, demoulding property, residual film property, pattern shape, screening character (I), screening character (II) and etching property of which are all excellent. The photo-curing composition according to the invention includes the following components: (a) a polymerized compound, (b) a photopolymerization evocating agent and / or photo-acid generating agent with the mass percentage between 0.1 to 15 percent, (c) at least one surfactant selected from fluorine-containing surfactant, siloxane surfactant and fluorine-containing siloxane surfactant, besides (d) the viscosity of the composition is between 3 to 18 Pa*s at 25 degree centigrade, wherein, the (a) polymerized compound contains (e) a polymerized unsaturated monomer and the skin initial stimulus index (PII value) of which is below 4.0, and the (f) a polymerized unsaturated monomer and the viscosity of which is below 30 mPa*s at 25 degree centigrade, and the content of the polymerized unsaturated monomer is above 50 mass percentage, (wherein, the polymerized unsaturated monomer of the (e) and the polymerized unsaturated monomer of the (f) can be the polymerized unsaturated monomer which are same at some parts or totally).

Description

technical field [0001] The present invention relates to a photocurable composition and a pattern forming method using the same. Background technique [0002] The nanoimprint method is a technology that develops the embossing technology known in optical disc manufacturing, and presses a metal mold prototype (generally called a mold, master plate, template, etc.) formed with a concave-convex pattern onto a resist, Make it mechanically deform, and transfer the fine pattern precisely. Once the mold is made, nanostructures can be easily and repeatedly molded, so it is economical, and since it is a nanofabrication technology with less harmful waste and discharge, it is expected to be applied to various fields in recent years. [0003] In the nanoimprint method, there are two proposals: that is, the case of using a thermoplastic resin as the material to be processed (S. Chou et al.: Appl. Phys. Lett Vol. 67, 114, 3314 (1995)) and The case of using a photocurable composition (M. C...

AI Technical Summary

Problems solved by technology

In the coating method of spinning after dripping at the center, although good coating uniformity can be obtained, for example, when using a large substrate with an angle of 1 m, the anti-corrosion film that is shaken off during rotation (during rotation) is discarded. The amount of etchant is quite large, and in addition, the cracking of the substrate caused by high-speed rotation and the problem of ensuring the production tact time (tact time)

In addition, there is a problem that since the coating performance in the method of spinning after dripping at the center depends on the rotation speed during rotation and the coating amount of the resist, it should be further applied to the fifth-generation substrate that is being enlarged. , there is no general-purpose motor that can provide the required acceleration, and when such a motor is specially ordered, the component cost increases

[0037] However, in addition to the above points (1) to (3), the technical difficulty of the nanoimprint photocurable composition is further increased from the viewpoints of the following (4), (5), and (6)

[0038] (4) When a hydrophobic resist film is used in order to improve the peelability with the mold, the wettability of the etching solution and the resist is further deteriorated, and etching residues are easily generated;

[0039] (5) Since the photocurable composition adopts a three-dimensional network structure, it is difficult to peel off compared with a positive resist. In addition, when the network structure is made stronger, although the etching resistance is improved, it becomes more difficult to peel;

[0041] For the photocurable composition for nanoimprinting, although various materials have been disclosed, there is no nanomaterial suitable for use in any of the photolithography process, etching process, and peeling process of nanoimprinting. Guidelines for Disclosure of Imprint Materials and Design of Materials

In addition, the photocurable compositions known so far in the application of inkjet compositions and protective films for magneto-optical disks have common parts in materials in the photolithography process, but do not have an etching process and a peeling process, which is different from etching. Resists are very different

Therefore, when the photocurable resin used in these applications is directly used as an etching resist, problems often arise in the etching process and the peeling process.